Claims
- 1. An imaging process comprising:
- providing an imaging member comprising a substrate, a substantially electrically insulating softenable layer, a fracturable layer of migration marking material contiguous the surface of and contacting the softenable layer spaced apart from the substrate, said softenable layer capable of having its resistance to migration of migration marking material decreased sufficiently to allow migration of migration marking material in depth in said softenable material, and
- an imagewise-shaped electrically conductive member to the surface of said softenable layer spaced apart from the substrate; and then
- electrically latently imaging said imaging member by electrically connecting said imagewise-shaped electrically conductive member to a first electrical potential and contacting the substrate to ground or to an electrical potential different from the first electrical potential, and
- developing said imaging member by decreasing the resistance to migration of migration marking material in depth in said softenable layer at least sufficient to allow imagewise migration of migration marking material at least in depth in said softenable layer.
- 2. An imaging process comprising:
- providing an imaging member comprising a substrate, a substantially electrically insulating softenable layer containing migration marking material, said softenable layer capable of having its resistance to migration of migration marking material decreased sufficiently to allow migration of migration marking material in depth in said softenable material, and
- contacting an imagewise-shaped electrically conductive member to the surface of said softenable layer spaced apart from the substrate; and then
- electrically latently imaging said imaging member by electrically connecting said imagewise-shaped electrically conductive member to a first electrical potential and contacting the substrate to ground or to an electrical potential different from the first electrical potential, and
- developing said imaging member by softening said softenable layer at least sufficient to allow imagewise migration of migration marking material at least in depth in said softenable layer.
- 3. An imaging process comprising:
- providing an imaging member comprising a substrate, a substantially electrically insulating softenable layer containing migration marking material, said softenable layer capable of having its resistance to migration of migration marking material decreased sufficiently to allow migration of migration marking material in depth in said softenable material, and
- contacting an imagewise-shaped electrically conductive member to the surface of said softenable layer spaced apart from the substrate; and then
- electrically latently imaging said imaging member by electrically connecting said imagewise-shaped electrically conductive member to a first electrical potential and contacting the substrate to ground or to an electrical potential different from the first electrical potential, and
- developing said imaging member by removing the softenable material and unmigrated material by contacting the imaging member with a solvent liquid which dissolves said softenable layer and washes away said unmigrated material.
- 4. The process of claim 1 wherein the softenable layer is of a thickness in the range between about 1/2 and about 16 microns, and the migration marking material is of average particle size not greater than about 2 microns.
- 5. The process of claim 1 wherein said fracturable layer is of a thickness in the range between about 0.01 microns and about 2 microns.
- 6. The process of claim 1 wherein said substrate is sufficiently transparent to transmit activating electromagnetic radiation.
- 7. The process of claim 1 wherein said electrically conductive member is sufficiently transparent to transmit activating electromagnetic radiation.
- 8. The process of claim 1 wherein said substrate is electrically conductive.
- 9. The process of claim 1 wherein said substrate is substantially electrically insulating and said member is electrically latently imaged while said insulating substrate is substantially everywhere contacting a conductive member which is electrically grounded or electrically connected to the opposite pole of the source of electrical potential.
- 10. The process of claim 1 wherein the imaging member comprising the substrate, softenable layer and migration marking material comprises electrically photosensitive material.
- 11. The process of claim 10 wherein said migration marking material comprises electrically photosensitive material.
- 12. The process of claim 10 wherein the softenable layer comprises electrically photosensitive softenable material.
- 13. The process of claim 1 wherein the electrically conductive member comprises a composite member comprising an electrically conductive member overlying a layer of material which is more insulating than the electrically conductive portion of the composite member, and said more insulating layer contacts the surface of the softenable layer.
- 14. The process of claim 13 wherein said more insulating layer is of a thickness not greater than about 75 microns.
- 15. The process of claim 13 wherein said more insulating layer comprises an insulating liquid.
- 16. The process of claim 13 wherein the layer of more insulating material contacting the surface of said softenable layer, is in a shape corresponding to the desired image configuration.
- 17. The process of claim 1 wherein said softenable layer and said supporting substrate are separate members and are brought into contact with each other.
- 18. The process of claim 1 wherein said softenable layer and said conductive member are separate members and are brought into contact with each other.
- 19. The process of claim 15 wherein said electrically conductive member is coated with said liquid layer, the surface of the softenable layer is brought into contact with said liquid layer and then separated from said liquid layer.
- 20. The process of claim 2 wherein the softenable layer is of a thickness in the range between about 1/2 and about 16 microns, and the migration marking material is of average particle size not greater than about 2 microns.
- 21. The process of claim 2 wherein said migration marking material initially comprises a fracturable layer contiguous and contacting the surface of the softenable layer spaced apart from the substrate.
- 22. The process of claim 21 wherein said fracturable layer is of a thickness in the range between about 0.01 microns and about 2 microns.
- 23. The process of claim 2 wherein the migration marking material is initially dispersed throughout said softenable layer.
- 24. The process of claim 2 wherein said substrate is sufficiently transparent to transmit activating electromagnetic radiation.
- 25. The process of claim 2 wherein said electrically conductive member is sufficiently transparent to transmit activating electromagnetic radiation.
- 26. The process of claim 2 wherein said substrate is electrically conductive.
- 27. The process of claim 2 wherein said substrate is substantially electrically insulating and said member is electrically latently imaged while said insulating substrate is substantially everywhere contacting a conductive member which is electrically grounded or electrically connected to the opposite pole of the source of electrical potential.
- 28. The process of claim 2 wherein the imaging member comprising the substrate, softenable layer and migration marking material comprises electrically photosensitive material.
- 29. The process of claim 28 wherein said migration marking material comprises electrically photosensitive material.
- 30. The process of claim 28 wherein the softenable layer comprises electrically photosensitive softenable material.
- 31. The process of claim 2 wherein the electrically conductive member comprises a composite member comprising an electrically conductive member overlying a layer of material which is more insulating than the electrically conductive portion of the composite member, and said more insulating layer contacts the surface of the softenable layer.
- 32. The process of claim 31 wherein said more insulating layer is of a thickness not greater than about 75 microns.
- 33. The process of claim 31 wherein said more insulating layer comprises an insulating liquid.
- 34. The process of claim 31 wherein the layer of more insulating material contacting the surface of said softenable layer, is in a shape corresponding to the desired image configuration.
- 35. The process of claim 2 wherein said softenable layer and said supporting substrate members and are brought into contact with each other.
- 36. The process of claim 2 wherein said softenable layer and said conductive member are separate members and are brought into contact with each other.
- 37. The process of claim 33 wherein said electrically conductive member is coated with said liquid layer, the surface of the softenable layer is brought into contact with said liquid layer and then separated from said liquid layers.
- 38. The process of claim 3 wherein the softenable layer is of a thickness in the range between about 1/2 and about 16 microns, and the migration marking material is of average particle size not greater than about 2 microns.
- 39. The process of claim 3 wherein said migration marking material initially comprises a fracturable layer contiguous and contacting the surface of the softenable layer spaced apart from the substrate.
- 40. The process of claim 39 wherein said fracturable layer is of a thickness in the range between about 0.01 microns and about 2 microns.
- 41. The process of claim 3 wherein the migration marking material is initially dispersed throughout said softenable layer.
- 42. The process of claim 3 wherein said substrate is sufficiently transparent to transmit activating electromagnetic radiation.
- 43. The process of claim 3 wherein said electrically conductive member is sufficiently transparent to transmit activating electromagnetic radiation.
- 44. The process of claim 3 wherein said substrate is electrically conductive.
- 45. The process of claim 3 wherein said substrate is substantially electrically insulating and said member is electrically latently imaged while said insulating substrate is substantially everywhere contacting a conductive member which is electrically grounded or electrically connected to the opposite pole of the source of electrical potential.
- 46. The process of claim 42 wherein the imaging member comprising the substrate, softenable layer and migration marking material comprises electrically photosensitive material.
- 47. The process of claim 46 wherein said migration marking material comprises electrically photosensitive material.
- 48. The process of claim 46 wherein the softenable layer comprises electrically photosensitive softenable material.
- 49. The process of claim 3 wherein the electrically conductive member comprises a composite member comprising an electrically conductive member overlying a layer of material which is more insulating than the electrically conductive portion of the composite member, and said more insulating layer contacts the surface of the softenable layer.
- 50. The process of claim 49 wherein said more insulating layer is of a thickness not greater than about 75 microns.
- 51. The process of claim 49 wherein said more insulating layer comprises an insulating liquid.
- 52. The process of claim 49 wherein the layer of more insulating material contacting the surface of said softenable layer, is in a shape corresponding to the desired image configuration.
- 53. The process of claim 3 wherein saiid softenable layer and said supporting substrate are separate members and are brought into contact with each other.
- 54. The process of claim 3 wherein said softenable layer and said conductive member are separate members and are brought into contact with each other.
- 55. The process of claim 51 wherein said electrically conductive member is coated with said liquid layer, the surface of the softenable layer is brought into contact with said liquid layer and then separated from said liquid layers.
- 56. A method of imaging comprising the steps of:
- a. providing an imaging member comprising a substrate, a substantially electrically insulating softenable layer on said substrate, said softenable layer containing a layer of electrically photosensitive material contiguous the surface of said softenable layer opposite said substrate;
- b. imagewise contacting and removing a biased electrode to the surface portions of said softenable layer to be charged; and
- c. developing said imaging member by decreasing the resistance to migration of said photosensitive material in depth in said softenable layer at least sufficient to allow imagewise migration of said photosensitive material at least in depth in said softenable layer.
CROSS-REFERENCE TO RELATED APPLICATIONS
This is a division of application Ser. No. 54,526, filed July 13, 1970.
Said application is a continuation-in-part of my copending U.S. Patent application (1) Ser. No. 327, filed Jan. 2, 1970 now abandoned; (2) Ser. No. 854,596, filed Sept. 2, 1969; (3) Ser. No. 837,780, filed June 30, 1969: and (4) Ser. No. 460,377, filed June 1, 1965 now U.S. Pat. No. 3,520,681. Application (1) is a continuation-in-part of my copending applications (2) and (3). Application (3) is a continuation-in-part of my applications (4), (5) Ser. No. 725,676, filed May 1, 1968, now abandoned, and (6) Ser. No. 483,675, filed Aug. 30, 1965; application (5) being a continuation-in-part of (4) and (6) and application Ser. No. 403,002, filed Oct. 12, 1964 (403,002 pending when (5) was filed but 403,002 now abandoned); (4) and (6) both being continuations-in-part of 403,002.
US Referenced Citations (4)
Related Publications (8)
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Date |
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854596 |
Sep 1969 |
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837780 |
Jun 1969 |
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460377 |
Jun 1965 |
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483675 |
Aug 1965 |
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460377 |
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460377 |
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403002 |
Oct 1964 |
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460377 |
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Divisions (1)
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Number |
Date |
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Parent |
54526 |
Jul 1970 |
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Continuation in Parts (5)
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Date |
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Parent |
327 |
Jan 1970 |
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Parent |
854596 |
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Parent |
725676 |
May 1968 |
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Parent |
483675 |
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Parent |
403002 |
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