1. Field of the Invention
The invention relates, in general, to flash memory devices and, more particularly, to a method of forming a gate of a flash memory device.
2. Discussion of Related Art
As the level of integration of flash memory devices increases, a metal line formation method using the damascene method instead of the conventional Reactive Ion Etching (RIE) method is increasingly used. This is because in memory devices of 60 nm or less, a tungsten gate has a narrow width of 60 nm or less and is difficult to pattern using the conventional RIE method. In the case where a tungsten silicide (WSi) gate is used, it is difficult to secure a gate line. In the case where a target is increased so as to secure resistance, it results in increased intra-capacitance. Furthermore, a hard mask layer, a tungsten silicide layer, a polysilicon layer, and an oxide layer must be etched at the same time even at the time of gate etch. In the case where a tungsten gate is formed using the RIE method, it is difficult to form a spacer because of tungsten oxidization and the reliability of the gate is low due to thermal budget. In addition, in the case where the conventional tungsten (W) single damascene method is used, a first polysilicon layer pattern must be formed at the ISO level and the coupling ratio is decreased due to misalignment.
Accordingly, the invention provides a method of forming a gate of a flash memory device, wherein gate pattern margin can be increased and capacitance between gates can be decreased.
According to one aspect, the invention provides a method of forming a gate of a flash memory device, including the steps of forming a gate on a semiconductor substrate and forming an oxide layer on the entire surface of the gate, forming a nitride layer on a sidewall of the oxide layer in a spacer form, performing a polishing process so that a top surface of the gate is exposed, and then stripping the nitride layer to form an opening, forming a barrier metal layer on a sidewall of the opening, and forming a tungsten layer in the opening.
Specific embodiments according to the invention are described below with reference to the accompanying drawings.
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As described above, the method of forming the gate of the flash memory device according to the invention has the following advantages.
First, the tungsten layer is formed on the second polysilicon layer. Accordingly, gate pattern margin can be increased.
Second, a coupling ratio at the interface between the first and second polysilicon layers can be increased.
Third, the tungsten layer is not formed until the spacer is formed. Accordingly, subsequent thermal budget can be reduced.
Fourth, the resistance of the tungsten layer can be kept constant because α-carbon is used as the hard mask.
Fifth, since the SAC nitride layer is partially etched, the SAC nitride layer can be prevented from being opened.
Sixth, the CD between the gates can be controlled by forming the oxide layer or the nitride layer on the sidewall of the opening.
Seventh, capacitance between the gates can be controlled by lowering the height of the second polysilicon layer and the tungsten layer.
Eighth, etch process margin can be secured when forming the opening due to a reduction in the height of the gate.
Although the foregoing description has been made with reference to various embodiments, changes and modifications of the invention may be made by those of ordinary skill in the art without departing from the spirit and scope of the invention.
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10-2006-0058779 | Jun 2006 | KR | national |
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10-2002-0056141 | Jul 2002 | KR |
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Number | Date | Country | |
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20080003754 A1 | Jan 2008 | US |