Claims
- 1. A negative-working image forming process which comprises uniformly exposing a photosensitive material comprising a support having thereon a sensitive layer comprising an admixture of (i) an O-quinonediazide compound and (ii) a second compound selected from the group consisting of diazo dyes, anthraquinone dyes, quinoneimine dyes, methine dyes, copper phthalocyanine dyes and dyes having amino groups, alkylamino groups or hydroxyl groups as an auxochrome, to actinic radiation which is able to convert the o-quinonediazide compound to the corresponding indenecarboxylic acid compound, and subsequent to said uniformly exposing imagewise exposing said exposed photosensitive material to a laser beam to thereby render the indenecarboxylic acid compound of the imagewise exposed areas converted to the corresponding indene compound and developing with an alkaline developing solution to dissolve out the unexposed area to the laser beam, wherein said second compound reduces the rate of dissolution of the laser exposed areas in the developing solution by converting the indenecarboxylic acid to the corresponding indene compound, whereby said image results.
- 2. The process of claim 1, wherein said second compound is a combination of said dye and at least one member selected from the group consisting of secondary or tertiary, aliphatic or aromatic amines, compounds of formula (I) below, compounds of formula (II) below, and hydroxy benzene compounds and carbonyl group-containing compounds ##STR61## wherein X represents ##STR62## and Ra, Rb, Rc and Y each represents an organic atom group having no carboxyl group and ##STR63## wherein X represents S, O, Se, Te or C(CH.sub.3).sub.2, Y and Z represent each C or N, R.sub.9 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, and R.sub.10, R.sub.11, R.sub.12 and R.sub.13 represent each a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group, a nitro group, an amino group, a halogen atom, a nitril group, a formyl group, a hydroxyl group, an alkoxycarbonyl group or an aryloxycarbonyl group, or --CH.dbd.CH--CH.dbd.CH-- by which R.sub.10 and R.sub.11 or R.sub.12 and R.sub.13 form a cyclic group upon linking each other.
- 3. The process of claim 1, wherein said dye is present in an amount of about 0.005 to about 1 part by weight based on 1 part by weight of o-quinonediazide compound.
- 4. The process of claim 1, wherein said actinic radiation is light having a wavelength of about 290 to 500 nm.
- 5. The process of claim 1, wherein said laser is an argon ion laser.
- 6. The process of claim 1, wherein said o-quinonediazide compound is selected from the group consisting of 2,2'-dihydroxy-diphenyl-bis(naphthoqhinone-1,2-diazide-5-sulfonic acid ester), 1,1',4,4'-tetrahydroxydiphenyl-tetra(naphthoquinone-1,2-diazide-5-sulfonic acid ester), 2,3,4-trioxybenzophenone-bis(naphthoquinone-1,2-diazide-5-sulfonic acid ester), and naphthoquinone-1,2-diazide-5-sulfonic acid esters of polyhydroxyphenols prepared by polycondensation of acetone and pyrogallol.
Priority Claims (1)
Number |
Date |
Country |
Kind |
53-134270 |
Oct 1978 |
JPX |
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CROSS REFERENCE TO RELATED APPLICATION
This application is a continuation of U.S. application Ser. No. 300,822 filed Sept. 10, 1981, now abandoned which in turn is a continuation-in-part of U.S. application Ser. No. 89,846, now abandoned entitled Image Forming Process, now abandoned.
US Referenced Citations (10)
Foreign Referenced Citations (1)
Number |
Date |
Country |
2547905 |
Apr 1977 |
DEX |
Non-Patent Literature Citations (1)
Entry |
Dinaburg, M. S., "Photosensitive Diazo Cpds", Focal Press, 1964, pp. 21-25. |
Continuations (1)
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Number |
Date |
Country |
Parent |
300822 |
Sep 1981 |
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Continuation in Parts (1)
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Number |
Date |
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Parent |
089846 |
Oct 1979 |
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