The present invention relates generally to substrate processing, and more particularly to methods and apparatus for cleaning a notch in an edge of a substrate.
Conventional systems, which contact a notch in the edge of a substrate with an abrasive tape to clean the notch, may not be able to contact all parts of the notch with the abrasive tape. As a result, these conventional systems may not be able to clean or polish all parts of the notch. Accordingly, effective methods and apparatus for cleaning or polishing all parts of notches in the edges of substrates are desired.
In some aspects of the invention an apparatus is provided for polishing a notch of a substrate. The apparatus includes a polishing head adapted to apply a polishing tape against the notch of the substrate. The polishing head includes a plunger; and an actuator, wherein the actuator is adapted to move the plunger with respect to the polishing tape.
In other aspects of the invention, a system is provided for polishing a notch of a substrate. The system includes a substrate support adapted to rotate a substrate; and a polishing head adapted to apply a polishing tape against the notch of the substrate. The polishing head includes a plunger; and an actuator, wherein the actuator is adapted to press the plunger into the polishing tape and thereby press the polishing tape against the notch. The system also includes a controller adapted to operate the rotation of the substrate and the actuator.
In yet other aspects of the invention, a method is provided for polishing a notch of a substrate. The method includes (1) securing a substrate on a support; (2) aligning a substrate notch with a polishing head including a plunger; (3) pressing a polishing tape against a notch with the plunger; and (4) advancing the polishing tape as the polishing tape is pressed against the notch.
Other features and aspects of the present invention will become more fully apparent from the following detailed description, the appended claim and the accompanying drawings.
Substrates used in semiconductor processing often have films and/or surface defects which it is helpful to remove prior to subsequent processing steps. These films and defects may occur on the edge of a substrate, including notches formed thereon.
In some embodiments, the present invention provides apparatus and methods that effectively adapt to various shapes of notches found in different substrates, ensure good contact of a polishing or abrasive film or tape with all sections of a substrate notch region, and remove thin films and surface defects at a substrate notch. In one or more embodiments, a polishing plunger may be provided. The polishing plunger may be adapted to press a moving polishing tape against the substrate notch. The polishing plunger may substantially conform to the shape of the substrate notch, such that the polishing tape contacts all portions of the notch.
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In some embodiments, one or more of the heads 204 may be adapted to be oscillated or moved (e.g., pivoted or angularly translated about a tangential axis of the substrate 102 and/or circumferentially relative to the substrate 102) around or along the substrate edge 104 and/or notch 116 so as to polish different portions of the substrate edge 104 and/or notch 116. In some embodiments, one or more of the heads 204 may be adapted to continuously or intermittently oscillate between the various positions. Alternatively, one or more of the heads 204 may be fixed and/or only adjusted while the substrate 102 is not being rotated. In yet other embodiments, the substrate 102 may be held fixed while one or more of the heads 204 oscillate (as described above) as well as rotate circumferentially around the substrate 102. This movement may be under the direction of a programmed or user operated controller 206, described below. Different heads 204 may be used for different substrates 100 or different types of substrates 100.
As described above, the system 200 may further include the controller 206, (e.g., a programmed computer, a programmed processor, a microcontroller, a gate array, a logic circuit, an embedded real time processor, etc.), which may control the driver(s) used to rotate the substrate 100 and/or the actuator(s) used to push a polishing plunger(s) (
As mentioned above, substrate polishing may be performed using one or more polishing apparatuses 202. In one or more embodiments, a plurality of polishing apparatuses 202 may be employed, in which each polishing apparatus 202 may have similar or different characteristics and/or mechanisms. In the latter case, particular polishing apparatuses 202 may be employed for specific operations. For example, one or more polishing apparatuses 202 may be adapted to perform relatively rough polishing and/or adjustments while another one or more polishing apparatus 202 may be adapted to perform relatively fine polishing and/or adjustments. Polishing apparatuses 202 may be used in sequence so that, for example, a rough polishing procedure may be performed initially and a fine polishing procedure may be employed subsequently as needed or according to a polishing recipe. The plurality of polishing apparatuses 202 may be located in a single chamber or module, as shown herein, or alternatively, one or more polishing apparatuses 202 may be located in separate chambers or modules. Where multiple chambers are employed, a robot or another type of transfer mechanism may be employed to move substrates 100 between the chambers so that polishing apparatuses 202 in the separate chambers may be used in series or otherwise.
Substrate [edge/notch] polishing may be performed using one or more polishing apparatuses 202. In one or more embodiments, a plurality of polishing apparatuses 202 may be employed, in which each polishing apparatus 202 may have similar or different characteristics and/or mechanisms. In the latter case, particular polishing apparatuses 202 may be employed for specific operations. For example, one or more of a plurality of polishing apparatuses 202 may be adapted to perform relatively rough polishing and/or adjustments while another one or more of the plurality of polishing apparatus 202 may be adapted to perform relatively fine polishing and/or adjustments. Polishing apparatuses 202 may be used in sequence so that, for example, a rough polishing procedure may be performed initially and a fine polishing procedure may be employed subsequently to make adjustments to a relatively rough polish as needed or according to a polishing recipe. The plurality of polishing apparatuses 202 may be located in a single chamber or module, as shown herein, or alternatively, one or more polishing apparatuses 202 may be located in separate chambers or modules. Where multiple chambers are employed, a robot or another type of transfer mechanism may be employed to move substrates 100 between the chambers so that polishing apparatuses 202 in the separate chambers may be used in series or otherwise.
In one or more embodiments, the polishing tape 318 may be made from many different materials, such as aluminum oxide, silicon oxide, silicon carbide, etc. Other materials may also be used. In some embodiments, abrasives used may range, for example, from about 0.1 microns up to about 10 microns in size or, for example, 0.5 microns to 3 microns in size, although other sizes may be used. Different widths of polishing tape 318 ranging from about 0.55 inch to about 1.5 inches may be used, although other polishing tape widths may be used. In one or more embodiments, the polishing tape 318 may be about 0.002 to about 0.02 inches thick and withstand about 1 to 5 lbs. in tension. Other polishing tapes having different thicknesses and tensile strengths may be used. The supply and take-up spools 324, 326 may have a diameter of approximately 3 inches and be capable of holding about 30,000 inches of polishing tape 318, or, for example, may have a diameter of approximately 1 inch and be capable of holding about 500 inches of polishing tape 318. Other spool dimensions may be used. The supply and take-up spools 324, 326 may be constructed from materials such as nylon, polyurethane, polyvinyl difluoride (PVDF), etc. Other materials may also be used.
With reference to
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However, the positioning of the supply and take-up spools 324, 326 may be arranged in different ways and may not have a large effect on the polishing of the notch 116. The plunger 316 may be a solid piece, resilient material, or inflatable, for example. The resilient material may be polyurethane foam or silicone rubber, for example. Other suitable materials may be used. The plunger 316 may be inflated with a pressurizable gas (e.g., air, nitrogen, carbon dioxide, etc.) or liquid (e.g., hydraulic fluid), or other suitable fluid. The plunger 316 may also be soft, rigid, and/or include or develop contours to conform to the shape of the notch 116. The radius of the plunger 316 may be selected to ensure that the polishing tape 318 is fully pushed into the notch 116 by the plunger 316. In some embodiments, the maximum radius of the plunger 316 is approximately less than 0.05 inches. In other embodiments, the maximum radius of the plunger 316 is approximately 0.03 inches or less. Any other suitable radius or dimensions may be used.
As mentioned above, the plunger 316 may be coupled to an actuator 500. The actuator 500 may be a pneumatic slide, hydraulic actuator, servomotor or any other suitable actuator 500. The actuator 500 may be mounted to the polishing head 314 or the support arm 310 for example. The operation of the actuator 500 may be controlled by the controller 206, for example. As described above with regard to
As described above, the polishing head 314 (and therefore the plunger 316) may pivot about the substrate edge 104 and/or the notch 116. In some embodiments a center of rotation 600 (
In some embodiments, one or more fluid channels (not shown) (e.g., a spray nozzle or bar) may be provided to deliver chemicals and/or water to aid in the polishing/cleaning of the notch 116, lubricate the substrate 100, and/or to wash away removed material. The fluid channel may be adapted to deliver fluid to the substrate 100 and/or to the polishing tape 318. In some embodiments, the fluid may be delivered directly to the notch 116. For example, one or more channels may be provided to direct chemicals or water to the notch 116 to assist in the polishing and/or to wash away particles resulting from the polishing. The chemicals may be sprayed directly onto the substrate 100, at the substrate/polishing tape interface. The fluids may be sprayed from either or both sides of the substrate 100 and the present invention may employ gravity or suction to cause the runoff not to contaminate or contact other parts of the substrate 100 or apparatus of the invention. Fluid also may be delivered through the moveable polishing tape 318 to the notch 116. The fluids may include deionized water which may serve as a lubricant and to flush particles away. A surfactant and/or other known cleaning chemistries may also be included. In some embodiments, sonic (e.g., megasonic) nozzles may be used to deliver sonicated fluids to the notch 116 or substrate edge 104 to supplement the cleaning.
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An exemplary method 900 for cleaning and polishing the substrate notch 116 is provided in
Further with respect to the method 900 for cleaning and polishing the substrate notch 116, the pressure with which the polishing tape 318 is pressed into contact with, and against, the substrate notch 116 may be determined by the force or pressure applied to the plunger 316 by the actuator 500, the pressure of the fluid in the plunger 316, and/or the resilience of the plunger 316 and the polishing tape 318. As the polishing tape 318 is advanced over the substrate notch 116, films and imperfections on the substrate notch 116 may be removed and eliminated by abrasion. The force or pressure applied by the actuator 500, and/or the pressure of the fluid in the plunger 316, may be adjusted by an actuator control unit and a pressure control unit, respectively, as needed. In step S910, a polishing-head driver or the controller 112 may rotate or pivot the polishing head 314 about the substrate notch 116 in a plane approximately perpendicular to major surfaces 102, 102′ of the substrate 100, in order to effectively clean and polish parts of the substrate notch 116 adjacent to major surfaces 102, 102′ of the substrate 100. The speed, direction, tension, pressing force, etc. of the polishing tape 318 may be adjustable, as may be the rotational displacement, speed, and/or acceleration of the polishing head 314 about the substrate 100. For instance, the polishing tape 318 may be advanced at one speed for a certain length, and then another speed for another length. In addition, the polishing tape 318 may be translated or oscillated, or both, with constant or variable tensions and pressing forces.
The foregoing description discloses only exemplary embodiments of the invention. Modifications of the above disclosed apparatus and methods which fall within the scope of the invention will be readily apparent to those of ordinary skill in the art.
Accordingly, while the present invention has been disclosed in connection with exemplary embodiments thereof, it should be understood that other embodiments may fall within the spirit and scope of the invention, as defined by the following claim.
The present application is related to the following commonly-assigned, co-pending U.S. Patent Applications, each of which is hereby incorporated herein by reference in its entirety for all purposes: U.S. patent application Ser. No. 12/124,137, filed May 20, 2008, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE USING A POLISHING PAD” (Attorney Docket No. 10674); U.S. patent application Ser. No. ______, filed Oct. 24, 2008, entitled “METHODS AND APPARATUS FOR POLISHING AN EDGE AND/OR NOTCH OF A SUBSTRATE” (Attorney Docket No. 10671/L); U.S. patent application Ser. No. ______, filed Oct. 24, 2008, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE WITH A MANDREL” (Attorney Docket No. 10672/L); and U.S. patent application Ser. No. ______, filed Oct. 24, 2008, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE WITH AN ABRASIVE CORD” (Attorney Docket No. 10673/L).