Information
-
Patent Grant
-
6527394
-
Patent Number
6,527,394
-
Date Filed
Wednesday, October 27, 199926 years ago
-
Date Issued
Tuesday, March 4, 200323 years ago
-
Inventors
-
Original Assignees
-
Examiners
Agents
- Watts, Hoffmann, Fisher & Heinke Co., L.P.A.
-
CPC
-
US Classifications
Field of Search
US
- 353 69
- 353 70
- 353 101
- 359 433
-
International Classifications
-
Abstract
The invention relates to objective arrangements for use in projection systems such as overhead projectors. An objective arrangement 10 provides a tilted image plane. The arrangement 10 is rotationally asymmetric by virtue of the third element 16 having a principal optical axis 22 which is displaced to one side, but parallel with the principal optical axes 20 of the first and second elements 12,14. This asymmetry has been found to correct aberrations introduced by a tilted Fresnel lens used in the projection arrangement.
Description
The present invention relates to objective arrangements particularly, but not exclusively, for use in overhead and liquid crystal display (LCD) projection systems.
Overhead projectors and LCD projectors are well known. In an overhead projector arrangement as shown schematically in
FIG. 1
, a slide
100
is laid on a horizontal light bed beneath an optical objective
102
having a substantially vertical axis. A mirror
104
above the objective reflects the image out onto a reflective screen
106
, for viewing.
In many situations, it is necessary to tilt the mirror to project the image higher up the screen, in order for it to be visible by the whole audience. When this is done, the distance over which the image is projected to the top of the screen is longer than the distance over which the image is projected to the bottom of the screen. Hence, the width of the image is greater at the top of the screen than at the bottom and consequently, an ostensibly rectangular image will appear on the screen with the distorted shape
108
shown in FIG.
2
. This type of distortion is known as the keystone effect, by analogy with the shape of an architectural keystone.
FIG. 3
shows one possible arrangement for dealing with the keystone effect. This arrangement seeks to keep the optical magnification constant across the field. It can be seen from
FIG. 3
that the image plane
110
is not perpendicular to the optical axis
112
, but is parallel to the object plane
114
, with the result that the keystone effect will be corrected, because the ratio L (top) to L (top)′ will be equal to the ratio of L (bot) to L (bot)′ (where L (top) and L (bot) are object distances at respective points in the field, and L (top)′ and L (bot)′ are image distances for the relevant field). However, the image plane and object plane will no longer be optically conjugate when a tilted objective is used. Other aberrations of the objective will therefore be very large and this method cannot be used when a large effective focal length is required, or high resolution is required.
Similar problems arise in relation to LCD projectors. However, the LCD array plane is preferably arranged to be tele-centric, i.e. not tilted relative to the objective, in order for the LCD array to have more energy output. However, the arrangement in
FIG. 4
has been proposed, and interposes a Fresnel lens
120
between the LCD plane
122
and the objective
124
, to produce a tilted intermediate virtual image of the LCD plane. The tilt introduced by the Fresnel lens
120
gives the virtual image a keystone shape but the intermediate virtual image can be conjugate with the plane of the screen
126
, to reduce other aberrations, and the keystone effect introduced by the Fresnel lens is opposite to that introduced by a tilted screen, so that the overall degree of keystone effect can reduce.
The present invention seeks to provide improved projection arrangements, particularly, but not exclusively for use with LCD arrays.
The invention provides an objective arrangement for use in a projection system which provides an image plane tilted relative to the optical axis, the arrangement being rotationally asymmetric.
The projection system may have a field lens, preferably a Fresnel lens. Preferably the objective arrangement comprises a plurality of elements, preferably three elements, and preferably at least one element is off-set from the principal optical axis of the arrangement, to provide rotational asymmetry. Preferably the off-set element is the final element of the arrangement.
The arrangement may be a fixed focus or vari-focus arrangement, and is preferably a zoom arrangement. Preferably the or each fixed elements is off-set and the or each movable element is aligned with the principal optical axis.
The degree of asymmetry is preferably selected substantially to balance rotationally asymmetric aberrations caused by the tilt of the Fresnel lens. The degree of asymmetry may be selected substantially to reduce or correct astigmatism caused by the tilt of the Fresnel lens.
The objective arrangement may be constructed according to the measurements set out in Appendix B below.
The invention also provides a projection system comprising a planar image source, a Fresnel lens tilted relative to the image plane, and an objective arrangement substantially as set out above, the system being arranged to cause an image from the image source to be projected through the Fresnel lens and objective arrangement.
The present invention will now be described in more detail, by way of example only, and with reference to the accompanying drawings, in which:
FIG. 1
is a schematic view of a prior art overhead projection arrangement,
FIG. 2
is a view at A—A in
FIG. 1
, showing the keystone effect in the image;
FIG. 3
shows a prior art arrangement adjusted to reduce the keystone effect;
FIG. 4
shows an arrangement similar to that of
FIG. 3
, for use with an LCD projector;
FIG. 5
illustrates an objective arrangement according to the invention;
FIG. 6
illustrates the modulation transfer function of an arrangement not embodying the invention;
FIG. 7
shows transverse ray fan plots of the arrangement of
FIG. 6
;
FIG. 8
shows field curvature and distortion plots of the arrangement of
FIG. 6
;
FIG. 9
shows spot diagrams of the arrangement of
FIG. 6
; and
FIGS. 10
to
13
correspond to
FIGS. 6
to
9
but relate to an arrangement according to the invention.
FIG. 5
illustrates schematically, in conventional form, an objective arrangement
10
for use in a projection system which provides a tilted image plane. The arrangement
10
is rotationally asymmetric.
In more detail, the arrangement
10
consists of three elements
12
,
14
,
16
. Light passes through the arrangement
10
from the right as shown in
FIG. 5
, toward the left, and on this account, the elements
12
,
14
,
16
will hereafter be called the first, second and third elements respectively.
The first element
12
is biconvex. The second element
14
is biconcave. The third element
16
is concave on its upstream face
16
a
and convex on its downstream face
16
b.
The first and second elements have coincident principle optical axes
20
, but the third element
16
has a principle optical axis
22
which is displaced to one side but parallel with the axes
20
. The significance of this displacement will become apparent below.
After systematic study and analysis, the inventors have appreciated that although conventional objective arrangements having a single principal optical axis can produce some aberrations which contribute toward a reduction in the aberrations resulting from the tilted Fresnel lens, the magnitude of the aberrations produced by the objectives was much less than that of the aberrations produced by the Fresnel lens and consequently, even if used for correction, the residual rotationally asymmetric (non-linear) aberrations, especially astigmatism, are still unacceptably large. The inventors have therefore adopted the arrangement shown in
FIG. 5
, in which the off-set of the last element
16
introduces a rotational asymmetry into the objective system, which can be used to further correct the aberrations introduced by the Fresnel lens.
Using this arrangement in connection with an LCD projector has resulted in the keystone effect being reduced to a negligible level because the tilted Fresnel lens produces a keystone effect opposite to that caused by the tilted screen and in addition, the off-set of the third element
16
also produces a small keystone effect which can be used to finally balance the overall keystone effect. In addition, the off-set can be chosen to introduce an appropriate amount of rotationally asymmetric aberration to balance the residual rotationally asymmetric aberrations otherwise present in the system. The overall effect is to produce a projection system having a substantially improved performance in terms of keystone and rotationally asymmetric distortions and aberrations.
The design of an objective arrangement according to the present invention can be more fully understood by first describing in detail an objective arrangement in which there is no off-set in the third element, and then similarly describing the effect of introducing the off-set in accordance with the invention.
Example Without Off-Set
Appendix A provides additional lens description data for an objective arrangement generally as shown in
FIG. 5
, but conventional in having three elements with coincident principle optical axes.
This objective arrangement has been used experimentally as the objective of an LCD projector arrangement of the type shown in
FIG. 4
, and yielded experimental results as shown in FIG.
6
.
FIG. 6
shows the polychromatic diffraction modulation transfer function for wavelengths from 0.486 t to 0.6563 microns.
FIG. 7
shows transverse ray fan plots for the same zoom position. Each plot includes data for three wavelengths, namely 0.486 microns, 0.588 microns and 0.656 microns. There are five pairs of plots, as follows:
Plot Identification
|
i
IMA: 0.00, 0.00 mm
|
ii
IMA: 48.00, 36.00 mm
|
iii
IMA: 65.00, 49.00 mm
|
iv
IMA: −48.00, −36.00 mm
|
v
IMA: −65.00, −49.00 mm
|
|
FIG. 8
shows field curvature and distortion plots for the same zoom positions, again showing lines for three wavelengths, namely 0.486 microns, 0.588 microns, 0.636 microns. In each case, the maximum field is 81.400 mm. Finally,
FIG. 9
shows spot diagrams at the three zoom positions. In these drawings, the reference bar
24
represents 400 microns and other parameters for these images are as follows:
|
FIG. No.
Parameters
RMS Radius
GEO Radius
|
|
|
9 i
IMA: 0.000, 19.739 mm
32.876
51.463
|
9 ii
IMA: 48.496, 56.243 mm
76.727
210.327
|
9 iii
IMA: 66.026, 69.784 mm
85.769
233.376
|
9 iv
IMA: −48.263, −16.311 mm
55.541
123.705
|
9 v
IMA: −65.591, −29.503 mm
87.616
220.385
|
|
Asymmetric Design
Appendix B and
FIGS. 10
to
13
correspond to Appendix A and
FIGS. 6
to
9
, but relate to an asymmetric arrangement according to the invention and having an effective focal length of 170 mm. The element
16
(
FIG. 5
) has been off-set from the principal optical axis, in accordance with the invention, by an amount of about 0.75 mm. Appendix B shows the general lens data.
FIG. 10
shows the optical transfer function for the same zoom position as illustrated in FIG.
6
. It is apparent that there is a substantial improvement in the transfer function.
In use, it is the off-set element
16
which remains fixed against rotation during zooming or focus adjustment, while one or both aligned elements
12
,
14
are movable.
FIG. 11
shows transverse ray fan plots corresponding to those in FIG.
7
and again, it can readily be seen that there is an overall significant improvement in performance.
FIG. 12
shows the field curvature and distortion obtained from the objective arrangement according to the invention and, when contrasted with the corresponding plots in
FIG. 8
shows again a marked improvement in performance. Finally, spot diagrams are shown in
FIG. 13
, to which the following experimental data applies:
|
FIG. No.
Parameters
RMS Radius
GEO Radius
|
|
|
13 i
IMA: 0.000, 20.819 mm
36.798
74.383
|
13 ii
IMA: 48.399, 57.279 mm
35.941
95.500
|
13 iii
IMA: 65.784, 70.737 mm
54.153
136.790
|
13 iv
IMA: −48.166, −15.078 mm
45.024
127.557
|
13 v
IMA: −65.392, −28.149 mm
56.421
148.747
|
|
This example may have fixed focus or be modified for variable focus, e.g. by allowing the relative positions of the elements to be changed. However, the off-set element remains fixed against rotation, during focusing or zooming, so that the asymmetry is retained.
The examples above off-set the final element of the triplet. It can be shown that when an optical element is small relative to its optical field of view, then off-setting any one element is equivalent to off-setting any one other element.
It will be apparent from the above disclosure that many variations and modifications can be made without departing from the scope of the present invention. These modifications would include fixed focus, vari-focus and zoom systems. In particular, the details disclosed are by way of example only and it will be readily apparent to the skilled man how other dimensions can be chosen in order to implement the invention in other embodiments, and to adapt the invention according to the choice of optical material (glass, polymers or the like).
Whilst endeavoring in the foregoing specification to draw attention to those features of the invention believed to be of particular importance it should be understood that the Applicant claims protection in respect of any patentable feature or combination of features herein before referred to and/or shown in the drawings whether or not particular emphasis has been placed thereon.
APPENDIX A
|
Whole F/#
5.6
|
Working F/#
9.5
|
Image heights:
(−65, −49), (−48, −36), (0,0), (48, 36), (65, 49)
|
Wavelengths:
0.48613, 0.58756, 0.65627
|
|
Surface data summary:
|
Thick-
|
Surf.
Radius
ness
Glass
Diameter
Decentr.
Tilt
|
|
Object
1800
8°
|
1
49.197
9.75
SSKN5
58
|
2
132.808
11.86
58
|
3
−150.129
2.60
F2
50
|
4
51.807
5.11
50
|
5
108.841
9.75
SK16
52
|
6
−97.431
138.26
52
|
FRES-
aspheric
2.00
ACRYLIC
164
6.5°
|
NEL
|
8
16.00
164
|
Image
|
|
APPENDIX B
|
Whole F/#
5.6
|
Working F/#
9.5
|
Image heights:
(−65, −49), (−48, −36), (0,0), (48, 36), (65, 49)
|
Wavelengths:
0.48613, 0.58756, 0.65627
|
|
Thick-
|
Surf.
Radius
ness
Glass
Diameter
Decentr.
Tilt
|
|
Object
1800
8°
|
1
47.788
9.75
SSKN5
58
0.75
|
2
117.960
11.86
58
0.75
|
3
−160.560
2.60
F2
50
|
4
50.795
5.11
50
|
5
101.486
9.75
SK16
52
|
6
−101.486
138.27
52
|
FRES-
aspheric
2.00
ACRYLIC
164
6.5°
|
NEL
|
8
16.00
164
|
Image
|
|
Claims
- 1. An objective arrangement for use in a projection system, the arrangement including a plurality of lenses configured to an image planes said image plane tilted relative to an optical axis, the arrangement being rotationally asymmetric, with a first part of the arrangement being configured on a first axis and at least a part of the remainder of the arrangement configured on a second axis, said first axis and said second axis being parallel whereby the image plane is variably tilted as the arrangement is rotated.
- 2. An arrangement according to claim 1, wherein the projection system has a field lens.
- 3. An arrangement according to claim 2, wherein the field lens is a Fresnel lens.
- 4. An arrangement according to claim 1, wherein the objective arrangement comprises a plurality of elements.
- 5. An arrangement according to claim 4, wherein the objective arrangement comprises three elements.
- 6. An arrangement according to claim 4, wherein at least one element is off-set from the principal optical axis of the arrangement, to provide rotational asymmetry.
- 7. An arrangement according to claim 6, wherein the off-set element is the final element of the arrangement, said final element being disposed farthest from said image plane relative to the other elements.
- 8. An arrangement according to claim 1, wherein the arrangement is a fixed focus arrangement.
- 9. An arrangement according to claim 1, wherein the arrangement is a vari-focus arrangement.
- 10. An arrangement according to claim 1, wherein the arrangement is a zoom arrangement.
- 11. An arrangement according to claim 1, wherein the objective arrangement comprises at least one fixed element and at least one movable element, wherein each of the at least one fixed element is off-set from the principle optical axis and each of the at least one movable element is aligned with the principle optical axis.
- 12. An arrangement according to claim 1, wherein a degree of the rotational asymmetry is selectable.
- 13. An arrangement according to claim 12, wherein the projection system has a Fresnel lens and the degree of asymmetry is selectable substantially to balance rotationally asymmetric aberrations caused by a tilt of the Fresnel lens relative to the image plane.
- 14. An arrangement according to claim 13 or claim 12, wherein the degree of asymmetry is selectable substantially to reduce or correct astigmatism caused by the tilt of the Fresnel lens.
- 15. A projection system comprising a planar image source defining an image plane, a Fresnel lens titled relative to the image plane, and an objective arrangement, the arrangement being rotationally asymmetric with a first part of the arrangement being configured on a first axis and at least a part of the remainder of the arrangement configured on a second axis, said first and said second axis being parallel whereby the image plane is variably filted as the arrangement is rotated, the system being arranged to cause an image from the image source to be projected through the Fresnel lens and objective arrangement.
Priority Claims (1)
| Number |
Date |
Country |
Kind |
| 9823998 |
Nov 1998 |
GB |
|
US Referenced Citations (7)
Foreign Referenced Citations (2)
| Number |
Date |
Country |
| 0115901 |
Aug 1984 |
EP |
| 498419 |
Jan 1937 |
GB |