Patent Application
20070231541
This application is related to commonly assigned, co-pending U.S. patent application Ser. No.______ by Fleming et al., entitled “Microstructured Tool and Method of Making Using Laser Ablation”, and filed of even date herewith (Docket 60840US002).
The invention relates to a microstructured tool and particularly to a microstructured tool comprising a microstructured layer of an aromatic acrylate polymer disposed on a base layer. The microstructured tool is made using laser ablation.
Microstructured tools comprising features of less than several millimeters are used in replication processes for forming microstructured replicas able to perform a specific function. The replicas can be made directly from a microstructured tool or from a metal tool which is formed from the microstructured tool. Microstructured replicas are used in a variety of applications including optical applications in which they function as prisms, lenses, and the like. In such applications, it is often critical that these microoptical components, and therefore the microstructured tools from which they are made, be free of imperfections such as surface roughness that might otherwise produce undesirable optical artifacts.
Laser ablation is a process that may be used to form microstructured tools having a microstructured polymer layer on a supporting substrate. The microstructured polymer layer comprises a polymer layer having one or more recessive features on its surface which are formed by removal of polymer in selected regions. Removal of polymer is a result of decomposition following absorption of radiation from a laser. In order to meet the growing demand for microoptical components, it is desirable to use laser ablation to form microstructured tools that meet the stringent criteria described above. Thus, there is a need for new materials that may be used in laser ablation processes.
Disclosed herein is a microstructured tool having a microstructured layer on a base layer. The microstructured layer is made from an aromatic acrylate polymer that is a reaction product of an oligomer and a radiation curable diluent, the aromatic acrylate polymer having a ratio of aromatic to aliphatic carbons of less than about 1:1, and the oligomer comprising a multifunctional acrylate monomer or an acrylate functionalized oligomer. The microstructured layer has a microstructured surface having one or more features. The base layer may comprise a metal, polymer, ceramic, or glass.
Also disclosed herein is a method of making the microstructured tool using laser ablation. The method comprises providing a laser ablatable article comprising: a laser ablatable layer comprising an aromatic acrylate polymer, the aromatic acrylate polymer comprising a reaction product of an oligomer and a radiation curable diluent, the aromatic acrylate polymer having a ratio of aromatic to aliphatic carbons of less than about 1:1, the oligomer comprising a multifunctional acrylate monomer or an acrylate functionalized oligomer, and a base layer comprising metal, polymer, ceramic, or glass, the base layer disposed adjacent the laser ablatable layer; providing a laser ablation apparatus having a laser; and ablating the laser ablatable layer to form a microstructured surface comprising one or more features.
Also disclosed herein is a method of making a microstructured replica. The method comprises: providing the microstructured tool of claim 1; applying a liquid composition over the microstructured surface; hardening the liquid composition to form a hardened layer; and separating the hardened layer from the microstructured tool.
Also disclosed herein is a method of making a microstructured metal tool. The method comprises: providing the microstructured tool of claim 1; applying a metal over the microstructured surface to form a metal layer; and separating the metal layer from the microstructured tool.
The microstructured articles disclosed herein may be used in optical applications such as plasma display devices, computer monitors, and hand-held devices; channel structures in microfluidic chips; mechanical applications, etc.
The above summary is not intended to describe each disclosed embodiment or every implementation of the invention. The Figures and the detailed description which follow more particularly exemplify illustrative embodiments.
a-4d show cross-sectional views of exemplary microstructured surfaces.
a and 5b are photographs of an exemplary laser ablated article after a selected number of laser shots.
a and 6b are photographs of an exemplary microstructured tool.
a are 7b are photographs of a comparative laser ablated article after a selected number of laser shots.
As described above, laser ablation is a process that may be used to create a microstructured polymer layer on a supporting substrate. In this process, radiation is emitted by the laser such that it is incident upon selected areas of the polymer layer. The polymer layer absorbs the radiation and removal of the polymer occurs by vaporization due to some combination of photothermal and photochemical mechanisms. The combination typically depends on selected properties of the polymer, for example, melting point, absorption coefficient at the wavelength of the radiation, heat capacity, and refractive index, and on laser ablation conditions such as laser fluence, wavelength, and pulse duration.
Microstructured tools suitable for use in optical applications, as disclosed herein, may be made using multi-shot laser ablation processes in which more than one shot by the laser is used to form each feature. This process allows one to control the side wall angles of the features and also to remove polymer down to the surface of the substrate or down to the surface of the base layer. Multi-shot laser ablation is also used for microstructuring thick aromatic acrylate polymer layers, for example, greater than 15 um.
Many types of systems are available for use in multi-shot laser ablation processes including, for example, projection, spot writing, shadow masking, and holographic systems. In a shadow masking ablation system, for example, a mask having the desired pattern is placed in close proximity or in contact with a laser ablatable article having a polymer layer. The pattern is formed on the surface of the polymer layer because the mask allows radiation to reach only selected areas. Laser ablation systems preferably utilize lasers that emit radiation having a wavelength of 400 nm or less including, for example, excimer lasers such as KrF, F2, ArF, KrCl, XeF, or XeCl lasers, or lasers that emit radiation having longer wavelengths but are converted to 400 nm or less using nonlinear crystals. Useful laser ablation systems and methods are described, for example, in U.S. Pat. No. 6,285,001 B1.
The microstructured tool 10 disclosed herein, as shown in the example of
The particular material used as the base layer will depend upon the particular application, but in general, the material should be lightweight, durable, and inexpensive. The base layer is also desirably stable under ordinary laboratory storage conditions with respect to temperature, humidity and light, and towards any materials in which it may come in contact with such as cleaning solutions, the aromatic acrylate polymer of the microstructured layer, and the material used to form the microstructured replicas.
The base layer may comprise metal, polymer, ceramic, or glass. Suitable materials include metals such as nickel, aluminum, copper, steel, brass, bronze, tin, tungsten, magnesium chrome, and alloys thereof; polymers such as polycarbonates, polyimides, polyesters, polystyrenes, or poly(meth)acrylics; ceramics such as silicon, alumina, and silicon nitride; glasses such as fused silica, optical glass, or float glass, or composites containing fiberglass. Nickel is especially useful as a base layer because it is capable of acting as a stop layer to the laser light used to form the microstructured surface 16 of the microstructured layer as shown in
In one particular example, the base layer comprises aluminum and a nickel layer comprising nickel is disposed thereon, between the base layer and the microstructured layer. Other examples of suitable base layers are described in commonly assigned, co-pending U.S. patent application Ser. No.______ by Fleming et al., entitled “Microstructured Tool and Method of Making Using Laser Ablation”, and filed of even date herewith (Docket 60840US002); the disclosure of which is incorporated herein by reference for all that it contains.
The surface roughness of the base layer, for the side adjacent the microstructured layer, may be important in obtaining desirable microstructured tools and replicas. This surface of the base layer must have a roughness that is at least as good as that needed at the top of microstructured replicas that will be made from the microstructured tool having the base layer. In general, the base layer may have an arithmetical mean roughness (Ra) of 1 um or less, and for most optical applications, Ra is 100 nm or less. The roughness of the surface after ablation should be no more than these limits as well.
The thickness of the base layer will also depend on the particular application, as well as on the nature of the material being used. In general, the base layer should be thick enough to be handleable, self-supporting and resistant to damage such as cracking, kinking, and breaking under routine handling. The stiffness of the base layer is not particularly limited but, in general, the larger the area, the more desirable it is to have a stiffer base layer. For stiffness and handleability, the microstructured tool may have a product of the modulus of elasticity times the thickness cubed of at least about 0.005 N-m (0.05 in-lb). For example, a base layer comprising 51 um (2 mil) thick aluminum (modulus 71×109 N/m2 (10.3×106 lb/in2)) may be useful because the product of the modulus of elasticity times the thickness cubed is about 0.009 N-m (0.08 in-lb). Aluminum having a thickness of up to 254 um (10 mil) may also be useful. For another example, a base layer comprising 6.4 mm (250 mil) thick steel (modulus 207×109 N/m2 (30×106 lb/in2)) may be useful because the product is about 54264 N-m (468750 lb-in).
In some cases, such as in the manufacture of barrier ribs used in plasma display devices, it is desirable for the base layer to have a sufficiently large area, for example, greater than about 100 cm2 or greater than about 1000 cm2. If the base layer is thick enough to have a measurable flatness, it may be desirable to have a flatness of better than about 10 μm per 100 cm2 or better than about 10 μm per 1000 cm2. If the base layer is too thin to have a measurable flatness, and it is supported during ablation by another flat object such as a support table or vacuum table, then it may be desirable for the base layer to have a parallelism of better than about 10 μm per 100 cm2 or better than about 10 μm per 1000 cm2.
The laser ablatable layer, i.e., the microstructured layer before it is ablated, and the microstructured layer itself, comprises an aromatic acrylate polymer comprising a reaction product of an oligomer and a radiation curable diluent, the aromatic acrylate polymer having a ratio of aromatic to aliphatic carbons of less than about 1:1, and preferably less than about 0.5:1. If an aromatic acrylate polymer having this property is employed in the laser ablatable layer, along with a properly selected curable diluent, it has been found that high thermal stability (minimal melting) is maximized, the amount of debris generated is minimized, the depth per number of shots is linear, and the resolution is not degraded. In addition, viscosity is right, and curing fast.
The oligomer comprises a multifunctional acrylate monomer or an acrylate functionalized oligomer such as an aromatic urethane acrylate. In particular, the aromatic urethane acrylate may be the reaction product of a multifunctional isocyanate comprising two or more isocyanate groups, a hydroxy (meth)acrylate comprising one or more (meth)acrylate groups and one or more hydroxyl groups, and a multifunctional alcohol comprising two or more hydroxyl groups.
Examples of useful multifunctional isocyanates are aromatic and may have from 2 to 5 isocyanate groups, for example, toluene diisocyanate; 4,4′-diphenylmethane diisocyanate; 1,4 phenylene diisocyanate; or tetramethyl meta-xylyl diisocyanate.
Examples of useful hydroxy (meth)acrylates comprise one (meth)acrylate group and one hydroxyl group, for example, a hydroxy alkyl (meth)acrylate such as 2-hydroxyethyl (meth)acrylate.
Examples of multifunctional alcohols comprise two to six hydroxyl groups such as an alkoxylated triol. One particular alkoxylated triol comprises:
wherein n is independently from 0 to 2.
A particularly useful oligomer comprises the reaction product of toluene diisocyanate, 2-hydroxyethyl acrylate, and the multifunctional alcohol comprising:
wherein n is independently from 0 to 2.
The radiation curable diluent may comprise one or more radiation curable components. Useful components include multifunctional (meth)acrylates comprising from two to six (meth)acrylate groups, for example, comprising
wherein n is independently from 0 to 5.
The oligomer may also comprise an aromatic epoxy acrylate such as those derived from bisphenol-A.
The radiation curable diluent may be present in an amount of up to 60 wt. % relative to the total weight of the oligomer and the radiation curable diluent.
The particular choice of oligomer and radiation curable diluent may be influenced by a variety of factors. For one, they should be selected such that their reaction product, i.e., the aromatic acrylate polymer, is stable under laboratory storage conditions with respect to temperature, humidity and light, and towards any materials in which it may come in contact with such as cleaning solutions, the base layer, release agents, and the material used to form the microstructured replicas. Further, the reaction product should have acceptable physical properties, so that it is not so soft as to be tacky, but not so hard as to be brittle and tend to crack and flake if the base layer is deformed. Also, as described below, the aromatic acrylate polymer ideally has an absorption coefficient greater than about 1×103 per cm at the wavelength of the radiation provided by the laser.
The laser ablatable layer may be provided in a number of ways. For example, the laser ablatable layer may be provided in the form of a film onto which the base layer is applied, or the two may be laminated together. Alternatively, the laser ablatable layer may be prepared by casting a solution comprising the oligomer and radiation curable diluent onto the base layer and which are then subsequently cured to form the layer. The laser ablatable layer may be crosslinked to minimize reflow in an ablated region.
Common curing processes include heat, time, and radiation such as UV radiation and electron beam radiation. Before curing, care must be taken so that the coated material to be cured does not flow and cause variations in the coating thickness. UV radiation is preferred and UV curable components are preferred because they cure quickly, reducing the amount of time for the coated material to shift, and also because they cure at or near room temperature, reducing the possibility of stress as described below. UV radiation in combination with heating may also be employed.
Other components which may be included in the aromatic acrylate polymer layer include dyes, UV absorbers, photoinitiators, plasticizers, and stabilizers such as antioxidants.
The solution may be coated using a variety of techniques of varying precision, many of which are known in the art, for example, knife coating, gravure coating, slide coating, spin coating, curtain coating, spray coating, die coating, etc. Viscosity of the solution is important because it should be coatable to any desired thickness as described below. That is, low viscosity solutions are needed for thin layers, and high viscosity solutions for thick layers.
The laser ablatable layer is desirably under little or no stress, otherwise during ablation, it can undesirably change shape or dimension. Thus, if the aromatic acrylate polymer is to be coated and then hardened, the properties of the material in its liquid or precursor form are important. Any shrinkage during curing or cooling should preferably be matched to the rest of the laser ablatable article. These considerations may also determine the thickness of the laser ablatable layer, because stress is often built up during solvent coating and curing for layers having thicknesses of about 50 um or more. It is also desirable that the laser ablatable layer be cleanly ablatable with little or no generation of soot, not meltable under atmospheric pressure, and swell little under heat.
The surface of the laser ablatable layer which becomes the microstructured surface must have a roughness that is at least as good as that needed at the bottom of microstructured replicas that will be made from a microstructured tool having the laser ablatable layer. In general, the surface may have an arithmetical mean roughness (Ra) of 1 um or less, and for most optical applications, Ra is 100 nm or less. The roughness of this surface after ablation should be no more than these limits as well.
The thickness of the laser ablatable layer may vary depending on the application and, in general, the thickness provides a convenient mechanical limit to the depth of the one or more features comprising the microstructured surface. Suitable thicknesses may be up to about 1000 um. For some applications, thicknesses greater than about 1000 um could be used, although microstructured surfaces with feature depths greater than about 1000 um usually take longer to make, and it becomes increasingly difficult to control feature shape of the microstructured surface far from the image plane. It is desirable for the laser ablatable layer to have uniform thickness because this determines the height uniformity of the features in the microstructured layer. If the laser ablatable layer is too thick or is not uniform enough, it may be mechanically machined using grinding or fly cutting with a diamond cutting tool.
In order to prevent variations in the ablation rate, the laser ablatable layer is desirably uniform and homogeneous throughout with respect to absorptivity of the laser radiation, density, refractive index at the laser wavelength, etc. Under identical conditions, and with a laser power at least two times the ablation threshold, the ablation rate of the aromatic acrylate polymer should not vary more than 10% over the entire area of the laser ablatable article. As described below, the ablation threshold may be found by drawing a curve of ablation depth vs. pulse energy and extrapolating to zero depth.
As shown in
In general, the tie layer should be as thin as possible, for example, less than about 1 um, such that its properties do not substantially affect the ablation properties of the laser ablatable layer or the properties of the laser ablatable article either before or after ablation. If the roughness of any of the layers is critical as described above, then the tie layer must not increase the roughness.
Also, in such cases, the tie layer must not lower the damage threshold of the nickel layer, the laser fluence above which material is removed, the surface roughened, or the material distorted, to less than four times the fluence that it takes to ablate the laser ablatable layer. That is, the damage threshold of the nickel layer with the tie layer on it must be at least four times the fluence required to ablate the laser ablatable layer.
As shown in
As shown in
The three-dimensional topography comprises one or more features that may very in terms of shape, size, and distribution across the surface. The features may be described as recesses, cavities, relief structures, microlens, grooves, channels, etc., and they may comprise rectangular, hexagonal, cubic, hemispherical, conical, pyramidal shapes, or combinations thereof.
As described above, the depth of the one or more features is limited by the thickness of the laser ablatable layer, such that they may have a maximum depth of up to about the maximum thickness of the laser ablatable layer. Thus, the one or more features may have a maximum depth of up to about 1000 um, for example, from about 0.5 um to about 1000 um. The one or more features may comprise multiple depths and the depths may vary from feature to feature if more than one feature is present. In some cases the nickel layer may be exposed within at least one of the recessive features. Dimensions other than the depth are not particularly limited.
If more than one feature is present, then they may be arranged in any way, such as randomly or in a pattern, or some combination thereof. For example, features may be randomly arranged within a region of the microstructured surface, and many regions may be arranged in a pattern across the surface. Examples of shape parameters that may be varied include depth, wall angle, diameter, aspect ratio (ratio of depth to width), etc.
Also disclosed herein is a method of making the microstructured tool. The method comprises providing a laser ablatable article comprising a laser ablatable layer comprising an aromatic acrylate polymer, the aromatic acrylate polymer comprising a reaction product of an oligomer and a radiation curable diluent, the aromatic acrylate polymer having a ratio of aromatic to aliphatic carbons of less than about 1:1, and a base layer comprising metal, polymer, ceramic, or glass, the base layer disposed adjacent the laser ablatable layer; providing a laser ablation apparatus having a laser; and ablating the laser ablatable layer to form a microstructured surface comprising one or more features.
As described above, any type of laser ablation apparatus or system may be used, provided it is equipped with a suitable laser and capable of multi-shot ablation. System parameters that may be varied include the wavelength of the radiation provided by the laser. Lasers that emit radiation having a wavelength of less than about 10 um are preferred because the feature size of the microstructured tool is limited by the wavelength of the laser. Also preferred are lasers that emit radiation having a wavelength of less than 2 um and less than 400 nm. The laser may be selected such that the radiation wavelength is less than about 10 times the resolution limit, i.e., the smallest dimension of a given feature to be ablated, and more preferably, less than 5 times the resolution limit, and most preferably, less than 2 times the resolution limit. More important is that the laser ablatable material have a high absorption at the wavelength used.
For efficiency, it is often desirable to select the laser depending on the absorption of the laser ablatable layer, or vice versa. The laser ablatable layer ideally has an absorption coefficient greater than about 1×103 per cm at the wavelength of the radiation provided by the laser. This helps minimize the ablation threshold, allowing structures to be created at lower powers. This also helps limit the collateral damage of the ablation process and allows smaller features to be made.
Other system parameters may be selected by determining the threshold energy density of the laser ablatable layer, which is the amount of laser energy necessary to ablate the least bit of the ablatable layer. The ablation threshold is found by drawing a curve of ablation depth vs. pulse energy and extrapolating to zero depth. One parameter that may be varied is the energy of the laser pulse. Varying the laser pulse energy is a convenient way of varying the depth of material removed at each pulse of the laser. Higher energies will remove more material, increasing productivity. Lower pulse energies will remove less material, increasing control of the process. It is desirable that the ablatable material have no process memory; that is, for the same laser pulse parameters, in each pulse, the same amount of material is removed no matter how many preceeding pulses. The depth of the features can then be controlled by knowing the depth per pulse and counting the number of pulses. Pulse width, temporal pulse shape, wavelength, and coherence lengths of the laser also affect the ablation process, but these parameters are usually fixed in each laser or can be varied only a small amount. The thickness of the laser ablatable layer is another factor to consider. As described above, the thickness before ablation needs to be at least that required for the maximum height of the microstructured surface, and multiple depths may also be desired, as well as removal of the laser ablatable layer down to the base layer.
In some cases, such as when enough pulses are used to ablate the laser ablatable layer down to the surface of the base layer, it may be desirable for the aromatic acrylate polymer to have a laser ablation threshold, the base layer a laser damage threshold, and wherein the laser ablation threshold is less than 0.25 of the laser damage threshold. This difference helps to ensure a clean, flat bottom of the microstructured layer without affecting the base layer.
The shapes of the laser ablatable article and the microstructured tool made therefrom are not particularly limited except that the laser ablation system must be able to define an image plane during ablation. The shapes either before, during, or after ablation may be the same or different. For example, both the laser ablatable article and the microstructured tool may be in a generally flat, sheet-like form, or the laser ablatable article may be in a generally flat, sheet-like form, and after ablation, be formed into a cylinder or a belt. Alternatively, the laser ablatable article may be in the shape of a cylinder or belt before ablation.
The microstructured tool may comprise an additional layer on the microstructured surface for protection against chemical degradation or mechanical damage, or to change the surface energy or optical characteristics. In particular, diamond-like glass may be applied using a plasma deposition process in order to make microstructured thin films that may be used in a variety of applications; see U.S. Pat. No. 6,696,157 B1 for a description of diamond-like glass and its applications.
The microstructured tool may undergo further processing, packaging, integration, or be cut into smaller parts.
Also disclosed herein is a method of making a microstructured replica, the method comprising: providing a microstructured tool as described above; applying a liquid composition over the microstructured surface; hardening the liquid composition to form a hardened layer; and separating the hardened layer from the microstructured tool. Before applying the liquid composition, the microstructured surface may be treated with a release agent such as a fluorochemical-, silicone-, or hydrocarbon-containing material. The liquid composition may comprise one or more monomers, oligomers, and/or polymers that are hardened by curing, or molten polymer that is hardened by cooling. In either case, the microstructured tool may be used repeatedly to make any number of microstructured replicas.
Also disclosed herein is a method of making a microstructured metal tool, the method comprising: providing the microstructured tool as described above; applying a metal over the microstructured surface to form a metal layer; and separating the metal layer from the microstructured tool. The metal may be electroplated onto the microstructured surface. Before applying the metal, the microstructured surface may be coated with a conductive seed layer for metal deposition during the electroplating process. The conductive seed layer may be applied using a vapor deposition process. The resulting microstructured metal tool may be used repeatedly to make any number of microstructured replicas. The microstructured metal tool may be used to make metal replicas or polymeric replicas. Either replica or the microstructured metal tool may be used to make an article. For example, the article may comprise a microstructured layer of frit formed on a glass substrate which is then heated to form a barrier rib structure for a plasma display device as described in U.S. Pat. No. 6,802,754, the disclosure of which is incorporated herein by reference.
Preparation and Ablation of Coated Panels
A commercially available aluminum sheet material (PREMIRROR 41 from Lorin Industries) with a thickness of 508 um (0.020″) was plated with a layer of electroless nickel. The layer of electroless nickel was 2.5-7.6 um (0.0001-0.0003″) thick. The plating process was carried out at Twin City Plating of Minneapolis, Minn.
The electroless nickel surface was cleaned with ethyl alcohol and a cloth wipe. To the surface was then applied a solution of Scotchprime® 389 ceramo-metal primer available from the 3M Company. The solution was sprayed onto the nickel surface, wiped to achieve a uniform coating, allowed to air dry, and cured in an oven at 110° C. for 10 minutes. The panel was removed and cooled to room temperature and any remaining unreacted agent removed with EtOH and a cloth wipe.
An aromatic urethane acrylate resin was prepared by mixing prepolymer components of an aromatic urethane triacrylate (average Mn 1300 g/mol) with 40 wt. % ethoxylated trimethylolpropane triacrylate as diluent (EBECRYL 6602 from Cytec Surface Specialties) at 82.5 wt. %, an ethoxylated trimethylolpropane triacrylate (SARTOMER SR454 from Sartomer Co.) at 16.5 wt. %, and photoinitiator (IRGACURE 369 from Ciba Specialty Chemicals) at 1 wt. %. The resin was coated over the nickel surface to a thickness of between 155-225 um by one of the following two methods: 1) A precision die coater at elevated temperature (i.e., 65° C.) providing a coating uniformity of ±5 um. 2) A standard knife coater at room temperature providing a coating uniformity of ±15 um. If the latter coating process is used, the sample may then be made more uniform by planarizing the top surface after curing by conventional machining methods such as flycutting, grinding, or lapping.
The coated panel was enclosed within a metal framed, glass topped, “inerting” chamber. The chamber was purged with dry nitrogen for 1 minute to reduce the oxygen level below 100 ppm. The sample was then cured with UV radiation (15 W, 18″-blacklight-blue bulbs, 30 seconds, 320-400 nm, ˜5-25 mW/cm2).
The resulting laser ablatable article was ablated using an excimer laser ablation system comprising a Lambda Physik laser LPX 300 CC. The laser beam was homogenized and passed through a mask that was imaged with a 5× projection lens using an optic system by Microlas.
At test pattern was ablated into the aromatic acrylate polymeric layer. A total of 90 shots at a beam fluence of 800 mJ/cm2 at 248 nm and 150 pulses per second were used. The resulting microstructured tool had a thickness of 162 μm and the pattern was ablated through to the nickel layer. The ablation debris was removed using ethyl alcohol and gentle wiping with a flock pad.
A mixture of an aromatic (bisphenol-A) epoxy diacrylate, EBECRYL 600 (79.3 wt %) from Surface Specialties of Smyrna, Ga., a trifunctional acrylate monomer, SR351 (19.8 wt %) from Sartomer Company of Exton, Pa., and photoinitiator IRGACURE 369 (1 wt %) from Ciba Specialty Chemical Corp. of Tarrytown, N.Y. was coated onto a glass panel with a knife coater to a thickness of approximately 120 microns. The coated sample was passed through a medium pressure Hg UV light source from RPC Industries of Plainfield, Ill. with a nitrogen purge and then ablated with a laser as described in Example 1.
A mixture of an aromatic (bisphenol-A) ethoxylate diacrylate, EBECRYL 150 (99 wt %) from Surface Specialties of Smyrna, Ga., and photoinitiator DAROCUR 1173 (1 wt %) from Ciba Specialty Chemical Corp. of Tarrytown, N.Y. was coated onto a glass panel with a knife coater to a thickness of approximately 140 microns. The coated sample was passed through a medium pressure Hg UV lightsource from RPC Industries of Plainfield, Ill. with a nitrogen purge and then ablated with a laser as described in Example 1.
A coated panel was prepared by mixing an epoxy resin EPON NOVALAC SU-8 from MicroChem of Newton, Mass. The mixture was coated onto a plate glass panel using a standard knife coater to a thickness of approximately 330 microns. The coating was pre-baked in a convection oven at 65° C. for 5 minutes followed by a softbake at 95° C. for 60 minutes. The coating was then exposed to UVA radiation using a BLB bulb 350-400 nm with an irradiance of 20-25 mW/cm2 for 30 sec. After exposure, the coating was post-exposure baked to crosslink the coating. The sample was post-baked in a convection oven at 65° C. for 1 minute followed by 15 minutes at 95° C. The sample was cooled to room temperature and ablated with a laser as described in Example 1.
A coated panel was prepared by mixing an epoxy resin EPON NOVALAC SU-3 from Resolution Performance Products of Pueblo, Colo. (98 wt %) and cationic photoinitiator CYRACURE UVI-6976 from Union Carbide Corp, of Danbury, Conn. (2 wt %) was coated onto a glass sheet using a knife coater to a thickness of approximately 200 microns. The coated panel was exposed to UVA radiation using a BLB bulb 350-400 nm with an irradiance of 20-25 mW/cm2 for 30 sec. The panel was then heated in a convection oven at 100° C. for 1 hour. The sample was cooled to room temperature and ablated with a laser as described in Example 1.
A mixture of an aromatic (bisphenol-A) diglycidyl ether EPON 828 from Resolution Performance Products of Pueblo, Colo. (98 wt %) and cationic photoinitiator CYRACURE UVI-6976 from Union Carbide Corp, of Danbury, Conn. (2 wt %) was coated onto a glass sheet using a knife coater to a thickness of approximately 230 microns. The coated panel was exposed to UVA radiation using a BLB bulb 350-400 nm with an irradiance of 20-25 mW/cm2 for 30 sec. The panel was then heated in a convection oven at 100° C. for 1 hour and then ablated with a laser as described in Example 1.
A sample of 225 mircon (5 mil) thick polyimide film, KAPTON H, available from DuPont, Circleville, Ohio was provided for ablation. This film was held onto the ablation table by vacuum. The sample was ablated with a laser as described in Example 1, except that the film was not ablated all the way through its thickness.
A mixture of an aliphatic polyester acrylate, EBECRYL 809 (99 wt %) from Surface Specialties of Smyrna, Ga., and photoinitiator DAROCUR 1173 (1 wt %) from Ciba Specialty Chemical Corp. of Tarrytown, N.Y. was coated onto a glass panel with a knife coater to a thickness of approximately 125 microns. The coated sample was passed through a medium pressure Hg UV lightsource from RPC Industries of Plainfield, Ill. with a nitrogen purge and then ablated with a laser as described in Example 1.
A mixture of an aliphatic acrylated polyol, IRR214 (99 wt %) from Surface Specialties of Smyrna, Ga., and photoinitiator DAROCUR 1173 (1 wt %) from Ciba Specialty Chemical Corp. of Tarrytown, N.Y. was coated onto a glass panel with a knife coater to an approximate thickness of 200 microns. The coated sample was passed through a medium pressure Hg UV lightsource from RPC Industries of Plainfield, Ill. with a nitrogen purge and then ablated with a laser as described in Example 1.
A mixture of aliphatic urethane acrylate oligomer PHOTOMER 6010 (99 wt %) from Cognis Corp. of Cincinnati, Ohio and photoinitiator DAROCUR 1173 (1 wt %) from Ciba Specialty Chemical Corp. of Tarrytown, N.Y. was coated onto a glass panel with a knife coater to a thickness of approximately 140 microns. The coated sample was passed through a medium pressure Hg UV lightsource from RPC Industries of Plainfield, Ill. with a nitrogen purge and then ablated with a laser as described in Example 1.
A summary of the materials used in Examples 1-3 and the comparative examples is provided in Table 1. The ratio of aromatic to aliphatic carbons is also included.
Evaluation of Ablated Panels
The ablated panels were evaluated for:
Ratings were given as follows and the results are shown in Table 2.
−=below average
NA = not applicable
Various modifications and alterations of this invention will be apparent to those skilled in the art without departing from the scope and spirit of the invention, and it should be understood that this invention is not limited to the examples and embodiments described herein.
