Microwave purification process

Information

  • Patent Grant
  • 8604398
  • Patent Number
    8,604,398
  • Date Filed
    Wednesday, November 10, 2010
    14 years ago
  • Date Issued
    Tuesday, December 10, 2013
    11 years ago
Abstract
A method of purifying a target powder having an oxygen content, the method comprising: flowing hydrogen gas through a microwave production chamber; applying microwaves to the hydrogen gas as the hydrogen gas flows through the microwave production chamber, thereby forming hydrogen radicals from the hydrogen gas; flowing the hydrogen radicals out of the microwave production chamber to the target powder disposed outside of the microwave production chamber; and applying the hydrogen radicals to the target powder, thereby removing a portion of the oxygen content from the powder. Preferably, the target powder is agitated as the hydrogen radicals are being applied.
Description
FIELD OF THE INVENTION

The present invention relates to the field of materials purification. More specifically, the present invention relates to a microwave-based purification process and system.


BACKGROUND OF THE INVENTION

In the powdered materials industry, there has become an increased interest in purer and purer powders. There are a variety of reasons for this interest. In the semiconductor industry, and more specifically the hard disk industry, there is a need for purer and purer metals. Components such as ¾″ inch hard drives in cell phones and MP3 players can have up to six layers of metal on the mini-hard drives in order to achieve the storage capacity needed for video and other data. One of the metals that is used for coating is ruthenium. Here, the oxygen content is critical. If the oxygen content is too high, it can result in the formation of ruthenium-oxides, which are non-conductive. Non-conductivity poses problems when trying to store data.



FIG. 1 illustrates one example of powder particles 100 that are typically used in the materials industry. These powder particles 100 typically contain impurities, such as oxygen content 102 disposed around their core. The industry is looking for purification levels equal to or less than 200 ppm of oxygen in the starting powders. Currently, one attempted solution is to place the powder in a vacuum furnace or in a hydrogen-fired vacuum furnace on a tray. The furnace is brought up to relatively high temperatures. The oxygen content (and moisture) is desorbed from the powder. Hydrogen can flow over the powder to grab and remove the oxygen and moisture content, which is pumped out, leaving a purer powder.


The downside of these furnace technologies is that they require the use of high temperatures for a long period of time. One problem with this requirement is that it places a limitation on the minimum size of grain that can be purified. The smaller the grain size, the lower the sintering temperature is for the powder, thus making small grain powders difficult to purify using these technologies. What is needed is a more cost effective technology that allows relatively small grains to be purified without sintering.


These issues are important to the powder industry in general. Cutting tools can be formed from powders, such as tungsten-carbide, tungsten-nitride and the like. However, the powders often contain oxygen, sometimes in the form of thin oxygen layers formed around each particle. In sintering the powders together to form the cutting tools, it is desirable to maintain the powder-like nature. However, it is important to minimize the void between the particles. If the void is too big, the structural integrity of the end product suffers. If there is too much oxygen, the particles will not sufficiently sinter together. When using a cutting tool made from powders having these deficiencies, the lack of structural integrity can cause the tool to fracture. What is needed is a better way to take oxygen out of powders, reduce the voids, and prepare the powders for sintering.



FIG. 2 illustrates one system 200 that has be used to try and purify powders. Here, the target powder 240 (for example, boron) is disposed in a crucible 230 that is housed within a microwave production chamber 210, such as a microwave oven. Hydrogen gas flows from a gas supply system 220 into the microwave production chamber 210 via a conduit or tube 225. As the hydrogen gas flows into the microwave production chamber 210 and the crucible 230, the microwave production chamber 210 generates and applies microwaves to the hydrogen gas, thereby forming a plasma 250 and creating hydrogen radicals, which flow over the target powder 240 and are drawn out of the chamber 210 along with oxygen content from the target powder. This drawing force is supplied by a vacuum pump 260. Although this system removes a portion of the oxygen content, there is a problem with having the target powder being exposed to the energy of the microwaves. In this configuration, the target powder can loosely couple to the microwave and heat up. This parasitic heating can result in the powder being crystallized. In circumstances where amorphous powders are preferred, this crystallization is highly undesirable.


Therefore, what is needed in the art is an efficient and cost effective system and method of removing oxygen content from a target powder, while avoiding or minimizing any parasitic heating.


SUMMARY OF THE INVENTION

In one aspect of the present invention, a method of purifying a target powder having an oxygen content is provided. The method comprises flowing hydrogen gas through a microwave production chamber and applying microwaves to the hydrogen gas as the hydrogen gas flows through the microwave production chamber, thereby forming hydrogen radicals from the hydrogen gas. The hydrogen radicals flow out of the microwave production chamber to a target powder disposed outside of the microwave production chamber, where they are applied to the target powder, thereby removing a portion of the oxygen content from the target powder.


In another aspect of the present invention, a microwave purification system is provided. The system comprises a gas supply system configured to provide hydrogen gas and a microwave production chamber fluidly coupled to the gas supply system. The microwave production chamber is configured to receive hydrogen gas from the gas supply system and apply microwaves to the hydrogen gas, thereby forming hydrogen radicals. A target chamber is disposed outside of and fluidly coupled to the microwave production chamber. The target chamber is configured to receive the hydrogen radicals from the microwave production chamber and apply the hydrogen radicals to a target powder disposed within the target chamber, thereby removing a portion of oxygen content from the target powder.


In preferred embodiments, the target powder is housed within a target chamber. The hydrogen radicals flow into the target chamber and remove oxygen content from the target powder. The removed oxygen content then flows out of the target chamber.


In preferred embodiments, applying the hydrogen radicals to the target powder comprises the steps of agitating the target powder within the target chamber and flowing the hydrogen radicals through the target chamber as the target powder is being agitated.


Preferably, the target chamber houses a rotatable paddle wheel having an interior circumference and a plurality of paddles disposed in an annular configuration along the interior circumference. The target powder is disposed in the paddle wheel and the wheel is rotated as the hydrogen radical flow through the target chamber. In a preferred embodiment, the rotatable paddle wheel comprises a first end through which the hydrogen radicals enter and a second end through which the removed oxygen content exits. The rotatable paddle wheel extends from the first end to an expanding frusto-conical surface to a substantially cylindrical surface to a narrowing frusto-conical surface to the second end. The plurality of paddles are disposed on the substantially cylindrical surface.


In certain embodiments, the target chamber is heated prior to or during the step of applying the hydrogen radicals to the target powder. Preferably, the target chamber is heated to a temperature equal to or less than 1200 degrees Fahrenheit. Furthermore, the target powder can be heated prior to the step of applying the hydrogen radicals to the target powder.


In preferred embodiments, the step of flowing the hydrogen gas comprises applying a vacuum force to the hydrogen gas and the step of flowing the hydrogen radicals comprises applying a vacuum force to the hydrogen radicals.


Additionally, the step of applying microwaves to the hydrogen gas can result in the formation of hydrogen ions within the microwave production chamber. In certain embodiments, the method further comprises the steps of flowing the hydrogen ions out of the microwave production chamber to the target powder disposed outside of the microwave production chamber and applying the hydrogen ions to the target powder.


It is contemplated that a wide variety of target powder can be used in the present invention. Such target powders include, but are not limited to, boron and ruthenium.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 illustrates a target powder having an oxygen content.



FIG. 2 illustrates a prior art powder purification system.



FIG. 3 illustrates one embodiment of a microwave purification system in accordance with the principles of the present invention.



FIG. 4 illustrates another embodiment of a microwave purification system in accordance with the principles of the present invention.



FIG. 5 illustrates yet another embodiment of a microwave purification system in accordance with the principles of the present invention.



FIG. 6 illustrates a plan view of one embodiment of a target chamber in accordance with the principles of the present invention.



FIG. 7 illustrates one embodiment of a rotatable paddle wheel in accordance with the principles of the present invention.



FIG. 8 is a flowchart illustrating one embodiment of a method of purifying powder in accordance with the principles of the present invention.





DETAILED DESCRIPTION OF THE INVENTION

The description below concerns several embodiments of the invention. The discussion references the illustrated preferred embodiment. However, various modifications to the described embodiments will be readily apparent to those skilled in the art and the generic principles herein may be applied to other embodiments. Therefore, the scope of the present invention is not limited to either the illustrated embodiment, nor is it limited to those discussed. To the contrary, the scope should be interpreted as broadly as possible based on the language of the Claims section of this document.


In the following description, numerous details and alternatives are set forth for purpose of explanation. However, one of ordinary skill in the art will realize that the invention can be practiced without the use of these specific details. In other instances, well-known structures and devices are shown in block diagram form in order not to obscure the description of the invention with unnecessary detail.


This disclosure refers to both particles and powders. These two terms are equivalent, except for the caveat that a singular “powder” refers to a collection of particles. The present invention may apply to a wide variety of powders and particles. Powders that fall within the scope of the present invention may include, but are not limited to, any of the following: (a) nano-structured powders (nano-powders), having an average grain size less than 250 nanometers and an aspect ratio between one and one million; (b) submicron powders, having an average grain size less than 1 micron and an aspect ratio between one and one million; (c) ultra-fine powders, having an average grain size less than 100 microns and an aspect ratio between one and one million; and (d) fine powders, having an average grain size less than 500 microns and an aspect ratio between one and one million.


The present invention will be readily understood by the following detailed description in conjunction with the accompanying drawings. To facilitate this description, like reference numerals designate like elements.



FIG. 3 illustrates one embodiment of a microwave purification system 300 in accordance with the principles of the present invention. The system 300 comprises a microwave production chamber 310 configured to generate microwaves, a gas supply system 320 configured to provide a gas (preferably hydrogen), and a vacuum pump 360 fluidly coupled to the gas supply system 320 via a conduit or tube 325 that runs into and out of the microwave production chamber 310.


In operation, the vacuum pump 360 draws the hydrogen gas from the gas supply system 320 through the conduit 325 and into the microwave production chamber 310. Here, the microwave production chamber 310 produces microwaves, which are applied to the hydrogen gas to strike a plasma 350. As a result, hydrogen radicals 355 are formed. The hydrogen radicals 355 are then drawn out of the microwave production chamber 310 by the vacuum pump 360 and are applied to the target powder 340, which is disposed out of the microwave production chamber 310. The target powder 340 can be contained within a crucible in fluid communication with the conduit 325. The hydrogen radicals 355 react with the oxygen content of the powder 340, thereby disassociating the oxygen content from the powder. The removed oxygen content can then be drawn further away from the powder by the vacuum pump.


In addition to the hydrogen radicals 355, it is contemplated that hydrogen ions (i.e., hydrogen plasma) can also be formed in the microwave production chamber 310. At a low enough pressure, the glow discharge of the hydrogen plasma 355 can be drawn out to the target powder 340 by the vacuum pump 360. The hydrogen plasma can be applied to the target powder 340 to aid in the removal of the oxygen content.


By disposing the target powder 340 outside of the microwave production chamber 310 (i.e., out of the pathway of the microwaves), the system 300 can subject the target powder 340 to hydrogen radicals and ions, while avoiding the microwave energy and the parasitic heating associated with it.


Additionally, it is contemplated that the target powder 340 can be heating at a controlled rate prior to or during its exposure to the hydrogen radicals. This heating can aid in the chemical reactivity of the hydrogen and ablate or drive off moisture on the target powder 340.



FIG. 4 illustrates another embodiment of a microwave purification system 400 in accordance with the principles of the present invention. The system 400 comprises a microwave production chamber 410 configured to generate microwaves, a gas supply system 420 configured to provide a gas (preferably hydrogen), and a vacuum pump 460 fluidly coupled to the gas supply system 420 via a conduit or tube 425 that runs into and out of the microwave production chamber 410. Upon exiting the microwave production chamber 410, the conduit 425 can gooseneck or bend within a displacement region. In a preferred embodiment, the conduit 425 is configured to be agitated in the direction of the displacement arrows in order to shake up the target powder 440.


In operation, the vacuum pump 460 draws the hydrogen gas from the gas supply system 420 through the conduit 425 and into the microwave production chamber 410. Here, the microwave production chamber 410 produces microwaves, which are applied to the hydrogen gas to strike a plasma 450. As a result, hydrogen radicals 455 are formed. The hydrogen radicals 455 are then drawn out of the microwave production chamber 410 by the vacuum pump 460 and are applied to the target powder 440, which is disposed out of the microwave production chamber 410. The target powder 440 can be contained within a crucible in fluid communication with the conduit 425. The hydrogen radicals react with the oxygen content of the powder 440, thereby disassociating the oxygen content from the powder. The removed oxygen content can then be drawn further away from the powder by the vacuum pump.


In addition to the hydrogen radicals, it is contemplated that hydrogen ions (i.e., hydrogen plasma) can also be formed in the microwave production chamber 410. At a low enough pressure, the glow discharge of the hydrogen plasma 450 can be drawn out to the target powder 440 by the vacuum pump 460. The hydrogen plasma can be applied to the target powder 440 to aid in the removal of the oxygen content.


By disposing the target powder 440 outside of the microwave production chamber 410 (i.e., out of the pathway of the microwaves), the system 400 can subject the target powder 440 to hydrogen radicals and ions, while avoiding the microwave energy and the parasitic heating associated with it.


Additionally, it is contemplated that the target powder 440 can be heating at a controlled rate prior to or during its exposure to the hydrogen radicals. This heating can aid in the chemical reactivity of the hydrogen and ablate or drive off moisture on the target powder 440.


Although not shown in FIGS. 3 and 4, it is contemplated that the conduits can run through the microwave production chambers through airtight seals.



FIG. 5 illustrates yet another embodiment of a microwave purification system 500 in accordance with the principles of the present invention. The system 500 comprises a microwave production chamber 510 configured to generate microwaves, a gas supply system 520 configured to provide a gas (preferably hydrogen), a target chamber 570 fluidly coupled to the microwave production chamber 510, preferably via a conduit or tube 525 that runs into and out of the microwave production chamber 510. A vacuum pump 560 is fluidly coupled to the target chamber 570, the microwave production chamber 510, and the gas supply system 520.


The target powder 540 is housed within the target chamber 570. In a preferred embodiment, the target chamber 570 is configured to agitate the target powder 540. Such agitation can be achieved in a variety of ways.


In operation, the vacuum pump 560 draws the hydrogen gas from the gas supply system 520 through the conduit 525 and into the microwave production chamber 510. Here, the microwave production chamber 510 produces microwaves, which are applied to the hydrogen gas to strike a plasma. As a result, hydrogen radicals 555 are formed. The hydrogen radicals 555 are then drawn out of the microwave production chamber 510 by the vacuum pump 560 and into the target chamber 570, where they are applied to the target powder 540 disposed therein. Some of the hydrogen radicals 555 flow straight through the target chamber 570 without reacting with the oxygen content of the target powder 540. However, some of the hydrogen radicals 555 do react with the oxygen content of the target powder 540, thereby disassociating the oxygen content from the powder. The removed oxygen content can then be drawn out of the target chamber 570 by the vacuum pump.


In order to maximize exposure of the target powder 540 to the hydrogen radicals 555, the target chamber preferably agitates the target powder 540 as the hydrogen radicals 555 flow through the target chamber 570. In a preferred embodiment, the target chamber 570 agitates the target powder 540 in such a way as to cause the powder to pass through the flow path of the hydrogen radicals.


In addition to the hydrogen radicals, it is contemplated that hydrogen ions (i.e., hydrogen plasma) can also be formed in the microwave production chamber 510. At a low enough pressure, the glow discharge of the hydrogen plasma can be drawn out to the target powder 540 by the vacuum pump 460. In a preferred embodiment, the hydrogen plasma discussed in FIGS. 3-5 is drawn out at a pressure equal to or less than approximately 1/350 of an atmosphere. The hydrogen plasma can be applied to the target powder 540 to aid in the removal of the oxygen content.


By disposing the target powder 540 outside of the microwave production chamber 510 (i.e., out of the pathway of the microwaves), the system 500 can subject the target powder 540 to hydrogen radicals and ions, while avoiding the microwave energy and the parasitic heating associated with it.


Additionally, it is contemplated that the target powder 540 can be heating at a controlled rate prior to or during its exposure to the hydrogen radicals. This heating can aid in the chemical reactivity of the hydrogen and ablate or drive off moisture on the target powder 540.



FIG. 6 illustrates one embodiment of a target chamber 600 in accordance with the principles of the present invention. In a preferred embodiment, the target chamber comprises a casing 610, preferably formed of metal so that it can be heated at a controlled rate as discussed above. The target chamber 600 is configured to agitate the target powder as the hydrogen radicals/ions flow through it via a gas supply conduit 660 fluidly coupled to the interior of the casing 610. Preferably, the gas supply conduit 660 is fluidly coupled to one of the microwave production chambers in FIGS. 3-5.


Within the casing 610 is housed a paddle wheel 620 configured to be rotated about a central axis. It is contemplated that the paddle wheel 620 can be rotated in a variety of ways, whether they be manual or automated. In a preferred embodiment, paddle wheel 620 is rotated by a shaft 640 to which it is coupled. Preferably, the interior of the casing 610 can be sealed off from any exterior contamination. The shaft 640 can be disposed within a rotary seal 625 that is connected to the gas supply conduit 660, thereby allowing the shaft 640 to rotate, while still preventing any contamination of the target powder within the casing 610 from external impurities.


In a preferred embodiment, the paddle wheel 620 comprises a first end through which the hydrogen radicals enter and a second end through which the removed oxygen content exits. The paddle wheel 620 preferably extends from the first end to an expanding frusto-conical surface 635a, to a substantially cylindrical surface, to a narrowing frusto-conical surface 635b, and finally to the second end. The frusto-conical surfaces aid in preventing the target powder from being drawn out of the paddle wheel 620 and the casing 610.


The paddle wheel 620 has an interior circumference and a plurality of paddles 630 disposed in an annular configuration along the interior circumference. The paddles 630 can be uniformly-spaced or irregularly-spaced apart. During operation, the target powder is disposed in the paddle wheel 620. As the paddle wheel 620 rotates about its central axis, the paddles 630 lift a portion of the target powder up, then drop the target powder down through a location proximate the central axis in line with the flow if the radicals/ions, thereby maximizing the target powder's exposure to the radicals/ions. In a preferred embodiment, the plurality of paddles are disposed on the substantially cylindrical surface. As seen in FIG. 7, which is a view of the paddle wheel 620 from the perspective of looking through the gas supply conduit 660 in the direction of the radical/ion flow, the paddles 630 can be slightly angled or have a minor hook in order to aid in the lifting of the target powder.


Shaft 640 can be coupled to the first end of the paddle wheel 620 using spokes 650a. The second end of the paddle wheel 620 can be rotatably coupled to an oxygen content outlet 670 using spokes 650b and a rotary seal 655. An additional conduit 680 can be coupled to the casing 610 so as to cover oxygen content outlet 670. Oxygen content conduit 670 preferably extends into the casing 610 and is configured to receive the oxygen content flowing out of the paddle wheel 620 and the casing 610.


Referring back to FIG. 7, dotted line 735a represents the opening at the narrowest end of frusto-conical surface 635a (from FIG. 6) and dotted line 735b represents the opening at the narrowest end of frusto-conical surface 635b (from FIG. 6). In a preferred embodiment, the opening 735b is smaller in diameter than the opening 735a, as it can be helpful to minimize the exit opening 735b in order to prevent target powder from being drawn out of the paddle wheel and the casing. However, it is contemplated that a variety of size configurations can be employed.



FIG. 8 is a flowchart illustrating one embodiment of a method 800 of purifying powder in accordance with the principles of the present invention. As would be appreciated by those of ordinary skill in the art, the protocols, processes, and procedures described herein may be repeated continuously or as often as necessary to satisfy the needs described herein. Additionally, although the steps of method 800 are shown in a specific order, certain steps may occur simultaneously or in a different order than is illustrated. Accordingly, the method steps of the present invention should not be limited to any particular order unless either explicitly or implicitly stated.


At step 810, hydrogen gas flows through a microwave production chamber. In a preferred embodiment, the hydrogen gas is supplied by a gas supply system and is drawn out by a vacuum pump through a conduit.


At step 820, the microwave production chamber generates and applies microwaves to the hydrogen gas as the hydrogen gas flows through the microwave production chamber, thereby forming hydrogen radicals from the hydrogen gas. Hydrogen ions/plasma can be formed as well.


At step 830, the hydrogen radicals, and possibly the hydrogen ions/plasma flow out of the microwave production chamber to a target powder disposed outside of the microwave production chamber. In a preferred embodiment, the target powder is housed within a target chamber, preferably configured to agitate the target powder as discussed above.


At step 840, the hydrogen radicals, and possibly the hydrogen ions/plasma, are applied to the target powder. The hydrogen ions react with oxygen content of the target powder, thereby removing a portion of the oxygen content from the target powder. This removed oxygen content can then be drawn away from the target powder, preferably out of the target chamber.


The present invention has been described in terms of specific embodiments incorporating details to facilitate the understanding of the principles of construction and operation of the invention. As such, references herein to specific embodiments and details thereof are not intended to limit the scope of the claims appended hereto. It will be apparent to those skilled in the art that modifications can be made to the embodiments chosen for illustration without departing from the spirit and scope of the invention.

Claims
  • 1. A microwave purification system comprising: a gas supply system configured to provide hydrogen gas;a microwave production chamber fluidly coupled to the gas supply system, wherein the microwave production chamber is configured to receive hydrogen gas from the gas supply system and apply microwaves to the hydrogen gas, thereby forming hydrogen radicals; anda target chamber disposed outside of and fluidly coupled to the microwave production chamber, wherein the target chamber is configured to receive the hydrogen radicals from the microwave production chamber and apply the hydrogen radicals to a target powder disposed within the target chamber, thereby removing a portion of oxygen content from the target powder.
  • 2. The system of claim 1, wherein the target chamber comprises an outlet and a vacuum pump is fluidly coupled to the outlet, the vacuum pump being configured to draw the hydrogen gas from the gas supply system to the microwave production chamber, draw the hydrogen radicals from the microwave production chamber to the target chamber, and draw the removed portion of oxygen content out of the target chamber.
  • 3. The system of claim 2, wherein the target chamber is further configured to agitate the target powder as the hydrogen radicals are being applied to the target powder.
  • 4. The system of claim 3, wherein the target chamber houses a paddle wheel having an interior circumference and a plurality of paddles disposed in an annular configuration along the interior circumference, the target powder disposed in the paddle wheel, the paddle wheel being configured to rotate about a central axis, lift a portion of the target powder up during rotation, and drop the target powder down through a location proximate the central axis.
  • 5. The system of claim 4, wherein the rotatable paddle wheel comprises a first end through which the hydrogen radicals enter and a second end through which the removed oxygen content exits, the rotatable paddle wheel extending from the first end to an expanding frusto-conical surface to a substantially cylindrical surface to a narrowing frusto-conical surface to the second end, the plurality of paddles being disposed on the substantially cylindrical surface.
  • 6. The system of claim 4, wherein the target chamber is configured to be heat the target powder prior to receiving the hydrogen radicals.
  • 7. The system of claim 1, wherein the target chamber is configured to be heat the target powder prior to receiving the hydrogen radicals.
CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a divisional application of co-pending U.S. patent application Ser. No. 12/152,095, filed on May 9, 2008, and entitled “MICROWAVE PURIFICATION PROCESS,” which claims priority to U.S. Provisional Application Ser. No. 60/928,946, filed May 11, 2007, entitled “MATERIAL PRODUCTION SYSTEM AND METHOD,” both of which are hereby incorporated by reference as if set forth herein.

US Referenced Citations (392)
Number Name Date Kind
2284554 Beyerstedt May 1942 A
2419042 Todd Apr 1947 A
2519531 Worn Aug 1950 A
2562753 Trost Jul 1951 A
2689780 Rice Sep 1954 A
3001402 Koblin Sep 1961 A
3042511 Reding, Jr. Jul 1962 A
3067025 Chisholm Dec 1962 A
3145287 Siebein et al. Aug 1964 A
3178121 Wallace, Jr. Apr 1965 A
3179782 Matvay Apr 1965 A
3313908 Unger et al. Apr 1967 A
3401465 Larwill Sep 1968 A
3450926 Kiernan Jun 1969 A
3457788 Miyajima Jul 1969 A
3537513 Austin Nov 1970 A
3552653 Inoue Jan 1971 A
3617358 Dittrich Nov 1971 A
3667111 Chartet Jun 1972 A
3741001 Fletcher et al. Jun 1973 A
3752172 Cohen et al. Aug 1973 A
3761360 Auvil et al. Sep 1973 A
3774442 Gustavsson Nov 1973 A
3830756 Sanchez et al. Aug 1974 A
3871448 Vann et al. Mar 1975 A
3892882 Guest et al. Jul 1975 A
3914573 Muehlberger Oct 1975 A
3959094 Steinberg May 1976 A
3959420 Geddes et al. May 1976 A
3969482 Teller Jul 1976 A
4008620 Narato et al. Feb 1977 A
4018388 Andrews Apr 1977 A
4021021 Hall et al. May 1977 A
4139497 Castor et al. Feb 1979 A
4157316 Thompson et al. Jun 1979 A
4171288 Keith et al. Oct 1979 A
4174298 Antos Nov 1979 A
4227928 Wang Oct 1980 A
4248387 Andrews Feb 1981 A
4253917 Wang Mar 1981 A
4284609 deVries Aug 1981 A
4344779 Isserlis Aug 1982 A
4369167 Weir Jan 1983 A
4388274 Rourke et al. Jun 1983 A
4419331 Montalvo Dec 1983 A
4431750 McGinnis et al. Feb 1984 A
4436075 Campbell et al. Mar 1984 A
4440733 Lawson et al. Apr 1984 A
4458138 Adrian et al. Jul 1984 A
4459327 Wang Jul 1984 A
4505945 Dubust et al. Mar 1985 A
4513149 Gray et al. Apr 1985 A
RE32244 Andersen Sep 1986 E
4609441 Frese, Jr. et al. Sep 1986 A
4723589 Iyer et al. Feb 1988 A
4731517 Cheney Mar 1988 A
4764283 Ashbrook et al. Aug 1988 A
4765805 Wahl et al. Aug 1988 A
4824624 Palicka et al. Apr 1989 A
4855505 Koll Aug 1989 A
4866240 Webber Sep 1989 A
4885038 Anderson et al. Dec 1989 A
4921586 Molter May 1990 A
4983555 Roy et al. Jan 1991 A
4987033 Abkowitz et al. Jan 1991 A
5015863 Takeshima et al. May 1991 A
5041713 Weidman Aug 1991 A
5043548 Whitney et al. Aug 1991 A
5070064 Hsu et al. Dec 1991 A
5073193 Chaklader et al. Dec 1991 A
5133190 Abdelmalek Jul 1992 A
5151296 Tokunaga Sep 1992 A
5157007 Domesle et al. Oct 1992 A
5230844 Macaire et al. Jul 1993 A
5233153 Coats Aug 1993 A
5269848 Nakagawa Dec 1993 A
5338716 Triplett et al. Aug 1994 A
5369241 Taylor et al. Nov 1994 A
5371049 Moffett et al. Dec 1994 A
5372629 Anderson et al. Dec 1994 A
5392797 Welch Feb 1995 A
5439865 Abe et al. Aug 1995 A
5442153 Marantz et al. Aug 1995 A
5460701 Parker et al. Oct 1995 A
5464458 Yamamoto Nov 1995 A
5485941 Guyomard et al. Jan 1996 A
5534149 Birkenbeil et al. Jul 1996 A
5553507 Basch et al. Sep 1996 A
5562966 Clarke et al. Oct 1996 A
5582807 Liao et al. Dec 1996 A
5611896 Swanepoel et al. Mar 1997 A
5630322 Heilmann et al. May 1997 A
5652304 Mizrahi Jul 1997 A
5714644 Irgang et al. Feb 1998 A
5723187 Popoola et al. Mar 1998 A
5726414 Kitahashi et al. Mar 1998 A
5749938 Coombs May 1998 A
5776359 Schultz et al. Jul 1998 A
5788738 Pirzada et al. Aug 1998 A
5811187 Anderson et al. Sep 1998 A
5837959 Muehlberger et al. Nov 1998 A
5851507 Pirzada et al. Dec 1998 A
5853815 Muehlberger Dec 1998 A
5858470 Bernecki et al. Jan 1999 A
5905000 Yadav et al. May 1999 A
5928806 Olah et al. Jul 1999 A
5935293 Detering et al. Aug 1999 A
5973289 Read et al. Oct 1999 A
5989648 Phillips Nov 1999 A
5993967 Brotzman, Jr. et al. Nov 1999 A
5993988 Ohara et al. Nov 1999 A
6004620 Camm Dec 1999 A
6012647 Ruta et al. Jan 2000 A
6033781 Brotzman, Jr. et al. Mar 2000 A
6045765 Nakatsuji et al. Apr 2000 A
6059853 Coombs May 2000 A
6084197 Fusaro, Jr. Jul 2000 A
6093306 Hanrahan et al. Jul 2000 A
6102106 Manning et al. Aug 2000 A
6117376 Merkel Sep 2000 A
6213049 Yang Apr 2001 B1
6214195 Yadav et al. Apr 2001 B1
6228904 Yadav et al. May 2001 B1
6254940 Pratsinis et al. Jul 2001 B1
6261484 Phillips et al. Jul 2001 B1
6267864 Yadav et al. Jul 2001 B1
6322756 Arno et al. Nov 2001 B1
6342465 Klein et al. Jan 2002 B1
6344271 Yadav et al. Feb 2002 B1
6379419 Celik et al. Apr 2002 B1
6387560 Yadav et al. May 2002 B1
6395214 Kear et al. May 2002 B1
6398843 Tarrant Jun 2002 B1
6409851 Sethuram et al. Jun 2002 B1
6413781 Geis et al. Jul 2002 B1
6416818 Aikens et al. Jul 2002 B1
RE37853 Detering et al. Sep 2002 E
6444009 Liu et al. Sep 2002 B1
6475951 Domesle et al. Nov 2002 B1
6506995 Fusaro, Jr. et al. Jan 2003 B1
6517800 Cheng et al. Feb 2003 B1
6524662 Jang et al. Feb 2003 B2
6531704 Yadav et al. Mar 2003 B2
6548445 Buysch et al. Apr 2003 B1
6554609 Yadav et al. Apr 2003 B2
6562304 Mizrahi May 2003 B1
6562495 Yadav et al. May 2003 B2
6569397 Yadav et al. May 2003 B1
6569518 Yadav et al. May 2003 B2
6572672 Yadav et al. Jun 2003 B2
6579446 Teran et al. Jun 2003 B1
6596187 Coll et al. Jul 2003 B2
6603038 Hagemeyer et al. Aug 2003 B1
6607821 Yadav et al. Aug 2003 B2
6610355 Yadav et al. Aug 2003 B2
6623559 Huang Sep 2003 B2
6635357 Moxson et al. Oct 2003 B2
6641775 Vigliotti et al. Nov 2003 B2
6652822 Phillips et al. Nov 2003 B2
6652967 Yadav et al. Nov 2003 B2
6669823 Sarkas et al. Dec 2003 B1
6682002 Kyotani Jan 2004 B2
6689192 Phillips et al. Feb 2004 B1
6699398 Kim Mar 2004 B1
6706097 Zornes Mar 2004 B2
6706660 Park Mar 2004 B2
6710207 Bogan, Jr. et al. Mar 2004 B2
6713176 Yadav et al. Mar 2004 B2
6716525 Yadav et al. Apr 2004 B1
6744006 Johnson et al. Jun 2004 B2
6746791 Yadav et al. Jun 2004 B2
6772584 Chun et al. Aug 2004 B2
6786950 Yadav et al. Sep 2004 B2
6813931 Yadav et al. Nov 2004 B2
6817388 Tsangaris et al. Nov 2004 B2
6832735 Yadav et al. Dec 2004 B2
6838072 Kong et al. Jan 2005 B1
6841509 Hwang et al. Jan 2005 B1
6855410 Buckley Feb 2005 B2
6855426 Yadav Feb 2005 B2
6855749 Yadav et al. Feb 2005 B1
6886545 Holm May 2005 B1
6896958 Cayton et al. May 2005 B1
6902699 Fritzemeier et al. Jun 2005 B2
6916872 Yadav et al. Jul 2005 B2
6919065 Zhou et al. Jul 2005 B2
6919527 Boulos et al. Jul 2005 B2
6933331 Yadav et al. Aug 2005 B2
6972115 Ballard Dec 2005 B1
6986877 Takikawa et al. Jan 2006 B2
6994837 Boulos et al. Feb 2006 B2
7007872 Yadav et al. Mar 2006 B2
7022305 Drumm et al. Apr 2006 B2
7052777 Brotzman, Jr. et al. May 2006 B2
7073559 O'Larey et al. Jul 2006 B2
7081267 Yadav Jul 2006 B2
7101819 Rosenflanz et al. Sep 2006 B2
7147544 Rosenflanz Dec 2006 B2
7147894 Zhou et al. Dec 2006 B2
7166198 Van Der Walt et al. Jan 2007 B2
7166663 Cayton et al. Jan 2007 B2
7172649 Conrad et al. Feb 2007 B2
7172790 Koulik et al. Feb 2007 B2
7178747 Yadav et al. Feb 2007 B2
7208126 Musick et al. Apr 2007 B2
7211236 Stark et al. May 2007 B2
7217407 Zhang May 2007 B2
7220398 Sutorik et al. May 2007 B2
7255498 Bush et al. Aug 2007 B2
7265076 Taguchi et al. Sep 2007 B2
7307195 Polverejan et al. Dec 2007 B2
7323655 Kim Jan 2008 B2
7384447 Kodas et al. Jun 2008 B2
7402899 Whiting et al. Jul 2008 B1
7417008 Richards et al. Aug 2008 B2
7494527 Jurewicz et al. Feb 2009 B2
7517826 Fujdala et al. Apr 2009 B2
7534738 Fujdala et al. May 2009 B2
7541012 Yeung et al. Jun 2009 B2
7541310 Espinoza et al. Jun 2009 B2
7557324 Nylen et al. Jul 2009 B2
7572315 Boulos et al. Aug 2009 B2
7611686 Alekseeva et al. Nov 2009 B2
7615097 McKechnie et al. Nov 2009 B2
7618919 Shimazu et al. Nov 2009 B2
7622693 Foret Nov 2009 B2
7632775 Zhou et al. Dec 2009 B2
7674744 Shiratori et al. Mar 2010 B2
7678419 Kevwitch et al. Mar 2010 B2
7709411 Zhou et al. May 2010 B2
7709414 Fujdala et al. May 2010 B2
7745367 Fujdala et al. Jun 2010 B2
7750265 Belashchenko et al. Jul 2010 B2
7803210 Sekine et al. Sep 2010 B2
7851405 Wakamatsu et al. Dec 2010 B2
7874239 Howland Jan 2011 B2
7897127 Layman et al. Mar 2011 B2
7902104 Kalck Mar 2011 B2
7905942 Layman Mar 2011 B1
7935655 Tolmachev May 2011 B2
8051724 Layman et al. Nov 2011 B1
8076258 Biberger Dec 2011 B1
8080494 Yasuda et al. Dec 2011 B2
8089495 Keller Jan 2012 B2
8142619 Layman et al. Mar 2012 B2
8168561 Virkar May 2012 B2
8173572 Feaviour May 2012 B2
8258070 Fujdala et al. Sep 2012 B2
8278240 Tange et al. Oct 2012 B2
8294060 Mohanty et al. Oct 2012 B2
8309489 Cuenya et al. Nov 2012 B2
8349761 Xia et al. Jan 2013 B2
20010004009 MacKelvie Jun 2001 A1
20010042802 Youds Nov 2001 A1
20020018815 Sievers et al. Feb 2002 A1
20020068026 Murrell et al. Jun 2002 A1
20020079620 DuBuis et al. Jun 2002 A1
20020100751 Carr Aug 2002 A1
20020102674 Anderson Aug 2002 A1
20020131914 Sung Sep 2002 A1
20020143417 Ito et al. Oct 2002 A1
20020182735 Kibby et al. Dec 2002 A1
20020183191 Faber et al. Dec 2002 A1
20020192129 Shamouilian et al. Dec 2002 A1
20030036786 Duren et al. Feb 2003 A1
20030042232 Shimazu Mar 2003 A1
20030047617 Shanmugham et al. Mar 2003 A1
20030066800 Saim et al. Apr 2003 A1
20030108459 Wu et al. Jun 2003 A1
20030110931 Aghajanian et al. Jun 2003 A1
20030139288 Cai et al. Jul 2003 A1
20030143153 Boulos et al. Jul 2003 A1
20030172772 Sethuram et al. Sep 2003 A1
20030223546 McGregor et al. Dec 2003 A1
20040009118 Phillips et al. Jan 2004 A1
20040023302 Archibald et al. Feb 2004 A1
20040023453 Xu et al. Feb 2004 A1
20040077494 LaBarge et al. Apr 2004 A1
20040103751 Joseph et al. Jun 2004 A1
20040109523 Singh et al. Jun 2004 A1
20040119064 Narayan et al. Jun 2004 A1
20040127586 Jin et al. Jul 2004 A1
20040167009 Kuntz et al. Aug 2004 A1
20040176246 Shirk et al. Sep 2004 A1
20040208805 Fincke et al. Oct 2004 A1
20040213998 Hearley et al. Oct 2004 A1
20040238345 Koulik et al. Dec 2004 A1
20040251017 Pillion et al. Dec 2004 A1
20040251241 Blutke et al. Dec 2004 A1
20050000321 O'Larey et al. Jan 2005 A1
20050000950 Schroder et al. Jan 2005 A1
20050066805 Park et al. Mar 2005 A1
20050070431 Alvin et al. Mar 2005 A1
20050077034 King Apr 2005 A1
20050097988 Kodas et al. May 2005 A1
20050106865 Chung et al. May 2005 A1
20050163673 Johnson et al. Jul 2005 A1
20050199739 Kuroda et al. Sep 2005 A1
20050220695 Abatzoglou et al. Oct 2005 A1
20050227864 Sutorik et al. Oct 2005 A1
20050233380 Pesiri et al. Oct 2005 A1
20050240069 Polverejan et al. Oct 2005 A1
20050258766 Kim Nov 2005 A1
20050275143 Toth Dec 2005 A1
20060051505 Kortshagen et al. Mar 2006 A1
20060068989 Ninomiya et al. Mar 2006 A1
20060094595 Labarge May 2006 A1
20060096393 Pesiri May 2006 A1
20060105910 Zhou et al. May 2006 A1
20060108332 Belashchenko May 2006 A1
20060153728 Schoenung et al. Jul 2006 A1
20060153765 Pham-Huu et al. Jul 2006 A1
20060159596 De La Veaux et al. Jul 2006 A1
20060166809 Malek et al. Jul 2006 A1
20060222780 Gurevich et al. Oct 2006 A1
20060231525 Asakawa et al. Oct 2006 A1
20070048206 Hung et al. Mar 2007 A1
20070049484 Kear et al. Mar 2007 A1
20070063364 Hsiao et al. Mar 2007 A1
20070084308 Nakamura et al. Apr 2007 A1
20070084834 Hanus et al. Apr 2007 A1
20070087934 Martens et al. Apr 2007 A1
20070163385 Takahashi et al. Jul 2007 A1
20070173403 Koike et al. Jul 2007 A1
20070178673 Gole et al. Aug 2007 A1
20070221404 Das et al. Sep 2007 A1
20070253874 Foret Nov 2007 A1
20070292321 Plischke et al. Dec 2007 A1
20080006954 Yubuta et al. Jan 2008 A1
20080031806 Gavenonis et al. Feb 2008 A1
20080038578 Li Feb 2008 A1
20080047261 Han et al. Feb 2008 A1
20080057212 Dorier et al. Mar 2008 A1
20080064769 Sato et al. Mar 2008 A1
20080105083 Nakamura et al. May 2008 A1
20080116178 Weidman May 2008 A1
20080125308 Fujdala et al. May 2008 A1
20080125313 Fujdala et al. May 2008 A1
20080138651 Doi et al. Jun 2008 A1
20080175936 Tokita et al. Jul 2008 A1
20080187714 Wakamatsu et al. Aug 2008 A1
20080206562 Stucky et al. Aug 2008 A1
20080207858 Kowaleski et al. Aug 2008 A1
20080248704 Mathis et al. Oct 2008 A1
20080274344 Vieth et al. Nov 2008 A1
20080277092 Layman et al. Nov 2008 A1
20080277264 Biberger et al. Nov 2008 A1
20080277266 Layman Nov 2008 A1
20080277267 Biberger et al. Nov 2008 A1
20080277268 Layman Nov 2008 A1
20080277269 Layman et al. Nov 2008 A1
20080277270 Biberger et al. Nov 2008 A1
20080277271 Layman Nov 2008 A1
20080280049 Kevwitch et al. Nov 2008 A1
20080280751 Harutyunyan et al. Nov 2008 A1
20080280756 Biberger Nov 2008 A1
20080283498 Yamazaki Nov 2008 A1
20090010801 Murphy et al. Jan 2009 A1
20090054230 Veeraraghavan et al. Feb 2009 A1
20090088585 Schammel et al. Apr 2009 A1
20090092887 McGrath et al. Apr 2009 A1
20090114568 Trevino et al. May 2009 A1
20090162991 Beneyton et al. Jun 2009 A1
20090168506 Han et al. Jul 2009 A1
20090170242 Lin et al. Jul 2009 A1
20090181474 Nagai Jul 2009 A1
20090200180 Capote et al. Aug 2009 A1
20090223410 Jun et al. Sep 2009 A1
20090253037 Park et al. Oct 2009 A1
20090274903 Addiego Nov 2009 A1
20090286899 Hofmann et al. Nov 2009 A1
20100089002 Merkel Apr 2010 A1
20100275781 Tsangaris Nov 2010 A1
20110006463 Layman Jan 2011 A1
20110052467 Chase et al. Mar 2011 A1
20110143041 Layman et al. Jun 2011 A1
20110143915 Yin et al. Jun 2011 A1
20110143916 Leamon Jun 2011 A1
20110143926 Leamon Jun 2011 A1
20110143930 Yin et al. Jun 2011 A1
20110143933 Yin et al. Jun 2011 A1
20110144382 Yin et al. Jun 2011 A1
20110152550 Grey et al. Jun 2011 A1
20110158871 Arnold et al. Jun 2011 A1
20110174604 Duesel et al. Jul 2011 A1
20110245073 Oljaca et al. Oct 2011 A1
20110247336 Farsad et al. Oct 2011 A9
20120045373 Biberger Feb 2012 A1
20120097033 Arnold et al. Apr 2012 A1
20120122660 Andersen et al. May 2012 A1
20120171098 Hung et al. Jul 2012 A1
20120308467 Carpenter et al. Dec 2012 A1
Foreign Referenced Citations (40)
Number Date Country
1 619 168 Jan 2006 EP
1 307 941 Feb 1973 GB
56-146804 Nov 1981 JP
61-086815 May 1986 JP
63-214342 Sep 1988 JP
1-164795 Jun 1989 JP
05-228361 Sep 1993 JP
05-324094 Dec 1993 JP
6-93309 Apr 1994 JP
6-135797 May 1994 JP
6-65772 Sep 1994 JP
6-272012 Sep 1994 JP
7031873 Feb 1995 JP
7-256116 Oct 1995 JP
11-502760 Mar 1999 JP
2000-220978 Aug 2000 JP
2002-336688 Nov 2002 JP
2004-233007 Aug 2004 JP
2004-249206 Sep 2004 JP
2004-290730 Oct 2004 JP
2005-503250 Feb 2005 JP
2005-122621 May 2005 JP
2005-218937 Aug 2005 JP
2005-342615 Dec 2005 JP
2006-001779 Jan 2006 JP
2006-508885 Mar 2006 JP
2006-247446 Sep 2006 JP
2006-260385 Sep 2006 JP
2007-46162 Feb 2007 JP
2007-203129 Aug 2007 JP
493241 Mar 1976 SU
201023207 Jun 2010 TW
WO-9628577 Sep 1996 WO
WO 02092503 Nov 2002 WO
WO 2004052778 Jun 2004 WO
WO-2005063390 Jul 2005 WO
WO 2006079213 Aug 2006 WO
WO-2008130451 Oct 2008 WO
WO-2008130451 Oct 2008 WO
WO-2011081833 Jul 2011 WO
Non-Patent Literature Citations (74)
Entry
Derwent English Abstract for publication No. SU 193241 A, Application No. 1973SU1943286 filed on Jul. 2, 1973, published on Mar. 1, 1976, entitled“Catalyst for Ammonia Synthesis Contains Oxides of Aluminium, Potassium, Calcium, Iron and Nickel Oxide for Increased Activity,” 3 pgs.
A. Gutsch et al., “Gas-Phase Production of Nanoparticles”, Kona No. 20, 2002, pp. 24-37.
Dr. Heike Mühlenweg et al., “Gas-Phase Reactions—Open Up New Roads to Nanoproducts”, Degussa ScienceNewsletter No. 08, 2004, pp. 12-16.
Coating Generation: Vaporization of Particles in Plasma Spraying and Splat Formation, M. Vardelle, A. Vardelle, K-I li, P. Fauchais, Universite de Limoges, 123 Avenue A. Thomas 87000, Limoges,F. , Pure & Chem, vol. 68, No. 5, pp. 1093-1099, 1996.
H. Konrad et al., “Nanostructured Cu-Bi Alloys Prepared by Co-Evaporation in a Continuous Gas Flow,” NanoStructured Materials, vol. 7, No. 6, 1996, pp. 605-610.
Kenvin et al. “Supported Catalysts Prepared from Mononuclear Copper Complexes: Catalytic Properties”, Journal of Catalysis, pp. 81-91, (1992).
J. Heberlein, “New Approaches in Thermal Plasma Technology”, Pure Appl. Chem., vol. 74, No. 3, 2002, pp. 327-335.
M. Vardelle et al., “Experimental Investigation of Powder Vaporization in Thermal Plasma Jets,” Plasma Chemistry and Plasma Processing, vol. 11, No. 2, Jun. 1991, pp. 185-201.
National Aeronautics and Space Administration, “Enthalpy”, http://www.grc.nasa.gov/WWW/K-12/airplane/enthalpy.html, Nov. 23, 2009, 1 page.
P. Fauchais et al., “Plasma Spray: Study of the Coating Generation,” Ceramics International, Elsevier, Amsterdam, NL, vol. 22, No. 4, Jan. 1996, pp. 295-303.
P. Fauchais et al., “Les Dépôts Par Plasma Thermique,” Revue Generale De L'Electricitie, RGE. Paris, FR, No. 2, Jan. 1993, pp. 7-12.
P. Fauchais et al, “La Projection Par Plasma: Une Revue,” Annales De Physique, vol. 14, No. 3, Jun. 1989, pp. 261-310.
T. Yoshida, “The Future of Thermal Plasma Processing for Coating”, Pure & Appl. Chem., vol. 66, No. 6, 1994 pp. 1223-1230.
Hanet al., Deformation Mechanisms and Ductility of Nanostructured A1 Alloys, Mat. Res. Soc. Symp. Proc. vol. 821, Jan. 2004, Material Research Society, http://www.mrs.org/s—mrs/bin.asp?CID=2670&DOC=FILE.PDF., 6 pages.
Nagai, Yasutaka, et al. “Sintering Inhibition Mechanism of Platinum Supported on Ceria-based Oxide and Pt-oxide-support Interaction,”Journal of Catalysis 242 (2006), pp. 103-109, Jul. 3, 2006, Elsevier.
McGuthry Banks, Tima Michele, U.S. Patent and Trademark Office, Notice of Allowance mailed Nov. 24, 2010, for U.S. Appl. No. 12/152,095, 8 pgs.
Bateman, J. E. et al. (Dec. 17, 1998). “Alkylation of Porous Silicon by Direct Reaction with Alkenes and Alkynes,” Angew. Chem Int. Ed. 37(19):2683-2685.
Carrot, G. et al. (Sep. 17, 2002). “Surface-Initiated Ring-Opening Polymerization: A Versatile Method for Nanoparticle Ordering,” Macromolecules 35(22):8400-8404.
Chen, H.-S. et al. (Jul. 3, 2001). “On the Photoluminescence of Si Nanoparticles,” Mater. Phys. Mech. 4:62-66.
Faber, K. T. et al. (Sep. 1988). “Toughening by Stress-Induced Microcracking in Two-Phase Ceramics,” Communications of the American Ceramic Society 71(9): C-399-C401.
Fojtik, A. et al. (Apr. 29, 1994). “Luminescent Colloidal Silicon Particles,”Chemical Physics Letters 221:363-367.
Fojtik, A. (Jan. 13, 2006). “Surface Chemistry of Luminescent Colloidal Silicon Nanoparticles,” J. Phys. Chem. B. 110(5):1994-1998.
Hua, F. et al. (Mar. 2006). “Organically Capped Silicon Nanoparticles With Blue Photoluminescence Prepared by Hydrosilylation Followed by Oxidation,” Langmuir 22(9):4363-4370.
Ji, Y. et al. (Nov. 2002) “Processing and Mechanical Properties of Al2O3-5 vol.% Cr Nanocomposites,” Journal of the European Ceramic Society 22(12):1927-1936.
Jouet, R. J. et al. (Jan. 25, 2005). “Surface Passivation of Bare Aluminum Nanoparticles Using Perfluoroalkyl Carboxylic Acids,” Chem. Mater.17(11):2987-2996.
Kim, N. Y. et al. (Mar. 5, 1997). “Thermal Derivatization of Porous Silicon with Alcohols,” J. Am. Chem. Soc. 119(9):2297-2298.
Kwon, Y.-S. et al. (Apr. 30, 2003). “Passivation Process for Superfine Aluminum Powders Obtained by Electrical Explosion of Wires,” Applied Surface Science 211:57-67.
Langner, A. et al. (Aug. 25, 2005). “Controlled Silicon Surface Functionalization by Alkene Hydrosilylation,” J. Am. Chem. Soc. 127(37):12798-12799.
Li, D. et al. (Apr. 9, 2005). “Environmentally Responsive “Hairy” Nanoparticles: Mixed Homopolymer Brushes on Silica Nanoparticles Synthesized by Living Radical Polymerization Techniques,” J. Am. Chem. Soc. 127(7):6248-6256.
Li, X. et al. (May 25, 2004). “Surface Functionalization of Silicon Nanoparticles Produced by Laser-Driven Pyrolysis of Silane Followed by HF-HNO3 Etching,” Langmuir 20(11):4720-4727.
Liao, Y.-C. et al. (Jun. 27, 2006). “Self-Assembly of Organic Monolayers on Aerosolized Silicon Nanoparticles,” J.Am. Chem. Soc. 128(28):9061-9065.
Liu, S.-M. et al. (Jan. 13, 2006). “Enhanced Photoluminescence from Si Nano-Organosols by Functionalization With Alkenes and Their Size Evolution,” Chem. Mater. 18(3):637-642.
Neiner, D. (Aug. 5, 2006). “Low-Temperature Solution Route to Macroscopic Amounts of Hydrogen Terminated Silicon Nanoparticles,” J. Am. Chem. Soc. 128:11016-11017.
Netzer, L. et al. (1983). “A New Approach to Construction of Artificial Monolayer Assemblies,” J. Am. Chem. Soc. 105(3):674-676.
“Platinum Group Metals: Annual Review 1996” (Oct. 1997). Engineering and Mining Journal, p. 63.
Rahaman, R. A. et al. (1995). “Synthesis of Powders,” in Ceramic Processing and Sintering. Marcel Decker, Inc., New York, pp. 71-77.
Sailor, M. J. (1997). “Surface Chemistry of Luminescent Silicon Nanocrystallites,” Adv. Mater. 9(10):783-793.
Stiles, A. B. (Jan. 1, 1987). “Manufacture of Carbon-Supported Metal Catalysts,” in Catalyst Supports and Supported Catalysts, Butterworth Publishers, MA, pp. 125-132.
Subramanian, S. et al. (1991). “Structure and Activity of Composite Oxide Supported Platinum-Iridium Catalysts,” Applied Catalysts 74: 65-81.
Tao, Y.-T. (May 1993). “Structural Comparison of Self-Assembled Monolayers of n-Alkanoic Acids on the surfaces of Silver, Copper, and Aluminum,” J. Am. Chem. Soc. 115(10):4350-4358.
Ünal, N. et al. (Nov. 2011). “Influence of WC Particles on the Microstructural and Mechanical Properties of 3 mol% Y2O3 Stabilized ZrO2 Matrix Composites Produced by Hot Pressing,” Journal of the European Ceramic Society (31)13: 2267-2275.
Zou, J. et al. (Jun. 4, 2004). “Solution Synthesis of Ultrastable Luminescent Siloxane-Coated Silicon Nanoparticles,” Nano Letters 4(7):1181-1186.
U.S. Appl. No. 13/291,983, filed Nov. 8, 2011, for Layman et al.
U.S. Appl. No. 12/152,084, filed May 9, 2008, for Biberger.
U.S. Appl. No. 13/028,693, filed Feb. 16, 2011, for Biberger.
U.S. Appl. No. 12/152,111, filed May 9, 2008, for Biberger et al.
U.S. Appl. No. 12/151,830, filed May 8, 2008, for Biberger et al.
U.S. Appl. No. 12/968,248, filed Dec. 14, 2010, for Biberger.
U.S. Appl. No. 12/968,245, filed Dec. 14, 2010, for Biberger.
U.S. Appl. No. 12/968,241, filed Dec. 14, 2010, for Biberger.
U.S. Appl. No. 12/968,239, filed Dec. 14, 2010, for Biberger.
U.S. Appl. No. 12/969,128, filed Dec. 15, 2010, for Biberger.
U.S. Appl. No. 12/962,463, filed Dec. 7, 2010, for Leamon.
U.S. Appl. No. 12/961,030, filed Dec. 6, 2010, for Lehman.
U.S. Appl. No. 12/961,108, filed Dec. 6, 2010, for Lehman.
U.S. Appl. No. 12/961,200, filed Dec. 6, 2010, for Lehman.
U.S. Appl. No. 12/968,253, filed Dec. 14, 2010, for Biberger.
U.S. Appl. No. 12/968,235, filed Dec. 14, 2010, for Biberger.
U.S. Appl. No. 12/969,306, filed Dec. 15, 2010, for Lehman et al.
U.S. Appl. No. 12/969,447, filed Dec. 15, 2010, for Biberger et al.
U.S. Appl. No. 12/969,087, filed Dec. 15, 2010, for Biberger.
U.S. Appl. No. 12/962,533, filed Dec. 7, 2010, for Yin et al.
U.S. Appl. No. 12/962,523, filed Dec. 7, 2010, for Yin et al.
U.S. Appl. No. 12/001,643, filed Dec. 11, 2007, for Biberger et al.
U.S. Appl. No. 12/474,081, filed May 28, 2009, for Biberger et al.
U.S. Appl. No. 12/001,602, filed Dec. 11, 2007, for Biberger et al.
U.S. Appl. No. 12/001,644, filed Dec. 11, 2007, for Biberger et al.
U.S. Appl. No. 12/969,457, filed Nov. 15, 2010, for Leamon et al.
U.S. Appl. No. 12/969,503, filed Nov. 15, 2010, for Leamon et al.
U.S. Appl. No. 12/954,813, filed Nov. 26, 2010, for Biberger.
U.S. Appl. No. 12/954,822, filed Nov. 26, 2010, for Biberger.
U.S. Appl. No. 13/033,514, filed Feb. 23, 2011, for Biberger et al.
U.S. Appl. No. 13/589,024, filed Aug. 17, 2012, for Yin et al.
U.S. Appl. No. 13/801,726, filed Mar. 13, 2013, for Qi et al.
Provisional Applications (1)
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60928946 May 2007 US
Divisions (1)
Number Date Country
Parent 12152095 May 2008 US
Child 12943909 US