N. Narayanswami, “A Theoretical Analysis of Wafer Cleaning Using a Cryogenic Aerosol,” J. of the Electrochemical Society, 146-2:767-774 (1999). |
N. Narayanswami et al., “Development and Optimization of a Cryogenic Aerosol Based Wafer Cleaning System,” 28th Annual Meeting of the Fine Particle Society Proceedings (1998). |
N. Narayanswami et al., “Particle Removal Mechanisms in Cryogenic-Aerosol-Based Wafer Cleaning,” FSI International Document No. 1133-TRS-0499 (1999). |
Product Literature by FSI International, Inc. entitled FSI® Aries™ CryoKinetic Cleaning Systems. |