Claims
- 1. A monomer comprising at least two dienophile groups and at least two ring structures which ring structures are characterized by the presence of two conjugated carbon-to-carbon double bonds and the presence of a leaving group L, wherein L is characterized that when the ring structure reacts with a dienophile group in the presence of an energy source, L is removed to form an aromatic ring structure.
- 2. The monomer of claim 1 wherein there are from two to four of the ring structures and from two to ten dienophile groups.
- 3. The monomer of claim 1 wherein the dienophile group is an acetylene group or a nitrile group.
- 4. The monomer of claim 1 wherein the dienophile group is an acetylene group.
- 5. The monomer of claim 1 wherein the ring structure is a cyclopentadienone group.
- 6. The monomer of claim 1 having the formula formula Z-X-Z or Z-X-Z′-X-Z wherein
Z is selected from 23Z′ is selected from 24and L is —O—, —S—, —N═N—, —(CO)—, —(SO2)—, or —O(CO)—; Y is independently in each occurrence hydrogen, an unsubstituted or inertly substituted aromatic group, an unsubstituted or inertly substituted alkyl group or —W—C≡C—V X is an unsubstituted or inertly substituted aromatic group or is —W—C≡C—W—and W is an unsubstituted or inertly substituted aromatic group, and V is hydrogen, an unsubstituted or inertly substituted aromatic group, or an unsubstituted or inertly substituted alkyl group; provided that at least two of the X and Y groups comprise an acetylene group.
- 7. A monomer of the formula
- 8. The monomer of claim 7 comprising two acetylene groups.
- 9. A composition comprising a monomer of the formula (II)
- 10. A composition comprising monomers of the formulas (III)
- 11. A composition comprising a monomer of the formula (IV)
- 12. A composition comprising a monomer of the formula (V)
- 13. A composition comprising a monomer of the formula (VI)
- 14. A composition comprising a monomer of the formula (VII)
- 15. A composition comprising at least one monomer selected from the group consisting of:
- 16. A composition comprising at least one monomer selected from:
- 16. The partially polymerized reaction product of a reaction mixture comprising the monomer of claim 1.
- 17. The partially polymerized reaction product of a reaction mixture comprising the monomer of claim 6.
- 18. The partially polymerized reaction product of a reaction mixture comprising the monomer of claim 7.
- 19 The partially polymerized reaction product of a reaction mixture comprising the monomer of claim 9.
- 20. The partially polymerized reaction product of claim 16 wherein the reaction mixture further comprises at least one additional monomer capable of undergoing a Diels-Alder reaction with the first monomer.
- 21. A highly crosslinked polymer made by polymerizing a reaction mixture comprising the monomer of claim 1.
- 22. A highly crosslinked polymer made by polymerizing a reaction mixture comprising the monomer of claim 6.
- 23. A highly crosslinked polymer made by polymerizing a reaction mixture comprising the monomer of claim 7.
- 24. A highly crosslinked polymer made by polymerizing a reaction mixture comprising the monomer of claim 9.
- 25. The highly crosslinked polymer of claim 21 wherein the reaction mixture further comprises at least one additional monomer capable of undergoing a Diels-Alder reaction with the first monomer.
- 26. A composition comprising an oligomer made by partially polymerizing the monomer of claim 1.
- 27. A composition comprising an oligomer made by partially polymerizing the monomer of claim 6.
- 28. A composition comprising an oligomer made by partially polymerizing the monomer of claim 7.
- 29. A composition comprising an oligomer made by partially polymerizing the monomer of claim 9.
- 30. The composition of claim 26 further comprising a porogen.
- 31. The composition of claim 29 further comprising a porogen.
- 32. The composition of claim 30 wherein the porogen is a polymer which has a molecular architecture selected from, crosslinked nanoparticle, linear, branched, hyperbranched, dendritic, star-like.
- 33. The composition of claim 31 wherein the porogen is a polymer which has a molecular architecture selected from, cross-linked nanoparticle, linear, branched, hyperbranched, dendritic, star-like.
- 34. The composition of claim 30 wherein the porogen is a crosslinked nanoparticle comprising a styrenic polymer.
- 35. The composition of claim 31 wherein the porogen is a crosslinked nanoparticle comprising a styrenic polymer.
- 36. A branched, crosslinkable oligomer or polymer comprising aromatic groups in the polymer backbone and comprising functional groups which groups are present in the backbone of the polymer, pendant to the backbone of the polymer and as terminal groups to the polymer chains wherein these functional groups are independently in each occurrence selected from the group of dienophile groups and ring structures which are characterized by the presence of two conjugated carbon-to-carbon double bonds and the presence of a leaving group, L, such that when the ring structure reacts with the dienophile group in the presence of an energy source, L is removed and an aromatic ring structure is formed.
- 37. The crosslinkable oligomer or polymer of claim 36 wherein the dienophile group is an acetylene group or an aromatic acetylene group.
- 38. The crosslinkable oligomer or polymer of claim 36 wherein the ring structure is a cyclopentadienone group.
- 39. The crosslinkable oligomer or polymer of claim 36 further comprising oxygen in the backbone.
- 40. The crosslinkable oligomer or polymer of claim 36 wherein the aromatic groups in the backbone are multivalent benzene rings.
- 41. A method of forming a film comprising a cross-linked aromatic polymer comprising providing a reaction mixture comprising the monomers of claim 1, partially polymerizing the monomers by heating to form a composition comprising oligomers, coating the composition of oligomers onto a substrate to form an uncured film and curing the uncured oligomer film by further heating to form the cross-linked aromatic polymer.
- 42. The method of claim 41 wherein the oligomers are coated by solvent coating.
- 43. The method of claim 41 wherein the substrate comprises a semiconducting material and transistors and the cross-linked aromatic polymer separates metal interconnects.
- 44. The method of claim 41 wherein the composition comprising oligomers further comprises a porogen.
- 45. The method of claim 44 wherein the monomer is the monomer of claim 9.
- 46. The method of claim 43 wherein the composition comprising oligomers further comprises a porogen.
- 47. The method of claim 44 wherein the porogen is removed by heating after the coating step.
- 48. The method of claim 47 wherein the porogen is removed after the curing step.
- 49. The method of claim 47 wherein the porogen is removed during the curing step.
- 50. The method of claim 46 wherein the porogen is removed after the coating step.
- 51. The method of claim 44 wherein the porogen is added prior to the partial polymerization step.
- 52. A porous film made by the method of claim 47.
- 53. An integrated circuit article made by the method of claim 50.
- 54. An article made by the method of claim 41.
- 55. An integrated circuit article made by the method of claim 43.
- 56. The method of claim 44 wherein the porogen is a cross-linked particle which is the reaction product of styrene and one aromatic compound having at least two ethylenically unsaturated substituent groups.
- 57. The method of claim 44 wherein the porogen is a polystyrene material.
- 58. The method of claim 44 wherein the porogen is a cross-linked polymeric particle with an average diameter of less than 30 nm.
- 59. The method of claim 58 further comprising removing the porogen by heating after the coating step.
- 60. An article made by the method of claim 59 wherein the percent porosity in the film is from 5 to 70% by volume and the average pore size is less than 30 nm.
Government Interests
[0001] This invention was made with United States Government support under Cooperative Agreement No. 70NANB8H4013 awarded by NIST. The United States Government has certain rights in the invention.
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
10078205 |
Feb 2002 |
US |
Child |
10365938 |
Feb 2003 |
US |