Optical information recording medium

Abstract
An optical information recording medium includes a substrate with guide grooves thereon, a recording layer provided on the substrate, including a recording material of which phase is reversibly changeable from a stable state to a semistable state and vice versa, a heat-resistant dielectric protective layer provided on the recording layer, including a protective material which includes Zn, Si, S and O, and a light reflection and heat dissipation layer provided on the heat-resistant dielectric protective layer.
Description




BACKGROUND OF THE INVENTION




1. Field of the Invention




The present invention relates to an optical information recording medium, more particularly to a phase-change type optical information recording medium.




2. Discussion of Background




There is conventionally known a phase-change type optical information recording medium which utilizes phase changes between a crystalline phase and an amorphous phase or between one crystalline phase and another crystalline phase as one of the optical recording media which are capable of recording, reproducing and erasing information, for instance, by the application of a laser beam thereto. This kind of phase-change type optical information recording medium is capable of overwriting information by the application of a single laser beam thereto.




Such a phase-change type optical information recording medium is generally composed of a substrate made of polycarbonate, a first protective layer provided on the substrate, a recording layer provided on the first protective layer, a second protective layer provided on the recording layer, and a light reflection and heat dissipation layer.




Representative examples of recording materials for use in the above-mentioned recording layer are the so-called chalcogen-based alloys, such as Ge-Te, Ge-Se-Sb and Ge-Te-Sn as disclosed in U.S. Pat. No. 3,530,441, and Ge-Te-Se-Sb and Ge-Te-Sb, with the composition ratios of such elements being specifically selected for improvement of the recording/erasing repetition performance thereof as proposed in Japanese Laid-Open Patent Applications 62-73438 and 63-228433.




Furthermore, as the materials for the above-mentioned protective layers, there are conventionally known oxides such as SiO and A1


2


O, and nitrides such as BN, Si


3


N


4


and AlN.




However, protective layers composed of such an oxide or nitride are known to have the shortcoming that the protective layers are thermally damaged by the heat applied thereto during the cycles of heating with the application of a laser beam and cooling, resulting in the reduction of the reliability of the performance of the optical information recording medium comprising such a protective layer.




In order to eliminate the above-mentioned shortcoming, mixed materials, such as a material composed of ZnS and SiO


2


, are proposed as disclosed in Japanese Laid-Open Patent Application 63-259855 and Japanese Patent Publication 4-74785. It is reported that by using such a material in the protective layer, the above-mentioned recording/erasing repetition performance can be significantly improved for high line speed recording media, but the recording/erasing repetition performance cannot be sufficiently improved for low line speed recording media such as compact disks.




SUMMARY OF THE INVENTION




It is therefore a first object of the present invention to provide a phase-change type optical information recording medium with high heat resistance.




A second object of the present invention is to provide a phase-change type optical information recording medium which has excellent recording, reproduction and erasing repetition performance (hereinafter referred to as repetition use performance), and high recording sensitivity.




A third object of the present invention is to provide a phase-change type optical information recording medium which has excellent repetition use performance, in particular, from low line speed operation through high line-speed operation.




These objects of the present invention can be achieved by an optical information recording medium comprising (a) a substrate with guide grooves thereon, (b) a recording layer provided on the substrate, comprising a recording material of which phase is reversibly changeable from a stable state to a semistable state and vice versa, (c) a heat-resistant dielectric protective layer provided on the recording layer, comprising a protective material which comprises Zn, Si, S and O, and (d) a light reflection and heat dissipation layer which is provided on the heat-resistant dielectric protective layer.




The desired heat resistance can be obtained by use of the above-mentioned heat-resistant dielectric protective layer. When the substrate is not sufficiently heat resistant for use in practice, an additional heat-resistant dielectric protective layer which may be the same as the above-mentioned heat-resistant dielectric protective layer may be provided between the substrate and the recording layer.




In the above optical information recording medium, it is preferable that the protective material for the heat-resistant dielectric protective layer comprise ZnS, ZnO and SiO


2


.




Furthermore, in the above protective material, it is preferable that the composition ratio of ZnS, ZnO and SiO


2


be such that the composition ratio thereof be represented by formula (I) in order to obtain excellent repetition use performance, in particular, from low line speed operation through high line speed operation:






(ZnS)


α


(ZnO)


β


(SiO


2


)


γ


  (I)






provided that 30≦α≦90, 55≦β≦50, and 5≦γ≦30, and α+β+γ=100 mole %.




Furthermore, for achieving the above-mentioned object, it is also preferable that the protective material have a thermal conductivity in a range of 1.2 W/m·k to 24.0 W/m·k.




For obtaining a phase-change type optical information recording medium having excellent repetition use performance and high recording sensitivity, it is preferable that the recording material for the recording layer comprise Ag, In, Sb and Te.




Furthermore, it is preferable that the recording material for the recording layer further comprise at least one element selected from the group consisting of N and Cl.




Furthermore, it is preferable that the recording material for the recording layer comprise Ag, S, one of Sb or As, and at least one element selected from the group consisting of Zn, Si, Ge and Sn.




For achieving the above-mentioned objects, it is also preferable that the recording material for the recording layer comprise Ag and St and one element selected from the group consisting of Sb and As and be present in the form of Ag


3


SbS


3


or Ag


3


AsS


3


in a crystalline state in the stable state, and in an amorphous state in the somistable state.




In the above, it is preferable that the recording material be in an amorphous state in the semistable state, and initialization and erasing be performed in the crystalline state.




In the above, it is also preferable that the recording layer comprise Ag


3


SbS


3


or Ag


3


AsS


3


in the stable state, with at least one element selected from the group consisting of Zn, Si, Ge and Sn being added thereto.




Furthermore, in the above, it is preferable that the recording layer comprise a compound of formula (II) or a compound of formula (III):






(Ag


3


SbS


3


)


x


M


100−x


  (II)






wherein M represents an element selected from the group consisting of Zn, Go, Si and Sn, and 92≦X≦99, X indicating mole %; and






(Ag


3


AsS


2


)


x


M


100−x


  (III)






wherein M represents an element selected from the group consisting of Zn, Ge, Si and Sn, and 92≦X≦99, X indicating mole %.











BRIEF DESCRIPTION OF THE DRAWINGS




A more complete appreciation of the invention and many of the attendant advantages thereof will be readily obtained an the same becomes better understood by reference to the following detailed description when considered in connection with the accompanying drawings, wherein:





FIG. 1

is a schematic cross-sectional view of an example of an optical information recording medium of the present invention.











DESCRIPTION OF THE PREFERRED EMBODIMENTS




In the phase-change type optical recording medium, the recording layer is fused by the application of a laser beam thereto and cooled for solidification for recording, reproduction and erasing. This fusing and cooling cycle is repeated, so that the material in the recording layer is caused to flow during the repetition of the fusing and cooling cycle. As a result, it may occur that the heat-resistant layer is peeled off the recording layer or cracks are formed in the heat-resistant layer by thermal shocks during the repetition of the fusing and cooling cycle, resulting in considerable deterioration of the phase-change type optical information recording medium (hereinafter referred to as the optical information recording medium).




In particular, the heat-resistant protective layer for the optical information recording medium is required to control the quantity of heat generated and accumulated in the recording layer by the application of laser beam thereto, and therefore plays a significantly important role for forming excellent recording marks with minimum litters and for achieving high operation reliability in the course of repeated use of the optical information recording medium.




The heat-resistant protective layer capable of playing the above-mentioned role is required to have the following properties:




(1) having high resistance against thermal shocks.




(2) capable of controlling the thermal conductivity of the heat-resistant protective layer an desired.




(3) having an appropriate refractive index for having the recording layer absorb laser beam effectively.




(4) chemically stable.




The optical information recording medium of the present invention is of a phase-change type and capable of recording information therein and erasing recorded information therefrom and being initialized before use, and comprises a substrate with guide grooves thereon; a recording layer provided on the substrate, comprising a recording material of which phase la reversibly changeable from a stable state to a semistable state and vice versa; a heat-resistant dielectric protective layer provided on the recording layer, comprising a protective material which comprises Zn, Si, S and O; and a light reflection and heat dissipation layer provided on the heat-resistant dielectric protective layer.




As mentioned previously, in the above, when the substrate is not sufficiently heat resistant, an additional heat-resistant dielectric protective layer comprising the same protective material as mentioned above may be interposed between the substrate and the recording layer.




In the present invention, it is particularly preferable that the above-mentioned protective material for use in the heat-resistant dielectric layer be a mixture of ZnS, ZnO and SiO


2


.




SiO


2


is known as a heat-resistant material which in highly resistant to thermal shocks. However, when SiO


2


is used alone in the above-mentioned heat-resistant protective layer, since the thermal coefficient of expansion of SiO


2


is much smaller than that of the recording layer, so that the heat-resistant protective layer made of SiO


2


tends to peel off the recording layer while in use. In order to solve this problem, it is proposed to use a mixture of SiO


2


and ZnS as disclosed in Japanese Laid-Open Patent Application 63-259855 and Japanese Patent Publication 7-111786. It is reported that the mixture of SiO


2


and ZnS exhibits excellent properties in terms of the thermal coefficient of expansion. However, the thermal conductivity of the mixture of SiO


2


and ZnS is as small as 1 w/m·k, which is considered to be much smaller than the thermal conductivities of other materials for use in the heat-resistant protective layer.




When a heat-resistant protective layer having such a small thermal conductivity is used in an optical information recording medium for compact disks for use at a low line speed, heat dissipation is not sufficient for repeated use due to the small thermal conductivity and therefore the repeated operation characteristics and mark jitter characteristics tend to deteriorate while in repeated use.




In the present invention, ZnO is added to the mixture of SiO


2


and ZnS in order to increase the thermal conductivity.




Furthermore, the refractive index of the mixture of SiO


2


and ZnS is 2.1, while the refractive index the mixture of Sis,, ZnS and ZnO is 1.9. Thus, by the addition of ZnO, the refractive index of the heat-resistant protective layer can be decreased, so that the light enclosing effect of the recording layer which is interposed between the substrate and the heat-resistant protective layer or between a pair of the heat-resistant protective layers is increased. As a result, the laser beam applied to the recording layer is more efficiently and effectively used, so that the recording sensitivity of the recording layer can be increased.




In order to fabricate a phase-change type optical information recording medium which can be employed with high operation reliability and excellent repetition use performance in a low line speed range through a high line speed range, the inventors of the present invention have experimentally confirmed that it is preferable to set the thermal conductivity of the heat-resistant protective layer or that of the protective material used in the heat-resistant protective layer in the range of 1.2 w/m·k to 24.0 w/m·k.




In the present invention, the above-mentioned thermal conductivity can be attained when the composition ratio of ZnS, ZnO and SiO


2


in the heat-resistant dielectric protective layer is set as represented by formula (I):






(ZnS)


α


(ZnO)


β


(SiO


2


)


γ


  (I)






wherein 30≦α≦90, 5≦β≦50, and 5≦γ≦30, and α+β+γ=100 mole %.




By adjusting the composition ratio of ZnS, ZnO and SiO


2


in the heat-resistant dielectric protective layer and accordingly by adjusting the thermal conductivity of the heat-resistant protective layer, the repetition use performance of rewritable CD-RW and DVD-RAM compact disks can be significantly improved. This can be attained by the addition of ZnO to the mixture of SiO


2


and ZnS as mentioned above.




In the present invention, it is preferable that the recording material comprising Ag, In, Sb and To be employed, more preferably with the addition thereto of at least one element selected from the group consisting of N and Cl. The addition of a nitrogen atom improves the repetition use performance of the recording material, while the addition of a chlorine atom increases the light absorption performance of the recording material and therefore improves the recording sensitivity of the recording material.




By use of the above recording material in the recording layer in combination with the above-mentioned the heat-resistant protective layer, the recording sensitivity and repetition use performance of the optical information recording medium can be significantly improved.




Ag-In-Sb-Tb recording materials are proposed as recording materials having high recording sensitivity a 1 high erasing performance in overwriting as disclosed in Japanese Laid-Open Patent Applications 2-37466, 2-171325 and 4-141485. However, when the recording layer composed of the above-mentioned Ag-In-Sb-Tb recording material is used in combination with the conventional ZnS·SiO


2


protective layer, the repetition use performance of the recording layer is not sufficient for use in compact disks used in a low line speed range.




For achieving the above-mentioned advantages of the present invention over the conventional optical information recording media, the recording material for use in the optical information recording medium of the present invention comprise Ag, S, one of Sb or As, and at least one element selected from the group consisting of Zn, Si, Go and Sn.




The above-mentioned recording material may be present in the form of Ag


3


SbS


3


or Ag


3


AsS


3


in a crystalline state in the stable state and in an amorphous state in the semistable state.




Furthermore, in the present invention, recording can be performed in the amorphous state, and initialization and erasing can be performed in the crystalline state.




Furthermore, the recording layer may comprise Ag


3


SbS


3


or Ag


3


AsS


3


in the stable state, with at least one element selected from the group consisting of Zn, Si, Ge and Sn being added thereto.




In the above, Zn serves as a donor and Si, Ge and Sn serve as an acceptor.




Furthermore, the recording layer may comprise a compound of formula (II) or a compound of formula (III):






(Ag


3


SbS


3


)


x


M


100−X


  (II)






wherein M represents at least one element selected from the group consisting of Zn, Ge, Si and Sn, and 92≦X≦99, X indicating mole %; and






(Ag


3


S


3


)


x


M


100−X


  (III)






wherein M represents at least one element selected from the group consisting of Zn, Go, Si and Sn, and 92≦X≦99, X indicating mole %.




With reference to

FIG. 1

, the structure of an example of the optical information recording medium of the present invention will now be explained.




In

FIG. 1

, on a substrate


1


, there are successively overlaid a first heat-resistant protective layer


2


, a recording layer


3


, a second heat-resistant protective layer


4


and a light reflection and heat dissipation layer


5


. As mentioned previously, it is not always necessary to provide a pair of the first and second heat-resistant protective layers between which the recording layer is to be interposed. However, when the substrate


1


is not heat resistant, for example, when the substrate


1


is made of polycarbonate, it is preferable to provide the first heat-resistant protective layer


2


as illustrated in FIG.


1


.




Examples of the materials for the substrate


1


are glass, ceramics and resins. In view of moldability and cost, a substrate made of a resin is preferable for use in the present invention.




Representative examples of resins for the substrate


1


are polycarbonate resin, acrylic resin, polystyrene resin, acrylonitrile-styrene copolymer resin, poly-ethylene resin, polypropylene resin, silicone resin, fluorine plastics, ABS resin and urethane resin. Of these resins, polycarbonate resin is most preferable in view of the workability and optical characteristics thereof




The substrate


1


may be in the shape of a disk, a card or a sheet.




The heat-resistant protective layers


2


and


4


for use in the present invention are dielectric layers and serve not only as heat-resistant protective layer, but also as optical interference layer. In order to have the protective layer serve as a suitable heat-resistant protective layer for use in the present invention, without causing the problem of peeling off the substrate or the recording layer, it is preferable that the heat-resistant protective layer have a thickness in the range of 200 Å to 3000 Å, more preferably in the range of 350 Å to 2000 Å.




The heat-resistant protective layer for use in the present invention can be formed by sputtering, using a ZnS·ZnO SiO


2


target.




The recording layer for use in the present invention can also be formed by sputtering. It is preferable that the recording layer have a thickness in the range of 100 Å to 1000 Å, more preferably in the range of 200 Å to 350 Å, in order to maintain appropriate light absorption performance and interference effect without reducing light transmittance thereof.




The light reflection and heat dissipation layer can be made of, for example, an aluminum alloy. The light reflection and heat dissipation layer can also be formed by sputtering. It is preferable that the light reflection and heat dissipation layer have a thickness in the range of 500 Å to 2000 Å, more preferably in the range of 700 Å to 1500 Å.




Other features of this invention will become apparent in the course of the following description of exemplary embodiments, which are given for illustration of the invention and are not intended to be limiting thereof.




EXAMPLES 1 to 13




On a disk-shaped polycarbonate substrate with a diameter of 120 mm and a thickness of 1.2 mm, with guide grooves with a pitch of 1.6 μm and a depth of about 600 Å being formed thereon, there were successively overlaid a first heat-resistant protective layer, a recording layer, a second heat-resistant protective layer, and a light reflection and heat dissipation layer by rf sputtering method.




The composition and thickness of each of the first heat-resistant protective layer, the recording layer, the second heat-resistant protective layer, and the light reflection and heat dissipation layer are shown in TABLE 1.




Thus, phase-change type optical recording media No. 1 to No. 13 of the present invention were respectively fabricated in Examples 1 to 13. In each of these phase-change type optical recording media, the first heat-resistant protective layer and the second heat-resistant protective layer have the same composition as shown in TABLE 1.




Comparative Example 1




The procedure of fabrication of the phase-changeable optical recording medium No. 1 in Example 1 was repeated except that the first and second heat-resistant protective layers employed in Example 1 were respectively replaced by a first heat-resistant protective layer with the composition as shown in TABLE 1, and a second heat-resistant protective layer with the composition as shown in TABLE 1, whereby a comparative phase-change type optical recording medium No. 1 was fabricated.




Comparative Example 2




The procedure of fabrication of the phase-changeable optical recording medium No. 10 in Example 10 was repeated except that the first and second heat-resistant protective layers employed in Example 10 were respectively replaced by a first heat-resistant protective layer with the composition as shown in TABLE 1, and a second heat-resistant protective layer with the composition as shown in TABLE 1, whereby a comparative phase-change type optical recording medium No. 2 was fabricated.




In each of the above comparative phase-change type optical recording media, the first heat-resistant protective layer and the second heat-resistant protective layer have the same composition as shown in TABLE 1.




Test samples with a thickness of 1 μm were prepared from the heat-resistant protective layers employed in Examples 1 to 13 and Comparative Example 1 and 2. Using these test samples, the thermal conductivity (w/m·k) of each of the heat-resistant protective layers employed in Examples 1 to 13 and Comparative Example 1 and 2 was measured by an optical alternate-current (A.C.) method.




Also using the same test samples, the thermal conductivity of each of the heat-resistant protective layers employed in Examples 1 to 13 and Comparative Example 1 and 2 was measured, using Ellipso Meter.




The results are shown in TABLE 2.




The thus obtained optical information recording media No. 1 to No. 9 of the present invention and comparative optical information recording medium No. 1 were evaluated by the following evaluation method A:




Evaluation Method A




Each of the above-mentioned optical information recording media was initialized and then subjected to overwriting with an EFM random pattern at a line speed of 1.4 m/s repeatedly. Thereafter, each optical information recording medium was evaluated with respect to the recording power dependence of 3T signals by reproduction of the overwritten EPM random pattern. The line speed at the reproduction was 2.8 m/s.




The results are shown in TABLES 3 to 12.




With respect to the comparative optical information recording medium No. 1 in Comparative Example 1, the number of repeatable overwriting times thereof was 1000 as shown in TABLE 12. In sharp contrast, with respect to the optical information recording media No. 1 to No. 9 of the present invention in Examples 1 to 9, the number of repeatable overwriting times was more than 3000.




It is considered that this is because the thermal conductivity of each of heat-resistant protective layers employed in the optical information recording media No. 1 to No. 9 of the present invention in Examples 1 to 9 is greater than that of each heat-resistant protective layer employed in the comparative optical information recording medium No. 1 in Comparative Example 1, so that the recording layers in the optical information recording media No. 1 to No. 9 were thermally less damaged than the recording layer in the comparative optical information recording medium No. 1 in Comparative Example 1. in particular, when the content ratio of ZnO is 5 mol % or more, the above-mentioned effect becomes conspicuous.




In Example 2, the content ratio of ZnO is greater than that in Example 1, so that the thermal conductivity of each heat-resistant protective layer in Example 2 is increased in comparison with the thermal conductivity of each heat-resistant protective layer in Example 1, so that 5,000 to 10,000 times overwriting was possible in the optical information recording medium No. 2 in Example 2.




In Example 3, the ZnO content ratio in each heat-resistant protective layer is 20 mole %, so that the thermal conductivity of each heat-resistant protective layer in Example 3 is increased to 11.9 W/m·k. As a result, the heat dissipation effect of each heat-resistant protective layer in Example 3 is greater than that of each heat-resistant protective layer in Example 2, but the recording sensitivity at relatively low recording powers is slightly lowered. However, the number of repeatable overwriting times is increased up to 15,000.




In Example 4, the ZnO content ratio in each heat-resistant protective layer is 30 mole %, so that the thermal conductivity of each heat-resistant protective layer in Example 4 is increased to 14.8 W/m·k. As a result, the heat dissipation effect of each heat-resistant protective layer in Example 4 is increased, so that the recording sensitivity at relatively low recording powers is slightly lowered. However, the number of repeatable overwriting times is increased up to 20,000.




In Example 5, the ZnO content ratio in each heat-resistant protective layer is 50 mole %, so that the thermal conductivity of each heat-resistant protective layer in Example 5 is increased to 23.8 W/m·k. Accordingly the heat dissipation effect of the heat-resistant protective layer in Example 5 is increased, so that the recording sensitivity at relatively low recording powers is slightly lowered. However, the number of repeatable overwriting times is increased up to 30,000 or more.




When the ZnO content ratio exceeds 50 mole %, the thermal conductivity of the heat-resistant protective layer is further increased and therefore the recording sensitivity at relatively low recording powers is further lowered. Therefore, the ZnO content ratio of more than 50 mole % is not always useful in practice.




In Example 6, the ZnO content ratio in each heat-resistant protective layer is 20 mole %, so that the thermal conductivity of the heat-resistant protective layer in Example 6 is smaller than that of the heat-resistant protective layer in Example 5. However, the number of repeatable overwriting times is 20,000 or more.




In Example 7, the optical information recording medium No. 7 thereof was fabricated in the same manner as in Example 3 except that the recording layer in Example 3 was replaced by a recording layer which was modified so as to include a nitrogen atom in the recording layer in Example 3.




The number of repeatable overwriting times of the optical information recording medium No. 3 in Example 3 was 15,000, while the number of repeatable overwriting times of the optical information recording medium No. 7 in Example 7 was 30,000. This indicates that the addition of nitrogen to the recording layer improves the number of repeatable overwriting times of the optical information recording medium No. 7.




In Example 8, the optical information recording medium No. 8 thereof was fabricated in the same manner as in Example 3 except that the recording layer in Example 3 was replaced by a recording layer which was modified so as to include a chlorine atom in the recording layer in Example 3.




The number of repeatable overwriting times of the optical information recording medium No. 3 in Example 3 was 15,000, and the number of repeatable overwriting times of the optical information recording medium No. 8 in Example 8 was also 15,000. However, TABLE 10 indicates that the recording sensitivity of the optical information recording medium No. 8 in Example 8 is higher than that of the optical information recording medium No. 3 in Example 3. This indicates that the addition of chlorine to the recording layer improves the recording sensitivity without having any adverse effect on the number of repeatable overwriting times of the optical information recording medium No. 8.




The previously obtained optical information recording media No. 10 to No. 13 of the present invention and comparative optical information recording medium No. 2 were evaluated by the following evaluation method B:




Evaluation Method B




Each of the above-mentioned optical information recording media was initialized. Recording was performed at a line speed of 1.2 m/s and a recording frequency (f1) of 0.4 MHZ, and then overwriting was performed with a recording frequency (f2) of 0.72 MHZ, using a recording laser with a wavelength of 780 nm. The C/N (dβ), the erasing ratio (dβ), the reflectivity of an erased portion, the reflectivity of a recorded portion, the contrast, and the number of repeatable overwriting times were measured. The results are shown in TABLE 13.




The results shown in TABLE 13 indicate that the use of the heat-resistant protective layer composed of (ZnS)


70


(ZnO)


10


(SiO


2


)


20


for both the first and second heat-resistant protective layers improves the recording sensitivity and the number of repeatable overwriting times. In particular, in Example 13, the recording layer includes not only Ag


3


SbS


3


, but also both Zn and Sn. In this recording layer, Zn serves as a donor and Sn serves as an acceptor, so that two energy levels are formed, which enhances the light absorption. Thus, the use of such recording layer significantly improves not only the recording sensitivity, but also the number of repeatable overwriting times.














TABLE 1











Thickness







Composition




(Å)











Example 1








First Heat-resistant




(ZnS)


30


(ZnO)


5


(SiO


2


)


5






1500 






Protective Layer




(mol %)






Recording Layer




Ag


4


In


10


Sb


47


Te


30


  (atm %)




200






Second Heat-resistant




(ZnS)


30


(ZnO)


5


(SiO


2


)


5






250






Protective Layer




(mol %)






Light Reflection and




Al alloy




1000 






Heat Dissipation Layer






Example 2






First Heat-resistant




(ZnS)


30


(ZnO)


10


(SiO


2


)


10






1500 






Protective Layer




(mol %)






Recording Layer




Ag


5


In


10


Sb


47


Te


30


  (atm %)




200






Second Heat-resistant




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






250






Protective Layer




(mol %)






Light Reflection and




Al alloy




1000 






Heat Dissipation Layer






Example 3






First Heat-resistant




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






1800 






Protective Layer




(mol %)






Recording Layer




Ag


5


In


10


Sb


47


Te


30


  (atm %)




200






Second Heat-resistant




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






275






Protective Layer




(mol %)






Light Reflection and




Al alloy




1000 






Heat Dissipation Layer






Example 4






First Heat-resistant




(ZnS)


50


(ZnO)


30


(SiO


2


)


20






2000 






Protective Layer




(mol %)






Recording Layer




Ag


5


In


10


Sb


47


Te


30


  (atm %)




200






Second Heat-resistant




(ZnS)


50


(ZnO)


30


(SiO


2


)


20






325






Protective Layer




(mol %)






Light Reflection and




Al alloy




800






Heat Dissipation Layer






Example 5






First Heat-resistant




(ZnS)


30


(ZnO)


50


(SiO


2


)


20






2000 






Protective Layer




(mol %)






Recording Layer




Ag


5


In


10


Sb


47


Te


30


  (atm %)




200






Second Heat-resistant




(ZnS)


30


(ZnO)


50


(SiO


2


)


20






350






Protective Layer




(mol %)






Light Reflection and




Al alloy




800






Heat Dissipation Layer






Example 6






First Heat-resistant




(ZnS)


50


(ZnO)


20


(SiO


2


)


20






1800 






Protective Layer




(mol %)






Recording Layer




Ag


5


In


10


Sb


47


Te


30


  (atm %)




200






Second Heat-resistant




(ZnS)


50


(ZnO)


20


(SiO


2


)


30






250






Protective Layer




(mol %)






Light Reflection and




Al alloy




1000 






Example 7






First Heat-resistant




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






1800 






Protective Layer




(mol %)






Recording Layer




Ag


5


In


10


Sb


46


Te


37


N


2


  (atm %)




200






Second Heat-resistant




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






275






Protective Layer




(mol %)






Light Reflection and




Al alloy




1000 






Example 8






First Heat-resistant




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






1800 






Protective Layer




(mol %)






Recording Layer




Ag


5


In


10


Sb


46.9


Te


30


Cl


0.1


  (atm %)




200






Second Heat-resistant




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






275






Protective Layer




(mol %)






Light Reflection and




Al alloy




1000 






Heat Dissipation Layer






Example 9






First Heat-resistant




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






1800 






Protective Layer




(mol %)






Recording Layer




Ag


5


In


10


Sb


48.9


Te


37


N


2


Cl


0.1


 (atm %)




200






Second Heat-resistant




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






275






Protective Layer




(mol %)






Light Reflection and




Al alloy




1000 






Example 10






First Heat-resistant




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






1800 






Protective Layer




(mol %)






Recording Layer




(Ag


3


SbS


3


)


95


Zn


3


  (atm %)




280






Second Heat-resistant




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






310






Protective Layer




(mol %)






Light Reflection and




Al alloy




800






Heat Dissipation Layer






Example 11






First Heat-resistant




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






1800 






Protective Layer




(mol %)






Recording Layer




(Ag


3


SbS


3


)


95


Zn


5


  (atm %)




300






Second Heat-resistant




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






300






Protective Layer




(mol %)






Light Reflection and




Al—Mg—Si




800






Heat Dissipation Layer






Example 12






First Heat-resistant




(ZnS)


70


(ZnO)


10


(SiO


2


)


20


(mol %)




1800 






Protective Layer






Recording Layer




(AgAsS)


90


Ge


10


  (atm %)




300






Second Heat-resistant




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






300






Protective Layer




(mol %)






Light Reflection and




Al—Mg—Si




800






Heat Dissipation Layer






Example 13






First Heat-resistant




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






1800 






Protective Layer




(mol %)






Recording Layer




(Ag


3


SbS


3


)


94


Zn


3


Sn


3


  (atm %)




300






Second Heat-resistant




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






280






Protective Layer




(mol %)






Light Reflection and




Al—Mg—Si




800






Heat Dissipation Layer






Comparative






Example 1






First Heat-resistant




(ZnS)


80


(SiO


2


)


20






1800 






Protective Layer




(mol %)






Recording Layer




Ag


5


In


10


Sb


47


Te


30


  (atm %)




200






Second Heat-resistant




(ZnS)


80


(SiO


2


)


20






250






Protective Layer




(mol %)






Light Reflection and




Al alloy




1000 






Heat Dissipation Layer






Comparative






Example 2






First Heat-resistant




(ZnS)


80


(SiO


3


)


20






1800 






Protective Layer




(mol %)






Recording Layer




(Ag


3


SbS


3


)


0.5


Zn


5


  (atm %)




300






Second Heat-resistant




(ZnS)


60


(SiO


2


)


20






300






Protective Layer




(mol %)






Light Reflection and




Al alloy




800






Heat Dissipation Layer

























TABLE 2













First and Second Heat-resistant Protective Layers

















Thermal








Composition




Conductivity




Refractive







(mol %)




(w/m · k)




Index


















Ex. 1




(ZnS)


90


(ZnO)


5


(SiO


2


)


5






1.20




2.02






Ex. 2




(ZnS


2


)


90


(ZnO)


10


(SiO


2


)


10






6.2




1.95






Ex. 3




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






11.9




1.97






Ex. 4




(ZnS)


50


(ZnO)


30


(SiO


2


)


20






18.4




1.82






Ex. 5




(ZnS)


30


(ZnO)


50


(SiO


2


)


20






23.8




1.91






Ex. 6




(ZnS)


50


(ZnO)


20


(SiO


2


)


30






13.3




1.77






Ex. 7




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






11.9




1.97






Ex. 8




(ZnS)


70


(ZnO)


20


(SiO


2


)


10






11.9




1.97






Ex. 9




(ZnS)


70


(ZnO)


30


(SiO


2


)


10






11.9




1.97






Ex. 10




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






12.0




1.98






Ex. 11




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






12.0




1.98






Ex. 12




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






12.0




1.98






Ex. 13




(ZnS)


70


(ZnO)


10


(SiO


2


)


20






12.0




1.98






Comp.




(ZnS)


90


(SiO


2


)


20






0.91




2.18






Ex. 1






Comp.




(ZnS)


90


(SiO


2


)


20






0.91




2.18






Ex. 2






















TABLE 3











Example 1












Number of




Recording power






repeatable




Jitter (ns)
















overwriting times




9 mW




10 mW




11 mW




12 mW




13 mW









   1




 9.6




 8.5




 8.1




 7.6




 8.2






  100




11.1




 9.3




 8.9




 8.8




 9.3






  500




13.2




10.1




 9.9




10.1




11.2






 1,000




14.8




12.2




11.8




12.3




13.1






 3,000




16.2




13.8




13.2




14.1




18.3






 5,000




22.1




18.2




17.6




18.9




x






10,000




x




x




x




x




x






15,000































20,000































30,000




































“x” denotes that recording was impossible.





















TABLE 4











Example 2












Number of




Recording power






repeatable




Jitter (ns)
















overwriting times




9 mW




10 mW




11 mW




12 mW




13 mW









   1




10.7




 9.2




 8.9




 7.9




 7.2






  100




11.9




 9.8




 9.5




 8.9




 7.9






  500




13.6




10.8




10.7




 9.9




 9.8






 1,000




14.8




12.3




12.3




12.1




12.6






 3,000




16.5




13.7




13.8




13.2




14.1






 5,000




21.2




17.8




18.2




14.9




18.3






10,000




33.2




30.1




30.4




27.5




x






15,000




x




x




x




x




x






20,000































30,000




































“x” denotes that recording was impossible.





















TABLE 5











Example 3












Number of




Recording power






repeatable




Jitter (ns)
















overwriting times




9 mW




10 mW




11 mW




12 mW




13 mW









   1




11.5




10.4




 9.6




 8.4




 7.7






   10




12.1




 9.6




 8.8




 7.6




 7.2






  500




13.6




 9.7




 9.2




 8.8




 8.3






 1,000




14.5




11.1




10.9




 9.9




 9.8






 3,000




17.7




13.1




12.6




11.6




13.6






 5,000




19.2




14.4




13.3




12.5




14.3






10,000




24.3




15.0




13.9




13.2




14.9






15,000




26.9




18.8




14.4




16.2




19.3






20,000




29.9




22.3




15.1




21.3




x






30,000




33.1




25.6




17.7




x
















“x” denotes that recording was impossible.





















TABLE 6











Example 4












Number of




Recording power






repeatable




Jitter (ns)
















overwriting times




10 mW




11 mW




12 mW




13 mW




14 mW









   1




11.9




10.7




 8.9




 8.2




 7.8






  100




10.1




 9.8




 8.1




 7.7




 7.3






  500




10.5




10.2




 9.0




 8.8




 8.6






 1,000




10.9




11.3




10.1




 9.7




10.7






 3,000




11.2




12.4




11.3




11.1




12.9






 5,000




13.3




13.1




12.2




12.4




14.0






10,000




14.4




13.9




13.0




13.2




14.7






15,000




15.1




14.1




13.9




14.7




18.1






20,000




15.5




14.7




14.5




15.9




26.6






30,000




16.3




15.1




15.4




18.3




x











“x” denotes that recording was impossible.





















TABLE 7











Example 5












Number of




Recording power






repeatable




Jitter (ns)
















overwriting times




11 mW




12 mW




13 mW




14 mW




15 mW









   1




18.1




15.2




12.1




10.1




 9.1






  100




17.9




14.7




11.8




 9.3




 8.8






  500




18.3




14.8




11.8




 9.5




 9.6






 1,000




18.7




14.8




11.9




 9.8




10.3






 3,000




19.1




15.0




12.1




10.3




12.6






 5,000




19.4




15.4




12.2




11.9




13.7






10,000




19.7




15.9




12.3




13.2




14.2






15,000




20.0




16.2




12.7




14.4




16.7






20,000




20.2




16.6




12.9




15.9




22.3






30,000




20.4




17.3




13.4




18.4




33.8






















TABLE 8











Example 6












Number of




Recording power






repeatable




Jitter (ns)
















overwriting times




10 mW




11 mW




12 mW




13 mW




14 mW









   1




10.3




 9.3




 8.3




 7.9




 7.4






  100




 9.8




 8.8




 7.9




 7.6




 7.2






  500




10.9




 9.9




 8.9




 8.8




 9.2






 1,000




12.1




12.2




10.4




11.6




12.9






 3,000




13.2




13.1




12.5




13.9




14.6






 5,000




14.1




14.0




14.4




15.5




17.1






10,000




14.9




15.5




17.2




19.2




20.2






15,000




17.1




18.2




19.6




22.3




25.6






20,000




19.3




22.2




26.6




27.5




29.3






30,000




25.6




27.2




x





















“x” denotes that recording was impossible.





















TABLE 9











Example 7












Number of




Recording power






repeatable




Jitter (ns)
















overwriting times




9 mW




10 mW




11 mW




12 mW




13 mW









   1




11.3




10.1




9.2




8.2




7.5






  100




11.7




 9.2




8.4




7.3




7.1






  500




12.1




 9.2




8.7




7.9




7.7






 1,000




12.6




 9.7




9.3




8.5




8.3






 3,000




14.2




10.2




10.0 




9.3




9.9






 5,000




14.9




10.9




10.6 




10.2 




12.2 






10,000




15.8




11.8




11.2 




10.9 




13.3 






15,000




17.7




13.2




12.9 




12.1 




14.3 






20,000




19.8




14.4




14.0 




13.8 




17.9 






30,000




23.1




18.9




15.8 




15.7 




23.3 






















TABLE 10











Example 8












Number of




Recording power






repeatable




Jitter (ns)
















overwriting times




9 mW




10 mW




11 mW




12 mW




13 mW









   1




12.3




10.9




10.2




 8.8




 8.0






  100




12.4




10.1




 9.9




 8.1




 7.6






  500




14.0




10.5




10.2




 8.8




 8.2






 1,000




14.9




11.7




11.1




 9.6




 9.2






 3,000




18.1




13.7




12.9




10.7




11.7






 5,000




19.5




14.8




13.8




11.9




12.5






10,000




25.1




15.5




14.4




13.7




16.8






15,000




27.2




19.3




15.0




17.3




22.3






20,000




30.3




22.8




15.7




24.7




x






30,000




31.2




26.3




17.6




x
















“x” denotes that recording was impossible.





















TABLE 11











Example 9












Number of




Recording power






repeatable




Jitter (ns)
















overwriting times




8 mW




9 mW




10 mW




11 mW




12 mW









   1




12.7




11.4




10.9




 9.6




 8.8






  100




12.9




10.8




10.3




 8.9




 8.2






  500




13.3




11.3




10.6




 9.2




 8.5






 1,000




13.7




11.6




11.0




 9.5




 8.9






 3,000




14.5




12.1




11.5




10.1




 9.5






 5,000




15.8




13.0




12.3




10.7




10.3






10,000




17.2




14.1




13.2




11.4




11.2






15,000




19.3




15.2




14.4




12.2




12.4






20,000




21.4




16.3




15.1




13.1




13.5






30,000




24.4




17.7




16.3




14.2




14.9






















TABLE 12











Comparative Example 1












Number of




Recording power






repeatable




Jitter (ns)
















overwriting times




9 mW




10 mW




11 mW




12 mW




13 mW









   1




11.1




 9.3




 8.9




10.6




14.6






  100




13.2




10.1




 9.7




12.3




15.7






  500




14.8




12.2




11.8




13.1




19.1






 1,000




18.2




13.8




13.2




14.3




34.2






 3,000




x




x




x




x




x






 5,000































10,000































15,000































20,000































30,000




































“x” denotes that recording was impossible.

























TABLE 13













Characteristics




Recording Power (Pw/Pa) (mW)



















Example 10

















19/10




20/10




21/10




22/10





















C/N (dβ)




48




48




49




50







Erasing ratio (dβ)




24




25




26




27







Reflectivity of




70




70




69




68







erased portion (%)







Reflectivity of




28




27




26




24







recorded portion (%)







Contrast




0.6




0.61




0.62




0.65







Repeatable number of




60




60




58




57







overwriting times


















Example 11

















21/10




22/10




23/10




24/10





















C/N (dβ)




48




48




49




50







Erasing ratio (dβ)




24




25




26




27







Reflectivity of




70




70




69




68







erased portion (%)







Reflectivity of




28




28




27




26







recorded portion (%)







Contrast




0.6




0.6




0.61




0.62







Repeatable number of




80




78




77




75







overwriting times


















Example 12

















20/10




21/10




22/10




23/10





















C/N (dβ)




47




48




48




49







Erasing ratio (dβ)




23




25




25




26







Reflectivity of




71




70




70




69







erased portion (%)







Reflectivity of




31




30




30




29







recorded portion (%)







Contrast




0.56




0.57




0.57




0.58







Repeatable number of




80




80




79




78







overwriting times


















Example 13

















17/10




18/10




19/10




20/10





















C/N (dβ)




48




49




50




51







Erasing ratio (dβ)




25




25




26




26







Reflectivity of




69




68




68




67







erased portion (%)







Reflectivity of




30




29




28




27







recorded portion (%)







Contrast




0.57




0.57




0.57




0.60







Repeatable number of




95




93




93




92







overwriting times


















Comparative Example 2

















25/10




26/10




27/10




28/10





















C/N (dβ)




45




46




46




47







Erasing ratio (dβ)




22




22




23




24







Reflectivity of




68




68




69




68







erased portion (%)







Reflectivity of




29




28




28




27







recorded portion (%)







Contrast




0.57




0.59




0.59




0.60







Repeatable number of




20




20




19




19







overwriting times















Japanese Patent Application No. 08-040205 filed Feb. 27, 1996 is hereby incorporated by reference.



Claims
  • 1. An optical information recording medium capable of recording information therein and erasing recorded information therefrom, and being initialized, comprising:a substrate with guide grooves thereon; a recording layer provided on said substrate, comprising a recording material of which phase is reversibly changeable from a stable state to a semistable state and; vice versa, said recording material comprising Ag, In, Sb and Te combined with chlorine; a heat-resistant dielectric protective layer provided on said recording layer, comprising a protective material which comprises ZnS, ZnO and SiO2; and a light reflection and heat dissipation layer provided on said heat-resistant dielectric protective layer.
  • 2. The optical information recording medium as claimed in claim 1, wherein the composition ratio of ZnS, ZnO and SiO2 in said heat-resistant dielectric protective layer is represented by formula (I): (ZnS)α(ZnO)2 (SiO2)γ  (I)wherein 30≦α≦90, 5≦β≦50and 5≦γ≦30, and α+β+γ=100 mole %.
  • 3. The optical information recording medium as claimed in claim 1, wherein said protective material has a thermal conductivity in a range of 1.2 W/m·k to 24.0 W/m·k.
  • 4. The optical information recording medium as claimed in claim 1, wherein said recording material further comprises nitrogen.
  • 5. The optical information recording medium as claimed in claim 1, wherein recording is performed in said amorphous state, and initialization and erasing are preformed in said crystalline state.
  • 6. The optical information recording medium as claimed in claim 1, further comprising an additional heat-resistant dielectric protective layer comprising a protective material which comprises Zn, St, S and O, which is interposed between said substrate and said recording layer.
Priority Claims (1)
Number Date Country Kind
8-040205 Feb 1996 JP
US Referenced Citations (8)
Number Name Date Kind
4954379 Nishida et al. Sep 1990
5011723 Harigaya et al. Apr 1991
5024927 Yamada et al. Jun 1991
5080947 Yamada et al. Jan 1992
5100700 Ide et al. Mar 1992
5156693 Ide et al. Oct 1992
5453346 Kawahara et al. Sep 1995
5470628 Tominaga et al. Nov 1995
Foreign Referenced Citations (12)
Number Date Country
0 564 260 Oct 1993 EP
0 574 025 Dec 1993 EP
0 630 007 Dec 1994 EP
0 639 830 Feb 1995 EP
0 706 179 Apr 1996 EP
0 706 176 Apr 1996 EP
0 717 404 Jun 1996 EP
0 745 975 Dec 1996 EP
2-103747 Apr 1990 JP
3-128282 May 1991 JP
5-073959 Mar 1993 JP
6-325406 Nov 1995 JP
Non-Patent Literature Citations (1)
Entry
Japanese Journal of Applied Physics, vol. 32, No. 5A, Part 1, pp. 1980-1982, May 1, 1993, Junki Tominaga, et al., “V and Ti Doping Effect on In-Ag-Te-Sb Optical Phase Change Rewritable Disc”.