Coating processes Apparatus therefor

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/16Coating processes Apparatus therefor

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for forming a resist fine pattern
- Patent number 12,365,190
- Issue date Jul 22, 2025
- UNIJET CO., LTD.
- Seog-soon Kim
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Solvent annealing of an organic planarization layer
- Patent number 12,362,168
- Issue date Jul 15, 2025
- International Business Machines Corporation
- Jing Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stabilized interfaces of inorganic radiation patterning composition...
- Patent number 12,360,454
- Issue date Jul 15, 2025
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Poly(cyanocinnamate)s for structural and optical applications
- Patent number 12,360,455
- Issue date Jul 15, 2025
- Brewer Science, Inc.
- Tony D. Flaim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method and apparatus for coating photo resist over a substrate
- Patent number 12,362,179
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung-Hung Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cup, liquid processing apparatus, and liquid processing method
- Patent number 12,358,016
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Ryunosuke Higashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,353,120
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Che Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist system and method
- Patent number 12,353,134
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flow cell coating methods
- Patent number 12,353,136
- Issue date Jul 8, 2025
- Illumina, Inc.
- Neil Brahma
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Liquid supplying device
- Patent number 12,343,754
- Issue date Jul 1, 2025
- Koganei Corporation
- Takeo Yajima
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,347,683
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing Hong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a master for a replication process
- Patent number 12,346,024
- Issue date Jul 1, 2025
- AMS-OSRAM ASIA PACIFIC PTE. LTD.
- Ji Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,334,386
- Issue date Jun 17, 2025
- Semes Co., Ltd.
- Kiwon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bubble measurement unit, substrate treating apparatus including the...
- Patent number 12,320,735
- Issue date Jun 3, 2025
- Semes Co., Ltd.
- Jung Suk Goh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support member, substrate treatment apparatus, and substr...
- Patent number 12,321,098
- Issue date Jun 3, 2025
- Tokyo Electron Limited
- Hitoshi Hashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment condition setting method, storage medium, and substrate t...
- Patent number 12,314,023
- Issue date May 27, 2025
- Tokyo Electron Limited
- Takuya Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Storage container storing treatment liquid for manufacturing semico...
- Patent number 12,313,976
- Issue date May 27, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 12,313,974
- Issue date May 27, 2025
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating and development equipment
- Patent number 12,306,537
- Issue date May 20, 2025
- KINGSEMI CO., LTD.
- Xudong Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin patterning materials with ligands having silicon/germaniu...
- Patent number 12,298,666
- Issue date May 13, 2025
- Inpria Corporation
- Robert E. Jilek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,300,487
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Yu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adhesion layer for multi-layer photoresist
- Patent number 12,292,684
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,292,685
- Issue date May 6, 2025
- SCREEN Holdings Co., Ltd.
- Jun Komori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist and method of formation and use
- Patent number 12,287,575
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modifying hydrophobicity of a wafer surface using an organosilicon...
- Patent number 12,288,685
- Issue date Apr 29, 2025
- Lam Research Corporation
- Jeremy D. Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and/or system for coating a substrate
- Patent number 12,283,499
- Issue date Apr 22, 2025
- Service Support Specialties, Inc
- Gary Hillman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist deposition using independent multichannel showerhead
- Patent number 12,282,256
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Farzad Houshmand
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern decomposition lithography techniques
- Patent number 12,278,204
- Issue date Apr 15, 2025
- Intel Corporation
- Charles H. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING SYSTEM
- Publication number 20250239454
- Publication date Jul 24, 2025
- SCREEN Holdings Co., Ltd.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...
- Publication number 20250237949
- Publication date Jul 24, 2025
- Merck Patent GmbH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONITORING APPARATUS, SUBSTRATE PROCESSING APPARATUS, MONITORING ME...
- Publication number 20250240390
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
WAFER HOLDER APPARATUS, SYSTEM AND METHOD OF FORMING SAME
- Publication number 20250231490
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Heng-Wei Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD...
- Publication number 20250231484
- Publication date Jul 17, 2025
- Sumitomo Chemical Company, Limited
- Masaru HATABE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ANTI-REFLECTIVE COATING COMPOSITION
- Publication number 20250231488
- Publication date Jul 17, 2025
- TAN KAH KEE INNOVATION LABORATORY
- Aiqiang Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...
- Publication number 20250231492
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SLANTED OPTICAL GRATINGS
- Publication number 20250224548
- Publication date Jul 10, 2025
- NIL TECHNOLOGY APS
- Niklas Hansson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS AND PHOTORESIST FILM
- Publication number 20250224669
- Publication date Jul 10, 2025
- Samsung SDI Co., Ltd.
- Changsoo WOO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST DEPOSITION USING INDEPENDENT MULTICHANNEL SHOWERHEAD
- Publication number 20250224678
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Farzad Houshmand
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...
- Publication number 20250224680
- Publication date Jul 10, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226223
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST AND METHOD OF FORMATION AND USE
- Publication number 20250224673
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Keng-Chu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20250224679
- Publication date Jul 10, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EDGE BEAD REMOVAL METHOD, SUBSTRATE TREATMENT APPARATUS PERFORMING...
- Publication number 20250216787
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Sung Gyu LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BUBBLE DEFECT REDUCTION
- Publication number 20250216788
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Akhil N. Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUCT STRUCTURE, STOCKER, AND PHOTORESIST BOTTLE MANAGEMENT FACILITIES
- Publication number 20250216100
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Sang Hoon KIM
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE
- Publication number 20250218775
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY...
- Publication number 20250207247
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PAINTING METHOD
- Publication number 20250208515
- Publication date Jun 26, 2025
- ASUSTEK COMPUTER INC.
- Guo-Lin YANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208510
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208506
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208512
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208509
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR MAKING EUV PATTERNABLE HARD MASKS
- Publication number 20250201553
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Chenghao Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLE CARRIER AND METHOD FOR MANUFACTURING AUXILIARY STRUCTURE IN...
- Publication number 20250201610
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lu-Chih LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...
- Publication number 20250188223
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...
- Publication number 20250189892
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20250189887
- Publication date Jun 12, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM FORMATION COMPOSITION
- Publication number 20250189896
- Publication date Jun 12, 2025
- NISSAN CHEMICAL CORPORATION
- Yuki MITSUTAKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Coating processes Apparatus therefor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method for forming a resist fine pattern

Solvent annealing of an organic planarization layer

Stabilized interfaces of inorganic radiation patterning composition...

Poly(cyanocinnamate)s for structural and optical applications

Method and apparatus for coating photo resist over a substrate

Cup, liquid processing apparatus, and liquid processing method

EUV photo masks and manufacturing method thereof

Photoresist system and method

Flow cell coating methods

Liquid supplying device

Method of manufacturing a semiconductor device

Method of manufacturing a master for a replication process

Apparatus and method for treating substrate

Bubble measurement unit, substrate treating apparatus including the...

Substrate support member, substrate treatment apparatus, and substr...

Treatment condition setting method, storage medium, and substrate t...

Storage container storing treatment liquid for manufacturing semico...

Resist underlayer composition, and method of forming patterns using...

Coating and development equipment

Treatment liquid and pattern forming method

Organotin patterning materials with ligands having silicon/germaniu...

Photoresist composition and method of forming photoresist pattern

Adhesion layer for multi-layer photoresist

Substrate processing apparatus

Photoresist and method of formation and use

Modifying hydrophobicity of a wafer surface using an organosilicon...

Method and/or system for coating a substrate

Photoresist deposition using independent multichannel showerhead

Pattern decomposition lithography techniques

Organotin oxide hydroxide patterning compositions, precursors, and...

Patents Applicationslast 30 patents

SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING SYSTEM

RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...

MONITORING APPARATUS, SUBSTRATE PROCESSING APPARATUS, MONITORING ME...

WAFER HOLDER APPARATUS, SYSTEM AND METHOD OF FORMING SAME

RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD...

ANTI-REFLECTIVE COATING COMPOSITION

MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...

SLANTED OPTICAL GRATINGS

METHOD OF FORMING PATTERNS AND PHOTORESIST FILM

PHOTORESIST DEPOSITION USING INDEPENDENT MULTICHANNEL SHOWERHEAD

ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

PHOTORESIST AND METHOD OF FORMATION AND USE

RESIST PATTERN FORMATION METHOD

EDGE BEAD REMOVAL METHOD, SUBSTRATE TREATMENT APPARATUS PERFORMING...

BUBBLE DEFECT REDUCTION

DUCT STRUCTURE, STOCKER, AND PHOTORESIST BOTTLE MANAGEMENT FACILITIES

MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE

METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY...

PAINTING METHOD

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

METHODS FOR MAKING EUV PATTERNABLE HARD MASKS

RETICLE CARRIER AND METHOD FOR MANUFACTURING AUXILIARY STRUCTURE IN...

POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...

POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

RESIST UNDERLAYER FILM FORMATION COMPOSITION