Patent Application
20210333219
The present disclosure relates to methods of determining a distance between a probe and a wafer held by a wafer probe station. More particularly, the present disclosure relates to methods of determining a distance between a probe tip and a wafer held by a wafer probe station.
As the demand for electronic devices has been increasing nowadays, the quality of the components of the electronic devices correspondingly becomes an important issue of the semiconductor industry. Apart from the improving technology of manufacture for the components, the accuracy of testing for the components has also become more important.
For example, wafer probe stations are in general used to test the quality of the wafers or dies in the semiconductor industry. Hence, the operational accuracy of wafer probe stations is undoubtedly concerned.
A technical aspect of the present disclosure is to provide a method of determining a first distance between a probe and a wafer held by a wafer probe station, which can obtain accurately the distance between the tip of the probe and the wafer in a simple and easy manner.
According to an embodiment of the present disclosure, a method of determining a first distance between a probe and a wafer held by a wafer probe station is provided. The method includes adjusting a microscope at a specific magnification; moving the microscope perpendicularly relative to a chuck to focus on the chuck to obtain a clear image of the chuck; defining a specific position of the microscope after the clear image of the chuck is obtained; maintaining the specific magnification of the microscope and moving the microscope perpendicularly relative to the chuck from the specific position by a travelling distance to focus on the probe to obtain a clear image of the probe; and determining the travelling distance minus a thickness of a wafer to be placed on a side of the chuck facing to the microscope as the first distance between the probe and the wafer.
In one or more embodiments of the present disclosure, the specific magnification is the maximum magnification of the microscope.
In one or more embodiments of the present disclosure, focusing on the probe includes focusing on a tip of the probe.
In one or more embodiments of the present disclosure, the method further includes determining the travelling distance of the microscope perpendicularly relative to the chuck from the specific position as a second distance between the probe and the chuck.
In one or more embodiments of the present disclosure, the probe includes a first portion and a second portion. The second portion is connected to a first end of the first portion and is located between the first portion and the chuck. The second portion has a length along a direction perpendicular to the chuck. A second end of the second portion away from the first end defines a tip. The focusing on the probe to obtain a clear image of the probe includes focusing on the first end to obtain a clear image of the first end. The method further includes determining the travelling distance minus the length of the second portion as a third distance between the tip and the chuck.
In one or more embodiments of the present disclosure, the method further includes determining the travelling distance minus the length of the second portion and the thickness of the wafer as a fourth distance between the tip and the wafer.
According to an embodiment of the present disclosure, a method of determining a first distance between a probe and a wafer held by a wafer probe station is provided. The method includes adjusting a microscope at a specific magnification; moving the microscope perpendicularly relative to the wafer to focus on the wafer to obtain a clear image of the wafer; defining a specific position of the microscope after the clear image of the wafer is obtained; maintaining the specific magnification of the microscope and moving the microscope perpendicularly relative to the wafer from the specific position by a travelling distance to focus on the probe to obtain a clear image of the probe; and determining the travelling distance as the first distance between the probe and the wafer.
In one or more embodiments of the present disclosure, the specific magnification is the maximum magnification of the microscope.
In one or more embodiments of the present disclosure, focusing on the probe includes focusing on a tip of the probe.
In one or more embodiments of the present disclosure, the probe includes a first portion and a second portion. The second portion is connected to a first end of the first portion and is located between the first portion and the wafer. The second portion has a length along a direction perpendicular to the wafer. A second end of the second portion away from the first end defines a tip. The focusing on the probe to obtain a clear image of the probe includes focusing on the first end to obtain a clear image of the first end. The method further includes determining the travelling distance minus the length of the second portion as a second distance between the tip and the wafer.
When compared with the prior art, the above-mentioned embodiments of the present disclosure have at least the following advantages:
(1) Since no extra tool is employed to determine the first distance between the probe and the wafer, the distance determining method provides a simple and easy way to obtain accurately the first distance between the probe, or the tip of the probe, and the wafer.
(2) According to the first distance between the probe, or the tip of the probe, and the wafer accurately determined, the user can move the chuck towards the probe until the wafer is precisely in contact with the tip of the probe in a safe manner. In this way, the accident that the wafer crashes with the probe when the chuck is moved towards the probe can be effectively avoided.
(3) Even if the tip of the probe is located substantially and vertically below the first end of the first portion and the tip of the probe is uneasy to be seen by the microscope, the sixth distance between the tip of the probe and the wafer can still be accurately determined. Similarly, according to the sixth distance between the probe, or the tip of the probe, and the wafer accurately determined, the user can move the chuck towards the probe until the wafer is precisely in contact with the tip of the probe in a safe manner. In this way, the accident that the wafer crashes with the probe when the chuck is moved towards the probe can be effectively avoided.
The disclosure can be more fully understood by reading the following detailed description of the embodiments, with reference made to the accompanying drawings as follows:
Drawings will be used below to disclose embodiments of the present disclosure. For the sake of clear illustration, many practical details will be explained together in the description below. However, it is appreciated that the practical details should not be used to limit the claimed scope. In other words, in some embodiments of the present disclosure, the practical details are not essential. Moreover, for the sake of drawing simplification, some customary structures and elements in the drawings will be schematically shown in a simplified way. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts.
Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meanings as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and the present disclosure, and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
Reference is made to
Reference is made to
(1) Adjusting the microscope 150 at a specific magnification (Step 310). In practical applications, for example, the microscope 150 is adjusted to reach the maximum magnification. At the maximum magnification, the range of the depth of focus (DOF) of the microscope 150 is the narrowest, which means a clear image can be obtained by the microscope 150 in the most accurate manner at the maximum magnification. In other embodiments, the microscope 150 can be adjusted to use other values of magnification according to the actual conditions. However, this does not intend to limit the present disclosure.
(2) Moving the microscope 150 perpendicularly relative to the chuck 110 to focus on the chuck 110 to obtain a clear image of the chuck 110 (Step 320). After the microscope 150 is adjusted to reach the maximum magnification as mentioned above, the microscope 150 is moved perpendicularly relative to the chuck 110 until the image of the chuck 110 is clearly focused by the microscope 150. In other words, the microscope 150 is moved towards the chuck 110 or away from the chuck 110 until the image of the chuck 110 is clearly focused by the microscope 150.
(3) Defining a specific position P of the microscope 150 after the clear image of the chuck 110 is obtained by the microscope 150 (Step 330). At the point that the image of the chuck 110 is clearly focused by the microscope 150, i.e., the clear image of the chuck 110 is obtained, the position of the microscope 150 with the chuck 110 in focus is particularly defined as the specific position P. When the microscope 150 is positioned at the specific position P, a second distance D2 between the microscope 150 and the chuck 110 is of a specific value and defined by the microscopes objective working distance. In contrast, when the image of the chuck 110 obtained by the microscope 150 is clear, it can be understood that the second distance D2 between the microscope 150 and the chuck 110 is of the specific value and is the same as the microscopes objective working distance. Moreover, since the range of the depth of focus (DOF) of the microscope 150 is the narrowest at the maximum magnification as mentioned above, the specific value of the second distance D2 between the microscope 150 and the chuck 110 is accurate. As shown in
(4) Maintaining the specific magnification to be the maximum magnification of the microscope 150 and moving the microscope 150 perpendicularly relative to the chuck 110 from the specific position P by a travelling distance DT to focus on the probe 140 to obtain a clear image of the probe 140 (Step 340). When the image of the probe 140 obtained by the microscope 150 is clear, a third distance D3 between the microscope 150 and the probe 140 is of the same specific value as the second distance D2 between the microscope 150 and the chuck 110 when the microscope 150 is positioned at the specific position P as mentioned above. As a result, a fourth distance D4 between the probe 140 and the chuck 110 can be determined to be equal to the travelling distance DT after the clear image of the probe 140 is obtained by the microscope 150. As shown in
It is worth to note that, the Step 340 and the Step 320 are practically interchangeable. This means, the probe 140 can be focused to obtain a clear image of the probe 140 first before a clear image of the chuck 110 is obtained, or the chuck 110 can be focused to obtain a clear image of the chuck 110 first before a clear image of the probe 140 is obtained, according to the actual situation.
(5) Determining the travelling distance DT minus a thickness T of a wafer 200 to be placed on a side of the chuck 110 facing to the microscope 150 as the first distance D1 between the probe 140 and the wafer 200 (Step 350), as shown in
Since no extra tool is employed to determine the first distance D1 between the probe 140 and the wafer 200, the distance determining method 300 provides a simple and easy way to obtain accurately the first distance D1 between the probe 140, or the tip 141 of the probe 140, and the wafer 200.
Moreover, according to the first distance D1 between the probe 140, or the tip 141 of the probe 140, and the wafer 200 accurately determined, the user can move the chuck 110 towards the probe 140 until the wafer 200 is precisely in contact with the tip 141 of the probe 140 in a safe manner. In this way, the accident that the wafer 200 crashes with the probe 140 when the chuck 110 is moved towards the probe 140 can be effectively avoided.
Reference is made to
Subsequently after a wafer 200 is placed on the chuck 110 for testing, in this embodiment, the distance determining method 300 further includes the step of determining the fifth distance D5 (which is equal to the travelling distance DT minus the length L of the second portion 140b as mentioned above) minus the thickness T of the wafer 200 as a sixth distance D6 between the tip 141 of the probe 140 and the wafer 200 (Step 370). In other words, even if the tip 141 of the probe 140 is substantially located vertically below the first end of the first portion 140a and the tip 141 of the probe 140 is uneasy to be seen by the microscope 150, the sixth distance D6 between the tip 141 of the probe 140 and the wafer 200 can still be accurately determined. Similarly, according to the sixth distance D6 between the tip 141 of the probe 140 and the wafer 200 accurately determined, the user can move the chuck 110 towards the probe 140 until the wafer 200 is precisely in contact with the tip 141 of the probe 140 in a safe manner. In this way, the accident that the wafer 200 crashes with the probe 140 when the chuck 110 is moved towards the probe 140 can be effectively avoided.
Please be noted that in other embodiments, however, the second portion 140b as shown in
Reference is made to
In details, in this embodiment as shown in
(1) Adjusting the microscope 150 at a specific magnification (Step 410). Similarly, for the sake of accuracy, the microscope 150 is adjusted to reach the maximum magnification.
(2) Moving the microscope 150 adjusted with the maximum magnification perpendicularly relative to the wafer 200 to focus on the wafer 200 to obtain a clear image of the wafer 200 (Step 420).
(3) Defining a specific position P of the microscope 150 after the clear image of the wafer 200 is obtained (Step 430).
(4) Maintaining the specific magnification to be the maximum magnification of the microscope 150 and moving the microscope 150 perpendicularly relative to the wafer 200 from the specific position P by a travelling distance DT to focus on the probe 140 to obtain a clear image of the probe 140 (Step 440).
Similarly, it is worth to note that, the Step 440 and the Step 420 are practically interchangeable. This means, the probe 140 can be focused to obtain a clear image of the probe 140 first before a clear image of the wafer 200 is obtained, or the wafer 200 can be focused to obtain a clear image of the wafer 200 first before a clear image of the probe 140 is obtained, according to the actual situation.
(5) Determining the travelling distance DT as the first distance D1 between the probe 140 and the wafer 200 (Step 450).
Similarly, since no extra tool is employed to determine the first distance D1 between the probe 140 and the wafer 200, the distance determining method 400 provides a simple and easy way to obtain accurately the first distance D1 between the probe 140, or the tip 141 of the probe 140, and the wafer 200.
Moreover, according to the first distance D1 between the probe 140, or the tip 141 of the probe 140, and the wafer 200 accurately determined, the user can move the chuck 110 towards the probe 140 until the wafer 200 is precisely in contact with the tip 141 of the probe 140 in a safe manner. In this way, the accident that the wafer 200 crashes with the probe 140 when the chuck 110 is moved towards the probe 140 can be effectively avoided.
In conclusion, when compared with the prior art, the aforementioned embodiments of the present disclosure have at least the following advantages:
(1) Since no extra tool is employed to determine the first distance between the probe and the wafer, the distance determining method provides a simple and easy way to obtain accurately the first distance between the probe, or the tip of the probe, and the wafer.
(2) According to the first distance between the probe, or the tip of the probe, and the wafer accurately determined, the user can move the chuck towards the probe until the wafer is precisely in contact with the tip of the probe in a safe manner. In this way, the accident that the wafer crashes with the probe when the chuck is moved towards the probe can be effectively avoided.
(3) Even if the tip of the probe is located substantially and vertically below the first end of the first portion and the tip of the probe is uneasy to be seen by the microscope, the sixth distance between the tip of the probe and the wafer can still be accurately determined. Similarly, according to the sixth distance between the probe, or the tip of the probe, and the wafer accurately determined, the user can move the chuck towards the probe until the wafer is precisely in contact with the tip of the probe in a safe manner. In this way, the accident that the wafer crashes with the probe when the chuck is moved towards the probe can be effectively avoided.
Although the present disclosure has been described in considerable detail with reference to certain embodiments thereof, other embodiments are possible. Therefore, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein.
It will be apparent to the person having ordinary skill in the art that various modifications and variations can be made to the structure of the present disclosure without departing from the scope or spirit of the present disclosure. In view of the foregoing, it is intended that the present disclosure cover modifications and variations of the present disclosure provided they fall within the scope of the following claims.
