Patent Application
20230044331
This disclosure relates generally to the field of integrated circuit (IC) manufacturing, and more specifically, to hybrid integrated circuit assemblies that include photonic and electronic components.
The need for fast and efficient photonics-based technologies is increasing, e.g., as internet data traffic growth rate is overtaking voice traffic, pushing the need for optical communications. In optical communications, information is transmitted by way of an optical carrier whose frequency is typically in the visible or near-infrared region of the electromagnetic spectrum. A carrier with such a high frequency is sometimes referred to as an optical signal, an optical carrier, a light wave signal, or simply light.
Technological advances today enable implementing portions of some photonic components at the IC (or chip) level, which provides advantages for use of optical communications in computer systems. For example, an optical receiver used in an optical communication system may include a photodetector (PD) implemented on a chip. A photonic integrated circuit (photonic IC (PIC)) is a device that integrates photonic functions for information signals imposed on electromagnetic waves, e.g., electromagnetic waves of optical wavelengths. PICs find application in fiber-optic communication, medical, security, sensing, and photonic computing systems. However, integrating photonic and electronic components is not trivial and further improvements are needed.
Embodiments will be readily understood by the following detailed description in conjunction with the accompanying drawings. To facilitate this description, like reference numerals designate like structural elements. Embodiments are illustrated by way of example, and not by way of limitation, in the figures of the accompanying drawings.
Overview
The systems, methods and devices of this disclosure each have several innovative aspects, no single one of which is solely responsible for all desirable attributes disclosed herein. Details of one or more implementations of the subject matter described in this specification are set forth in the description below and the accompanying drawings.
For purposes of illustrating hybrid IC assemblies having multiple stacked layers as described herein it might be useful to first understand phenomena that may come into play during IC fabrication. The following foundational information may be viewed as a basis from which the present disclosure may be properly explained. Such information is offered for purposes of explanation only and, accordingly, should not be construed in any way to limit the broad scope of the present disclosure and its potential applications.
IC dies are conventionally coupled to a package substrate for mechanical stability and to facilitate connection to other components, such as circuit boards. The performance that can be realized by such conventional IC packages is constrained by the performance of the die, manufacturing, materials, and thermal consideration, among others. Furthermore, communicating large numbers of signals between two or more dies in a multi-die IC package is challenging due to the increasingly small size of such dies, thermal constraints, and power delivery constraints, among others. Optical communication is being explored as a way to increase bandwidth between dies or within dies. However, photonic components with IC dies having electronic components provides an extra level of difficulty in view of all of these considerations and constraints.
One challenge resides in integrated circuits that include photonic components is that, given a usable surface area of a substrate, there are only so many optical components that can be formed in that area, placing a significant limitation on the density of optical structures. In an optical or hybrid integrated circuit, signals are transmitted using waveguides that propagate light. Waveguides are wider than metal lines (e.g., copper wires) for transmitting electrical signals in electronic-based processing, and it is difficult to reduce their size and maintain functionality.
In electronic circuits, metal, semiconductor, and insulating materials may be deposited in multiple layers to produce stacked structures. Optical structures cannot be built in layers in the same way. In order to propagate light, waveguide are formed of monocrystalline, or single-crystal, material. While one layer of monocrystalline material may be deposited on another monocrystalline material, current deposition methods do not enable monocrystalline materials to be repeatedly deposited, layer-by-layer. For example, each subsequent layer may have a less uniform crystal structure, and after multiple layers have been deposited, the higher layers (e.g., the third or fourth layer) may not have sufficient uniformity to form waveguides and other optical structures.
Embodiments of the present disclosure may improve on at least some of the challenges and issues described above by stacking multiple layers that include optical and electronic components to generate a vertically-stacked hybrid IC. Monocrystalline layers for forming the optical components are separately fabricated, and layer transfer is used to form a stack that includes multiple monocrystalline layers, so that optical components can be provided on multiple levels of the hybrid ID. For example, a first monocrystalline layer and a second monocrystalline layer are grown on separate substrates. Optical features including waveguides may be formed in or over the first monocrystalline layer. The second monocrystalline layer is attached to a carrier wafer, bonded to the first monocrystalline layer, and the carrier wafer is removed. Optical features including waveguides may then be formed in or over the second monocrystalline layer, providing a second optical layer. One or both of the optical layers may also include electronic components, or electronic components may be formed in one or more separate electronic layers. A bonding material having a lower crystallinity (e.g., a polycrystalline material), or no crystal structure (e.g., an amorphous material), may bond at least some of the layers. In addition, isolation layers are included in the stacked structure to prevent leakage of optical signals from the waveguides. The isolation layers have a different index of refraction from the optical waveguides.
The isolation layers and electronic layers may be formed using deposition or layer transfer. In general, vertically-stacked hybrid ICs may have various arrangements of waveguide layers, isolation layers, electronic layers, and bonding layers. Any of these layers may include multiple sub-layers, e.g., an electronic layer may include a full metal stack with multiple layers.
For purposes of explanation, specific numbers, materials and configurations are set forth in order to provide a thorough understanding of the illustrative implementations. However, it will be apparent to one skilled in the art that the present disclosure may be practiced without the specific details or/and that the present disclosure may be practiced with only some of the described aspects. In other instances, well-known features are omitted or simplified in order not to obscure the illustrative implementations.
Further, references are made to the accompanying drawings that form a part hereof, and in which is shown, by way of illustration, embodiments that may be practiced. It is to be understood that other embodiments may be utilized, and structural or logical changes may be made without departing from the scope of the present disclosure. Therefore, the following detailed description is not to be taken in a limiting sense. For convenience, if a collection of drawings designated with different letters are present, e.g.,
In the drawings, some schematic illustrations of example structures of various devices and assemblies described herein may be shown with precise right angles and straight lines, this is simply for ease of illustration, and embodiments of these assemblies may be curved, rounded, or otherwise irregularly shaped as dictated by, and sometimes inevitable due to, the manufacturing processes used to fabricate semiconductor device assemblies. Therefore, it is to be understood that such schematic illustrations may not reflect real-life process limitations which may cause the features to not look so “ideal” when any of the structures described herein are examined using e.g., scanning electron microscopy (SEM) images or transmission electron microscope (TEM) images. In such images of real structures, possible processing defects could also be visible, e.g., not-perfectly straight edges of materials, tapered vias or other openings, inadvertent rounding of corners or variations in thicknesses of different material layers, occasional screw, edge, or combination dislocations within the crystalline region, and/or occasional dislocation defects of single atoms or clusters of atoms. There may be other defects not listed here but that are common within the field of device fabrication. Furthermore, although a certain number of a given element may be illustrated in some of the drawings (e.g., a certain number and type of interconnects and waveguides in the first and second IC structures of the IC assemblies illustrated in some drawings, a certain number of dies in the IC packages illustrated in other drawings, etc.), this is simply for ease of illustration, and more, or less, than that number may be included in IC assemblies and related devices according to various embodiments of the present disclosure. Still further, various views shown in some of the drawings are intended to show relative arrangements of various elements therein. In other embodiments, various IC assemblies, or portions thereof, may include other elements or components that are not illustrated. Inspection of layout and mask data and reverse engineering of parts of a device to reconstruct the circuit using e.g., optical microscopy, TEM, or SEM, and/or inspection of a cross-section of a device to detect the shape and the location of various device elements described herein using e.g., physical failure analysis (PFA) would allow determination of presence of one or more hybrid IC assemblies having multiple stacked layers as described herein.
Various operations may be described as multiple discrete actions or operations in turn, in a manner that is most helpful in understanding the claimed subject matter. However, the order of description should not be construed as to imply that these operations are necessarily order dependent. These operations may not be performed in the order of presentation. Operations described may be performed in a different order from the described embodiment. Various additional operations may be performed, and/or described operations may be omitted in additional embodiments.
For the purposes of the present disclosure, the phrase “A and/or B” means (A), (B), or (A and B). For the purposes of the present disclosure, the phrase “A, B, and/or C” means (A), (B), (C), (A and B), (A and C), (B and C), or (A, B, and C). The term “between,” when used with reference to measurement ranges, is inclusive of the ends of the measurement ranges. Although certain elements may be referred to in the singular herein, such elements may include multiple sub-elements. For example, “an electrically conductive material” may include one or more electrically conductive materials.
The description uses the phrases “in an embodiment” or “in embodiments,” which may each refer to one or more of the same or different embodiments. The terms “comprising,” “including,” “having,” and the like, as used with respect to embodiments of the present disclosure, are synonymous. The disclosure may use perspective-based descriptions such as “above,” “below,” “top,” “bottom,” and “side” to explain various features of the drawings, but these terms are simply for ease of discussion, and do not imply a desired or required orientation. The accompanying drawings are not necessarily drawn to scale. Unless otherwise specified, the use of the ordinal adjectives “first,” “second,” and “third,” etc., to describe a common object, merely indicate that different instances of like objects are being referred to, and are not intended to imply that the objects so described must be in a given sequence, either temporally, spatially, in ranking or in any other manner.
In the following detailed description, various aspects of the illustrative implementations will be described using terms commonly employed by those skilled in the art to convey the substance of their work to others skilled in the art.
For example, the term “interconnect” may be used to describe any element formed of an electrically conductive material for providing electrical connectivity to one or more components associated with an IC or/and between various such components. In general, the “interconnect” may refer to both conductive traces (also sometimes referred to as “lines” or “trench contacts”) and conductive vias. In general, in context of interconnects, the term “conductive trace” may be used to describe an electrically conductive element isolated by an insulator material (e.g., a low-k dielectric material) that is provided within the plane of an IC die. Such traces are typically stacked into several levels, or several layers, of metallization stacks. On the other hand, the term “via” may be used to describe an electrically conductive element that interconnects two or more traces of different levels. To that end, a via may be provided substantially perpendicularly to the plane of an IC die and may interconnect two traces in adjacent levels or two traces in not adjacent levels. A term “metallization stack” may be used to refer to a stack of one or more interconnects for providing connectivity to different circuit components of an IC chip. Sometimes, traces and vias may be referred to as “conductive traces” and “conductive vias”, respectively, to highlight the fact that these elements include electrically conductive materials such as metals.
Interconnects as described herein, in particular interconnects hybrid IC assemblies having multiple stacked layers as described herein, may be used for providing connectivity to one or more components associated with an IC or/and between various such components, where, in various embodiments, components associated with an IC may include, for example, transistors, diodes, power sources, resistors, capacitors, inductors, sensors, transceivers, receivers, antennas, etc. Components associated with an IC may include those that are mounted on IC or those connected to an IC. The IC may be either analog or digital and may be used in a number of applications, such as microprocessors, optoelectronics, logic blocks, audio amplifiers, etc., depending on the components associated with the IC. The IC may be employed as part of a chipset for executing one or more related functions in a computer.
In context of photonics, waveguides described herein may be considered a type of “interconnect” in that they support propagation of optical signals between various components associated with an IC and/or between various such components. Such interconnects may be referred to as “optical interconnects” to differentiate them from electrically conductive interconnects of electronic components, which may be referred to herein simply as “interconnects.” Similarly, vias made of dielectric materials to serve as waveguides that support propagation of optical signals are described herein as “dielectric vias” to differentiate them from electrically conductive vias of electronic components, which may be described herein simply as “vias.”
In another example, the terms “package” and “IC package” are synonymous, as are the terms “die” and “IC die,” the term “insulating” means “electrically insulating,” the term “conducting” means “electrically conducting,” unless otherwise specified. Furthermore, the term “connected” may be used to describe a direct electrical or magnetic connection between the things that are connected, without any intermediary devices, while the term “coupled” may be used to describe either a direct electrical or magnetic connection between the things that are connected, or an indirect connection through one or more passive or active intermediary devices. The term “circuit” may be used to describe one or more passive and/or active components that are arranged to cooperate with one another to provide a desired function.
In yet another example, if used, the terms “oxide,” “carbide,” “nitride,” etc. refer to compounds containing, respectively, oxygen, carbon, nitrogen, etc., the term “high-k dielectric” refers to a material having a higher dielectric constant than silicon oxide, while the term “low-k dielectric” refers to a material having a lower dielectric constant than silicon oxide.
The terms “substantially,” “close,” “approximately,” “near,” and “about,” generally refer to being within +/−20% of a target value based on the context of a particular value as described herein or as known in the art. Similarly, terms indicating orientation of various elements, e.g., “coplanar,” “perpendicular,” “orthogonal,” “parallel,” or any other angle between the elements, generally refer to being within +/−5-20% of a target value based on the context of a particular value as described herein or as known in the art.
Example IC with Multiple Stacked Optical Layers
In general, hybrid IC assemblies with multiple stacked layers are described herein with reference to IC assemblies, such as the IC assemblies shown in
With respect to
The IC assembly 100 may be formed or carried out on a support structure, not specifically shown in
Generally speaking, each of the optical layers 110 and 120 includes waveguides for transmitting optical signals. Each optical layer may further include one or more other materials forming the boundaries of the waveguide and preventing leakage of optical signals from the waveguides; such materials may be referred to as cladding or isolation materials. Multiple isolation materials may be used along different edges or portions of a waveguide. For example, a waveguide having a rectangular cross-section may be formed over a first isolation layer, so a bottom face of the waveguide is coupled to the first isolation layer. A second isolation material may be deposited over the waveguide, so that the second isolation layer surrounds the sides and top face of the waveguide.
The waveguide material has a uniform crystal structure that allows an optical wave to propagate through the waveguide material with minimal loss. For example, the waveguide material may have grain size of at least 5 nanometers (nm). In some embodiments, the waveguide material has a larger minimum grain size, e.g., a grain size of at least 20 nm, a grain size of at least 50 nm, or a grain size of at least 100 nm. The waveguides may be formed of any suitable single-crystal material, such as sapphire, quartz, silicon, a compound of silicon (e.g., silicon oxide), indium phosphide, germanium or a germanium alloy, gallium, arsenic (e.g., an arsenide III compound, where arsenic III is in combination with another element such as boron, aluminum, gallium, or indium), or any group III-V material (i.e., materials from groups III and V of the periodic system of elements).
The isolation material is a material without optical properties, or with different optical properties from the waveguide. For example, the isolation material may include a polycrystalline or amorphous silicon or silicon compound, such as silicon dioxide or silicon nitride. In some embodiments, the isolation material is a single-crystal material with different optical properties than the waveguide, e.g., a monocrystalline material (e.g., single-crystal silicon, gallium arsenide, or any of the other monocrystalline materials mentioned above) with a higher refractive index than the waveguide. In some embodiments, multiple isolation layers are formed of two or more different isolation materials.
The waveguide material may have a refractive index between 1.3 and 4, and an isolation material abutting at least a portion of the waveguide may have a different refractive index between 1.3 and 4. The waveguide material and isolation material may be selected such that the isolation material has a much higher or much lower refractive index than the waveguide material. In some embodiments, the isolation material and the waveguide material may have a similar or same refractive index. In such embodiments, an interface between the waveguide material and the isolation material may prevent leakage of signals into the isolation material, e.g., if the crystal structures of the waveguide material and the isolation material are different, or if the crystal structure restarts at the interface (e.g., if the isolation material and waveguide material are grown separately).
In some embodiments, one or more of the optical layers 110, 120 may further include photonic components to manipulate the optical signals, such as gain chips, diffraction gratings, combiners, demodulators, etc. The photonics components may include any of the waveguide materials described above. In some embodiments, one or more of the optical layers 110, 120 may include electro-optical components, e.g., an electro-optic modulator such as a Mach-Zehnder modulator or a ring oscillator.
The optical layers 110 and 120 are bonded together by a bonding layer 130. The bonding layer 130 is present in between the faces of the optical layers 110 and 120, e.g., above a front face of the optical layer 110 and below a back face of the optical layer 120. For each optical layer 110 and 120, the terms “bottom face” or “back face” of the structure may refer to the back of the structure, e.g., the face of the optical layer 120 along the bonding layer 130 is its bottom face, while the terms “top face” or “front face” of the structure may refer to the opposing upper face. The bonding material 130 may be applied to the one or both faces of the optical layers 110 and 120 that should be bonded and then the optical layers 110 and 120 are put together, possibly while applying a suitable pressure and heating up the assembly to a suitable temperature (e.g., to moderately high temperatures, e.g., between about 50 and 200 degrees Celsius) for a duration of time. An example illustration of a layer transfer process that can be used to bond the second optical layer 120 to the first optical layer 110 is shown in
In some embodiments, the bonding material 130 may be an adhesive material that ensures attachment of the optical layers 110 and 120 to one another. In some embodiments, the bonding material 130 may be an etch-stop material. In some embodiments, the bonding material may be both an etch-stop material and have suitable adhesive properties to ensure attachment of optical layers 110 and 120 to one another. Such a bonding interface may be recognizable as a seam or a thin layer in the IC assembly 100, using, e.g., selective area diffraction (SED). The bonding material 130 has a lower crystallinity than one or more materials in each of the optical layers 110 and 120. In particular, the bonding material 130 has a lower crystallinity than the waveguides in the optical layers 110 and 120. For example, the bonding material 130 may have polycrystalline structure with a grain size of 20 nm or lower, e.g., a grain size between 1 nm and 20 nm. In some embodiments, the bonding material 130 has a grain size of 10 nm or lower, e.g., between 5 nm and 10 nm. In some embodiments, the bonding material 130 may have an amorphous structure. A polycrystalline or amorphous bonding material 130 is used to prevent optical leakage or transmission of optical signals along the bonding material 130. In some embodiments, the bonding material 130 is used as an isolation material, described above.
In some embodiments, the bonding material 130 may include silicon, nitrogen, and carbon, where the atomic percentage of any of these materials may be at least 1%, e.g., between about 1% and 50%, indicating that these elements are added deliberately, as opposed to being accidental impurities which are typically in concentration below about 0.1%. Using an etch-stop material that includes include silicon, nitrogen, and carbon, where the atomic percentage of any of these materials may be at least 1%, e.g., SiOCN, may be advantageous in terms that such a material may act both as an etch-stop material, and have sufficient adhesive properties to bond the first and second optical layers 110, 120 together. In addition, an etch-stop material at the interface between the first and second optical layers 110, 120 that includes include silicon, nitrogen, and carbon, where the atomic percentage of any of these materials may be at least 1%, may be advantageous in terms of improving etch-selectivity of this material with respect to etch-stop materials that may be used in different of the first and second optical layers 110, 120.
In some embodiments, no bonding material 130 may be used, in which case the layer labeled “130” in
In some embodiments, the IC assembly 100 may include one or more dielectric vias, providing one or more dielectric pathways for guiding optical signals between the optical layers 110 and 120. The dielectric vias extend through the bonding material 130. Example dielectric vias are shown in
Example Arrangements of Optical Layers
In a PIC or hybrid IC, waveguide layers and isolation layers may be stacked in various configurations. In general, each layer (e.g., a waveguide layer or an isolation layer) may either be deposited onto the layer below (e.g., a waveguide layer deposited on an isolation layer), or fabricated separately and transferred onto the layer below using a layer transfer process. As noted above, the waveguide material is monocrystalline. The isolation material for the waveguides may be monocrystalline, or it may have a different structure, e.g., polycrystalline or amorphous. Furthermore, a single-crystal structure (e.g., a monocrystalline waveguide layer) may be deposited over another monocrystalline layer (e.g., a monocrystalline isolation layer). However, repeated deposition of monocrystalline layers typically results in defects in the higher layers. For example, a monocrystalline waveguide layer (e.g., single-crystal germanium) can be deposited over a monocrystalline base layer (e.g., a single-crystal silicon substrate). The waveguide layer may have some defects (e.g., grain boundaries), but the crystal size is sufficiently large to form waveguides that propagate optical signals with minimal losses. When light propagating through a waveguide passes through a grain boundary, the light diffracts and loses energy, which is undesirable. If subsequent single-crystal layers are deposited over the waveguide layer (e.g., a second silicon isolation layer, followed by a second germanium waveguide layer), these layers can have decreasing crystal sizes and more grain boundaries, which make them unsuitable for waveguides. Therefore, to create a layered IC structure with sufficiently monocrystalline waveguides, at least some of the layers (e.g., isolation and/or waveguide layers) are stacked using a layer transfer process.
The first optical layer 110 is formed over the support layer 210. The first optical layer 110 includes a waveguide layer 220a and an isolation layer 230a. The second optical layer 120 is formed over the first optical layer 110, and the second optical layer 120 is bonded to the first optical layer 110 by the bonding material 130. The second optical layer 120 includes a waveguide layer 220b and an isolation layer 230b. In this example, the waveguide layers 220a and 220b of the first and second optical layers 110 and 120 are similar, e.g., formed of the same material and using a similar process. The waveguide layers 220a and 220b are referred to generally as waveguide layers 220. In other examples, the waveguide layers 220a and 220b may be different, e.g., formed of different materials. In this example, the isolation layers 230a and 230b of the first and second optical layers 110 and 120 are similar, e.g., formed of the same material and using a similar process. The isolation layers 230a and 230b are referred to generally as isolation layers 230. In other examples, the isolation layers 230a and 230b may be different, e.g., formed of different materials. While two optical layers 110 and 120 are shown in
A bonding layer 240 bonds the first optical layer 110, and in particular, the waveguide layer 220a, to the support layer 210. The bonding layer 240 may be similar to the bonding layer 130, described with respect to
The waveguide layers 220a and 220b are fabricated separately from the IC assembly 200 and transferred onto the IC assembly 200, i.e., over the support layer 210 and isolation layer 230a, respectively. For example, each waveguide layer 220 is formed from an upper portion of a single-crystal silicon wafer or die, or each waveguide layer 220 is a single-crystal layer formed over a separate single-crystal substrate. Fabricating the waveguide layers 220 separately ensures that the waveguide layers 220 have a monocrystalline structure with minimal grain boundaries. The waveguide layers 220 are transferred as sheets of monocrystalline material. After each waveguide layer 220 is transferred, the waveguide layer 220 is patterned and etched to form various optical structures, such as waveguides and other optical features.
After the optical structures have been formed in a given waveguide layer 220, an isolation layer 230 is formed over the waveguide layer 220 using deposition (e.g., the isolation layer 230a is deposited over the waveguide layer 220a). The isolation layers 230 may be made of any material, including non-optical monocrystalline material, polycrystalline material, or amorphous material. While a single isolation layer 230 is shown in each optical layer 110 and 120, in some embodiments, the isolation layers 230 are formed from multiple layers. For example, the isolation layer 230a may include a first material that encloses the waveguide features, and a second material that is layered over the first material. A front face of the first isolation layer 230a may be smoothed (e.g., by grinding and polishing) to provide a suitable surface for layer transferring the second waveguide layer 220b.
The optical layers 110 and 120 may have other arrangements than the arrangements shown in
In another embodiment, each of the waveguide layers 220 and isolation layers 230 are layer transferred onto the IC assembly and separated by a bonding layer 130. In still another embodiment, isolation layers are layer transferred onto the IC assembly and separated from the waveguide layers below by a bonding layer, and the waveguide layers are deposited over the isolation layers. In this embodiment, the isolation layers are formed of a monocrystalline material so that the waveguide layers, deposited over the isolation layers, have a single-crystal structure with sufficient uniformity to create optical features.
Example Hybrid IC with Multiple Stacked Optical Layers
The support structure 310 supports optical layer 1320a and the layers formed above optical layer 1320a. The support structure 310 may be, e.g., a substrate, a die, a wafer or a chip. The support structure 310 may be similar to the support structure described with respect to
Optical layer 1320a is formed over the support structure 310. In this example, optical layer 1320a is shown as being formed directly over the support structure 310, without a bonding layer 340. For example, the support structure 310 and a waveguide portion of optical layer 1320a may be formed using a silicon-on-insulator (SOI) wafer, e.g., the waveguide material for optical layer 1320a is a single-crystal silicon layer formed over a single-crystal insulator, such as sapphire, that acts as the support structure 310. In such embodiments, optical features, including waveguides, are formed from the upper silicon layer of the SOI wafer. In other embodiments, a bonding layer may be present between the support structure 310 and optical layer 1320a. In some embodiments, one or more additional layers, such as the isolation layers 230 described with respect to
Electronic layer 1330a is formed over optical layer 1320a. In this example, a bonding layer 340a bonds an upper face of optical layer 1320a to a lower face of electronic layer 1330a. This may indicate that a layer transfer process, e.g., the layer transfer process described with respect to
In the example shown in
While the hybrid IC assembly 300 includes two optical layers 320 and two electronic layers 330, any number of optical layers 320 and electronic layers 330 may be included, and in any order. For example, while optical layer 1320a is the first layer over the support structure 310, in another embodiment, an electronic layer 330 may be the first layer over the support structure 310. While the optical layers 320 and electronic layers 330 are arranged in an alternating fashion, in other embodiments, two or more optical layers 320 may be arranged adjacent to each other without an intervening electronic layer 330, or two or more electronic layers 330 may be arranged adjacent to each other without an intervening electronic layer 330. The hybrid IC assembly 300 may include different numbers of optical layers 320 and electronic layers 330.
In
The support structure 410 supports hybrid layer 1420a and the layers formed above hybrid layer 1420a. The support structure 410 may be, e.g., a substrate, a die, a wafer or a chip. The support structure 410 may be similar to the support structure described with respect to
Hybrid layer 1420a is formed over the support structure 410. In this example, hybrid layer 1420a is shown as being formed directly over the support structure 410, without a bonding layer 440. For example, the support structure 410 and a base portion of hybrid layer 1420a may be formed using a silicon-on-insulator (SOI) wafer, e.g., the waveguide material for hybrid layer 1420a is a single-crystal silicon layer formed over a single-crystal insulator, such as sapphire, that acts as the support structure 410. In such embodiments, optical features, including waveguides, are formed from the upper silicon layer of the SOI wafer. Single-crystal silicon is also a semiconductor that can be used to form electronic features, such as transistors, in hybrid layer 1420a. In other embodiments, a bonding layer may be present between the support structure 410 and optical layer 1320a, e.g., if a sheet of single-crystal silicon or other monocrystalline material is layer-transferred over the support structure 410.
One or more regions of the monocrystalline material are used to form optical structures including waveguides, and one or more other regions of the monocrystalline material may be used to form electronic features such as transistors. In some embodiments, a portion of the monocrystalline material used to form electronic features is doped with an n-type or p-type material. In some embodiments, one or more additional layers, such as the isolation layers 230 described with respect to
While
Example Cross-Sections of Hybrid ICs with Optical Layers and Electronic Layers
The optical structures 505 are formed at or near a front side of the optical layer 320a, e.g., over an isolation layer. While not specifically shown in
In this example, the electronic structures 515 are formed at or near a front side of the electronic layer 330a, e.g., over an insulating material that has been layer transferred over the optical layer 320a. The electronic structures 515 may represent, for example, a transistor layer, a memory layer, or some other electronic layer. It should be understood that additional layers, including conductive layers forming vias, trenches, or other interconnect elements, may be included in the electronic layers 330. The interconnect elements may extend above and/or below the electronic structures 515 represented in
In this example, the electronic structures 515 are shown as being physically separated from the optical structures 505. Electronic elements produce heat that can influence the optical properties within the optical structures 505, e.g., by changing the permittivity of the waveguide material, and altering how optical signals propagate through the waveguide (and in particular, how well different frequencies of light propagate through the waveguide). If the electronic structures 515 are operating independently from the optical structures 505, and heat-based effects in the optical structures 505 are not desired, separating the electronic structures 515 from the optical structures 505 may be helpful.
In this example, the optical structures 505 and electronic structures 515 are both formed on the front sides if their respective layers 320 and 330. To further increase the distance between the electronic structures 515 and the optical structures 505, the optical structures 505 may be formed near the back side of the optical layer 320a. However, if multiple optical layers 320 and electronic layers 330 are alternately stacked, e.g., as shown in
In this example, the optical structures 505 are formed at or near a front side of the optical layer 320a, e.g., over an isolation layer. The optical structures 505 and optical layer 320a may be similar to the optical layer 320a described with respect to
Unlike in
As with
Example Cross-Sections of Hybrid ICs with Optical Connections
In some implementations, hybrid IC assemblies may be configured to provide primarily electronic-based (e.g., transistor-based) logic and/or memory, with optical communication pathways enabling communication between groups of electronic structures, including between multiple groups of electronic structures on the IC, or between electronic structures on other connected devices. As noted above, optical channels, e.g., waveguides, can enable signal transmission at higher bandwidth than typical electronic channels, e.g., metal trenches and vias. To increase bandwidth in a hybrid IC, one or more groups of electronic structures can be coupled to an electro-optical conversion component to convert between electronic signals and optical signals. This allows data from electronic structures to be transmitted through an optical structure and/or allows electronic structures to receive data through the optical structure.
In this example, each hybrid layer 420 includes both optical structures 710 and electronic structures 720, e.g., the first hybrid layer 420a includes a group of optical structures 710a and a group of electronic structures 720a. Each group of optical structures 710 is formed in an optical portion 715 of the assembly, and each group of electronic structures 720 is formed in an electronic portion 725 of the assembly. In this example, the optical portions 715 and electronic portions 725 are stacked over each other (e.g., the optical structures 710b are stacked over the optical structures 710a), but in other examples, each hybrid layer 420 may have optical structures 710 and electronic structures 720 in different portions, e.g., the group of optical structures 710b may be stacked over the group of electronic structures 720a. The groups of electronic structures 720a and 720b may be considered different electronic regions of the hybrid IC assembly 700.
An optical via 730 is coupled to the groups of optical structures 710a and 710b to carry optical signals between the groups of optical structures 710a and 710b, e.g., from the first group of optical structures 710a to the second group of optical structures 710b and/or from the second group of optical structures 710b to the first group of optical structures 710a. The optical via 730 extends through the bonding material 440a. While one optical via 730 is shown in
In this example implementation, the hybrid IC assembly 700 shown in
For example, if the optical via 730 transmits signals from the optical structures 710a to the optical structures 710b, the conversion circuitry 740a receives signals (e.g., digital signals represented by two different voltage levels) and converts them to optical signals (e.g., a light wave modulated to represent the digital signals, e.g., using frequency, amplitude, and/or phase modulation) for transmission through the optical structures 710a, through the optical via 730, and to the optical structures 710b. The conversion circuitry 740b receives the optical signals and converts the optical signals to digital electronic signals received by the electronic structures 720b.
While the optical vias 730, optical structures 710, and conversion circuitry 740 are represented as connecting two groups of electronic structures 720 in the same hybrid IC assembly 700, in some embodiments, optical structures (e.g., conversion circuitry and waveguides) may be configured to communicate signals on and/or off the hybrid IC assembly, e.g., to form optical communication pathways to one or more devices coupled to the hybrid IC assembly. For example, an optical waveguide may be coupled between some electronic structures (e.g., the second group of electronic structures 720b) and an optical port on the hybrid IC assembly 700 to transfer signals off the hybrid IC assembly 700 and/or onto the hybrid IC assembly 700.
In the example shown in
In addition, the electronic structures 720 are depicted as being formed at or near a front side of each hybrid layer 420, e.g., over an insulating material. The electronic structures 720 may be similar to the electronic structures 515 described with respect to
The cross-section includes an optical layer 320a, corresponding to optical layer 1320a shown in
In this example, the two groups of electronic structures 820a and 820b may be considered different electronic regions of the electronic layer 330a, and more generally, different electronic regions of the hybrid IC assembly 800. A first optical via 830a and a first conversion circuitry 840a are coupled between the optical structures 810a and the first group of electronic structures 820a, and a second optical via 830b and a second conversion circuitry 840b are coupled between the optical structures 810 and the second group of electronic structures 810b. The conversion circuitries 840 converts electronic signals to optical signals (or vice versa) so that data between the groups of electronic structures 820a and 820b may be transmitted through the optical structures 810 and the optical vias 830a and 830b. The conversion circuitries 840, optical vias 830, and optical structures 810 may be considered an optical pathway between the two groups of electronic structures 820a and 820b. While one optical pathway is shown in
In this example, the hybrid IC assembly 800, and in particular, the electronic structures 820 may provide primarily electronic-based (e.g., transistor-based) logic and/or memory, with the optical pathways enabling communication between groups of electronic structures 820.
While the optical vias 730, optical structures 710, and conversion circuitry 740 are represented as connecting two groups of electronic structures 720 in the same hybrid IC assembly 700, in some embodiments, optical structures (e.g., conversion circuitry and waveguides) may be configured to communicate signals on and/or off the hybrid IC assembly, e.g., to form optical communication pathways to one or more devices coupled to the hybrid IC assembly.
In the example shown in
In addition, the electronic structures 720 are depicted as being formed at or near a back side of the electronic layer 330a. The electronic structures 820 may be similar to the electronic structures described with respect to
Example Layer Transfer Process
The monocrystalline material 910 is formed as a sheet that extends in an x-direction (into and/or out of the page) and in the y-direction, labelled in
In
In
In
In
In alternate embodiments, e.g., if the monocrystalline material 910 is suitably thick and mechanically stable, the carrier wafer 940 is not used. Instead, the monocrystalline material 910 may be flipped to bond the back face of the lower portion 910b to the IC assembly 950, and the upper portion 910a is lifted off the IC assembly 950.
Various device assemblies illustrated in
Further,
Inspection of layout and mask data and reverse engineering of parts of a device to reconstruct the circuit using e.g., optical microscopy, TEM, or SEM, and/or inspection of a cross-section of a device to detect the shape and the location of various device elements described herein using e.g., Physical Failure Analysis (PFA) would allow determination of presence of the stacked hybrid IC devices as described herein.
The three-dimensional transistors with recessed gates disclosed herein may be included in any suitable electronic device.
The IC device 1600 may include one or more device layers 1604 disposed on the substrate 1602. The device layer 1604 may include features of one or more transistors 1640 (e.g., metal oxide semiconductor field-effect transistors (MOSFETs)) formed on the substrate 1602. The device layer 1604 may include, for example, one or more source and/or drain (S/D) regions 1620, a gate 1622 to control current flow in the transistors 1640 between the S/D regions 1620, and one or more S/D contacts 1624 to route electrical signals to/from the S/D regions 1620. The transistors 1640 may include additional features not depicted for the sake of clarity, such as device isolation regions, gate contacts, and the like. The transistors 1640 are not limited to the type and configuration depicted in
Each transistor 1640 may include a gate 1622 formed of at least two layers, a gate electrode layer and a gate dielectric layer.
The gate electrode layer may be formed on the gate interconnect support layer and may consist of at least one P-type workfunction metal or N-type workfunction metal, depending on whether the transistor is to be a PMOS or an NMOS transistor, respectively. In some implementations, the gate electrode layer may consist of a stack of two or more metal layers, where one or more metal layers are workfunction metal layers and at least one metal layer is a fill metal layer. Further metal layers may be included for other purposes, such as a barrier layer or/and an adhesion layer.
For a PMOS transistor, metals that may be used for the gate electrode include, but are not limited to, ruthenium, palladium, platinum, cobalt, nickel, and conductive metal oxides, e.g., ruthenium oxide. A P-type metal layer will enable the formation of a PMOS gate electrode with a workfunction that is between about 4.9 electron Volts (eV) and about 5.2 eV. For an NMOS transistor, metals that may be used for the gate electrode include, but are not limited to, hafnium, zirconium, titanium, tantalum, aluminum, alloys of these metals, and carbides of these metals such as hafnium carbide, zirconium carbide, titanium carbide, tantalum carbide, aluminum carbide, tungsten, tungsten carbide. An N-type metal layer will enable the formation of an NMOS gate electrode with a workfunction that is between about 3.9 eV and about 4.2 eV.
In some embodiments, when viewed as a cross section of the transistor 1640 along the source-channel-drain direction, the gate electrode may be formed as a U-shaped structure that includes a bottom portion substantially parallel to the surface of the substrate and two sidewall portions that are substantially perpendicular to the top surface of the substrate. In other embodiments, at least one of the metal layers that form the gate electrode may simply be a planar layer that is substantially parallel to the top surface of the substrate and does not include sidewall portions substantially perpendicular to the top surface of the substrate. In other embodiments, the gate electrode may be implemented as a combination of U-shaped structures and planar, non-U-shaped structures. For example, the gate electrode may be implemented as one or more U-shaped metal layers formed atop one or more planar, non-U-shaped layers. In some embodiments, the gate electrode may consist of a V-shaped structure (e.g., when a fin of a FinFET transistor does not have a “flat” upper surface, but instead has a rounded peak).
Generally, the gate dielectric layer of a transistor 1640 may include one layer or a stack of layers, and the one or more layers may include silicon oxide, silicon dioxide, and/or a high-k dielectric material. The high-k dielectric material included in the gate dielectric layer of the transistor 1640 may include elements such as hafnium, silicon, oxygen, titanium, tantalum, lanthanum, aluminum, zirconium, barium, strontium, yttrium, lead, scandium, niobium, and zinc. Examples of high-k materials that may be used in the gate dielectric layer include, but are not limited to, hafnium oxide, hafnium silicon oxide, lanthanum oxide, lanthanum aluminum oxide, zirconium oxide, zirconium silicon oxide, tantalum oxide, titanium oxide, barium strontium titanium oxide, barium titanium oxide, strontium titanium oxide, yttrium oxide, aluminum oxide, lead scandium tantalum oxide, and lead zinc niobate. In some embodiments, an annealing process may be carried out on the gate dielectric layer to improve its quality when a high-k material is used.
The S/D regions 1620 may be formed within the substrate 1602 adjacent to the gate 1622 of each transistor 1640, using any suitable processes known in the art. For example, the S/D regions 1620 may be formed using either an implantation/diffusion process or a deposition process. In the former process, dopants such as boron, aluminum, antimony, phosphorous, or arsenic may be ion-implanted into the substrate 1602 to form the S/D regions 1620. An annealing process that activates the dopants and causes them to diffuse farther into the substrate 1602 may follow the ion implantation process. In the latter process, an epitaxial deposition process may provide material that is used to fabricate the S/D regions 1620. In some implementations, the S/D regions 1620 may be fabricated using a silicon alloy such as silicon germanium or silicon carbide. In some embodiments, the epitaxially deposited silicon alloy may be doped in situ with dopants such as boron, arsenic, or phosphorous. In some embodiments, the S/D regions 1620 may be formed using one or more alternate semiconductor materials such as germanium or a group III-V material or alloy. In further embodiments, one or more layers of metal and/or metal alloys may be used to form the S/D regions 1620. In some embodiments, an etch process may be performed before the epitaxial deposition to create recesses in the substrate 1602 in which the material for the S/D regions 1620 is deposited.
Electrical signals, such as power and/or input/output (I/O) signals, may be routed to and/or from the transistors 1640 of the device layer 1604 through one or more interconnect layers disposed on the device layer 1604 (illustrated in
The interconnect structures 1628 may be arranged within the interconnect layers 1606-1610 to route electrical signals according to a wide variety of designs (in particular, the arrangement is not limited to the particular configuration of interconnect structures 1628 depicted in
In some embodiments, the interconnect structures 1628 may include trench contact structures 1628a (sometimes referred to as “lines”) and/or via structures 1628b (sometimes referred to as “holes”) filled with an electrically conductive material such as a metal. The trench contact structures 1628a may be arranged to route electrical signals in a direction of a plane that is substantially parallel with a surface of the substrate 1602 upon which the device layer 1604 is formed. For example, the trench contact structures 1628a may route electrical signals in a direction in and out of the page from the perspective of
The interconnect layers 1606-1610 may include a dielectric material 1626 disposed between the interconnect structures 1628, as shown in
In some embodiments, the dielectric material 1626 disposed between the interconnect structures 1628 in different ones of the interconnect layers 1606-1610 may have different compositions. In other embodiments, the composition of the dielectric material 1626 between different interconnect layers 1606-1610 may be the same.
A first interconnect layer 1606 (referred to as Metal 1 or “M1”) may be formed directly on the device layer 1604. In some embodiments, the first interconnect layer 1606 may include trench contact structures 1628a and/or via structures 1628b, as shown. The trench contact structures 1628a of the first interconnect layer 1606 may be coupled with contacts (e.g., the S/D contacts 1624) of the device layer 1604.
A second interconnect layer 1608 (referred to as Metal 2 or “M2”) may be formed directly on the first interconnect layer 1606. In some embodiments, the second interconnect layer 1608 may include via structures 1628b to couple the trench contact structures 1628a of the second interconnect layer 1608 with the trench contact structures 1628a of the first interconnect layer 1606. Although the trench contact structures 1628a and the via structures 1628b are structurally delineated with a line within each interconnect layer (e.g., within the second interconnect layer 1608) for the sake of clarity, the trench contact structures 1628a and the via structures 1628b may be structurally and/or materially contiguous (e.g., simultaneously filled during a dual-damascene process) in some embodiments.
A third interconnect layer 1610 (referred to as Metal 3 or “M3”) (and additional interconnect layers, as desired) may be formed in succession on the second interconnect layer 1608 according to similar techniques and configurations described in connection with the second interconnect layer 1608 or the first interconnect layer 1606.
The IC device 1600 may include a solder resist material 1634 (e.g., polyimide or similar material) and one or more bond pads 1636 formed on the interconnect layers 1606-1610. The bond pads 1636 may be electrically coupled with the interconnect structures 1628 and configured to route the electrical signals of the transistor(s) 1640 to other external devices. For example, solder bonds may be formed on the one or more bond pads 1636 to mechanically and/or electrically couple a chip including the IC device 1600 with another component (e.g., a circuit board). The IC device 1600 may have other alternative configurations to route the electrical signals from the interconnect layers 1606-1610 than depicted in other embodiments. For example, the bond pads 1636 may be replaced by or may further include other analogous features (e.g., posts) that route the electrical signals to external components.
In some embodiments, the circuit board 1702 may be a printed circuit board (PCB) including multiple metal layers separated from one another by layers of dielectric material and interconnected by electrically conductive vias. Any one or more of the metal layers may be formed in a desired circuit pattern to route electrical signals (optionally in conjunction with other metal layers) between the components coupled to the circuit board 1702. In other embodiments, the circuit board 1702 may be a non-PCB substrate.
The IC device assembly 1700 illustrated in
The package-on-interposer structure 1736 may include an IC package 1720 coupled to an interposer 1704 by coupling components 1718. The coupling components 1718 may take any suitable form for the application, such as the forms discussed above with reference to the coupling components 1716. Although a single IC package 1720 is shown in
The interposer 1704 may be formed of an epoxy resin, a fiberglass-reinforced epoxy resin, a ceramic material, or a polymer material such as polyimide. In some implementations, the interposer 1704 may be formed of alternate rigid or flexible materials that may include the same materials described above for use in a semiconductor substrate, such as silicon, germanium, and other group III-V and group IV materials. The interposer 1704 may include metal interconnects 1708 and vias 1710, including but not limited to TSVs 1706. The interposer 1704 may further include embedded devices 1714, including both passive and active devices. Such devices may include, but are not limited to, capacitors, decoupling capacitors, resistors, inductors, fuses, diodes, transformers, sensors, electrostatic discharge (ESD) devices, and memory devices. More complex devices such as radio frequency (RF) devices, power amplifiers, power management devices, antennas, arrays, sensors, and microelectromechanical systems (MEMS) devices may also be formed on the interposer 1704. The package-on-interposer structure 1736 may take the form of any of the package-on-interposer structures known in the art.
The IC device assembly 1700 may include an IC package 1724 coupled to the first face 1740 of the circuit board 1702 by coupling components 1722. The coupling components 1722 may take the form of any of the embodiments discussed above with reference to the coupling components 1716, and the IC package 1724 may take the form of any of the embodiments discussed above with reference to the IC package 1720.
The IC device assembly 1700 illustrated in
A number of components are illustrated in
Additionally, in various embodiments, the computing device 1800 may not include one or more of the components illustrated in
The computing device 1800 may include a processing device 1802 (e.g., one or more processing devices). As used herein, the term “processing device” or “processor” may refer to any device or portion of a device that processes electronic data from registers and/or memory to transform that electronic data into other electronic data that may be stored in registers and/or memory. The processing device 1802 may include one or more digital signal processors (DSPs), application-specific ICs (ASICs), central processing units (CPUs), graphics processing units (GPUs), cryptoprocessors (specialized processors that execute cryptographic algorithms within hardware), server processors, or any other suitable processing devices. The computing device 1800 may include a memory 1804, which may itself include one or more memory devices such as volatile memory (e.g., dynamic random-access memory (DRAM)), nonvolatile memory (e.g., read-only memory (ROM)), flash memory, solid state memory, and/or a hard drive. In some embodiments, the memory 1804 may include memory that shares a die with the processing device 1802. This memory may be used as cache memory and may include embedded dynamic random-access memory (eDRAM) or spin transfer torque magnetic random-access memory (STT-MRAM).
In some embodiments, the computing device 1800 may include a communication chip 1812 (e.g., one or more communication chips). For example, the communication chip 1812 may be configured for managing wireless communications for the transfer of data to and from the computing device 1800. The term “wireless” and its derivatives may be used to describe circuits, devices, systems, methods, techniques, communications channels, etc., that may communicate data through the use of modulated electromagnetic radiation through a nonsolid medium. The term does not imply that the associated devices do not contain any wires, although in some embodiments they might not.
The communication chip 1812 may implement any of a number of wireless standards or protocols, including but not limited to Institute for Electrical and Electronic Engineers (IEEE) standards including Wi-Fi (IEEE 802.11 family), IEEE 802.16 standards (e.g., IEEE 802.16-2005 Amendment), Long-Term Evolution (LTE) project along with any amendments, updates, and/or revisions (e.g., advanced LTE project, ultramobile broadband (UMB) project (also referred to as “3GPP2”), etc.). IEEE 802.16 compatible Broadband Wireless Access (BWA) networks are generally referred to as WiMAX networks, an acronym that stands for Worldwide Interoperability for Microwave Access, which is a certification mark for products that pass conformity and interoperability tests for the IEEE 802.16 standards. The communication chip 1812 may operate in accordance with a Global System for Mobile Communication (GSM), General Packet Radio Service (GPRS), Universal Mobile Telecommunications System (UMTS), High-Speed Packet Access (HSPA), Evolved HSPA (E-HSPA), or LTE network. The communication chip 1812 may operate in accordance with Enhanced Data for GSM Evolution (EDGE), GSM EDGE Radio Access Network (GERAN), Universal Terrestrial Radio Access Network (UTRAN), or Evolved UTRAN (E-UTRAN). The communication chip 1812 may operate in accordance with Code Division Multiple Access (CDMA), Time Division Multiple Access (TDMA), Digital Enhanced Cordless Telecommunications (DECT), Evolution-Data Optimized (EV-DO), and derivatives thereof, as well as any other wireless protocols that are designated as 3G, 4G, 5G, and beyond. The communication chip 1812 may operate in accordance with other wireless protocols in other embodiments. The computing device 1800 may include an antenna 1822 to facilitate wireless communications and/or to receive other wireless communications (such as AM or FM radio transmissions).
In some embodiments, the communication chip 1812 may manage wired communications, such as electrical, optical, or any other suitable communication protocols (e.g., the Ethernet). As noted above, the communication chip 1812 may include multiple communication chips. For instance, a first communication chip 1812 may be dedicated to shorter-range wireless communications such as Wi-Fi or Bluetooth, and a second communication chip 1812 may be dedicated to longer-range wireless communications such as global positioning system (GPS), EDGE, GPRS, CDMA, WiMAX, LTE, EV-DO, or others. In some embodiments, a first communication chip 1812 may be dedicated to wireless communications, and a second communication chip 1812 may be dedicated to wired communications.
The computing device 1800 may include battery/power circuitry 1814. The battery/power circuitry 1814 may include one or more energy storage devices (e.g., batteries or capacitors) and/or circuitry for coupling components of the computing device 1800 to an energy source separate from the computing device 1800 (e.g., AC line power).
The computing device 1800 may include a display device 1806 (or corresponding interface circuitry, as discussed above). The display device 1806 may include any visual indicators, such as a heads-up display, a computer monitor, a projector, a touchscreen display, a liquid crystal display (LCD), a light-emitting diode display, or a flat panel display, for example.
The computing device 1800 may include an audio output device 1808 (or corresponding interface circuitry, as discussed above). The audio output device 1808 may include any device that generates an audible indicator, such as speakers, headsets, or earbuds, for example.
The computing device 1800 may include an audio input device 1824 (or corresponding interface circuitry, as discussed above). The audio input device 1824 may include any device that generates a signal representative of a sound, such as microphones, microphone arrays, or digital instruments (e.g., instruments having a musical instrument digital interface (MIDI) output).
The computing device 1800 may include a GPS device 1818 (or corresponding interface circuitry, as discussed above). The GPS device 1818 may be in communication with a satellite-based system and may receive a location of the computing device 1800, as known in the art.
The computing device 1800 may include an other output device 1810 (or corresponding interface circuitry, as discussed above). Examples of the other output device 1810 may include an audio codec, a video codec, a printer, a wired or wireless transmitter for providing information to other devices, or an additional storage device.
The computing device 1800 may include an other input device 1820 (or corresponding interface circuitry, as discussed above). Examples of the other input device 1820 may include an accelerometer, a gyroscope, a compass, an image capture device, a keyboard, a cursor control device such as a mouse, a stylus, a touchpad, a bar code reader, a Quick Response (QR) code reader, any sensor, or a radio frequency identification (RFID) reader.
The computing device 1800 may have any desired form factor, such as a hand-held or mobile computing device (e.g., a cell phone, a smart phone, a mobile internet device, a music player, a tablet computer, a laptop computer, a netbook computer, an ultrabook computer, a personal digital assistant (PDA), an ultramobile personal computer, etc.), a desktop computing device, a server or other networked computing component, a printer, a scanner, a monitor, a set-top box, an entertainment control unit, a vehicle control unit, a digital camera, a digital video recorder, or a wearable computing device. In some embodiments, the computing device 1800 may be any other electronic device that processes data.
The following paragraphs provide various examples of the embodiments disclosed herein.
Example 1 provides a hybrid IC assembly including a first IC structure including a waveguide formed of a substantially monocrystalline material, the first IC structure having a front face; a second IC structure including at least one electronic circuit element, the second IC structure having a back face; and a bonding layer between the front face of the first IC structure and the back face of the second IC structure, the bonding layer including a bonding material having a lower crystallinity than the waveguide.
Example 2 provides the hybrid IC assembly according to example 1, where the first IC structure is a hybrid IC structure that further includes at least one electronic circuit element.
Example 3 provides the hybrid IC assembly according to example 1 or 2, where the second IC structure is a hybrid IC structure that further includes a second waveguide.
Example 4 provides the hybrid IC assembly according to example 1, where the at least one electronic circuit element includes a heating element located proximate to an optical element, the heating element to modulate a wavelength of light in the optical element.
Example 5 provides the hybrid IC assembly according to example 4, where the optical element is in the second IC structure.
Example 6 provides the hybrid IC assembly according to example 4, where the optical element is in the first IC structure.
Example 7 provides the hybrid IC assembly according to example 6, where the optical element is formed on a front side of the first IC structure, and the heating element is on a back side of the second IC structure.
Example 8 provides the hybrid IC assembly according to example 1, where the optical waveguide couples a first portion of the IC assembly to a second portion of the IC assembly.
Example 9 provides the hybrid IC assembly according to example 8, where the first portion of the IC assembly is the first IC structure, the second portion of the IC assembly is the second IC structure, and the optical waveguide includes an optical via that couples the first IC structure and the second IC structure through the bonding layer.
Example 10 provides the hybrid IC assembly according to example 8, where the first portion of the IC assembly is a first electronics portion of the first IC structure, and the second portion of the IC assembly is a second electronics portion of the first IC structure.
Example 11 provides the hybrid IC assembly according to any of the preceding examples, where the substantially monocrystalline material has a grain size of at least 5 nanometers, e.g., at least 100 nanometers.
Example 12 provides the hybrid IC assembly according to any of the preceding examples, where the bonding layer is a polycrystalline material.
Example 13 provides the hybrid IC assembly according to example 12, where the bonding layer has a grain size between 1 and 20 nanometers, e.g., between 5 nm and 10 nm.
Example 14 provides the hybrid IC assembly according to any of examples 1 through 11, where the bonding layer is an amorphous material.
Example 15 provides the hybrid IC assembly according to any of the preceding examples, where the second IC structure includes a plurality of memory cells.
Example 16 provides the hybrid IC assembly according to any of examples 1-14, where the second IC structure is a processing device.
Example 17 provides a hybrid IC assembly including a first plurality of interconnected electronic logic devices in a first region of the hybrid IC assembly; a second plurality of interconnected electronic logic devices in a second region of the hybrid IC assembly; and an optical waveguide coupled between the first plurality of interconnected electronic logic devices and the second plurality of interconnected electronic logic devices; where the first plurality of interconnected electronic logic devices are in a first layer of the hybrid IC assembly, and the optical waveguide is in a second layer of the hybrid IC assembly.
Example 18 provides the hybrid IC assembly according to example 17, where the first region of the hybrid IC assembly includes a first portion of the first layer, and the second region of the hybrid IC assembly includes a second portion of the first layer.
Example 19 provides the hybrid IC assembly according to example 17, where the second region of the hybrid IC assembly is in the second layer of the hybrid IC assembly, and the optical waveguide is to transfer data from the first layer to the second layer.
Example 20 provides the hybrid IC assembly according to any of examples 17-19, further including a bonding layer between the first layer and the second layer, where the optical waveguide extends through the bonding layer.
Example 21 provides the hybrid IC assembly according to example 20, where the bonding layer includes a bonding material having a lower crystallinity than the optical waveguide.
Example 22 provides the hybrid IC assembly according to example 17, further including a first conversion circuitry that couples the first plurality of interconnected electronic logic devices to the optical waveguide and a second conversion circuitry that couples the second plurality of interconnected electronic logic devices to the optical waveguide.
Example 23 provides the hybrid IC assembly according to example 17, further including a second optical waveguide coupled between the first plurality of interconnected logic devices and an optical port.
Example 24 provides a hybrid IC assembly including an electronic layer including at least one electronic circuit element, the electronic layer having a back face; an optical layer including at least one waveguide formed of a substantially monocrystalline material, the first IC structure having a back face; and a bonding layer between the front face of the electronic layer and the back face of the optical layer.
Example 25 provides the hybrid IC assembly according to example 24, the bonding layer including a bonding material having a lower crystallinity than the waveguide.
Example 26 provides the hybrid IC assembly according to example 24 or 25, the optical layer including a waveguide layer and an isolation layer.
Example 27 provides the hybrid IC assembly according to example 26, where the bonding layer bonds the isolation layer to the electronic layer, and the at least one waveguide is formed over the isolation layer.
Example 28 provides the hybrid IC assembly according to example 26, where the isolation layer is formed over the at least one waveguide.
The above description of illustrated implementations of the disclosure, including what is described in the Abstract, is not intended to be exhaustive or to limit the disclosure to the precise forms disclosed. While specific implementations of, and examples for, the disclosure are described herein for illustrative purposes, various equivalent modifications are possible within the scope of the disclosure, as those skilled in the relevant art will recognize. These modifications may be made to the disclosure in light of the above detailed description.
