Claims
- 1. A method of making an orifice plate having an orifice extending therethrough, the method comprising the steps of:
- selecting an essentially planar substrate for an orifice plate, said essentially planar substrate having a first surface and a second surface, said first surface including a first portion having a wetting characteristic with respect to ink;
- forming an orifice extending from said first surface of the orifice plate to said second surface in said orifice plate, said orifice and said first portion of said first surface joining to define an edge, said first portion of said first surface being adjacent to said edge, surrounding said orifice, and separated from said orifice by said edge;
- surrounding said first portion of said first surface with a second portion of said first surface, said second portion given a non-wetting characteristic with respect to ink; and
- surrounding said second portion of said first surface with a third portion of said first surface said third portion of said first surface having a wetting characteristic with respect to ink.
- 2. The method of claim 1 wherein the step of surrounding said second portion comprises the step of etching said third portion of said first surface to provide said wetting characteristic.
- 3. The method of claim 1 wherein the step of surrounding said first portion comprises the step of spraying onto said first surface a material that has said first wetting characteristic.
- 4. The method of claim 3 wherein the step of surrounding said first portion comprises the step of masking said third portion of said first surface while said second portion of said first surface is sprayed to have said second wetting characteristic.
- 5. The method of claim 1 further comprising the step of masking said third portion of said first surface and said first portion of said first surface while said second portion of said first surface is sprayed to have the first wetting characteristic.
- 6. The method of claim 1 wherein said steps of surrounding said first portion of said first surface and surrounding said second portion of said first surface further comprise the steps of applying a photoresist mask to essentially all of said first surface except for said second portion of said first surface and applying a layer of non-wetting material onto said second portion of said first surface.
- 7. The method of claim 6 wherein said step of applying said layer of non-wetting material further comprises the step of applying said layer to a thickness of between 0.2.mu. and 2.0.mu..
- 8. The method of claim 1 further comprising the steps of:
- applying a mask to said second surface of said essentially planar substrate and to a surface which defines the orifice; and
- etching said first surface, thereby producing said first wetting characteristic with respect to ink.
CROSS REFERENCE TO RELATED APPLICATION
This is a divisional of application Ser. No. 07/724,648 filed on Jul. 2, 1991, now U.S. Pat. No. 5,434,606.
US Referenced Citations (13)
Foreign Referenced Citations (1)
Number |
Date |
Country |
0359365 |
Jul 1989 |
EPX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
724648 |
Jul 1991 |
|