Ghandhi, S., "VLSI Fabrication Principles . . . ", pp. 401-407, 1983. |
IEDM, 1983, titled "Device Isolation Technology by Selective Low-Pressure Silicon Epitaxy," pp. 35-38, by H. J. Voss et al. |
IEDM, 1983, titled "CMOS Technology Using SEG Isolation Technique," pp. 31-34, by N. Endo et al. |
IEDM, 1984, titled "Application of Selective Silicon Epitaxial Growth for CMOS Technology," pp. 593-596, by S. Nagao, et al. |
Proceedings of IEEE, vol. 70, No. 5, May 1982, pp. 420-426, titled "Silicon as a Mechanical Material" by Kurt E. Peterson. |
S. M. Sze's Textbook, "Physics of Semiconductor Devices," pp. 7-13, 2nd ed. 1981, by John Wiley & Sons, Inc. |
IEDM, 1982, titled "Novel Device Isolation Technology with Selective Epitaxial Growth," pp. 241-244, by Endo et al. |