Relative arrangement or disposition of electrodes; moving means

Industry

CPC
H01J37/32568

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32568Relative arrangement or disposition of electrodes; moving means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Edge seal for lower electrode assembly
- Patent number 12,368,025
- Issue date Jul 22, 2025
- Lam Research Corporation
- David Schaefer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,368,027
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Takatoshi Orui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,368,050
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Masahiko Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for controlling source frequ...
- Patent number 12,362,144
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,143
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Glow plasma stabilization
- Patent number 12,362,140
- Issue date Jul 15, 2025
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, method...
- Patent number 12,354,848
- Issue date Jul 8, 2025
- Kokusai Electric Corporation
- Yasunori Ejiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Susceptor assembly for plasma apparatus
- Patent number 12,347,644
- Issue date Jul 1, 2025
- ASM IP Holding B.V.
- Sam Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,340,985
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power return path
- Patent number 12,340,984
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Luke Bonecutter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,340,986
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Hiroyuki Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable plasma exclusion zone in semiconductor fabrication
- Patent number 12,340,987
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Che Wei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,334,305
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etcher uniformity control by tuning edge zone plasma sheath
- Patent number 12,334,314
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Lung Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active gas generation apparatus
- Patent number 12,327,711
- Issue date Jun 10, 2025
- TMEIC Corporation
- Ren Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage power supply apparatus and plasma etching equipment ha...
- Patent number 12,327,712
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Jihwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and method
- Patent number 12,327,748
- Issue date Jun 10, 2025
- PIOTECH INC.
- Zhuo Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 12,308,217
- Issue date May 20, 2025
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Power adjustment method of upper electrode power supply and semicon...
- Patent number 12,300,460
- Issue date May 13, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 12,283,461
- Issue date Apr 22, 2025
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,272,528
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus for coating of 3D-objects
- Patent number 12,272,525
- Issue date Apr 8, 2025
- EVATEC AG
- Stephan Voser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,266,511
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device
- Patent number 12,266,510
- Issue date Apr 1, 2025
- Clean Crop Technologies, Inc.
- Yaqoot Shaharyar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and cleaning method
- Patent number 12,261,024
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Wataru Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and dielectric window cleaning m...
- Patent number 12,257,608
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Chunming Liu
- B08 - CLEANING
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,261,021
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Hyun Bae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck device
- Patent number 12,249,492
- Issue date Mar 11, 2025
- Sumitomo Osaka Cement Co., Ltd.
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate support unit
- Patent number 12,249,491
- Issue date Mar 11, 2025
- Semes Co., Ltd.
- Hyoungkyu Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,723
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR WAFER PROCESSING APPARATUS
- Publication number 20250239436
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Seongha JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250232954
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Mitsuhiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250232961
- Publication date Jul 17, 2025
- Hitachi High-Tech Corporation
- Kazuya TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR-CORE COIL IN ANALOG CIRCUIT FILTERS FOR PLASMA PROCESSING
- Publication number 20250218748
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PROCESSING A SUBSTRATE AND METHOD OF PROCESSING A SUBS...
- Publication number 20250218749
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Ki Hoon CHOI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218843
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Iksu BYUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...
- Publication number 20250218739
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, ELECTRODE ASSEMBLY, SUBSTRATE PROCE...
- Publication number 20250218738
- Publication date Jul 3, 2025
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20250210324
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Tomohiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250210326
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250210322
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- HYUNJAE LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250210331
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takumi IMAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode and Coil Configurations For Processing Chambers and Relat...
- Publication number 20250210304
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE CONFIGURATIONS AND MAGNET CONFIGURATIONS FOR PROCESSING C...
- Publication number 20250210319
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250201533
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20250201520
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Hyun Bae KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, MET...
- Publication number 20250201594
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20250201532
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20250191888
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250191891
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIDEWALL PASSIVATION USING ALDEHYDE OR ISOCYANATE CHEMISTRY FOR HIG...
- Publication number 20250188600
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Eric A. Hudson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER...
- Publication number 20250188594
- Publication date Jun 12, 2025
- Evatec AG
- Jurgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20250166970
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT
- Publication number 20250166977
- Publication date May 22, 2025
- SEMES CO., LTD.
- HYOUNGKYU SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250157793
- Publication date May 15, 2025
- DAIHEN Corporation
- Ryoji TAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR CONTROLLING A SLOPE AND LOCATION OF AN UPPER ELECTRODE
- Publication number 20250149304
- Publication date May 8, 2025
- VM Inc.
- Sang Woo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149308
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250149310
- Publication date May 8, 2025
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149291
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149292
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- H01 - BASIC ELECTRIC ELEMENTS

Relative arrangement or disposition of electrodes; moving means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Edge seal for lower electrode assembly

Substrate processing method and substrate processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and method for controlling source frequ...

Plasma processing apparatus and plasma processing method

Glow plasma stabilization

Substrate processing apparatus, substrate processing method, method...

Susceptor assembly for plasma apparatus

Plasma processing apparatus and plasma processing method

Radio frequency power return path

Plasma processing apparatus and plasma processing method

Tunable plasma exclusion zone in semiconductor fabrication

Plasma processing apparatus

Dry etcher uniformity control by tuning edge zone plasma sheath

Active gas generation apparatus

High voltage power supply apparatus and plasma etching equipment ha...

Semiconductor processing apparatus and method

Apparatus for preventing contamination of self-plasma chamber

Power adjustment method of upper electrode power supply and semicon...

Systems and methods for achieving peak ion energy enhancement with...

Stage and plasma processing apparatus

Sputtering apparatus for coating of 3D-objects

Substrate support and substrate processing apparatus

Plasma treatment device

Plasma processing apparatus and cleaning method

Semiconductor processing apparatus and dielectric window cleaning m...

Apparatus and method for treating substrate

Electrostatic chuck device

Substrate treating apparatus and substrate support unit

Plasma processing apparatus

Patents Applicationslast 30 patents

SEMICONDUCTOR WAFER PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

PLASMA PROCESSING APPARATUS

AIR-CORE COIL IN ANALOG CIRCUIT FILTERS FOR PLASMA PROCESSING

APPARATUS OF PROCESSING A SUBSTRATE AND METHOD OF PROCESSING A SUBS...

SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...

SUBSTRATE PROCESSING APPARATUS, ELECTRODE ASSEMBLY, SUBSTRATE PROCE...

WAFER PLACEMENT TABLE

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Electrode and Coil Configurations For Processing Chambers and Relat...

ELECTRODE CONFIGURATIONS AND MAGNET CONFIGURATIONS FOR PROCESSING C...

PLASMA PROCESSING APPARATUS

APPARATUS AND METHOD FOR TREATING SUBSTRATE

MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, MET...

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SIDEWALL PASSIVATION USING ALDEHYDE OR ISOCYANATE CHEMISTRY FOR HIG...

VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER...

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT

PLASMA PROCESSING APPARATUS

SYSTEM FOR CONTROLLING A SLOPE AND LOCATION OF AN UPPER ELECTRODE

PLASMA PROCESSING APPARATUS

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS