Relative arrangement or disposition of electrodes; moving means

Industry

CPC
H01J37/32568

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32568Relative arrangement or disposition of electrodes; moving means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, method of processing substrate, met...
- Patent number 12,195,854
- Issue date Jan 14, 2025
- Kokusai Electric Corporation
- Teruo Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for forming an overcoat
- Patent number 12,198,741
- Issue date Jan 14, 2025
- Nanyang Technological University
- Rajdeep Singh Rawat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi racetrack cathodic arc
- Patent number 12,198,905
- Issue date Jan 14, 2025
- Vapor Technologies, Inc.
- Zachary Zembower
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 12,188,126
- Issue date Jan 7, 2025
- Jusung Engineering Co., Ltd.
- Jae Wan Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,191,121
- Issue date Jan 7, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with spatially tunable RF coupling to a wafer
- Patent number 12,191,122
- Issue date Jan 7, 2025
- Lam Research Corporation
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,124
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuo Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,176,187
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma generation
- Patent number 12,159,765
- Issue date Dec 3, 2024
- MKS Instruments, Inc.
- Ron Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,148,598
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control in pulsed DC plasma chamber
- Patent number 12,148,595
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for substrate transport in vacuum processing systems
- Patent number 12,142,463
- Issue date Nov 12, 2024
- VON ARDENNE Asset GmbH & Co. KG
- Falk Milde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
- Patent number 12,142,469
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with multiple radio frequency meshes to control...
- Patent number 12,136,536
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,125,672
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer support device
- Patent number 12,119,212
- Issue date Oct 15, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotating biasable pedestal and electrostatic chuck in semiconductor...
- Patent number 12,112,972
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system
- Patent number 12,112,920
- Issue date Oct 8, 2024
- Samsung Electronics Co., Ltd.
- Jaewon Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus having a middle electrode
- Patent number 12,106,977
- Issue date Oct 1, 2024
- SK hynix Inc.
- Jin Ho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interlocking fastening upper electrode assembly having improved fas...
- Patent number 12,104,638
- Issue date Oct 1, 2024
- TEM CO., LTD.
- Jin Kyung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of plasma generation with microwaves
- Patent number 12,106,939
- Issue date Oct 1, 2024
- Rimere, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom electrode assembly, plasma processing apparatus, and method...
- Patent number 12,094,693
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Jiangtao Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for disinfection of healthcare personal protectiv...
- Patent number 12,090,240
- Issue date Sep 17, 2024
- MagPlasma, Inc.
- Martin E. Toomajian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and system
- Patent number 12,087,591
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,087,556
- Issue date Sep 10, 2024
- Kioxia Corporation
- Yosuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 12,080,526
- Issue date Sep 3, 2024
- Jusung Engineering Co., Ltd.
- Woong Kyo Oh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20250037971
- Publication date Jan 30, 2025
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250029817
- Publication date Jan 23, 2025
- JUSUNG ENGINEERING CO., LTD.
- WOONG KYO OH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Systems And Methods Of Plasma Generation With Microwaves
- Publication number 20250022685
- Publication date Jan 16, 2025
- Rimere, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...
- Publication number 20250022694
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Pranav Vijay Gadre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...
- Publication number 20250022745
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA
- Publication number 20250014871
- Publication date Jan 9, 2025
- Samsung Electronics Co., Ltd.
- Sungwon CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE
- Publication number 20250006470
- Publication date Jan 2, 2025
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240429027
- Publication date Dec 26, 2024
- TOKYO ELECTRON LIMITED
- Noriyuki SAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240429028
- Publication date Dec 26, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Kensuke WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240429029
- Publication date Dec 26, 2024
- DAIHEN Corporation
- Ryoji TAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT DEVICE
- Publication number 20240429032
- Publication date Dec 26, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE
- Publication number 20240429070
- Publication date Dec 26, 2024
- SK HYNIX INC.
- Jin Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240420923
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Manabu ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR CARBON PLUG FORMATION
- Publication number 20240420927
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...
- Publication number 20240420929
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXTRACTION OPTICS HAVING NON UNIFORM GRID ASSEMBLY
- Publication number 20240412956
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Costel BILOIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...
- Publication number 20240412957
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Gautam PISHARODY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240412951
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- DONG-HUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...
- Publication number 20240412989
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Young Eun JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY
- Publication number 20240404834
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Hsun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404801
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CANTILEVER WITH ETCH CHAMBER FLOW DESIGN
- Publication number 20240387147
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHER UNIFORMITY CONTROL BY TUNING EDGE ZONE PLASMA SHEATH
- Publication number 20240387152
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Lung HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION
- Publication number 20240387148
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Che Wei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240379328
- Publication date Nov 14, 2024
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20240379332
- Publication date Nov 14, 2024
- PSK INC.
- Kwang-Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Method, Apparatus, and System
- Publication number 20240363405
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Masato SAKAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING
- Publication number 20240355586
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE
- Publication number 20240355592
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING
- Publication number 20240355587
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS

Relative arrangement or disposition of electrodes; moving means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus, method of processing substrate, met...

Apparatus and method for forming an overcoat

Multi racetrack cathodic arc

Substrate processing apparatus

Plasma processing apparatus

Electrostatic chuck with spatially tunable RF coupling to a wafer

Plasma processing apparatus and plasma processing method

Cleaning method and plasma processing apparatus

Substrate processing apparatus and interlock method thereof

Spatial control of plasma processing environments

Method and apparatus for plasma generation

Etching apparatus and etching method

Plasma processing apparatus

Plasma uniformity control in pulsed DC plasma chamber

Device and method for substrate transport in vacuum processing systems

Control of plasma sheath with bias supplies

Plasma processing chambers configured for tunable substrate and edg...

Electrostatic chuck with multiple radio frequency meshes to control...

Plasma processing method and plasma processing apparatus

Wafer support device

Rotating biasable pedestal and electrostatic chuck in semiconductor...

Plasma processing system

Substrate processing apparatus having a middle electrode

Interlocking fastening upper electrode assembly having improved fas...

Systems and methods of plasma generation with microwaves

Bottom electrode assembly, plasma processing apparatus, and method...

Method and device for disinfection of healthcare personal protectiv...

Plasma processing apparatus and system

Plasma processing apparatus and plasma processing method

Substrate processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING DEVICE

SUBSTRATE PROCESSING APPARATUS

Systems And Methods Of Plasma Generation With Microwaves

HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...

Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...

SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA

EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE

PLASMA PROCESSING APPARATUS

ACTIVE GAS GENERATION APPARATUS

PLASMA PROCESSING APPARATUS

WAFER SUPPORT DEVICE

SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE

PLASMA PROCESSING APPARATUS

SYSTEM AND METHOD FOR CARBON PLUG FORMATION

EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...

ION EXTRACTION OPTICS HAVING NON UNIFORM GRID ASSEMBLY

HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...

METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY

PLASMA TREATMENT APPARATUS

CANTILEVER WITH ETCH CHAMBER FLOW DESIGN

DRY ETCHER UNIFORMITY CONTROL BY TUNING EDGE ZONE PLASMA SHEATH

TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION

PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS

APPARATUS FOR PROCESSING SUBSTRATE

Substrate Processing Method, Apparatus, and System

MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING

UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE

MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING