Magnetic storage systems, such as a hard disk drive (HDD), are utilized in a wide variety of devices in both stationary and mobile computing environments. Examples of devices that incorporate magnetic storage systems include desktop computers, portable notebook computers, portable hard disk drives, digital versatile disc (DVD) players, high definition television (HDTV) receivers, vehicle control systems, cellular or mobile telephones, television set top boxes, digital cameras, digital video cameras, video game consoles, and portable media players.
A typical disk drive includes magnetic storage media in the form of one or more flat disks. The disks are generally formed of two main substances, namely, a substrate material that gives it structure and rigidity, and a magnetic media coating that holds the magnetic impulses or moments that represent data. Such disk drives also typically include a read head and a write head (e.g., writer), generally in the form of a magnetic transducer which can sense and/or change the magnetic fields stored on the disks.
Main pole domain lock up, on track erasure, and side track erasure are typical writer reliability issues. All of these issues are related to writer/head stray fields, which can erase the media unintentionally. As such, a method for controlling stray fields of a writer or other magnetic feature is needed.
In order to address the stray field problem, one can enhance the magnetic anisotropy to the preferred direction. Most commonly, designers might utilize the magnetic shape anisotropy, and/or crystalline anisotropy to achieve something like this. However, due to the complexity of three dimensional (3-D) structures in current perpendicular magnetic writers, most of the time the shape anisotropy is not in the preferred direction. The 3-D device fabrication also limits the implementation of the crystalline anisotropy.
Referring now to the drawings, embodiments of systems and methods for controlling these stray fields of a magnetic feature are illustrated. The methods can involve selecting a plurality of materials for a magnetic feature, selecting a plurality of additives, combining the plurality of materials for the magnetic feature and the plurality of additives in an electrolyte solution to form a combined solution, adding nitrogen (N) to the combined solution, degassing the combined solution, depositing the combined solution as a thin film on a wafer using pulse plating, and lapping the thin film to form an edge of the magnetic feature. In several embodiments, the magnetic feature is a component of a magnetic transducer such as a writer pole, a reader shield, or a writer shield. The systems can involve a magnetic transducer implemented with one of the methods for controlling stray fields of the magnetic feature (e.g., write head).
In operation, a spindle motor (not shown) rotates the spindle assembly 104, and thereby rotates disk 102 to position head 108 at a particular location along a desired disk track 107. The position of head 108 relative to disk 102 may be controlled by position control circuitry 110.
dEms=−σdλ
for an infinitesimal rotation of Ms.
To maximize the utilization of magneto-elastic anisotropy and thereby minimize the stray field in the magnetic head, aspects of the invention involve a design process to control the materials and structure to meet preselected requirements, such as those illustrated in
In one embodiment, the plurality of additives includes hydroxylmethyl-P-tolysulfone (HPT) in a concentration between about 0 to about 10 parts per million. In other embodiments, other suitable additives can be used. In block 206, the process combines the plurality of materials for the magnetic feature and the plurality of additives in an electrolyte solution to form a combined solution. In block 208, the process adds nitrogen (N) to the combined solution. In one embodiment, adding the nitrogen can effectively remove oxygen from the combined solution. In several embodiments, the process adds the write pole materials and the organic additives to the electrolyte solution with about 0 to about 0.05 ppm of dissolved oxygen.
In block 210, the process degasses the combined solution. In one embodiment, the degassing can remove oxygen and N from the combined solution. In one embodiment, the degassing involves applying a vacuum pressure to a membrane in contact with the combined solution. In such case, the membrane can be configured to allow gas to pass but not liquid. More specifically, the membrane can be configured to allow gas to escape the electrolyte solution but prevent passage of any liquid, thereby helping to eliminate any gas, such as oxygen, from the electrolyte solution. In one embodiment, the electrolyte solution has about 0 to about 0.05 ppm of Fe3+ (e.g., minimal Fe3+ since the oxygen has been minimized or eliminated).
In block 212, the process deposits the combined solution as a thin film on a wafer using pulse plating. Pulse plating of these types of pole materials (e.g., to minimize surface roughness) is described in co-pending U.S. patent application Ser. No. 13/423,009, filed on Mar. 16, 2012, and entitled, “METHOD OF ELECTROPLATING IRON-COBALT ALLOY FILMS USING PULSED ELECTROPLATING METHODS”, the entire content of which is incorporated herein by reference.
In block 214, the process laps the thin film to form an edge of the magnetic feature. In several embodiments, the lapping can optimize the directional stress as described above.
In several embodiments, the magnetic feature is a writer pole. In one such case, the plurality of materials for the magnetic feature can include CoFe having an Fe content between about 50 and about 75 percent. In another such case, the plurality of materials for the magnetic feature include CoFe with a preselected Fe content, where the plurality of additives are selected to achieve the preselected Fe content.
In several embodiments, the magnetic feature includes Fe and the process further provides a sacrificial anode immersed in the combined solution to reverse oxidation of the Fe. In one such case, the magnetic feature includes Fe2+ and the process further provides the sacrificial anode immersed in the combined solution to reverse oxidation of the Fe3+.
In several embodiments, the majority of the writer magnetic materials are electroplated (by volume) alloys, and the properties of electroplated magnetic alloys can be easily tuned by altering the plating process. In several such embodiments, aspects of this invention can utilize the high tensile stress of these magnetic alloys.
In one embodiment, the process of
In one embodiment, the fabrication process of
In one example embodiment for a perpendicular magnetic main writer pole where FeCo materials are used as high moment materials, the remanent Ms direction needs to be contained within a plane of the ABS surface, which can be defined as being along the x direction as depicted in
In a second stage of the second exemplary process, the writer structure can be formed with the stress anisotropy in the preferred direction. To introduce the stress anisotropy in the writer, the three dimensional structure can be formed by first constructing the trench, then backfilling the magnetic materials, and finally cutting (e.g., lapping or removing) one side of trench structure to relax the stress of backfilled materials inside the trench in that direction.
Still using the FeCo writer as an example, as described earlier, it may be preferable to have higher tensile stress in the writer application. By choosing high Young's Modulus type trench materials (compressive Al2O3 for example) with the good adhesion between the backfill materials and trench side wall, the backfilled FeCo tensile stress can be preserved. In fact, the FeCo tensile stress can be even higher after thermal annealing. At this stage of the second exemplary process, the system may have high isotropic stress, which may not benefit the design goal until after one side of the trench materials has been removed. After lapping through the trench along the ABS surface (see
In some embodiments, the thin film FeCo has improved corrosion properties (e.g., Ecorr is about −400 mV versus Ag/AgCl reference electrode). In one embodiment, the FeCo film resistivity is less than about 27 micro ohm cm at a film Fe concentration percentage of about 70%. In one embodiment, the HPT byproduct concentration is about 0 to about 10 ppm (0.01 g/l), and includes byproducts such as p-Toluenesulfinte and p-Toluenesulfonate.
In using the positive λ and positive σ for the FeCo pole materials, the constructed high anisotropy tensile stress (magneto-elastic energy anisotropy) can promote the Ms to stay in the x direction (e.g., the preferred low energy state that is roughly parallel to the ABS).
In a third stage of the second exemplary process, the pole material's increased tensile stress can result in stray fields with a preferential orientation (e.g., cross track but parallel to ABS or in the x direction in
In a fourth stage of the second exemplary process, the use of compressive pole materials may be considered. For highly compressive pole materials, the magneto-striction (λ) may need to be negative to have the same effect.
In a fifth stage of the second exemplary process, it can be considered whether a particular application needs to have stray fields come out of the trench lapping surface. If so, the negative λσ materials can be picked by increasing the stress number.
In a sixth stage of the second exemplary process, aspects of the invention can be considered for applications other than a writer. For example, the way to construct the three dimensional feature, the method to grow the property matched material, and the design to utilize the produced magneto-elastic energy term can be generalized for many applications. For magnetic recording, one or more of the magnetic shield layers in the head can benefit from the magnetic writer fabrication processes in a similar way. That is, they may benefit by controlling the stray fields to prevent the unintended erasure.
Thus, the stress versus film Fe concentration percentage for electroplated NiFe and FeCo are plotted in
As an experiment, DC plated FeCo film (which can include properties such as low stress film and low magneto-elastic anisotropy) and pulse plated FeCo film (which can include properties such as high stress and high magneto-elastic anisotropy) have been deposited into a device damascene pole trench (e.g., made of alumina), for given positive magneto-striction FeCo materials. The high tensile stress pulse plated FeCo (as compared to the DC plated FeCo) is expected to have better aligned magnetization along the x direction (within the ABS surface). Backend device domain lock up (DLU) test results have confirmed this, as shown in
In several embodiments, pulse plated high magneto-elastic energy (high stress) materials has significantly improved domain lock up (DLU) performance.
Most recently, these high magneto-elastic anisotropy (high stress) pulse plated FeCo pole materials have been qualified as being suitable for certain writer pole applications. Magneto-striction is an intrinsic material property, and for most high moment electroplated soft magnetic alloys, it has a positive value. Alloy stress is function of film Fe concentration percentage. High Fe content in the film is one of the signatures of a high stress film which can be utilized to optimize the magneto-elastic energy for head overall stability improvement.
The terms “above,” “below,” and “between” as used herein refer to a relative position of one layer with respect to other layers. As such, one layer deposited or disposed above or below another layer may be directly in contact with the other layer or may have one or more intervening layers. Moreover, one layer deposited or disposed between layers may be directly in contact with the layers or may have one or more intervening layers.
In several embodiments, the deposition of materials described herein can be performed using a variety of deposition sub-processes, including, but not limited to physical vapor deposition (PVD), sputter deposition and ion beam deposition, and chemical vapor deposition (CVD) including plasma enhanced chemical vapor deposition (PECVD), low pressure chemical vapor deposition (LPCVD) and atomic layer chemical vapor deposition (ALCVD). In other embodiments, other suitable deposition techniques known in the art may also be used.
While the above description contains many specific embodiments of the invention, these should not be construed as limitations on the scope of the invention, but rather as examples of specific embodiments thereof. Accordingly, the scope of the invention should be determined not by the embodiments illustrated, but by the appended claims and their equivalents.
The various features and processes described above may be used independently of one another, or may be combined in various ways. All possible combinations and sub-combinations are intended to fall within the scope of this disclosure. In addition, certain method, event, state or process blocks may be omitted in some implementations. The methods and processes described herein are also not limited to any particular sequence, and the blocks or states relating thereto can be performed in other sequences that are appropriate. For example, described tasks or events may be performed in an order other than that specifically disclosed, or multiple may be combined in a single block or state. The example tasks or events may be performed in serial, in parallel, or in some other suitable manner. Tasks or events may be added to or removed from the disclosed example embodiments. The example systems and components described herein may be configured differently than described. For example, elements may be added to, removed from, or rearranged compared to the disclosed example embodiments.
This application claims priority to and the benefit of U.S. Provisional Application No. 61/949,390, filed on Mar. 7, 2014, entitled, “METHODS FOR CONTROLLING STRAY FIELDS OF A MAGNETIC HEAD USING MAGNETO-ELASTIC ANISOTROPY”, the entire content of which is incorporated herein by reference.
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