Number | Date | Country | Kind |
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90 05529 | May 1990 | FRX |
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4239819 | Holzl | Dec 1980 | |
4460669 | Ogawa et al. | Jul 1984 | |
4485146 | Mizuhashi et al. | Nov 1984 | |
4568614 | Eichen et al. | Feb 1986 | |
4666808 | Kawamura et al. | May 1987 | |
4668365 | Foster et al. | May 1987 | |
4683186 | Ohashi et al. | Jul 1987 | |
4737379 | Hudgens et al. | Apr 1988 | |
4777090 | Ovshinsky et al. | Nov 1988 | |
5116665 | Ganthier et al. | May 1992 |
Number | Date | Country |
---|---|---|
0289402 | Feb 1988 | EPX |
0345107 | Jun 1989 | EPX |
Entry |
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Thin Solid Films, vol. 148, No. 3, Apr. 27, 1987, pp. 285-291, Lausanne CH; J. E. Schoenholtz et al "Plasma-enhanced deposition of silicon oxynitride films". |