Claims
- 1. A method for manufacturing a microvalve including a plurality of at least partially bonded, stacked layers, at least one of the plurality of layers being at least partially made of a metallic material, the method comprising the steps of:
- (a) providing an electromagnetic drive; and
- (b) forming a multilayer lower valve part from the plurality of stacked layers using an electrodeposition process, the multilayer lower valve part being separate from the electromagnetic drive, the multilayer lower valve part including at least one armature, a valve-closure element, a valve-seat surface, at least one inlet and at least one outlet, the valve-seat surface communicating with the valve-closure element, the valve-seat surface being positioned between the at least one inlet and the at least one outlet, the valve-closure element being deflectable using the electromagnetic drive.
- 2. A method for manufacturing a microvalve including a plurality of at least partially bonded, stacked layers, at least one of the plurality of layers being at least partially made of a metallic material, the method comprising the steps of:
- (a) providing an electromagnetic drive;
- (b) forming the plurality of stacked layers, separate from the electromagnetic drive, using an electrodeposition process to form a multilayer lower valve part, the multilayer lower valve part including at least one armature, a valve-closure element, a valve-seat surface, at least one inlet and at least one outlet, the valve-seat surface communicating with the valve-closure element, the valve-seat surface being positioned between the at least one inlet and the at least one outlet, the valve-closure element being deflectable using the electromagnetic drive;
- (c) before steps (a) and (b), applying a sacrificial layer to a substrate of the multilayer lower valve part;
- (d) applying a photoresist layer over at least one of the substrate and the sacrificial layer;
- (e) selectively patterning the photoresist layer to form a negative pattern for a later layer of the multilayer lower valve part in the photoresist;
- (f) forming resist trenches in the negative pattern of the photoresist using a micro-electrodeposition process, the resist trenches being galvanically filled with a metal composition material;
- (g) repeating steps (c) through (f) for forming a desired number of the plurality of layers of the microvalve; and
- (h) after step (g), dicing the microvalve and dissolving the photoresist out of the multilayer lower valve part.
- 3. The method according claim 2, further comprising the step of:
- (i) applying galvanic starting layers between the plurality of layers.
- 4. The method according to claim 2, wherein, in step (d), the photoresist is applied by laminating a non-removable resist.
- 5. The method according to claim 2, wherein, in step (d), the photoresist is applied using one of a spin-on deposition and a spray-on deposition of a liquid resist.
- 6. The method according to claim 2, wherein, in step (d), the photoresist is applied using one of a spin-on deposition and a spray-on deposition of a liquid polyimide.
- 7. The method according to claim 2, wherein, in step (e), the photoresist is patterned using a UV-irradiation through a mask and through a UV depth lithography.
- 8. The method according to claim 2, wherein, in step (e), the photoresist is patterned using a deposition of one of an oxide and a nitride, one of the patterned oxide and patterned nitride being used as a mask for a dry-etching process of the photoresist.
- 9. The method according to claim 2, wherein, in step (e), the photoresist is patterned using a laser ablation process.
- 10. The method according to claim 2, wherein, after step (g), two layers of the microvalve are formed using the electrodeposition process, and further comprising the step of:
- (k) horizontally and vertically extending the metal composition material over the photoresist.
Priority Claims (1)
Number |
Date |
Country |
Kind |
95 23 915 |
Jun 1995 |
DEX |
|
Parent Case Info
This application is a division of Ser. No. 08/793,427 filed Feb. 21, 1997.
US Referenced Citations (7)
Foreign Referenced Citations (2)
Number |
Date |
Country |
42 41 089 |
Jan 1994 |
DEX |
44 32 725 |
Jan 1996 |
DEX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
793427 |
Feb 1997 |
|