Micro-electro-mechanical device and method of making

Information

  • Patent Grant
  • 6794101
  • Patent Number
    6,794,101
  • Date Filed
    Friday, May 31, 2002
    22 years ago
  • Date Issued
    Tuesday, September 21, 2004
    20 years ago
Abstract
A micro-electro-mechanical device (10) including a shorting bar (40) having a first portion (42) electrically coupled to a first input/output signal line (34) and a second portion (43) electrically uncoupled to a second input/output signal line (36). Shorting bar (40) is coupled to a moveable end (49) of a cantilever structure (44). Thus, preferably only the second portion (43) of shorting bar (40) needs to be actuated to be electrically coupled to the second input/output signal line (36).
Description




FIELD OF THE INVENTION




This invention relates to electronics, in general, and to micro-electro-mechanical devices and methods of making, in particular.




BACKGROUND OF THE INVENTION




Micro-electro-mechanical devices are used for a wide range of applications. These devices or micro-switches have the advantage of providing superior switching characteristics over a wide range of frequencies. One type of micro-electro-mechanical switch structure utilizes a cantilever beam design. A cantilever beam with contact metal thereon rests above an input signal line and an output signal line. During switch operation, the beam is electro-statically actuated by applying voltage to an electrode on the cantilever beam. Electrostatic force pulls the cantilever beam toward the input signal line and the output signal line, thus creating a conduction path between the input line and the output line through the metal contact on the cantilever beam.




One disadvantage of this design is the high contact resistance of the shorting bar, which must make contact to two places, the input signal line and the output signal line. High contact resistance results in higher radio frequency (RF) power insertion loss through the signal path.




Accordingly, a need exists for a micro-electro-mechanical device with reliable mechanical and electrical contact characteristics having low contact resistance. A need also exists for a method of making the micro-electro-mechanical device.











BRIEF DESCRIPTION OF THE DRAWINGS




The invention will be better understood from a reading of the following detailed description, taken in conjunction with the accompanying figures in the drawings in which:





FIG. 1

illustrates a simplified top view of a micro-electro-mechanical device according to a first embodiment of the present invention;





FIG. 2

illustrates a cross-sectional view of the micro-electro-mechanical device of

FIG. 1

, taken along a cross-sectional line


2





2


in

FIG. 1

;





FIG. 3

illustrates a cross-sectional view of the micro-electro-mechanical device of

FIG. 1

, taken along a cross-sectional line


3





3


in

FIG. 1

;





FIG. 4

illustrates a cross-sectional view of a prior art device;





FIG. 5

illustrates a simplified top view of a micro-electro-mechanical device according to a second embodiment of the present invention;





FIG. 6

illustrates a cross-sectional view of the micro-electro-mechanical device of

FIG. 5

, taken along a cross-sectional line


6





6


in

FIG. 5

;





FIG. 7

illustrates a simplified top view of a micro-electro-mechanical device according to a third embodiment of the present invention;





FIG. 8

illustrates a simplified top view of a micro-electro-mechanical device according to a fourth embodiment of the present invention;





FIG. 9

illustrates a simplified top view of a micro-electro-mechanical device according to a fifth embodiment of the present invention.





FIG. 10

illustrates a cross-sectional view of the micro-electro-mechanical device of

FIG. 9

, taken along a cross-sectional line


10





10


in

FIG. 9

;





FIG. 11

illustrates a simplified top view of a micro-electro-mechanical device according to a sixth embodiment of the present invention; and





FIG. 12

illustrates a cross-sectional view of the micro-electro-mechanical device of

FIG. 11

, taken along a cross-sectional line


12





12


in FIG.


11


.











For simplicity and clarity of illustration, the drawing figures illustrate the general manner of construction, and descriptions and details of well-known features and techniques are omitted to avoid unnecessarily obscuring the invention. Additionally, elements in the drawing figures are not necessarily drawn to scale. For example, the dimensions of some of the elements in the figures may be exaggerated relative to other elements to help to improve understanding of embodiments of the present invention. Furthermore, the same reference numerals in different figures denote the same elements.




Furthermore, the terms first, second, third, fourth, and the like in the description and in the claims, if any, are used for distinguishing between similar elements and not necessarily for describing a sequential or chronological order. It is further understood that the terms so used are interchangeable under appropriate circumstances such that the embodiments of the invention described herein are, for example, capable of operation in other sequences than illustrated or otherwise described herein.




Moreover, the terms left, right, front, back, top, bottom, over, under, and the like in the description and in the claims, if any, are used for descriptive purposes and not necessarily for describing permanent relative positions. It is understood that the terms so used are interchangeable under appropriate circumstances such that the embodiments of the invention described herein are, for example, capable of operation in other orientations than illustrated or otherwise described herein.




DETAILED DESCRIPTION OF THE DRAWINGS




The present invention relates to structures and methods for forming a micro-electro-mechanical device. More particularly, the micro-electro-mechanical device described herein utilizes an electrically coupled or fixed portion and an electrically uncoupled or moveable portion of a shorting bar so that when a cantilever structure or beam is actuated, preferably only one portion of the shorting bar, i.e., the uncoupled or movable portion, needs to make electrical contact to one of the input/output signal lines. The electrically coupled or fixed portion of the shorting bar is fabricated so that it is electrically coupled to one of the input/output signal lines preferably at all times, not just during actuation of the cantilever structure.




Turning now to

FIGS. 1

,


2


, and


3


, a micro-electro-mechanical device


10


is illustrated according to an embodiment of the present invention.

FIG. 1

illustrates a simplified top view of a micro-electro-mechanical device


10


;

FIG. 2

illustrates a cross-sectional view of micro-electro-mechanical device


10


, taken along a cross-sectional line


2





2


in

FIG. 1

, and

FIG. 3

illustrates a cross-sectional view of micro-electro-mechanical device


10


, taken along a cross-sectional line


3





3


in

FIG. 1. A

substrate


32


provides structural or mechanical support. Preferably, substrate


32


is comprised of material, such as a high resistivity silicon (Si), gallium arsenide (GaAs), or glass, that does not allow any RF losses. Other materials may also be suitable.




A first electrically conductive layer or first input/output signal line


34


(

FIGS. 1 and 3

) and a second electrically conductive layer or second input/output signal line


36


, a ground electrode


38


(FIG.


2


), and a top contact


39


(

FIGS. 1 and 3

) are formed over substrate


32


. First input/output signal line


34


is physically separated from second input/output signal line


36


, as shown in FIG.


1


.




Preferably, first input/output signal line


34


, second input/output signal line


36


, ground electrode


38


, and top contact


39


for top electrode


46


are formed of the same material(s) and at the same time. These contact layers or electrodes can be formed by lift off techniques, by electroplating, or by first forming and then patterning a metal layer or metal layers over substrate


32


. A lift-off process is preferred if the metal materials used are difficult to pattern using etching techniques. The methods of forming the first input/output signal line


34


, second input/output signal line


36


, ground electrode


38


, and top contact


39


are well known in the art.




First input/output signal line


34


, second input/output signal line


36


, ground electrode


38


, and top contact


39


are preferably comprised of (1) a conductive layer that is comprised of a non-oxidizing metal or (2) metal layers, such as, for example, chrome and gold (with chrome being deposited first). If chrome and gold are used, a suitable thickness of chrome is 10-30 nanometers and of gold is 0.5-3 micrometers.




A cantilever structure


44


is formed overlying substrate


32


and anchored to substrate


32


at a first or anchored end


48


over top contact


39


. Anchored end


48


is fixed to and immovable relative to first input/output signal line


34


. Cantilever structure


44


also has a second or moveable end


49


suspended over substrate


32


. Moveable end


49


of cantilever structure


44


is moveable in the direction of arrow


50


(

FIGS. 2 and 3

) and relative to second input/output signal line


36


and substrate


32


.




A shorting bar


40


is coupled to the bottom of movable end


49


of cantilever structure


44


. A first or electrically coupled portion


42


of shorting bar


40


is electrically coupled, preferably permanently, to first input/output signal line


34


(see FIG.


2


). A second or electrically uncoupled portion


43


of shorting bar


40


is suspended over and overlies second input/output signal line


36


. This single contact design is configured so that preferably only the electrically uncoupled portion


43


of shorting bar


40


must be actuated to make electrical contact to second input/output signal line


36


. This single-point, electrical coupling method provides lower total contact resistance than the dual-point electrical coupling method of the prior art.




In

FIGS. 1

,


2


, and


3


one can see that shorting bar


40


bridges over at least a portion of second input/output signal line


36


and that the electrically coupled portion


42


of shorting bar


40


is permanently electrically coupled to first input/output signal line


34


. A top electrode


46


is formed over the top of cantilever structure


44


. Top electrode


46


is electrically coupled to top contact


39


. Shorting bar


40


also extends, from electrically coupled portion


42


to electrically uncoupled portion


43


, in a direction approximately 90 degrees from the direction of cantilever structure


44


.




In a preferred embodiment, electrically coupled portion


42


is also physically directly coupled or connected to first input/output signal line


34


. Note that ground electrode


38


is not shown in

FIG. 1

(nor will it be shown in the later drawing figures showing a top view) in order to simplify the illustration.





FIG. 3

readily shows the electrically coupled portion


42


, which is preferably permanently electrically coupled to first input/output signal line


34


, and the electrically uncoupled portion


43


, which is overlying, but not electrically coupled to, second input/output signal line


36


when cantilever structure


44


has not been actuated. In this embodiment, electrically coupled portion


42


can also be referred to as a fixed portion, and electrically uncoupled portion


43


can also be referred to as a moveable portion.




Electrically uncoupled portion


43


of shorting bar


40


is electrically coupled to second input/output signal line


36


when cantilever structure


44


has been actuated. This actuation preferably only occurs during operation of micro-electro-mechanical device


10


. Cantilever structure


44


is actuated when an electrostatic charge between top electrode


46


and ground electrode


38


pulls the cantilever structure


44


toward ground electrode


38


, thus making the second or electrically uncoupled portion


43


of shorting bar


40


be electrically coupled to second input/output signal line


36


. The electrostatic charge is formed when a voltage is applied between top electrode


46


and ground electrode


38


.




Still referring to

FIGS. 1

,


2


, and


3


, the process of forming cantilever structure


44


, shorting bar


40


, and top electrode


46


is described briefly below. Cantilever structure


44


, shorting bar


40


, and top electrode


46


are suspended over substrate


32


by first forming a sacrificial layer (not shown) over substrate


32


. The formation of a sacrificial layer is well known in the art, and thus is not described herein.




Shorting bar


40


is formed over the sacrificial layer overlying input/output signal lines


34


and


36


. Shorting bar


40


is preferably formed using lift-off techniques. Lift-off techniques are well known in the art, and thus this step is not described further. Shorting bar


40


should be comprised of an electrically conductive layer or metal that is compatible with first input/output signal line


34


and second input/output signal line


36


. In a preferred embodiment, shorting bar


40


is comprised of a layer of gold and a layer of chrome. Gold is formed first so that the gold of shorting bar


40


is in contact with the gold of first input/output signal line


34


and second input/output signal line


36


when cantilever structure


44


is actuated or closed during switch operation. A suitable amount of gold is approximately 400-2,000 nanometers, and a suitable amount of chrome is approximately 15-25 nanometers. Other thicknesses, however, may be acceptable.




Subsequent to the formation of shorting bar


40


and before removal of the sacrificial layer (not shown), the cantilever structure


44


is formed over substrate


32


and overlying shorting bar


40


. An opening (not shown) leading to top contact


39


is made in the sacrificial layer (not shown) that is subsequently removed so that cantilever structure


44


can be anchored to it. Cantilever structure


44


is preferably comprised of silicon dioxide, silicon oxynitride, or silicon nitride, but other dielectrics may be used as well, including a composite layer of different dielectrics. The thickness of cantilever structure


44


is in the range of approximately 1-3 micrometers and preferably formed by Pressure Enhanced Chemical Vapor Deposition (PECVD) to produce a low stress dielectric layer.




Top electrode


46


is then formed over cantilever structure


44


and over top contact


39


. Top electrode


46


is preferably comprised of titanium and gold. For example, 15-25 nanometers of titanium and 100-300 nanometers of gold may be formed. Top electrode


46


is preferably formed by using photoresist lift-off techniques.




Top electrode


46


and cantilever structure


44


are defined; then the sacrificial layer is removed from underneath electrically uncoupled portion


43


of shorting bar


40


, cantilever structure


44


, and top electrode


46


so that electrically uncoupled portion


43


, cantilever structure


44


, and top electrode


46


are released and are able to move in the direction shown by arrow


50


in

FIGS. 2 and 3

.




Micro-electro-mechanical device


10


has improved manufacturability and reliability and reduced contact resistance. When cantilever structure


44


is actuated, the contact resistance between the first or electrically coupled portion


42


and first input/output signal line


34


is lower than the contact resistance between the second or electrically uncoupled portion


43


and second input/output signal line


36


. The reason that the contact resistance between the first or electrically coupled portion


42


and first input/output signal line


34


is lower is because electrically coupled portion


42


is fixedly or permanently electrically coupled or contacted to first input/output signal line


34


. Thus, micro-electro-mechanical device


10


has lower contact resistance overall, which improves the operating characteristics. Manufacturability is improved because the design of a single contact is less complicated than a dual contact design of the prior art (described below).





FIG. 4

illustrates a prior art structure shown in the same view as FIG.


3


. The same reference numbers are used for similar elements despite their potentially dissimilar configuration, in order to ease the understanding of the differences between micro-electro-mechanical device


10


and the prior art. In the prior art, shorting bar


40


does not have an electrically coupled portion


42


in combination with an electrically uncoupled portion


43


. In the illustrated prior art, no portion of shorting bar


40


is electrically coupled to either of first and second input/output signal lines


34


and


36


until the cantilever structure


44


is actuated.





FIG. 5

shows a simplified top view of a second embodiment of the present invention, which illustrates a cantilever structure


44


having a two finger pattern.

FIG. 6

illustrates a cross-sectional view of the device in

FIG. 5

, taken along a cross-sectional line


6





6


in FIG.


5


. For ease of understanding, the same numerals are used for similar elements, despite their potentially dissimilar configurations. The two finger pattern allows for the ability to make one of the fingers, or the finger on the side of the electrically uncoupled portion


43


of shorting bar


40


, wider (or otherwise having more mass) than the other finger, or the finger on the side of the electrically coupled portion


42


of shorting bar


40


. Although not illustrated herein, more than two fingers may be formed if desired. With more mass, less electrostatic force is needed to pull the electrically uncoupled portion


43


of shorting bar


40


toward second input/output signal line


36


.

FIG. 7

illustrates a third embodiment of the present invention, wherein another design of cantilever structure


44


has a two finger pattern and also provides for more mass on the side of the electrically uncoupled portion


43


of shorting bar


40


is illustrated. The overall objective is to get more mass on one side, and the openings


51


and


54


represent one technique for achieving that. For ease of understanding, the same numerals are used for similar elements, despite their potentially dissimilar configurations. In this embodiment, cantilever structure


44


has more openings


51


on the side of the electrically coupled portion


42


of shorting bar


40


. Only two variations have been shown herein, but many different patterns of cantilever structure


44


are available to meet the goal of providing more mass on the side of the electrically uncoupled portion


43


of shorting bar


40


. Having more mass in cantilever structure


44


on the side of the electrically uncoupled portion


43


of shorting bar


40


may provide for higher rigidity, thus higher resistance to deformation of that portion


43


of shorting bar


40


, so that portion


43


of shorting bar


40


preferably only bends as needed to make electrical contact with second input/output signal line


36


. The higher rigidity compensates for the non-symmetrical bending of the shorting bar


40


.





FIG. 8

illustrates a top view of a fourth embodiment of the present invention. For ease of understanding, the same numerals are used for similar elements, despite their potentially dissimilar configurations. In this embodiment, top electrode


46


comprises less metal, or another electrically conductive material, and covers less area of cantilever structure


44


, which comprises a two finger pattern, on the side of the electrically uncoupled portion


43


of shorting bar


40


. The less metal of top electrode


46


provides for reduced electrostatic force on the side of the electrically uncoupled portion


43


. The goal is also to compensate for the asymmetrical bending and improve contact quality.




Now with reference to both

FIGS. 9 and 10

,

FIG. 9

illustrates a simplified top view of a fifth embodiment of the present invention, and

FIG. 10

illustrates a cross-sectional view of micro-electro-mechanical device


10


of

FIG. 9

taken along a cross-sectional line


10





10


in FIG.


9


. For ease of understanding, the same numerals are used for similar elements, despite their potentially dissimilar configurations. In this embodiment, shorting bar


40


is fabricated to have a symmetrical design when viewed across a width of cantilever structure


44


, shown by arrow


52


in FIG.


9


and as shown in

FIG. 10

, where a length of cantilever structure


44


is greater than the width and a thickness of cantilever structure


44


. This symmetry is contrasted to the embodiments shown in

FIGS. 1

,


3


,


5


,


6


,


7


, and


8


in which shorting bar


40


is asymmetrical across the width of cantilever structure


44


. In this embodiment, electrically coupled portion


42


is still fixed, and electrically uncoupled portion


43


is still moveable in a direction of arrow


50


(FIG.


10


). Shorting bar


40


, however, further comprises a third or fixed portion


58


(

FIG. 10

) permanently and physically connected or coupled to substrate


32


and is not moveable relative to substrate


32


. Fixed portion


58


(

FIG. 10

) of shorting bar


40


is also an electrically uncoupled portion.




Referring to

FIGS. 11 and 12

,

FIG. 11

illustrates a simplified top view of a sixth embodiment of the present invention, and

FIG. 12

illustrates a cross-sectional view of micro-electra-mechanical device


10


taken along a cross-sectional line


12





12


in FIG.


11


. For ease of understanding, the same numerals are used for similar elements, despite their potentially dissimilar configurations. One end (in this embodiment, portion


43


) of shorting bar


40


is formed underneath cantilever structure


44


. Shorting bar


40


also extends, from electrically coupled portion


42


to electrically uncoupled portion


43


, in a direction approximately parallel to the direction of cantilever structure


44


.




In the embodiment of

FIGS. 11 and 12

, the electrically coupled portion


42


of the shorting bar


40


is also preferably permanently electrically coupled to first input/output signal line


34


. Electrically uncoupled portion


43


of shorting bar


40


is formed underneath the end of the movable end, or end


49


, of cantilever structure


44


and overlies second input/output signal line


36


. In this embodiment, as in the other embodiments of the present invention, preferably only one portion, the electrically uncoupled portion


43


, needs to be moved to be electrically coupled to second input/output signal line


36


, while the other portion, electrically coupled portion


42


, is preferably permanently electrically coupled to first input/output signal line


34


. Also in this embodiment, shorting bar


40


is symmetrical about a length of cantilever structure


44


, and a length of shorting bar


40


is substantially parallel to the length of cantilever structure


44


.




By now it should be appreciated that structures and methods have been provided for improving the manufacturability of micro-electro-mechanical devices as well as for providing a micro-electro-mechanical device with improved electrical characteristics and better reliability. In particular, the aforementioned advantages are obtained by a shorting bar


40


that is electrically coupled to one first input/output signal line


34


, preferably at all times during operation, so that electrical coupling preferably only needs to be made to the other second input/output signal line


36


during operation. Thus, a design and process for fabricating a micro-electro-mechanical device, which fully meets the advantages set forth above, has been provided.




Although the invention has been described with reference to specific embodiments, it will be understood by those skilled in the art that various changes may be made without departing from the spirit or scope of the invention. For instance, the numerous details set forth herein such as, for example, the material compositions are provided to facilitate the understanding of the invention and are not provided to limit the scope of the invention. Accordingly, the disclosure of embodiments of the invention is intended to be illustrative of the scope of the invention and is not intended to be limiting. It is intended that the scope of the invention shall be limited only to the extent required by the appended claims.




Additionally, benefits, other advantages, and solutions to problems have been described with regard to specific embodiments. The benefits, advantages, solutions to problems, and any element or elements that may cause any benefit, advantage, or solution to occur or become more pronounced, however, are not to be construed as critical, required, or essential features or elements of any or all of the claims.



Claims
  • 1. A micro-electro-mechanical device comprising:a substrate; a first conductive layer over the substrate; a second conductive layer over the substrate and separated from the first conductive layer; a cantilever structure over the substrate, wherein the cantilever structure has a first end anchored to the substrate and a second end suspended over the substrate; and a shorting bar adjacent to the cantilever structure, wherein the shorting bar has a first portion and a second portion, wherein: the first portion is anchored to and electrically coupled to the first conductive layer; the second portion overlies and is removably electrically coupled to the second conductive layer; and the shorting bar does not comprise an insulating material.
  • 2. The micro-electro-mechanical device of claim 1 wherein the cantilever structure has at least a two finger pattern.
  • 3. A micro-electro-mechanical device comprising:a substrate; a first conductive layer over the substrate; a second conductive layer over the substrate and separated from the first conductive layer; a cantilever structure over the substrate, wherein the cantilever structure has a first end anchored to the substrate and a second end suspended over the substrate; and a shorting bar adjacent to the cantilever structure, wherein the shorting bar has a first portion and a second portion, and wherein the first portion is anchored to and electrically coupled to the first conductive layer and the second portion overlies and is removably electrically coupled to the second conductive layer, wherein the cantilever structure has less mass at a first side of the cantilever structure than at a second side of the cantilever structure, the first side of the cantilever structure closer to the first conductive layer than the second side of the cantilever structure.
  • 4. A micro-electro-mechanical device comprising:a substrate; a first conductive layer over the substrate; a second conductive layer over the substrate and separated from the first conductive layer; a cantilever structure over the substrate, wherein the cantilever structure has a first end anchored to the substrate and a second end suspended over the substrate; and a shorting bar adjacent to the cantilever structure, wherein the shorting bar has a first portion and a second portion, and wherein the first portion is anchored to and electrically coupled to the first conductive layer and the second portion overlies and is removably electrically coupled to the second conductive layer; and a third conductive layer over the cantilever structure and covering more area at a first side of the cantilever structure than at a second side of the cantilever structure, the first side of the cantilever structure closer to the first conductive layer than the second side of the cantilever structure.
  • 5. A micro-electro-mechanical device comprising:a substrate; a first conductive layer over the substrate; a second conductive layer over the substrate and separated from the first conductive layer; a cantilever structure over the substrate, wherein the cantilever structure has a first end anchored to the substrate and a second end suspended over the substrate; and a shorting bar adjacent to the cantilever structure wherein the shorting bar has a first portion and a second portion, and wherein the first portion is anchored to and electrically coupled to the first conductive layer and the second portion overlies and is removably electrically coupled to the second conductive layer, wherein the cantilever structure has first and second fingers over the second conductive layer, the first finger closer to the first conductive layer than the second finger and narrower than the second finger.
  • 6. A micro-electro-mechanical device comprising:a substrate; a first conductive layer over the substrate: a second conductive layer over the substrate and separated from the first conductive layer; a cantilever structure over the substrate, wherein the cantilever structure has a first end anchored to the substrate and a second end suspended over the substrate; and a shorting bar adjacent to the cantilever structure, wherein the shorting bar has a first portion and a second portion, and wherein the first portion is anchored to and electrically coupled to the first conductive layer and the second portion overlies and is removably electrically coupled to the second conductive layer, wherein the cantilever structure has less mass at a first side of the cantilever structure than at a second side of the cantilever structure, the first side closer to the first conductive layer than the second side.
  • 7. A micro-electro-mechanical device comprising:a substrate; a first conductive layer over the substrate; a second conductive layer over the substrate and separated from the first conductive layer; a cantilever structure over the substrate, wherein the cantilever structure has a first end anchored to the substrate and a second end suspended over the substrate; and a shorting bar adjacent to the cantilever structure, wherein the shorting bar has a first portion and a second portion, and wherein the first portion is anchored to and electrically coupled to the first conductive layer and the second portion overlies and is removably electrically coupled to the second conductive layer, wherein a third portion of shorting bar is anchored to the substrate, the second portion of the shorting bar located between the first and third portions of the shorting bar.
  • 8. The micro-electro-mechanical device of claim 1 wherein the shorting bar is symmetrical across a width of the cantilever structure.
  • 9. A micro-electro-mechanical device comprising:a substrate; a first conductive layer over the substrate; a second conductive layer over the substrate and separated from the first conductive layer; a cantilever structure over the substrate, wherein the cantilever structure has a first end anchored to the substrate and a second end suspended over the substrate; and a shorting bar adjacent to the cantilever structure, wherein the shorting bar has a first portion and a second portion, and wherein the first portion is anchored to and electrically coupled to the first conductive layer and the second portion overlies and is removably electrically coupled to the second conductive layer, wherein the shorting bar is asymmetric across a width of the cantilever structure.
  • 10. The micro-electro-mechanical device of claim 1 wherein the shorting bar assists in suspending the second end of the cantilever structure over the substrate.
  • 11. The micro-electra-mechanical device of claim 1 wherein the cantilever structure has a length substantially parallel to a length of the shorting bar.
  • 12. The micro-electro-mechanical device of claim 1 wherein the shorting bar extends in a direction approximately parallel to a direction of the cantilever structure, where the direction of the cantilever structure is measured between the first end and the second end of the cantilever structure.
  • 13. The micro-electro-mechanical device of claim 1 wherein the shorting bar extends in a direction approximately 90 degrees from a direction of the cantilever structure, where the direction of the cantilever structure is measured between the first end and the second end of the cantilever structure.
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