This is a continuation application of Ser. No. 08/964,206 filed Nov. 4, 1997.
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5597495 | Keil et al. | Jan 1997 | A |
5677011 | Hatakeyama et al. | Oct 1997 | A |
5708267 | Hatakeyama | Jan 1998 | A |
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5853959 | Brand et al. | Dec 1998 | A |
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Number | Date | Country |
---|---|---|
19518185 | Nov 1996 | DE |
08238426 | Sep 1996 | JP |
08257781 | Oct 1996 | JP |
08264511 | Oct 1996 | JP |
09045639 | Feb 1997 | JP |
Entry |
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Masahiro Hatakeyama et al., “Fast Atom Beam (FAB) Processing with Separated Masks”, The Institute of Electronics, Information and Communication Engineers, vol. E78-C, No. 2, pp. 174-179 Feb. 1995. |
Ichiki, K. et al, “New fast atom beam processing with separated masks for fabricating multiple microstructures” Thin Solid Films, 281-282, pp 630-633. 1996. |
Toma, Y. et al “Fast atom beam etching of glass materials with contact and non-contact masks” Jpn. J. Appl. Phys., vol. 36, Part 1, No. 12B, pp 7655-7659. Dec. 1997. |
Toma, Y. et al “Demonstration of Fast Atom Beam Etching of Glass Materials with Contact and Non-contact masks” Dig Pap Microprocess Nanotechnol, pp 148-149, 1997. |
Number | Date | Country | |
---|---|---|---|
Parent | 08/964206 | Nov 1997 | US |
Child | 09/941692 | US |