Number | Name | Date | Kind |
---|---|---|---|
3288662 | Weisberg | Nov 1966 | |
3740280 | Ronen | Jun 1973 | |
3939555 | Jantsch et al. | Feb 1976 | |
4152824 | Gonsiovowski | May 1979 | |
4256829 | Daniel | Mar 1981 | |
4450021 | Batra et al. | May 1984 | |
4523372 | Balda et al. | Jun 1985 | |
4666555 | Tsang | May 1987 | |
4758525 | Kido et al. | Jul 1988 | |
4789648 | Chou et al. | Dec 1988 | |
4853345 | Himelick | Aug 1989 | |
4966870 | Barber et al. | Oct 1990 | |
4999317 | Lu et al. | Mar 1991 | |
5022958 | Farreau et al. | Jun 1991 | |
5084416 | Ozaki et al. | Jan 1992 | |
5202291 | Charvat et al. | Apr 1993 | |
5286674 | Roth et al. | Feb 1994 | |
5310454 | Ohiwa et al. | May 1994 | |
5321211 | Haslam et al. | Jun 1994 | |
5426073 | Imaoka et al. | Jun 1995 | |
5498570 | Becker | Mar 1996 | |
5753565 | Becker | May 1998 | |
5846443 | Abraham | Dec 1998 |
Entry |
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S. Wolf et al, "Silicon Processing For the VLSI Era vol. 1" Lattice Press, 1986, pp. 168-171, 187-193. |
Penkunas et al., "Simultaneous Exposure of Photoresist on Both Sides of a wafer", Western Electric Technical Digest No. 35, Jul. 1974, pp. 47-48. |
Co-pending application: "Method Of Reducing Overetch During The Formation Of A Semiconductor Device," Serial No. 08/728,007, Docket #96-0339.00 filed Oct. 9, 1996. |