Claims
- 1. A method for forming an ultra hard, dual band anti-reflection coating for a window comprising:
- forming a first silicon layer of predetermined thickness;
- forming a first diamond like carbon layer less than 0.5 micron thick on said first silicon layer;
- forming a second silicon layer less than 0.5 micron thick on said first diamond like carbon layer; and
- forming a second DLC layer less than 1 micron thick on said second silicon layer to produce a coating which passes radiation in both the approximate 2-5 and 7-12 micron range.
- 2. A method according to claim 1 wherein forming a said first silicon layer is by ion aided electron beam deposition.
Parent Case Info
This is a divisional of application Ser. No. 07/400,606 filed Aug. 30, 1989.
US Referenced Citations (8)
Divisions (1)
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Number |
Date |
Country |
Parent |
400606 |
Aug 1989 |
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