The present invention relates to a coater in an optical process, particularly to a nozzle cleaning device for a coater and a coater provided with it.
There is a widespread gelatin problem with a photoresist coating platform used in the display manufacturing process. That is, after the photoresist coating is completed, there is frequently partially solidified photoresist residue left at the tip and surroundings of the nozzle. When the nozzle is used next time for coating, the photoresist residue may obstruct the channel through which the photoresist is sprayed, which may affect the quality of the subsequently processed products. Therefore, in the prior art, before each glass plate is coated with photoresist, a cleaner made of rubber is usually used to wipe the photoresist residue off the tip of the nozzle. However, due to the great elasticity of the rubber itself, the cleaner is often unable to closely fit with the nozzle, and thus it is difficult to clean the tip of the nozzle effectively. Besides, with most of the rubber materials have very poor absorbency, it is difficult to adsorb and remove photoresist when the nozzle is wiped with rubber, making the photoresist wiped away still remain at the tip of the nozzle, causing the nozzle to be dirtier.
For the above problem, another commonly used solution is to coat the inner portion and surroundings of the nozzle with a film made of particular nanomaterials, so as to increase the lubricity of the tip of the nozzle, prevent retention and accumulation of the photoresist material in the vicinity of the nozzle, and thereby keep the nozzle clean. But this method needs to use expensive nanomaterials and has a high cost.
The object of the present invention is to provide a nozzle cleaning device that can suck the photoresist residue off the tip and surroundings of the nozzle through vacuuming as well as a coater provided with the nozzle cleaning device, so as to overcome the defect that the rubber cleaner cannot clean the nozzle of the coater completely in the prior art.
A nozzle cleaning device is provided, comprising a cleaner, a vacuum pipe and a vacuum pump; the cleaner has a recessed hole coinciding in shape with the nozzle of the coater for receiving the nozzle of the coater, and the inner wall of the recessed hole is provided with a plurality of through-holes; one end of the vacuum pipe is connected to said a plurality of through-holes, and the other end of the vacuum pipe is connected to the vacuum pump.
In the nozzle cleaning device, the through-holes are arranged at the bottom of the inner wall of the recessed hole.
In the nozzle cleaning device, the through-holes are also arranged at both sides of the inner wall of the recessed hole.
In the nozzle cleaning device, the cleaner is made of rubber material.
A coater is also provided, comprising:
a coating liquid output device filled with coating liquid, including a nozzle through which the coating liquid is sprayed;
a nozzle cleaning device including a cleaner, a vacuum pipe and a vacuum pump, the cleaner has a recessed hole coinciding in shape with the nozzle of the coater for receiving the nozzle of the coater, the inner wall of the recessed hole is provided with a plurality of through-holes; one end of the vacuum pipe is connected to said a plurality of through-holes, and the other end of the vacuum pipe is connected to the vacuum pump; and
a transmission device connected to the bottom of the cleaning device, operable to controlling the movement of the cleaning device and providing a driving force to make the cleaning device up and down.
In the coater, the cleaning device includes a base, to which the transmission device is connected for supporting the cleaning device.
In the coater, the length of the cleaner is it as that of the nozzle.
In the coater, the through-holes are arranged at the bottom of the inner wall of the recessed hole.
In the coater, the through-holes at the bottom of the recessed hole are offset with respect to the internal pipe of the nozzle of the coater.
In the coater, the through-holes are also arranged at both sides of the inner wall of the recessed hole.
A coater is provided, comprising:
a coating liquid output device filled with coating liquid, including a nozzle through which the coating liquid is sprayed; and
a nozzle cleaning device including a cleaner, a vacuum pipe, a vacuum pump, and a movable base; the cleaner is mounted on the base and it has a recessed hole coinciding in shape with the nozzle of the coater for receiving the nozzle of the coater, the inner wall of the recessed hole is provided with a plurality of through-holes; one end of the vacuum pipe is connected to said a plurality of through-holes, and the other end of the vacuum pipe is connected to the vacuum pump
In the coater, the length of the cleaner is it as that of the nozzle.
In the coater, the through-holes are arranged at the bottom of the inner wall of the recessed hole.
In the coater, the through-holes at the bottom of the recessed hole are offset with respect to the internal pipe of the nozzle of the coater.
In the coater, the through-holes are also arranged at both sides of the inner wall of the recessed hole.
Through the nozzle cleaning device and a coater provided with it according to the present invention, the following beneficial effects can be obtained: The rubber cleaner is additionally provided with a plurality of through-holes which are connected to the vacuum pump through the vacuum pipe; the photoresist residue at the tip and surroundings of the nozzle is sucked into the vacuum pipe by vacuuming, thus getting the nozzle of the coater cleaned. The nozzle cleaning device of the present invention can be used conveniently to remove the photoresist residue so as to clean the nozzle, which effectively improves the product yield and the production efficiency, and reduces the cost due to needing no expensive nanomaterials.
The nozzle cleaning device and the coater provided with it according to the present invention will be explained further with reference to appending drawings and embodiments. In the drawings:
A nozzle cleaning device and a coater provided with it are provided to thoroughly remove the photoresist residue around the nozzle of the coater, thereby solving the corresponding product quality problem and improving the product yield. The nozzle cleaning device of the coater in the present invention is preferably used for cleaning the photoresist coating platform in the preceding process of the thin film transistor liquid crystal display (TFT-LCD) process; in different embodiments, it can also be applied to the high precision processes such as a semiconductor process or the like, or other processes that need prevention of gel formation.
Referring to
In the preferred embodiment shown in
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It should be understood that those skilled in the art can make improvement or transformation according to the above contents, which shall all fall within the scope of protection of the claims of the present invention.
Number | Date | Country | Kind |
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201310008969.9 | Jan 2013 | CN | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/CN2013/070980 | 1/25/2013 | WO | 00 | 3/18/2013 |