Claims
- 1. In a method of making a ventricular catheter for controlling the condition of hydrocephalus by relieving the excessive cerebrospinal fluid pressure comprising the steps of
- covering at least one end portion of each of a plurality of microtubular members with a mask having a plurality of microscopic openings therein,
- placing said covered microtubular members in a vacuum environment, and
- exposing said mask to a beam of ions whereby perforations are produced in said end portions of said microtubular members.
- 2. A method of making a ventricular catheter as claimed in claim 1 wherein the microtububular members are of a fluoropolymer material.
- 3. A method of making a ventricular catheter as claimed in claim 2 wherein the microtubular members are of a fluoropolymer material selected from the group consisting of polytetrafluoroethylene, and fluoroethylene propylene.
- 4. A method of making a ventricular catheter as claimed in claim 2 wherein the microtubular members have diameters of about 0.44 mm.
- 5. A method of making a ventricular catheter as claimed in claim 4 wherein the perforations in the microtubular members have diameters between about 14 microns and 150 microns.
- 6. A method of making a ventricular catheter as claimed in claim 1 including the step of
- enclosing a plurality of said perforated microtubular members in a tubular sheath.
- 7. A method of making a ventricular catheter as claimed in claim 6 wherein the tubular sheath is of a silicone rubber material.
- 8. A method of making a ventricular catheter as claimed in claim 6 wherein said perforated portions of said microtubular members extend from an end of said sheath.
- 9. A method of making a ventricular catheter as claimed in claim 6 wherein the tubular sheath has a diameter of about 0.015 m.
- 10. A method of making a ventricular catheter as claimed in claim 1 wherein the mask is electroformed metal mesh having openings with diameters between about 20 .mu.m and about 150 .mu.m.
- 11. A method of making a ventricular catheter as claimed in claim 1 including the steps of
- mounting the microtubular members on a cylindrical supporting means located downstream from a source of ions,
- positioning the mask between said ion source and said supporting means in close proximity with said supporting means, and
- rotating said supporting means about its normal axis.
- 12. A method of making a ventricular catheter as claimed in claim 11 wherein the supporting means is mounted in a vacuum environment having a pressure of about 4.times.10.sup.-5 torr.
- 13. A method of making a ventricular catheter as claimed in claim 12 wherein the masked portions of the microtubular members on the supporting means are exposed to a beam of argon ions.
- 14. A method of making a ventricular catheter as claimed in claim 13 wherein the beam of argon ions is between 300 eV and 500 eV.
- 15. A method of making a ventricular catheter as claimed in claim 11 wherein the microtubular members are mounted around the outer peripheral surface of a cylindrical mandrel member in a substantially parallel juxtaposition.
- 16. A method of making a ventricular catheter as claimed in claim 11 wherein the microtubular members are wrapped around the outer peripheral surface of a cylindrical mandrel member in a spiral configuration.
- 17. A method of making a ventricular catheter as claimed in claim 11 including the steps of
- applying a twisting force to the microtubular member,
- maintaining said twisting force on said microtubular members during ion sputtering, and
- removing said twisting force subsequent to forming the perforations whereby said perforations have a general spiral configuration about the walls of said microtubular members.
RELATED APPLICATION
This application is a division of application of Ser. No. 272,407 which was filed June 10, 1981, and now U.S. Pat. No. 4,377,169 issued Mar. 22, 1983.
ORIGIN OF THE INVENTION
The invention described herein was made by an employee of the United States Government and may be manufactured and used by or for the Government for governmental purposes without the payment of any royalties thereon or therefor.
US Referenced Citations (13)
Foreign Referenced Citations (1)
Number |
Date |
Country |
2233028 |
Jun 1973 |
FRX |
Non-Patent Literature Citations (2)
Entry |
P. D. Townsend et al., Ion Implantation, Sputtering and Their Applications, Academic Press, London, 1976, pp. 247-261. |
J. L. Vossen et al., Thin Film Processes, Academic Press, New York, 1978, pp. 497-556. |
Divisions (1)
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Number |
Date |
Country |
Parent |
272407 |
Jun 1981 |
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