Claims
- 1. A system for coating a substrate with a material, said system comprising:a mobile shuttle mechanism having a motion interface with the system; a dispenser that is attached to the shuttle mechanism and dispenses the material onto the substrate; and a chuck holder supporting a chuck for holding the substrate, the chuck holder suspended to permit the motion interface to be located beneath the chuck holder and the dispenser to pass above the chuck holder.
- 2. The system of claim 1, wherein the shuttle mechanism is linearly mobile, and the motion interface is a linear motion interface.
- 3. The system of claim 1, wherein the motion interface comprises an air bearing.
- 4. The system of claim 1, wherein the motion interface comprises a plurality of rollers.
- 5. The system of claim 1, wherein the motion interface comprises low friction sliding contact.
- 6. The system of claim 1, further comprising means for mounting a dispensing head.
- 7. The system of claim 1, wherein the shuttle mechanism experiences motion, and wherein motion of the shuttle mechanism is coordinated with means for fluid flow control to the dispenser.
- 8. The system of claim 1, wherein motion of the shuttle mechanism is electrically powered by shuttle motion control means.
- 9. The system of claim 8, wherein the motion of the shuttle mechanism is coordinated with means for fluid flow control to the dispenser.
- 10. The system of claim 1, wherein the dispenser is a linear extrusion head.
- 11. The system of claim 1, wherein the chuck holder is stationary.
- 12. The system of claim 1, wherein the chuck holder moves a distance less than 50% of the total relative motion between the dispenser and a substrate.
- 13. The system of claim 1, wherein the chuck holder comprises a skeletal structure which provides support for the chuck at a plurality of points around the periphery of the chuck, thereby creating peripheral points of support.
- 14. The system of claim 13, wherein providing support only at a plurality of peripheral points of support permits the chuck and a substrate located upon the chuck to flex vertically downward in between the peripheral points of support, thereby creating downward vertical flexing at points on the chuck displaced the points of support in directions parallel to and perpendicular to the direction of shuttle mechanism travel.
- 15. The system of claim 14, wherein the downward vertical flexing in the chuck and substrate travel acts to minimize variation in the gap between the dispenser and the substrate along an axis parallel to the length of dispenser.
- 16. The system of claim 1, wherein the chuck holds a substrate in place through use of vacuum.
- 17. The system of claim 1, wherein the chuck comprises means for raising the substrate out of the chuck.
- 18. The system of claim 1, wherein the chuck comprises a substrate lifting mechanism for raising the substrate out of the chuck.
- 19. The system of claim 18, wherein substrate lifting mechanism comprises means for converting motion in a first direction to motion in a second direction.
- 20. The system of claim 18, wherein the substrate lifting mechanism comprises:means for effecting horizontal displacement of a solid member; and means for converting the horizontal displacement of a solid member into the vertical displacement of the lift plate and lift pins.
- 21. The system of claim 20, wherein the means for effecting horizontal displacement is at least one air cylinder.
- 22. The system of claim 20, wherein the means for converting horizontal to vertical motion comprises horizontally moving a slanted plane towards a cam follower which is axially secured to a structure which moves vertically in response to the horizontal motion of the slanted plane.
- 23. The system of claim 20, wherein the means for converting horizontal to vertical motion comprises horizontally moving a first structure axially attached to a cam follower toward a slanted plane which is secured to a second structure which moves vertically in response to the horizontal motion of the second structure.
- 24. The system of claim 1, wherein all fluid supply equipment is disposed on a single structure which is removably attached to a station comprising the balance of the coating apparatus when said dispenser is in a home position.
- 25. The system of claim 1, further comprising a dispenser utility station.
- 26. The system of claim 25, wherein the utility station comprises means for cleaning the dispenser.
- 27. The system of claim 25, wherein the utility station comprises means for priming the dispenser.
- 28. The system of claim 1, wherein the height of the dispenser above a substrate disposed on the chuck, is automatically controlled during the coating process.
- 29. The system of claim 28, wherein the automatic control of the height of the dispenser comprises:measuring the height of the dispenser above the substrate in real time, thereby generating a real time height measurement; and adjusting the height of the dispenser based upon the real time height measurement.
- 30. The system of claim 1, wherein the height of the substrate is mapped prior to beginning a coating operation.
- 31. The system of claim 1, wherein a substrate having a surface and a surface height is on the chuck; andwherein the chuck comprises means for adjusting the height of a surface to be coated of the substrate at selected points on the substrate surface.
- 32. The system of claim 1, further comprising means for measuring height variation of a surface of a substrate located in the chuck.
- 33. The system of claim 32, further comprising means for adjusting the height of a substrate at selected points along the surface of said substrate.
- 34. The system of claim 32, further comprising means for establishing a constant height across the surface of the substrate.
- 35. The system of claim 32, further comprising means for maintaining a constant distance between the dispenser and the substrate as the dispenser travels across the substrate.
- 36. The system of claim 35, wherein a control system coordinates the means for measuring and the means for maintaining a constant height between the dispenser and the substrate.
- 37. The system of claim 35, wherein the means for adjusting comprises a plurality of piezoelectric crystals.
- 38. The system of claim 36, wherein the means for measuring is optical.
- 39. The system of claim 36, wherein the means for measuring comprises at least one camera.
- 40. The system of claim 1, wherein a substrate having a surface and a surface height is on the chuck, andwherein the system further comprises means for mapping and storing the height of the substrate surface as a function of position in two dimensions along the surface of the substrate.
- 41. The system of claim 1, further comprising a liquid reservoir and pumping means located remotely from the dispenser.
- 42. The system of claim 41, further comprising a pumping means integrally mounted to the dispenser for precisely controlling fluid flow to the dispenser.
- 43. The system of claim 42, wherein a control system coordinates fluid flow between said remotely located pumping means and said integrally mounted pumping means.
- 44. The system of claim 42, wherein the integrally mounted pumping means can produce negative pressure.
- 45. The system of claim 1, wherein the dispenser has a length, further comprising means for coating in segments across the length of the dispenser, thereby producing segment coating.
- 46. The system of claim 45, wherein the means for segment coating comprises deployment of die lip attached to the dispenser, said die lip comprising a plurality of openings along the length of the dispenser.
- 47. The system of claim 1, wherein the dispenser has a length, and wherein the dispenser comprises a plurality of slots along its length.
- 48. The dispenser of claim 47, further comprising a control system for controlling fluid flow to the plurality of slots in the dispenser.
- 49. The system of claim 1, comprising a plurality of dispensers, each dispenser having a length and comprising a plurality of slots along said length.
- 50. A system for coating a substrate with a material, said system comprising:a mobile shuttle mechanism having a motion interface with the system; a dispenser that is attached to the shuttle mechanism and dispenses the material onto the substrate; and a chuck holder supporting a chuck for holding the substrate, the chuck holder suspended to permit the motion interface to be located to at least one side of the chuck holder and the dispenser to pass above the chuck holder.
- 51. The system of claim 50, wherein the shuttle mechanism is linearly mobile, and the motion interface is a linear motion interface.
- 52. The system of claim 50, wherein the motion interface comprises an air bearing.
- 53. The system of claim 50, wherein the motion interface comprises a plurality of rollers.
- 54. The system of claim 50, wherein the motion interface comprises low friction sliding contact.
- 55. The system of claim 50, further comprising means for mounting a dispensing head.
- 56. The system of claim 50, wherein the shuttle mechanism experiences motion, and wherein motion of the shuttle mechanism is coordinated with means for fluid flow control to the dispenser.
- 57. The system of claim 50, wherein motion of the shuttle mechanism is electrically powered by shuttle motion control means.
- 58. The system of claim 57, wherein the motion of the shuttle mechanism is coordinated with means for fluid flow control to the dispenser.
- 59. The system of claim 50, wherein the dispenser is a linear extrusion head.
- 60. The system of claim 50, wherein the chuck holder is stationary.
- 61. The system of claim 50, wherein the chuck holder moves a distance less than 50% of the total relative motion between the dispenser and a substrate.
- 62. The system of claim 50, wherein the chuck holder comprises a skeletal structure which provides support for the chuck at a plurality of points around the periphery of the chuck, thereby creating peripheral points of support.
- 63. The system of claim 62, wherein providing support only at a plurality of peripheral points of support permits the chuck and a substrate located upon the chuck to flex vertically downward in between the peripheral points of support, thereby creating downward vertical flexing at points on the chuck displaced the points of support in directions parallel to and perpendicular to the direction of shuttle mechanism travel.
- 64. The system of claim 63, wherein the downward vertical flexing in the chuck and substrate travel acts to minimize variation in the gap between the dispenser and the substrate along an axis parallel to the length of dispenser.
- 65. The system of claim 50, wherein the chuck holds a substrate in place through use of vacuum.
- 66. The system of claim 50, wherein the chuck comprises means for raising the substrate out of the chuck.
- 67. The system of claim 50, wherein the chuck comprises a substrate lifting mechanism for raising the substrate out of the chuck.
- 68. The system of claim 67, wherein substrate lifting mechanism comprises means for converting motion in a first direction to motion in a second direction.
- 69. The system of claim 67, wherein the substrate lifting mechanism comprises:means for effecting horizontal displacement of a solid member; and means for converting the horizontal displacement of a solid member into the vertical displacement of the lift plate and lift pins.
- 70. The system of claim 69, wherein the means for effecting horizontal displacement is at least one air cylinder.
- 71. The system of claim 69, wherein the means for converting horizontal to vertical motion comprises horizontally moving a slanted plane towards a cam follower which is axially secured to a structure which moves vertically in response to the horizontal motion of the slanted plane.
- 72. The system of claim 69, wherein the means for converting horizontal to vertical motion comprises horizontally moving a first structure axially attached to a cam follower toward a slanted plane which is secured to a second structure which moves vertically in response to the horizontal motion of the second structure.
- 73. The system of claim 50, wherein all fluid supply equipment is disposed on a single structure which is removably attached to a station comprising the balance of the coating apparatus when said dispenser is in a home position.
- 74. The system of claim claim 50, further comprising a dispenser utility station.
- 75. The system of claim 74, wherein the utility station comprises means for cleaning the dispenser.
- 76. The system of claim 74, wherein the utility station comprises means for priming the dispenser.
- 77. The system of claim 50, wherein the height of the dispenser above a substrate disposed on the chuck, is automatically controlled during the coating process.
- 78. The system of claim 77, wherein the automatic control of the height of the dispenser comprises:measuring the height of the dispenser above the substrate in real time, thereby generating a real time height measurement; and adjusting the height of the dispenser based upon the real time height measurement.
- 79. The system of claim claim 50, wherein the height of the substrate is mapped prior to beginning a coating operation.
- 80. The system of claim 50, wherein a substrate having a surface and a surface height is on the chuck; andwherein the chuck comprises means for adjusting the height of a surface to be coated of the substrate at selected points on the substrate surface.
- 81. The system of claim 50, further comprising means for measuring height variation of a surface of a substrate located in the chuck.
- 82. The system of claim 81, further comprising means for adjusting the height of a substrate at selected points along the surface of said substrate.
- 83. The system of claim 82, further comprising means for establishing a constant height across the surface of the substrate.
- 84. The system of claim 82, further comprising means for maintaining a constant distance between the dispenser and the substrate as the dispenser travels across the substrate.
- 85. The system of claim 84, wherein the means for adjusting comprises a plurality of piezoelectric crystals.
- 86. The system of claim 84, wherein a control system coordinates the means for measuring and the means for maintaining a constant height between the dispenser and the substrate.
- 87. The system of claim 86, wherein the means for measuring is optical.
- 88. The system of claim 86, wherein the means for measuring comprises at least one camera.
- 89. The system of claim 50, wherein a substrate having a surface and a surface height is on the chuck, andwherein the system further comprises means for mapping and storing the height of the substrate surface as a function of position in two dimensions along the surface of the substrate.
- 90. The system of claim 50, further comprising a liquid reservoir and pumping means located remotely from the dispenser.
- 91. The system of claim 90, further comprising a pumping means integrally mounted to the dispenser for precisely controlling fluid flow to the dispenser.
- 92. The system of claim 91, wherein a control system coordinates fluid flow between said remotely located pumping means and said integrally mounted pumping means.
- 93. The system of claim 91, wherein the integrally mounted pumping means can produce negative pressure.
- 94. The system of claim 50, wherein the dispenser has a length, further comprising means for coating in segments across the length of the dispenser, thereby producing segment coating.
- 95. The system of claim 94, wherein the means for segment coating comprises deployment of die lip attached to the dispenser, said die lip comprising a plurality of openings along the length of the dispenser.
- 96. The system of claim 50, wherein the dispenser has a length, and wherein the dispenser comprises a plurality of slots along its length.
- 97. The dispenser of claim 96, further comprising a control system for controlling fluid flow to the plurality of slots in the dispenser.
- 98. The system of claim 50, comprising a plurality of dispensers, each dispenser having a length and comprising a plurality of slots along said length.
REFERENCE TO RELATED APPLICATIONS
This application claims the benefit of United States Provisional Application Serial No. 60/070,985 filed Jan. 9th, 1998, entitled “INTELLIGENT CONTROL SYSTEM FOR EXTRUSION HEAD DISPENSEMENT”, Provisional Application Serial No. 60/070,984 filed Jan. 9th, 1998, entitled “EXTRUSION COATING SYSTEM FOR SEGMENTED COATING USING DIE LIPS”, and Provisional Application Serial No. 60/070,983 filed Jan. 9th, 1998, entitled “MICRO DEFORMING CHUCK”, the disclosures of which are incorporated herein by reference.
The present invention is also related, and reference hereby made to concurrently filed, co-pending and commonly assigned patent applications: Ser. No. 09/227,692 entitled “INTELLIGENT CONTROL SYSTEM AND METHOD FOR EXTRUSION HEAD DISPENSEMENT”; Ser. No. 09/227,362, now U.S. Pat. No. 6,092,937, entitled “LINEAR DEVELOPER”; Ser. No. 09/226,983, now U.S. Pat. No. 6,387,184, entitled “SYSTEM AND METHOD FOR INTERCHANGEABLY INTERFACING WET COMPONENTS WITH A COATING APPARATUS”; Ser. No. 09/227,381, entitled “METHOD FOR CLEANING AND PRIMING AND EXTRUSION HEAD”; Ser. No. 09/227,459, now U.S. Pat. No. 6,319,323, entitled “SYSTEM AND METHOD FOR ADJUSTING A WORKING DISTANCE TO CORRESPOND WITH THE WORK SPACE”; the disclosures of which applications are incorporated herein by reference.
The present application is also related, and reference hereby made, to previously filed, co-pending, and commonly assigned patent applications: Ser. No. 09/148,463 entitled “LINEAR EXTRUSION COATING SYSTEM AND METHOD”; and Ser. No. 09/201,543 entitled “SYSTEM AND METHOD FOR PROVIDING COATING OF SUBSTRATES”.
US Referenced Citations (18)
Foreign Referenced Citations (2)
Number |
Date |
Country |
846626 |
Aug 1960 |
GB |
55133964 |
Oct 1980 |
JP |
Provisional Applications (3)
|
Number |
Date |
Country |
|
60/070985 |
Jan 1998 |
US |
|
60/070984 |
Jan 1998 |
US |
|
60/070983 |
Jan 1998 |
US |