Claims
- 1. A pulsed laser, emitting energy at a plurality of selected, characteristic wavelengths within the visible and near infra-red regions of the spectrum, by dissociation of a plurality of selected metal dihalides, comprising:
- (a) enclosure means;
- (b) at least two metal halides from group II-B of the Periodic Table, present within said enclosure means;
- (c) an inert buffer gas, present within said enclosure means;
- (d) a heat source, for vaporization of said metal halides, capable of maintaining said enclosure means at a temperature of at least about 370.degree. C.;
- (e) a source of pulsed dissociative energy, located in proximity to said enclosure means and in communication therewith, for effecting dissociation of said vaporized metal halides;
- (f) pre-ionization means, located in proximity to said enclosure means and in communication therewith, for effecting ionization of the vaporized metal halides in concert with and during said pulsed dissociation; and
- (g) an optical cavity disposed about said enclosure means, comprising a reflective surface and a partially reflective surface, each aligned to permit pulsed emission of a portion of said laser energy.
- 2. The pulsed laser of claim 1, having a sealed enclosure means.
- 3. The pulsed laser of claim 2 wherein the group II-B metal halides are zinc iodide and cadmium iodide.
- 4. The pulsed laser of claim 1, having enclosure means wherein a uniform stream of vaporized metal halides in inert buffer gas flows therethrough.
- 5. The pulsed laser of claim 4 wherein the group II-B metal halides are mercury bromide and mercury iodide.
- 6. The pulsed laser of claim 1 wherein one or more of the group II-B metal halide components consists substantially of a single metal or halogen isotope.
- 7. The pulsed laser of claim 1 wherein the inert buffer gas is selected from the class consisting of helium, neon, argon, krypton, xenon, radon, nitrogen, hydrogen, and mixtures thereof.
- 8. The pulsed laser of claim 7 wherein the inert buffer gas is a substantially equimolar mixture of helium and hydrogen.
- 9. The pulsed laser of claim 1 wherein the heat source is capable of maintaining a temperature within the range from about 370.degree. to about 450.degree. C.
- 10. The pulsed laser of claim 1 wherein the source of dissociative energy comprises photons from an external laser.
- 11. The pulsed laser of claim 1 wherein the source of dissociative energy comprises electrons derived from a discharge apparatus.
- 12. The pulsed laser of claim 11 wherein there is present, together with the metal halides from group II-B in the enclosure means, a minor proportion of free group II-B metals corresponding to the metals of the metal halides.
- 13. The pulsed laser of claim 11 wherein the discharge apparatus includes electrodes plated with a substantially chemically inert and electrically conducting material.
- 14. The pulsed laser of claim 13 wherein the plating material is gold or platinum.
- 15. The pulsed laser of claim 11 wherein the discharge apparatus includes electrodes comprising nickel.
- 16. The pulsed laser of claim 1 wherein the partial pressure of each of the group II-B metal halides is within the range from about 0.1 to about 10 Torr.
- 17. The pulsed laser of claim 1 wherein the total pressure maintained within the enclosure means is within the range from about 0.1 to about 5 atmospheres.
- 18. A pulsed laser, for emission of energy by metal halide dissociation and comprising enclosure means, sources for heat and pulsed dissociation energy, and an optical cavity disposed about said enclosure means and capable of permitting pulsed emission of a portion of said laser energy, having at least two metal halides from Group II-B of the Periodic Table present within said enclosure means, and emitting energy at a plurality of selected, characteristic wavelengths within the visible and near infra-red regions of the spectrum.
- 19. The pulsed laser of claim 18 wherein a uniform stream of vaporized metal halides in inert buffer gas flows through the enclosure means.
- 20. The pulsed laser of claim 18 wherein the heat-source maintains said enclosure means at a temperature of at least about 370.degree. C.
BACKGROUND OF THE INVENTION
This invention was made with Government support under contract 79-0138, awarded by the Air Force Office of Scientific Research, and under contract N 00014-82-K-0209, awarded by the Office of Naval Research. The Government has certain rights in this invention.
US Referenced Citations (8)
Number |
Name |
Date |
Kind |
4126890 |
Fournier et al. |
Nov 1978 |
|
4168475 |
Schimitschek et al. |
Sep 1979 |
|
4228408 |
Schimitschek et al. |
Oct 1980 |
|
4229711 |
Schimitschek et al. |
Oct 1980 |
|
4230995 |
Burnham |
Oct 1980 |
|
4262267 |
Schimitschek et al. |
Apr 1981 |
|
4423510 |
Pack et al. |
Dec 1983 |
|
4505876 |
Womack |
Mar 1985 |
|
Non-Patent Literature Citations (2)
Entry |
Chou, et al., "Laser Operation by Dissociation of Metal Complexes", J. of Applied Physics; vol. 47, No. 3; Mar. 1976; pp. 1055-1061. |
Fahlen; Self-Heated, Multiple-Metal-Vapor Laser; IEEE J. of Quantum Electronics; Mar. 1976; pp. 200-201. |