BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a diagram showing a schematic structure of a nonvolatile semiconductor memory 200 according to a first embodiment, FIG. 2 is a view showing sectional structures of a memory cell and a select transistor which are to be used in the nonvolatile semiconductor memory 200,
FIG. 3 is a view showing a sectional structure of an NAND type memory cell array to be used in the nonvolatile semiconductor memory 200,
FIG. 4 is a diagram showing structures of a memory cell array and a bit line control circuit in the nonvolatile semiconductor memory 200,
FIG. 5(
a) is a diagram showing a relationship between data of a memory cell and a threshold voltage distribution of the memory cell in the case in which a writing operation is carried out in order of a second page and a first page and FIG. 5(b) is a diagram showing a relationship between the data of the memory cell and the threshold voltage distribution of the memory cell in the case in which the writing operation is carried out in order of the first page and the second page,
FIG. 6 is a diagram showing the relationship between the data of the memory cell and the threshold voltage distribution of the memory cell in the case in which the writing operation is carried out in order of the second page and the first page,
FIG. 7 is a diagram showing the relationship between the data of the memory cell and the threshold voltage distribution of the memory cell in the case in which the writing operation is carried out in order of the first page and the second page,
FIG. 8 is a flowchart for explaining a reading operation (a read operation) of the nonvolatile semiconductor memory 200 according to the first embodiment,
FIG. 9 is a flowchart for explaining a writing operation (a first page programming operation) of the nonvolatile semiconductor memory 200 according to the first embodiment,
FIG. 10 is a flowchart for explaining a writing operation (a second page programming operation) of the nonvolatile semiconductor memory 200 according to the first embodiment,
FIG. 11 is a diagram showing a structure of a nonvolatile semiconductor memory 200 according to a second embodiment,
FIG. 12 is a diagram showing a relationship between a threshold voltage distribution and data of a memory cell in a nonvolatile semiconductor memory described in JP-A-2001-93288, and writing and reading methods, and
FIG. 13 is a diagram showing a relationship between the data of the memory cell in the nonvolatile semiconductor memory described in JP-A-2001-93288 and write and read data.