This invention relates generally to integrated circuits and more particularly to on-chip inductors and on-chip transformers.
Integrated circuits (IC's) are known to include a substrate, one or more dielectric layers on the substrate, and one or more metal layers supported by a corresponding dielectric layer. The metal layers are fabricated in such a way to produce on-chip components such as resistors, transistors, capacitors, inductors, et cetera. How an on-chip component is fabricated and the physical limits placed on on-chip components are dictated by the technology used and foundry rules governing such technology.
For example, CMOS technology is readily used for cost effective integrated circuits. Foundries that manufacture CMOS integrated circuits provide rules governing the number of dielectric layers, number of metal layers, metal track sizes, spacing between metal tracks, angular bends of metal tracks, and other aspects of integrated circuit production.
While CMOS technology and the corresponding foundry rules allow on-chip inductors to be created, the quality factor (i.e., the measure of a component's ability to produce a large output at a resident frequency and selectivity of the component) is limited to a value of 5-10. As is known, a circular trace pattern for an on-chip inductor theoretically has a greater Q factor than a square or rectangular trace pattern of similar inductance, but has a larger IC footprint and violates foundry rules. As such, circular on-chip inductors are not used.
To emulate the benefits of a circular on-chip inductor, while maintaining compliance with foundry rules, many integrated circuit designers use an octagonal inductor. However, an octagonal inductor is larger than a similar trace length square or rectangular inductor. As such, IC designers choose between larger octagonal inductors with a higher Q factor and smaller square or rectangular inductors with a lower Q factor. In some instances, an octagonal inductor is impractical due to its size and yet a square or rectangular on-chip inductor is impractical due to its low quality factor. And, in all instances, smaller on-chip inductors with similar performance characteristics are preferred over larger on-chip inductors.
Therefore, a need exists for a high quality factor rectangular and/or square on-chip inductor.
These needs and others are substantially met by the on-chip inductor and/or on-chip transformer disclosed herein. Such an on-chip inductor includes a dielectric layer and a conductive winding on the dielectric layer. The conductive winding has a substantially square geometry and has at least its exterior corners geometrically shaped to reduce impedance of the conductive winding at a particular operating frequency. Since the quality factor of an on-chip inductor is inversely proportional to the effective series impedance of the inductor at an operating frequency, by reducing the effective series impedance, the quality factor is increased. In addition, the inductor has lower capacitance values in comparison to substantially equal inductors that do not practice the present invention, thus allowing the inductor of the present invention to have a higher self-resonance.
Other embodiments of the on-chip inductor include providing a geometric shaping of the internal and external corners at approximately 135° each. Alternatively, the interior angle of a corner may be approximately 90° while the exterior of the corner may be approximately 135°. Further variations of the geometric shaping have multiple angles on the interior angle and multiple angles on the exterior angle. Still further embodiments of the on-chip inductor include having a spiral configuration for the conductive winding, having conductive windings on one or more dielectric layers operably coupled together via metal bridges, and/or including a secondary winding to produce an on-chip transformer.
Such an on-chip conductor and/or on-chip transformer may be manufactured by creating a dielectric layer and then creating a conductive winding on the dielectric layer. The conductive winding is created to have a substantially square geometry where its corners are geometrically shaped to reduce impedance of the on-chip inductor at an operating frequency.
In general, the inductance value of an on-chip inductor is dependent on the length of the interior edge of the metalization (i.e., the interior edge of winding 12) where the current tends to concentrate. Accordingly, the interior diameter of the inductor is the deciding factor for size minimization. As has been demonstrated in simulations, the highest current density is distributed on the interior edge of an inductor and gives the dominate contribution to the inductance. Note that the simulations were performed at 1.6 gigahertz and 2.4 gigahertz. As such, the inductance of an on-chip inductor is increased by increasing the length of its interior edge. This favors a rectangular design rather than an octagonal one, occupying the same rectangular area on an integrated circuit and having the same track width.
To improve the quality factor of rectangular on-chip inductors and/or square on-chip inductors, current turbulence within the metal track needs to be reduced. Such turbulence consumes power as resistive loss, but does not contribute to the inductive value. Thus, by eliminating, or reducing current turbulence, by cutting the corners of winding 12, the resistive loss due to turbulence is reduced and the inductance value is not affected. As such, by including the 135° corners on the exterior of the winding, as illustrated in
The geometric shape 26 has the interior and exterior angles of each corner being approximately 135°. As such, the geometric shaping 26 reduces the current turbulence within winding 22 and thus reduces the resistive loss without effecting the inductance value of on-chip inductor 20. As one of average skill in the art will appreciate, for the on-chip inductors of
As illustrated, winding 52 includes geometric shaping 56 on its exterior angles. In this illustration, the geometric shaping 56 includes multiple angles at the corners. The angles for the geometric shaping 56 are dependent on allowable angle cuts per the foundry rules.
As shown, each corner of winding 62 is geometrically shaped 66. In this illustration, the geometric shaping 66 includes multiple angles on both the interior corner and exterior corner of the corners of winding 62. Again, the angles for such multiple angles are dependent on allowable foundry rules.
As one of average skill in the art will appreciate, each of the primary and secondary windings may be a single turn on a single layer, multiple turns on a single layer, multiple single turns on multiple layers, and/or multiple spiral turns on multiple layers.
The process then proceeds to Step 82 where a conductive winding is created on the dielectric layer. The creation of the conductive winding includes forming the winding to have a substantially square geometry and geometrically shaping its corners to reduce impedance of the on-chip inductor at an operating frequency. The geometric shaping may be done as illustrated in
The process then proceeds to Step 92 where a secondary conductive winding that has a substantially square geometry is created on a 2nd dielectric layer. The corners of the secondary conductive winding are geometrically shaped to reduce impedance of the secondary conductive winding at an operating frequency. The geometric shaping of the corners may be done as illustrated in
The preceding discussion has presented an on-chip inductor that has a substantially square geometry with an improved quality factor. As one of average skill in the art will appreciate, other embodiments may be derived from the teachings of the present invention, without deviating from the scope of the claims.
Number | Name | Date | Kind |
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6285273 | Morikawa | Sep 2001 | B1 |
6407647 | Apel et al. | Jun 2002 | B1 |
20030137383 | Yang et al. | Jul 2003 | A1 |
Number | Date | Country | |
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20030162376 A1 | Aug 2003 | US |