Claims
- 1. An imaging method comprising the steps of:
- a. providing an imaging member comprising a layer of migration material spaced apart from at least one surface of, but contracting a softenable layer, said softenable layer capable of having its resistance to migration of migration material decreased sufficiently to allow migration of migration material in depth in said softenable layer;
- b. applying an imagewise migration force to said migration material; and
- c. developing said imaging member by decreasing the resistance of said softenable layer to migration of migration material in depth in the softenable layer at least sufficient to allow imagewise migration of migration material subject to said force at least in depth in said softenable layer.
- 2. An imaging method according to claim 1 wherein said softenable layer is on a substrate, said substrate spaced apart from said migration layer.
- 3. An imaging method according to claim 2 wherein said migration layer is fracturable and from about 0.2 to about 2.0 microns thick.
- 4. An imaging method according to claim 3 wherein said migration layer is fracturable and wherein said fracturable migration layer comprises particles with an average particle size between about 0.2 to about 2.0 microns.
- 5. An imaging method according to claim 2 wherein said migration layer is electrically photosensitive.
- 6. An imaging method according to claim 4 wherein said migration layer is contacting said softenable layer and contiguous the surface of said softenable layer opposed to the softenable layer surface-substrate interface.
- 7. An imaging method according to claim 1 wherein said softenable layer is substantially electrically insulating and said imagewise migration force comprises an electrical latent image.
- 8. An imaging method according to claim 7 wherein said imagewise electrical force is an attraction of charged portions of the migration layer to charges of a polarity opposite the polarity of charges on said migration layer, said opposite polarity charges induced at a location spaced apart from said migration layer in the direction of migration.
- 9. An imaging method according to claim 8 wherein said migration layer is electrically photosensitive and wherein said imagewise electrical force applying step includes, the steps of:
- a. electrically charging said member; and
- b. exposing the member to an image pattern of activating radiation.
- 10. An imaging method according to claim 7 wherein said electrical latent image is formed by the step including applying an external electric field to said member.
- 11. An imaging method according to claim 8 wherein said imagewise electrical force applying step comprises forming an electrostatic latent image on said member.
- 12. An imaging method according to claim 1 wherein said imagewise migration force comprises an imagewise magnetic field acting on a uniformly magnetized migration layer.
- 13. An imaging method according to claim 2 wherein the developing is accomplished by steps comprising applying a solvent for said softenable layer to cause said softenable layer and selective portions of said layer of migration material to be substantially removed and to allow an imagewise migration of other portions of migration material to said substrate to be deposited on said substrate in image configuration.
- 14. An imaging method according to claim 8 wherein said migration layer is thermoconductive and said imagewise electrical force applying step includes the steps of:
- a. electrically charging said member; and
- b. imagewise heating said member.
- 15. An imaging method comprising the steps of:
- a. providing an imaging member comprising a layer of migration material spaced apart from at least one surface of, but contacting a softenable layer, said softenable layer capable of having its resistance to migration of migration material decreased sufficiently to allow migration of migration material in depth in said softenable layer;
- b. applying a uniform electrostatic migration force to said migration layer; and
- c. developing said imaging member by decreasing the resistance to migration of migration material in depth in the softenable layer at least sufficient to allow uniform migration of migration material at least in depth in said softenable layer.
- 16. An imaged member comprising:
- a. a layer of softenable material; and,
- b. a layer of migration material selectively distributed in depth in said softenable material in first image configuration, said imaged member comprising in addition to said first image pattern of migration material distributed in depth in said softenable material, a complementary image pattern of migration material in said softenable material but spaced apart from said first pattern.
- 17. An imaging method comprising the steps of:
- a. providing an imaged member according to claim 16, wherein said complementary image pattern is contiguous the surface of and contacting said softenable layer, with a softenable layer of material capable of being hardened when exposed to a hardening electromagnetic radiation; and
- b. exposing said member to hardening radiation for said softenable layer from the complementary image pattern side of said member to selectively harden said softenable layer in portions where there is no complementary image pattern of migration material.
- 18. An imaging method comprising the steps of:
- a. providing an imaging member comprising a layer of migration material spaced apart from at least one surface of, but contacting a softenable layer, said softenable layer capable of having its resistance to migration of migration material decreased sufficiently to allow migration of migration material in depth in said softenable layer, said softenable layer overlying a photoconductive layer overlying a transparent substrate spaced apart from said migration layer;
- b. forming an electrical latent image on said member by steps comprising charging and exposing said member to actinic radiation which is activating to said photoconductive layer through said transparent substrate; and
- c. developing said imaging member by decreasing the resistance of said softenable layer to migration of migration material in depth in the softenable layer at least sufficient to allow imagewise migration of migration material at least in depth in said softenable layer.
- 19. An imaging member comprising:
- a. a layer of migration material spaced apart from at least one surface but contacting a
- b. softenable layer,
- c. said softenable layer on a photoconductive substrate spaced apart from said migration layer.
CROSS-REFERENCES TO RELATED APPLICATIONS
This application is a continuation-in-part of my copending U.S. patent applications (1) Ser. No. 725,676, filed May 1, 1968; (2) Ser. No. 460,377, filed June 1, 1965 and (3) Ser. No. 483,675, filed Aug. 30, 1965; application (1) being a continuation-in-part of (2) and (3) and application Ser. No. 403,002, filed Oct. 12, 1964 (Ser. No. 403,002 pending when application (1) was filed but which is now abandoned); (2) and (3) both being continuations-in-part of Ser. No. 403,002.
US Referenced Citations (17)
Foreign Referenced Citations (1)
Number |
Date |
Country |
1,466,349 |
Dec 1966 |
FR |
Related Publications (4)
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Number |
Date |
Country |
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460377 |
Jun 1965 |
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|
483675 |
Aug 1965 |
|
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483675 |
Aug 1965 |
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403002 |
Oct 1964 |
|
Continuation in Parts (3)
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Number |
Date |
Country |
Parent |
725676 |
May 1968 |
|
Parent |
403002 |
Oct 1964 |
|
Parent |
460377 |
Jun 1965 |
|