Claims
- 1. A negative-working photosensitive composition comprising:
(A) a film-forming polymer (B) an unsaturated compound having a radical polymerizable ethylenic double bond, (C) a photopolymerization initiator, (D) a thermal polymerization inhibitor, and (E) at least one member selected from compounds represented by the following formula:
5in an amount of 3.5 wt % or less based on the weight of the photosensitive resin composition.
- 2. The negative-working photosensitive resin composition according to claim 1, wherein the amount of component (E) is in the range of 0.5-2.0 wt % based on the weight of the photosensitive resin composition.
- 3. The negative-working photosensitive resin composition according to claim 1, wherein the amount of component (E) is in the range of 1.0-1.5 wt % based on the weight of the photosensitive resin composition.
- 4. The negative-working photosensitive resin composition according to claim 1, wherein component (E) is p-toluenesulfonamide.
- 5. The negative-working photosensitive resin composition according to claim 1, wherein component (A) is a water-soluble polymer.
Priority Claims (1)
Number |
Date |
Country |
Kind |
10-071513 |
Mar 1998 |
JP |
|
Parent Case Info
[0001] [0001] This is a continuation-in-part of Ser. No. 09/262,077, filed Mar. 4, 1999.
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09262077 |
Mar 1999 |
US |
Child |
09739750 |
Dec 2000 |
US |