BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a manufacturing process flow chart showing a semiconductor device manufacturing process according to a first embodiment of the present invention;
FIG. 2 is a conceptual plan view of a semiconductor wafer in the semiconductor device manufacturing process according to the first embodiment;
FIG. 3 is a plan view of a principal portion of the semiconductor wafer in the semiconductor device manufacturing process according to the first embodiment;
FIG. 4 is a plan view of a principal portion of the semiconductor wafer, showing an alignment pattern-formed area and the vicinity thereof on a larger scale;
FIG. 5 is a sectional view of a principal portion in the semiconductor device manufacturing process according to the first embodiment;
FIG. 6 is a sectional view of the principal portion in the semiconductor device manufacturing process which follows FIG. 5;
FIG. 7 is a plan view showing an area which is exposed by one shot in an exposure step in a photolithography process;
FIG. 8 is a plan view of a principal portion of a semiconductor wafer in a semiconductor device manufacturing process as a comparative example;
FIG. 9 is a plan view of a principal portion of the semiconductor wafer in the comparative semiconductor device manufacturing process;
FIG. 10 is a manufacturing process flow chart showing a dicing process for a semiconductor wafer;
FIG. 11 is an explanatory diagram of the wafer dicing process;
FIG. 12 is an explanatory diagram of the wafer dicing process;
FIG. 13 is an explanatory diagram of the wafer dicing process;
FIG. 14 is an explanatory diagram of the wafer dicing process;
FIG. 15 is an explanatory diagram of the water dicing process;
FIG. 16 is a plan view showing a mounted state of a semiconductor chip to an LCD panel;
FIG. 17 is a sectional view of a principal portion, showing a mounted state of the semiconductor chip to the LCD panel;
FIG. 18 is a plan view of a principal portion of a semiconductor wafer in a semiconductor device manufacturing process according to another embodiment of the present invention;
FIG. 19 is a plan view of a principal portion of the semiconductor wafer, showing an alignment pattern-formed area and the vicinity thereof on a larger scale;
FIG. 20 is a plan view of a principal portion of a semiconductor wafer in a semiconductor device manufacturing process according to a further embodiment of the present invention; and
FIG. 21 is a plan view of a principal portion of another semiconductor wafer in the semiconductor device manufacturing process according to the further embodiment.