Number | Name | Date | Kind |
---|---|---|---|
3410774 | Barson et al. | Nov 1968 | |
3733258 | Hanak et al. | Feb 1971 | |
4119881 | Calderon | Oct 1978 | |
4148705 | Battey et al. | Apr 1979 | |
4209357 | Gorin et al. | Jun 1980 |
Number | Date | Country |
---|---|---|
55-39690 | Mar 1980 | JPX |
Entry |
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A. Galicki et al., "Plasma Reaction Chamber", IBM Technical Disclosure Bulletin, vol. 20, No. 6, Nov. 1977, p. 2211. |
L. M. Ephrath, "Selective Etching of Silicon Dioxide Using Reactive Ion Etching with CF.sub.4 -H.sub.2 ", J. Electrochem. Soc.: SOLID-STATE SCIENCE AND TECHNOLOGY, Aug. 1979, pp. 1419-1421. |
J. J. Cuomo et al., "Device for Controlling Ion-Beam Size", IBM Technical Disclosure Bulletin, vol. 21, No. 7, Dec. 1978, pp. 3036, 3037. |