Objective arrangements

Information

  • Patent Grant
  • 6527394
  • Patent Number
    6,527,394
  • Date Filed
    Wednesday, October 27, 1999
    26 years ago
  • Date Issued
    Tuesday, March 4, 2003
    23 years ago
Abstract
The invention relates to objective arrangements for use in projection systems such as overhead projectors. An objective arrangement 10 provides a tilted image plane. The arrangement 10 is rotationally asymmetric by virtue of the third element 16 having a principal optical axis 22 which is displaced to one side, but parallel with the principal optical axes 20 of the first and second elements 12,14. This asymmetry has been found to correct aberrations introduced by a tilted Fresnel lens used in the projection arrangement.
Description




The present invention relates to objective arrangements particularly, but not exclusively, for use in overhead and liquid crystal display (LCD) projection systems.




Overhead projectors and LCD projectors are well known. In an overhead projector arrangement as shown schematically in

FIG. 1

, a slide


100


is laid on a horizontal light bed beneath an optical objective


102


having a substantially vertical axis. A mirror


104


above the objective reflects the image out onto a reflective screen


106


, for viewing.




In many situations, it is necessary to tilt the mirror to project the image higher up the screen, in order for it to be visible by the whole audience. When this is done, the distance over which the image is projected to the top of the screen is longer than the distance over which the image is projected to the bottom of the screen. Hence, the width of the image is greater at the top of the screen than at the bottom and consequently, an ostensibly rectangular image will appear on the screen with the distorted shape


108


shown in FIG.


2


. This type of distortion is known as the keystone effect, by analogy with the shape of an architectural keystone.





FIG. 3

shows one possible arrangement for dealing with the keystone effect. This arrangement seeks to keep the optical magnification constant across the field. It can be seen from

FIG. 3

that the image plane


110


is not perpendicular to the optical axis


112


, but is parallel to the object plane


114


, with the result that the keystone effect will be corrected, because the ratio L (top) to L (top)′ will be equal to the ratio of L (bot) to L (bot)′ (where L (top) and L (bot) are object distances at respective points in the field, and L (top)′ and L (bot)′ are image distances for the relevant field). However, the image plane and object plane will no longer be optically conjugate when a tilted objective is used. Other aberrations of the objective will therefore be very large and this method cannot be used when a large effective focal length is required, or high resolution is required.




Similar problems arise in relation to LCD projectors. However, the LCD array plane is preferably arranged to be tele-centric, i.e. not tilted relative to the objective, in order for the LCD array to have more energy output. However, the arrangement in

FIG. 4

has been proposed, and interposes a Fresnel lens


120


between the LCD plane


122


and the objective


124


, to produce a tilted intermediate virtual image of the LCD plane. The tilt introduced by the Fresnel lens


120


gives the virtual image a keystone shape but the intermediate virtual image can be conjugate with the plane of the screen


126


, to reduce other aberrations, and the keystone effect introduced by the Fresnel lens is opposite to that introduced by a tilted screen, so that the overall degree of keystone effect can reduce.




The present invention seeks to provide improved projection arrangements, particularly, but not exclusively for use with LCD arrays.




The invention provides an objective arrangement for use in a projection system which provides an image plane tilted relative to the optical axis, the arrangement being rotationally asymmetric.




The projection system may have a field lens, preferably a Fresnel lens. Preferably the objective arrangement comprises a plurality of elements, preferably three elements, and preferably at least one element is off-set from the principal optical axis of the arrangement, to provide rotational asymmetry. Preferably the off-set element is the final element of the arrangement.




The arrangement may be a fixed focus or vari-focus arrangement, and is preferably a zoom arrangement. Preferably the or each fixed elements is off-set and the or each movable element is aligned with the principal optical axis.




The degree of asymmetry is preferably selected substantially to balance rotationally asymmetric aberrations caused by the tilt of the Fresnel lens. The degree of asymmetry may be selected substantially to reduce or correct astigmatism caused by the tilt of the Fresnel lens.




The objective arrangement may be constructed according to the measurements set out in Appendix B below.




The invention also provides a projection system comprising a planar image source, a Fresnel lens tilted relative to the image plane, and an objective arrangement substantially as set out above, the system being arranged to cause an image from the image source to be projected through the Fresnel lens and objective arrangement.











The present invention will now be described in more detail, by way of example only, and with reference to the accompanying drawings, in which:





FIG. 1

is a schematic view of a prior art overhead projection arrangement,





FIG. 2

is a view at A—A in

FIG. 1

, showing the keystone effect in the image;





FIG. 3

shows a prior art arrangement adjusted to reduce the keystone effect;





FIG. 4

shows an arrangement similar to that of

FIG. 3

, for use with an LCD projector;





FIG. 5

illustrates an objective arrangement according to the invention;





FIG. 6

illustrates the modulation transfer function of an arrangement not embodying the invention;





FIG. 7

shows transverse ray fan plots of the arrangement of

FIG. 6

;





FIG. 8

shows field curvature and distortion plots of the arrangement of

FIG. 6

;





FIG. 9

shows spot diagrams of the arrangement of

FIG. 6

; and





FIGS. 10

to


13


correspond to

FIGS. 6

to


9


but relate to an arrangement according to the invention.












FIG. 5

illustrates schematically, in conventional form, an objective arrangement


10


for use in a projection system which provides a tilted image plane. The arrangement


10


is rotationally asymmetric.




In more detail, the arrangement


10


consists of three elements


12


,


14


,


16


. Light passes through the arrangement


10


from the right as shown in

FIG. 5

, toward the left, and on this account, the elements


12


,


14


,


16


will hereafter be called the first, second and third elements respectively.




The first element


12


is biconvex. The second element


14


is biconcave. The third element


16


is concave on its upstream face


16




a


and convex on its downstream face


16




b.






The first and second elements have coincident principle optical axes


20


, but the third element


16


has a principle optical axis


22


which is displaced to one side but parallel with the axes


20


. The significance of this displacement will become apparent below.




After systematic study and analysis, the inventors have appreciated that although conventional objective arrangements having a single principal optical axis can produce some aberrations which contribute toward a reduction in the aberrations resulting from the tilted Fresnel lens, the magnitude of the aberrations produced by the objectives was much less than that of the aberrations produced by the Fresnel lens and consequently, even if used for correction, the residual rotationally asymmetric (non-linear) aberrations, especially astigmatism, are still unacceptably large. The inventors have therefore adopted the arrangement shown in

FIG. 5

, in which the off-set of the last element


16


introduces a rotational asymmetry into the objective system, which can be used to further correct the aberrations introduced by the Fresnel lens.




Using this arrangement in connection with an LCD projector has resulted in the keystone effect being reduced to a negligible level because the tilted Fresnel lens produces a keystone effect opposite to that caused by the tilted screen and in addition, the off-set of the third element


16


also produces a small keystone effect which can be used to finally balance the overall keystone effect. In addition, the off-set can be chosen to introduce an appropriate amount of rotationally asymmetric aberration to balance the residual rotationally asymmetric aberrations otherwise present in the system. The overall effect is to produce a projection system having a substantially improved performance in terms of keystone and rotationally asymmetric distortions and aberrations.




The design of an objective arrangement according to the present invention can be more fully understood by first describing in detail an objective arrangement in which there is no off-set in the third element, and then similarly describing the effect of introducing the off-set in accordance with the invention.




Example Without Off-Set




Appendix A provides additional lens description data for an objective arrangement generally as shown in

FIG. 5

, but conventional in having three elements with coincident principle optical axes.




This objective arrangement has been used experimentally as the objective of an LCD projector arrangement of the type shown in

FIG. 4

, and yielded experimental results as shown in FIG.


6


.

FIG. 6

shows the polychromatic diffraction modulation transfer function for wavelengths from 0.486 t to 0.6563 microns.





FIG. 7

shows transverse ray fan plots for the same zoom position. Each plot includes data for three wavelengths, namely 0.486 microns, 0.588 microns and 0.656 microns. There are five pairs of plots, as follows:




Plot Identification





















i




IMA: 0.00, 0.00 mm







ii




IMA: 48.00, 36.00 mm







iii




IMA: 65.00, 49.00 mm







iv




IMA: −48.00, −36.00 mm







v




IMA: −65.00, −49.00 mm
















FIG. 8

shows field curvature and distortion plots for the same zoom positions, again showing lines for three wavelengths, namely 0.486 microns, 0.588 microns, 0.636 microns. In each case, the maximum field is 81.400 mm. Finally,

FIG. 9

shows spot diagrams at the three zoom positions. In these drawings, the reference bar


24


represents 400 microns and other parameters for these images are as follows:


















FIG. No.




Parameters




RMS Radius




GEO Radius


























9 i




IMA: 0.000, 19.739 mm




32.876




51.463






9 ii




IMA: 48.496, 56.243 mm




76.727




210.327






9 iii




IMA: 66.026, 69.784 mm




85.769




233.376






9 iv




IMA: −48.263, −16.311 mm




55.541




123.705






9 v




IMA: −65.591, −29.503 mm




87.616




220.385














Asymmetric Design




Appendix B and

FIGS. 10

to


13


correspond to Appendix A and

FIGS. 6

to


9


, but relate to an asymmetric arrangement according to the invention and having an effective focal length of 170 mm. The element


16


(

FIG. 5

) has been off-set from the principal optical axis, in accordance with the invention, by an amount of about 0.75 mm. Appendix B shows the general lens data.

FIG. 10

shows the optical transfer function for the same zoom position as illustrated in FIG.


6


. It is apparent that there is a substantial improvement in the transfer function.




In use, it is the off-set element


16


which remains fixed against rotation during zooming or focus adjustment, while one or both aligned elements


12


,


14


are movable.





FIG. 11

shows transverse ray fan plots corresponding to those in FIG.


7


and again, it can readily be seen that there is an overall significant improvement in performance.





FIG. 12

shows the field curvature and distortion obtained from the objective arrangement according to the invention and, when contrasted with the corresponding plots in

FIG. 8

shows again a marked improvement in performance. Finally, spot diagrams are shown in

FIG. 13

, to which the following experimental data applies:


















FIG. No.




Parameters




RMS Radius




GEO Radius


























13 i




IMA: 0.000, 20.819 mm




36.798




74.383






13 ii




IMA: 48.399, 57.279 mm




35.941




95.500






13 iii




IMA: 65.784, 70.737 mm




54.153




136.790






13 iv




IMA: −48.166, −15.078 mm




45.024




127.557






13 v




IMA: −65.392, −28.149 mm




56.421




148.747














This example may have fixed focus or be modified for variable focus, e.g. by allowing the relative positions of the elements to be changed. However, the off-set element remains fixed against rotation, during focusing or zooming, so that the asymmetry is retained.




The examples above off-set the final element of the triplet. It can be shown that when an optical element is small relative to its optical field of view, then off-setting any one element is equivalent to off-setting any one other element.




It will be apparent from the above disclosure that many variations and modifications can be made without departing from the scope of the present invention. These modifications would include fixed focus, vari-focus and zoom systems. In particular, the details disclosed are by way of example only and it will be readily apparent to the skilled man how other dimensions can be chosen in order to implement the invention in other embodiments, and to adapt the invention according to the choice of optical material (glass, polymers or the like).




Whilst endeavoring in the foregoing specification to draw attention to those features of the invention believed to be of particular importance it should be understood that the Applicant claims protection in respect of any patentable feature or combination of features herein before referred to and/or shown in the drawings whether or not particular emphasis has been placed thereon.




APPENDIX A





















Whole F/#




5.6







Working F/#




9.5







Image heights:




(−65, −49), (−48, −36), (0,0), (48, 36), (65, 49)







Wavelengths:




0.48613, 0.58756, 0.65627















Surface data summary:



















Thick-










Surf.




Radius




ness




Glass




Diameter




Decentr.




Tilt









Object





1800














1




49.197




9.75




SSKN5




58






2




132.808




11.86





58






3




−150.129




2.60




F2




50






4




51.807




5.11





50






5




108.841




9.75




SK16




52






6




−97.431




138.26





52






FRES-




aspheric




2.00




ACRYLIC




164





6.5°






NEL






8





16.00





164






Image














APPENDIX B





















Whole F/#




5.6







Working F/#




9.5







Image heights:




(−65, −49), (−48, −36), (0,0), (48, 36), (65, 49)







Wavelengths:




0.48613, 0.58756, 0.65627























Thick-










Surf.




Radius




ness




Glass




Diameter




Decentr.




Tilt









Object





1800














1




47.788




9.75




SSKN5




58




0.75






2




117.960




11.86





58




0.75






3




−160.560




2.60




F2




50






4




50.795




5.11





50






5




101.486




9.75




SK16




52






6




−101.486




138.27





52






FRES-




aspheric




2.00




ACRYLIC




164





6.5°






NEL






8





16.00





164






Image













Claims
  • 1. An objective arrangement for use in a projection system, the arrangement including a plurality of lenses configured to an image planes said image plane tilted relative to an optical axis, the arrangement being rotationally asymmetric, with a first part of the arrangement being configured on a first axis and at least a part of the remainder of the arrangement configured on a second axis, said first axis and said second axis being parallel whereby the image plane is variably tilted as the arrangement is rotated.
  • 2. An arrangement according to claim 1, wherein the projection system has a field lens.
  • 3. An arrangement according to claim 2, wherein the field lens is a Fresnel lens.
  • 4. An arrangement according to claim 1, wherein the objective arrangement comprises a plurality of elements.
  • 5. An arrangement according to claim 4, wherein the objective arrangement comprises three elements.
  • 6. An arrangement according to claim 4, wherein at least one element is off-set from the principal optical axis of the arrangement, to provide rotational asymmetry.
  • 7. An arrangement according to claim 6, wherein the off-set element is the final element of the arrangement, said final element being disposed farthest from said image plane relative to the other elements.
  • 8. An arrangement according to claim 1, wherein the arrangement is a fixed focus arrangement.
  • 9. An arrangement according to claim 1, wherein the arrangement is a vari-focus arrangement.
  • 10. An arrangement according to claim 1, wherein the arrangement is a zoom arrangement.
  • 11. An arrangement according to claim 1, wherein the objective arrangement comprises at least one fixed element and at least one movable element, wherein each of the at least one fixed element is off-set from the principle optical axis and each of the at least one movable element is aligned with the principle optical axis.
  • 12. An arrangement according to claim 1, wherein a degree of the rotational asymmetry is selectable.
  • 13. An arrangement according to claim 12, wherein the projection system has a Fresnel lens and the degree of asymmetry is selectable substantially to balance rotationally asymmetric aberrations caused by a tilt of the Fresnel lens relative to the image plane.
  • 14. An arrangement according to claim 13 or claim 12, wherein the degree of asymmetry is selectable substantially to reduce or correct astigmatism caused by the tilt of the Fresnel lens.
  • 15. A projection system comprising a planar image source defining an image plane, a Fresnel lens titled relative to the image plane, and an objective arrangement, the arrangement being rotationally asymmetric with a first part of the arrangement being configured on a first axis and at least a part of the remainder of the arrangement configured on a second axis, said first and said second axis being parallel whereby the image plane is variably filted as the arrangement is rotated, the system being arranged to cause an image from the image source to be projected through the Fresnel lens and objective arrangement.
Priority Claims (1)
Number Date Country Kind
9823998 Nov 1998 GB
US Referenced Citations (7)
Number Name Date Kind
5096288 Yano et al. Mar 1992 A
5302983 Sato et al. Apr 1994 A
5355188 Biles et al. Oct 1994 A
5820240 Ohzawa Oct 1998 A
6118501 Ohzawa Sep 2000 A
6123425 Ohzawa Sep 2000 A
6188523 Choi Feb 2001 B1
Foreign Referenced Citations (2)
Number Date Country
0115901 Aug 1984 EP
498419 Jan 1937 GB