The present application relates generally to methods and apparatuses for generating trace vapors.
Trace vapor detection of explosives and narcotics is critical to protecting the nation from explosive devices and preventing illegal narcotics and cargo from entering the United States. Deployed throughout the United States are sensors designed to detect extremely small concentrations of explosives and narcotics. Each sensor has an operating range over which it can detect concentrations of explosives and narcotics. For example, many sensors can detect concentrations in the parts-per-million range. However, all sensors have a lower limit to their detection ability. For example, a sensor that can detect concentrations in the parts-per-million range may not be able to detect concentrations in the parts-per billion. Research is currently underway to develop new sensors with even more sensitive detection capabilities than those that exist today. However, any such sensors must first be evaluated to ensure they are reliable and accurate. Such evaluations require apparatuses that are capable of reproducibly and accurately generating extremely small concentrations of trace vapor. For certain compounds, that is a difficult task. For example, many narcotics and explosives have compounds with low vapor pressures that make it difficult to accurately produce trace vapor amounts. Currently, techniques such as ink-jet droplet formation or chemical deposition on quartz wool or glass beads placed in temperature controlled zones are used to generate trace vapors. Yet, these techniques have drawbacks. The vapor stream produced by these techniques is either pulsed or steadily declining with time, rather than constant. It can also be difficult to change concentrations for dynamic range studies with these techniques. Finally, none of these techniques offer the capability of switching between clean and analyte air streams. Accordingly, there is a need for a trace vapor generator that is capable of overcoming one or more of these deficiencies.
One or more the above limitations may be diminished by structures and methods described herein.
In one embodiment, an apparatus for generating trace vapors is provided. The apparatus includes a controller and an oven. The controller includes: a processor, a memory storing at least one control program, a clean solution supply port constructed to output a clean solution, an analyte solution supply port constructed to output an analyte solution, a carrier gas inlet port constructed to receive a carrier gas, and a plurality of carrier gas supply controllers constructed to output the carrier gas. The oven includes a clean manifold, an analyte manifold, a clean solution nebulizer constructed to: receive the clean solution from the clean solution supply port, and the carrier gas from one of the plurality of carrier gas supply controllers, and output a clean solution vapor stream comprising the clean solution and the carrier gas to the clean manifold, an analyte solution nebulizer constructed to: receive the analyte solution from the analyte solution supply port and the carrier gas from another one of the plurality of carrier gas supply controllers, and output an analyte solution vapor stream comprising the analyte solution and the carrier gas to the analyte manifold, a pneumatic actuator controllably connected to the processor and communicatively connected to the clean manifold and the analyte manifold, and an output supply port communicatively connected to a crossover valve. The controller is configured to operate the crossover valve to allow the clean vapor or the analyte vapor to exit the output supply port.
In another embodiment, an apparatus for generating a trace vapor is provided. The apparatus includes an oven, and a first manifold for receiving a first vapor stream comprising an analyte compound. Also included is a second manifold for receiving a second vapor stream comprising a non-analyte compound, an output supply port, an exhaust port, and a valve communicably connected to the output supply port, the first manifold, and the second manifold, and configured to switch between a first state, in which the first vapor stream in the first manifold is permitted to flow to the output supply port and the second vapor stream is permitted to flow to the exhaust port, and a second state, in which the second vapor stream is permitted to flow to the output supply port and the first vapor stream is permitted to flow to the exhaust port. The first manifold and the second manifold are removably disposed in a side of the oven.
In yet another embodiment, a method of generating a trace vapor is provided. A first vapor stream comprising an analyte compound is received into a first manifold. A second vapor streaming comprising a non-analyte compound is received into a second manifold. The first vapor stream or the second vapor stream is provided to an outlet port in accordance with an instruction received from a processor. The first manifold and the second manifold are removably disposed in an oven.
The teachings claimed and/or described herein are further described in terms of exemplary embodiments. These exemplary embodiments are described in detail with reference to the drawings. These embodiments are non-limiting exemplary embodiments, in which like reference numerals represent similar structures throughout the several views of the drawings, and wherein:
Different Figures may have at least some reference numerals that are the same in order to identify the same components, although a detailed description of each such component may not be provided below with respect to each Figure.
In accordance with example aspects described herein are described methods and apparatuses for generating trace vapors
In a preferred embodiment, notification unit 102 is a touch-screen display that not only displays relevant information received from processor 104, but also serves to receive commands from a user and provide the same to processor 104. Processor 104 is communicatively connected to notification unit 102, memory 106, LFCs 108A and 108B, MFCs 112A-112D, as well as elements contained within oven 100B, namely thermocouple 122, blower fan 124, heater 126, and an actuator 306 (as described below). Processor 104 may be embodied as a central processing unit (CPU), microprocessor, or a microcontroller. Memory 106 stores a control program that, when executed by processor 104, provides for overall control of the trace vapor generator 100. Memory 106 also includes storage space for temporary calculations by processor 104 and storing data from previous runs.
As noted above, processor 104 is communicatively connected to LFCs 108A and 108B and MFCs 112A-112D. Processor 104 is constructed to receive instructions for operating LFCs 108A and 108B and MFCs 112-112D. One or more of those instructions may be manually entered by an operator through notification of unit 102 and provided to processor 104 at the beginning of a run of system 100. One or more of those instructions may also be provided in memory 106 and called by processor 104 during the execution of the control program stored in memory 106.
LFCs 108A and 108B control, in accordance with instructions from processor 104, flow of analyte solution and clean solution, respectively. Clean solution contained in a container may be connected to a liquid supply port 110A located on controller 100A. In a preferred embodiment, the clean solution is nearly pure water. Similarly, analyte solution contained in a container may be connected to a liquid supply port 110B. In the exemplary embodiment shown in
MFCs 112A-112D control, under the instructions from processor 104, flows of a carrier gas from port 114 to nebulizers 116A and 116B, as well as carrier gas inlets 117A and 117B. More specifically, MFC 112A controls the flow of a carrier gas 126A from port 114 to the nebulizer 116A. MFC 112B controls the flow of the carrier gas 126B from port 114 to carrier gas inlet port 117A. As explained in greater detail below, nebulizer 116A combines the carrier gas from flow 126A with the flow of clean solution 124A to convert the liquid solution to a gaseous vapor at a programmed concentration. The flow of carrier gas 126B is provided to a carrier gas inlet 117A on the oven 100B and used to generate a sheath flow around the nebulizer's 116A vapor flow, as explained below. In a similar manner to MFC 112A, MFC 112C controls the flow of the carrier gas 128A from port 114 to nebulizer 116B. MFC 112D controls the flow of the carrier gas 126B from port 114 to carrier gas inlet port 117B. Similarly to inlet 117A above, the flow of carrier gas 128B provided to carrier gas inlet 117B is used to generate a sheath flow around nebulizer's 116B vapor flow.
Having described the functions of the controller 100A, attention will now be turned to oven 100B. Oven 100B includes, among other features described below, nebulizers 116A and 116B, carrier gas inlets 117A and 117B, manifolds 118A and 118B, a crossover valve 600, a vapor supply port 134, at least one thermocouple 122, a blower fan 124, and a heater 126. The general operation of the oven 100B is as follows. Vapor flows from nebulizers 116A and 116B are combined with sheath flows from the carrier gas provided to inlets 117A and 117B in manifolds 118A and 118B, respectively. The gaseous vapor flows 130A and 130B in the manifolds 118A and 118B, respectively, are provided to a crossover valve 600. Under the control of processor 104, crossover valve 600 controls the path of gaseous vapor flow 130A and 130B. Output flow is then supplied to either tube 510, or both tubes 511 and 516. To prevent adsorption of the gaseous vapors on the surfaces of manifolds 118A and 118B, heater 126 is provided. Heater 126, under the control of processor 104, provides heat to the interior of the oven 100B. The hot air is then circulated by a blower fan 124 to produce an even temperature distribution within the oven 100B. The temperature inside the oven 100B is monitored by a thermocouple 122 which provides temperature readings to processor 104. Based on the temperature readings from thermocouple 122, processor 104 controls the heat output of heater 126.
Finally, distal portions, that is away from the interior of oven 100B, of nebulizers 116A and 116B protrude through the flange 505. These distal portions include connections for receiving liquid and gas from controller 100A. More specifically, nebulizer 116A includes a liquid supply connection 518B for receiving the flow of clean solution 124A from liquid supply port 110A, and a carrier gas connection 518A for receiving carrier gas flow 126A. In a similar manner, nebulizer 116B includes a liquid supply connection 520B for receiving the flow of analyte solution 124B from liquid supply port 110B, and a carrier gas connection 520A for receiving carrier gas flow 128A.
Manifolds 118A and 118B are connected to the crossover valve 600 by connecting chambers 606A and 606B, respectively. Crossover valve 600 may be, in a preferred embodiment, a Swagelok 4-way crossover valve. This configuration allows the clean and analyte vapors in manifolds 118A and 118B, to be provided to connector piece 606C or 606D by operation of valve 600. As noted above, valve 600 is operatively connected to actuator 306 which is controlled by processor 104. Processor 104 is therefore configured to control the flow of clean and analyte vapors to crossover valve 600. Crossover valve 600 is connected to a supply port 134 by tube 516. Thus, by controlling the operation of crossover valve 600, processor 104 is configured to control the output of supply port 134. Namely, processor 104 can direct a clean vapor or an analyte vapor to supply port 134. Moreover, processor 104 can switch the output of supply port 134 from a clean vapor to an analyte vapor by operation of crossover valve 600. This switchover may occur as rapidly as actuator 306 may allow. In one embodiment, processor 104 controls crossover valve 600 to direct vapor from either manifold 118A or 118B to supply port 134 and exhaust port 506. By capping exhaust port 506, the vapor sample may be delivered to a sensor attached to supply port 134 with positive pressure flow.
For lower positive pressures, a vacuum may be applied to exhaust port 506 to adjust the positive pressure applied to supply port 134. For detection systems which utilize their own sampling system, e.g. a vacuum sampler, exhaust port 506 may be sealed with a cap and a tee coupler 710 added to supply port 134; the detector is attached to one fitting 714 on the tee coupler to sample vapor from a gas stream which is delivered via the remaining fitting 712 to an exhaust hood, as shown in
One of the features of oven 100B is that manifolds 118A and 118B may be replaced by removing manifold assembly 300. Thus, if the operator desires to change the type of analyte, the manifolds 118A and 118B may be replaced with clean manifolds to ensure that no cross-contamination occurs. By operation of the components of system 100 described, vapor concentrations may range from parts per quadrillion to parts per million.
While various example embodiments of the invention have been described above, it should be understood that they have been presented by way of example, and not limitation. It is apparent to persons skilled in the relevant art(s) that various changes in form and detail can be made therein. Thus, the disclosure should not be limited by any of the above described example embodiments, but should be defined only in accordance with the following claims and their equivalents.
In addition, it should be understood that the figures are presented for example purposes only. The architecture of the example embodiments presented herein is sufficiently flexible and configurable, such that it may be utilized and navigated in ways other than that shown in the accompanying figures.
Further, the purpose of the Abstract is to enable the U.S. Patent and Trademark Office and the public generally, and especially the scientists, engineers and practitioners in the art who are not familiar with patent or legal terms or phraseology, to determine quickly from a cursory inspection the nature and essence of the technical disclosure of the application. The Abstract is not intended to be limiting as to the scope of the example embodiments presented herein in any way. It is also to be understood that the procedures recited in the claims need not be performed in the order presented.
Number | Name | Date | Kind |
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6834531 | Rust | Dec 2004 | B2 |
20160077062 | Leckebusch | Mar 2016 | A1 |
Number | Date | Country | |
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20190250184 A1 | Aug 2019 | US |
Number | Date | Country | |
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62630532 | Feb 2018 | US |