Number | Name | Date | Kind |
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5114529 | Masuyama et al. | May 1992 | |
5336326 | Karner et al. | Aug 1994 | |
5531862 | Otsubo et al. | Jul 1996 | |
5928427 | Hwang | Jul 1999 |
Entry |
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J. Reece Roth : Industrial Plasma Engineering, vol. 1, Principles, Institute of Physics Publishing, Bristol and Philadelphia, 1995, pp. 332, 438. |
Donald Smith : Thin-Film Deposition, Principle and Practice, McGraw-Hills, Inc., NY-Toronto, 1995, p. 511. |