Claims
- 1. A method for making an amorphous electrolyte for an electrochemical cell comprising the steps of:
- a) selecting a sputtering apparatus chosen from the group consisting of rf magnetron sputterers and diode sputterers for deposition of thin films;
- b) selecting a lithium orthophosphate target material for sputtering in said sputtering apparatus;
- c) selecting a pure Nitrogen process gas for operation in said sputtering apparatus;
- d) operating said sputtering apparatus at a total gas pressure of 20 milliTorr and a total gas flow rate of at least 14 sccm; and
- e) depositing said electrolyte at an average rate of 8 Angstroms per minute.
Parent Case Info
This application is a division of application Ser. No. 07/921,538 filed Jul. 29, 1992 now U.S. Pat No. 5,338,625.
Government Interests
This invention was made with Government support under Contract No. DE-AC05-84OR21400 awarded by the U.S. Department of Energy to Martin Marietta Energy Systems, Inc. The Government has certain rights in this invention.
US Referenced Citations (4)
Number |
Name |
Date |
Kind |
4412901 |
Hartwig |
Nov 1983 |
|
5141614 |
Akridge et al. |
Aug 1992 |
|
5171413 |
Arntz et al. |
Dec 1992 |
|
5202201 |
Meunier et al. |
Apr 1993 |
|
Non-Patent Literature Citations (2)
Entry |
Vossen et al., "Thin Film Process", Academic Press, 1978, pp. 150.156. |
Maissel et al., "Handbook of Thin Film Technology", 1970, pp. 4-17 to 4-19 and 4-35 to 4-38. |
Divisions (1)
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Number |
Date |
Country |
Parent |
921538 |
Jul 1992 |
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