Patent Application
20180128948
The field of the present invention relates to phase-transforming optical reflectors. In particular, methods are disclosed for making such optical reflectors using partial etching or using partial etching with reflow.
An inventive optical element comprises a reflective surface supported by a substantially solid substrate; the reflective surface comprises a multitude of discrete recessed and non-recessed areas arranged contiguously along the reflective surface. The recessed or non-recessed areas include a non-empty subset of areas of the multitude having a largest transverse dimension less than about a design vacuum wavelength λ0. The recessed and non-recessed areas are characterized by a depth function d(x,y), which is a function of two-dimensional position coordinates x and y along the reflective surface, that equals zero in the non-recessed areas and that assumes non-zero values in the recessed areas up to a maximum depth DR. The reflective surface is reflective over an operational wavelength range that includes the design vacuum wavelength λ0; a corresponding volume within each recessed area is substantially transparent over the operational wavelength range and is characterized by a first bulk refractive index n1(λ). The optical element is structurally arranged so as to receive an optical signal incident on the reflective surface and to reflect at least a portion of the incident optical signal transformed substantially according to a specified effective phase transformation function φeff(x,y) that varies as a function of x and y. The discrete areas of the multitude are variously sized and distributed on the reflective surface so as to impart on the reflected portion of the incident optical signal the effective phase transformation φeff(x,y). Inventive methods for making an inventive optical element include spatially selectively processing a surface or layer of material to form the recessed and non-recessed areas, and can further include a calibration process, an iterative fabrication process, or a reflow process.
Objects and advantages pertaining to phase-transforming optical reflectors may become apparent upon referring to the example embodiments illustrated in the drawings and disclosed in the following written description or appended claims.
This Summary is provided to introduce a selection of concepts in a simplified form that are further described below in the Detailed Description. This Summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used as an aid in determining the scope of the claimed subject matter.
The embodiments depicted are shown only schematically: all features may not be shown in full detail or in proper proportion, certain features or structures may be exaggerated relative to others for clarity, and the drawings should not be regarded as being to scale. For example, the actual optical elements depicted as having a handful of discrete areas or volumes might have thousands or millions of such areas or volumes per square millimeter; the number of such areas or volumes is reduced in the drawings for clarity. In addition, the height, depth, or width of each area or volume often can be exaggerated relative to, e.g., the thickness of an underlying substrate. The examples depicted all show normal incidence of an optical signal, however, the apparatus and methods disclosed herein can be employed with non-normal incidence of optical signals. The embodiments shown are only examples; they should not be construed as limiting the scope of the present disclosure or appended claims.
The present application is related to subject matter disclosed in (i) U.S. non-provisional application Ser. No. 14/687,882 filed Apr. 15, 2015 in the names of Mossberg et al (now U.S. Pat. No. 9,618,664), and (ii) U.S. provisional App. No. 62/410,380 filed Oct. 19, 2016 in the names of Iazikov et al. Each of said applications is incorporated by reference as if fully set forth herein.
Optical elements of various types can be described generally as imposing some desired phase transformation function φ(x,y) onto an optical signal propagating through or reflected from the optical element (where x and y are two-dimensional position coordinates along a surface of the optical element in directions substantially transverse to the propagation direction of the optical signal). In some transmissive optical elements, the phase transformation is imparted by a single-pass transmission; in a some reflective optical elements, the phase transformation is imparted by double-pass transmission with an intervening reflection; in some reflective optical elements, the phase transformation is imparted by surface reflection. Such a phase transformation function may also be referred to herein as a phase shift function, phase delay function, or phase function. Note that it is the relative phase delay across an optical signal wavefront that is relevant, not the absolute phase delay. One example of a phase transformation function is a linear phase transformation function of the form φ(x,y)=Ax+By, which results in angular deflection of the optical signal without otherwise altering its spatial properties (somewhat analogous to refraction, with the direction of deflection depending on the values of the constants A and B). A second example is a quadratic phase transformation function of the form φ(x,y)=Ax2+By2; φ(x,y) written in this form assumes the coordinates x and y are centered with respect to φ(x,y) and rotated to coincide with principal axes of φ(x,y). A quadratic phase transformation acts as a positive or negative lens in the corresponding transverse dimension according to the signs of the constants A and B. If either A or B (but not both) is zero, then the phase transformation acts as a cylindrical lens (in the paraxial limit). If A=B, the phase transformation acts as a spherical lens (in the paraxial limit). A third example is an angular phase transformation function of the form φ(x,y)=Mθ for 0≤θ<2π, where θ is related to x and y by cos θ=x/(x2+y2)1/2 and sin θ=y/(x2+y2)1/2 and M is an integer. An angular phase transformation acts as a so-called vortex lens that can be used, e.g., to convert an optical beam with a Gaussian transverse profile into a beam with a doughnut-shaped transverse profile. Phase transformation functions are additive, i.e., a phase transformation function φ(x,y) can be a sum of two (or more) distinct, specified, position-dependent phase transformation functions φ1(x,y) and φ2(x,y). In one such example, φ1(x,y) can be a quadratic function and φ2(x,y) can be an angular function; the sum φ(x,y) can result in, e.g., focusing of a Gaussian beam while simultaneously converting it to a doughnut-shaped beam, thereby combining the functions of a spherical lens and a vortex lens in a single optical element.
A specified phase transformation function φ(x,y) can be imposed by an optical element that imparts a position-dependent phase shift or phase delay onto a transmitted or reflected optical beam. For a transmissive layer 100 of a transmissive optical element (e.g., as in
In a singlet refractive lens, a single optical medium is employed and the thickness varies with respect to transverse position. In so-called gradient-index elements (e.g., a GRIN lens), the refractive index varies with transverse position. Certain phase transformation profiles are relatively easy to produce by standard manufacturing techniques. Spherical lenses, for example, provide a quadratic phase transformation (in the paraxial limit) and are easily manufactured; GRIN lenses can be readily manufactured from segments of optical fiber. Other more arbitrary phase transformation functions φ(x,y) are not necessarily quite so readily produced. It would be desirable to produce an optical element having an arbitrarily specified phase transformation function φ(x,y).
Because of the periodic nature of optical signals, phase delays separated by integer multiples of 2π all have the same effect on the optical signal. Because of the periodicity, any given phase transformation function can be replaced with an equivalent modulo 2π function, i.e., each function value can be replaced by the corresponding value from 0 to 2π that differs from the original value by an integer multiple of 2π. The original phase function and its modulo 2π equivalent effect the same transformation on an optical signal. Illustrative examples are shown in
Spatially selective material processing techniques, e.g., photolithography or e-beam lithography, can in principle be employed to produce an optical element that imparts a specified, arbitrary phase transformation function φ(x,y). However, most such techniques are best suited for forming a spatial profile having only two levels, (e.g., a given area can be etched or not, photo-exposed or not, doped or not) and so are not so readily employed to provide an arbitrary phase transformation function with a continuous (or near continuous) relative phase distribution. Grayscale or multilevel lithography techniques can produce an optical element that imparts a continuous, arbitrary phase function, but such techniques are far more complex and are difficult to implement at production scales. It would be more desirable to enable use of a two-level lithographic technique (i.e., binary lithography) to produce such optical elements. Reflow of one or more of the lithographically patterned materials can then be employed in some instances to alter further the spatial profile of the reflowed material. Inventive optical elements disclosed herein are formed using binary lithographic techniques, and in some instances followed by reflow, to impart a specified, arbitrary phase transformation function, or at least an operationally acceptable approximation thereof. In the context of the instant specification and appended claims, the phrase operationally acceptable indicates a condition or arrangement that deviates from an ideal condition or arrangement by an amount that still enables the optical device to perform adequately in a given operational context. For example, a conventional singlet lens that deviates from an ideal spherical surface by as much as λ/4 might be sufficient for some imaging applications, while other imaging applications might require more stringent surface accuracy, e.g., λ/10 or λ/20.
In any of the disclosed arrangements (single-pass transmission, double-pass reflection, or surface reflection), the actual phase shift that results depend, inter alia, on the angle of incidence, the wavelength of the incident optical signal, and on the details of the spatial variation of the functions di(x,y) or d(x,y). Given a desired phase transformation φ(x,y), an initial estimate of the functions di(x,y) or d(x,y) can be calculated. In many examples, however, an iterative design/fabrication/measurement process can be advantageously employed to find functions di(x,y) or d(x,y) that yield an optical element that provides an effective phase transformation φeff(x,y) that exhibits acceptably small (i.e., operationally acceptable) phase error relative to the designed phase transformation φ(x,y). The functions di(x,y) or d(x,y) that result from such an iterative process can differ from those calculated based on φ(x,y).
Some examples of an inventive optical element 10 comprises a transmissive layer 100, illustrated schematically in
A non-empty subset of the volumes 103 of the multitude have transverse dimensions (i.e., dimensions parallel to the transmissive layer 100) that are less than about λ0 (i.e., a non-empty subset of the volumes 103 are sub-wavelength features of the transmissive layer 100). The multitude of discrete volumes 103 can be arranged so that any given simply connected (topologically) sample volume of a transmission region of the transmissive layer 100, having both transverse dimensions about equal to λ0 along the first surface 101 and extending from the first surface 101 through the transmissive layer 100 to the second surface 102, includes only the first optical medium, only the second optical medium, or both the first and second optical media of at least portions of two or more of the discrete volumes 103. Typically, the multitude of discrete volumes 103 is arranged so that any locally perpendicular straight-line path, extending from a first surface 101 of the transmissive layer 100 to a second surface 102 of the transmissive layer 100, passes through only the first optical medium, through only the second optical medium, or through only one discrete volume 103 of each of the first and second optical media. Note that for each of the surfaces 101 and 102, in some examples the surface can be a distinct physical interface or boundary between differing structures or materials (e.g., wherein the transmissive layer 100 comprises an etched layer of one material on a substrate of another material, as in the example of, inter alia,
The discrete volumes 103 are variously sized and distributed on the transmissive layer so as to impart on the transmitted or reflected portion of the incident optical signal the effective phase transformation φeff(x,y). In some examples, the discrete volumes 103 can be distributed on the transmissive layer 100 so that (2π/λ0)·(n1(λ0)·d1(x,y)+n2(λ0)·d2(x,y)), as a function of two-dimensional position coordinates x and y along the first surface of the transmissive layer, averaged over an area having transverse dimensions about equal to λ0 on the first surface of the transmissive layer, is substantially equal to, or substantially proportional to, a specified position-dependent effective phase transformation function φeff(x,y) for a single-pass-transmissive optical element (or substantially equal to ½·φeff(x,y) for a double-pass-reflective optical element), where (i) d1(x,y) and d2(x,y) are the respective local thicknesses through the first and second optical media along the locally perpendicular straight-line path through a given position (x,y), and (ii) φeff(x,y) varies with one or both x or y.
In some examples in which an optical signal is received at substantially normal incidence relative to the transmissive layer 100, the transmissive layer 100 can impart a local phase delay (at wavelength λ0) for single-pass transmission, that can be approximated by (2π/λ0)·(n1(λ0)·d1(x,y)+n2(λ0)·d2(x,y)), that varies with two-dimensional position (x,y) along the first surface 101 of the transmissive layer 100. A similar approximation can be calculated for non-normal incidence. In general the thicknesses d1(x,y) and d2(x,y) can vary in any suitable way; however, in many examples those thicknesses will be subject to the constraint that the transmissive layer 100 has a substantially uniform thickness d1(x,y)+d2(x,y)=DT (i.e., substantially uniform to within limits imposed by constraints of fabrication processes employed; see below). Such an arrangement arises naturally when employing a lithographic process on a substrate surface (where DT would typically be equal to the etch depth) or on a uniform surface layer on a substrate (where DT would typically equal the surface layer thickness). Another common arrangement is one in which the transmissive layer 100 includes areal regions for which either d1(x,y) or d2(x,y), but not both, equals zero; in other words, the transmissive layer includes regions wherein only one of the optical media spans the transmissive layer 100 by extending from the first surface 101 through the transmissive layer 100 to the second surface 102. In some examples, all such regions comprise only one of the optical media and no volume of the other optical medium spans the transmissive layer 100; in other examples, some such regions comprise the first optical medium while other such regions comprise the second optical medium; in some of those latter examples, every areal region of the transmissive layer 100 comprises only one or the other optical medium extending from the first surface 101 to the second surface 102 (as in
Propagation of an optical signal at wavelength λ0 through the transmissive layer 100 at normal incidence at given position (x,y) would nominally result in a phase delay of (2π/λ0)·(n1(λ0)·d1(x,y)+n2(λ0)·d2(x,y)) for single-pass transmission. However, due to the wave nature of the optical signal having wavelength λ0, the optical signal propagating through one of the subwavelength discrete volumes 103 is affected by (i.e., effectively “samples”) other nearby discrete volumes 103 (i.e., discrete volumes 103, or portions thereof, within a surrounding region having transverse dimensions about equal to λ0), some of which may have index n1(λ0) and some of which may have index n2(λ0). The optical signal is affected at position (x,y) as if it were transmitted through a medium having an average index, between n1 and n2, that is about equal to a spatial average of the indices of the nearby discrete volumes 103 or nearby portions thereof. At normal incidence the transmissive layer 100 therefore imparts a spatially varying effective phase transformation function φeff(x,y,λ0) that is about equal to the quantity (2π/λ0)·(n1(λ0)·d1(x,y)+n2(λ0)·d2(x,y)) (for a single pass), or about equal to the quantity (4π/λ0)·(n1(λ0)·d1(x,y)+n2(λ0)·d2(x,y)) (for a double pass), spatially averaged over a sampling area having transverse dimensions about equal to λ0. Similar approximation and averaging can be applied for non-normal incidence. The discrete volumes 103 can be sized and distributed on the transmissive layer 100 so that (2π/λ0)·(n1(λ0)·d1(x,y)+n2(λ0)·d2(x,y)) (for a single pass), or (4π/λ0)·(n1(λ0)·d1(x,y)+n2(λ0)·d2(x,y)) (for a double pass), approximates (or is approximately proportional to) a specified phase transformation function φ(x,y) that varies with both x and y, including those described above. The optical element is structurally arranged so as to receive an optical signal 11 incident on the first surface 101 and to transmit (
Some illustrative examples follow. For n1 of about 1.5 and n2 of unity (e.g., glass or silica and air), the thickness required to effect a 2π relative phase shift in a single pass is about 1.6 μm for λ0 of about 800 nm. For n1 of about 3 and n2 of unity (e.g., a semiconductor and air), the thickness required to effect a 2π relative phase shift in a single pass is about 0.75 μm at λ0 of about 1500 nm. The greater the index contrast between the first and second optical media, the smaller the thickness of the transmissive layer 100 can be while still providing a sufficiently large phase shift.
Similar behavior is exhibited by reflective surfaces made up of recessed and non-recessed areas 201 and 202, respectively, that include a non-empty subset of areas of the multitude having a largest transverse dimension less than about λ0 (e.g., as in the examples of
As with the transmissive layer 100, the wave nature of the incident optical signal 211 having wavelength λ0 causes the optical signal propagating through one of the subwavelength discrete areas 201/202 to be affected by (i.e., effectively “samples”) other nearby discrete areas 201/202 (i.e., discrete areas 201/202, or portions thereof, within a surrounding region having transverse dimensions about equal to λ0), some of which may be recessed and some of which may be non-recessed. The optical signal is affected at position (x,y) as if it were reflected by a surface recessed to an average depth, between zero and DR, that is about equal to a spatial average of the depths of the nearby discrete areas 201/202 or nearby portions thereof. The reflective surface therefore imparts upon reflection a spatially varying effective phase transformation function φeff(x,y,λ0) that can be approximated (at normal incidence) by the quantity (4π/λ0)·n1(λ0)·d(x,y) spatially averaged over a sampling area having transverse dimensions about equal to λ0. Similar approximation and averaging can be applied for non-normal incidence.
Some illustrative examples follow. For n1 of about 1 (e.g., the reflective surface in immersed in vacuum or air), the thickness required to effect a 2π relative phase shift in a single pass is about 0.4 μm for λ0 of about 800 nm. For n1 of about 1.5 (e.g., polymer or silica filling the recessed areas 201), the thickness required to effect a 2π relative phase shift in a single pass is about 0.5 μm at λ0 of about 1500 nm. The larger the index of the medium filling the recessed areas 201, the smaller the depth of those recessed areas 201 can be while still providing a sufficiently large phase shift.
For conceptualizing and computationally designing the inventive optical element, it can be advantageous in some examples for the transmissive layer thickness to result in a phase difference of an integer multiple of 2π between the first and second optical media. For a transmissive optical element with a transmissive layer 100 (single pass and normal incidence, as in
Similarly, in some surface-reflective examples (as in
In all of those categories, i.e., single-pass transmission (through layer 100, e.g., as in
Spatially selective material processing (e.g., etching, deposition, and so forth) and subsequent reflow can be implemented in a wide variety of ways using a wide variety of materials. Some examples are described below.
The transmissive layer 100 (e.g., as in
In some examples, the transmissive layer 100 is mechanically stabilized by a substrate or overlayer 30 positioned against the surface 101 (the incident surface). The substrate 30 comprises a suitably rigid and stable, substantially transparent, solid material (crystalline, polycrystalline, or amorphous), e.g., one or more of a doped or undoped dielectric material, a doped or undoped semiconductor material, or a doped or undoped polymer. The incident optical signal 11 propagates through the substrate 30; the portion 13 of the incident optical signal 11 transmitted through the transmissive layer 100 and into the ambient medium 20 is transformed substantially according to the effective phase transformation function φeff(x,y). In the examples of
In the examples of
The arrangements of
The examples of
The examples of
Additional examples (not shown) can be implemented that resemble
Any of the examples of
The examples of
The examples of
An inventive method employing an inventive optical element disclosed herein comprises (i) directing an optical signal 11 onto the first surface of the transmissive layer 100 of the optical element (e.g., as in
An inventive method for making some examples disclosed herein (e.g.,
An inventive method, for making some examples disclosed herein (e.g.,
Another inventive method, for making some examples disclosed herein (e.g.,
In some examples of surface-reflective optical elements (e.g.,
In some other examples of surface-reflective optical elements (e.g.,
The inventive optical elements disclosed herein enable the approximation of an arbitrary phase transformation function φ(x,y) in an optical element made using only binary spatial processing techniques, followed in some examples by at least partial reflow of one or optical media or reflective material. That result is achieved by exploiting the wave nature of the optical signal and its effective “sampling” of multiple sub-wavelength spatial features of the optical element, and in some examples employing reflow to reduce resulting unwanted diffraction or scattering. In effect, use of reflow can relax the spatial resolution required to achieve a desired effective phase transformation function, because the alteration of the morphology of the spatially processed material is at least partly “averaged out” by the reflow. However, smaller spatial features are increasingly difficult to fabricate with decreasing transverse size. Perhaps more importantly, the transverse feature size limits the corresponding thickness of those features, e.g., a 100 nm linewidth can be readily achieved by spatially selective processing of a 100 nm thick layer of material, but cannot be as readily achieved in a 1 μm thick layer of material. The thickness limitation puts a lower limit on the feature size that can be readily employed, at least in those instances wherein at least a 2π phase shift is needed or desired to approximate many phase transformation functions and sufficient thickness must be employed to achieve that phase shift.
In some examples (
In some examples, the multitude of discrete volumes 103, or the multitude of recessed and non-recessed areas 201/202, is arranged so that, within each unit cell of the grid pattern, the discrete volumes 103, areas 201/202, or portions thereof encompassed by that unit cell are arranged according to one of a set of K predetermined unit arrangements, so that (2π/λ0)·(n1(λ0)·d1(x,y)+n2(λ0)·d2(x,y)), averaged over each unit cell of the grid pattern, can assume one of K discrete values. An example of a set of unit cell arrangement is illustrated schematically in
In other examples, each one of the volumes 103 or areas 201/202 is arranged so that, within each unit cell, a single simply connected volume of the first optical medium is surrounded by the second optical medium, or vice versa; some example unit cells are shown in
An example procedure for arranging the discrete volumes 103, or the multitude of recessed and non-recessed areas 201/202, to approximate the desired phase function φ(x,y) proceeds as follows (assuming a substantially uniform thickness DT for the transmissive layer 100 and assuming n1>n2; assuming a substantially uniform depth DR for the recessed areas 201). The optical element is divided into a grid with unit cells Λ0×Λ0 in size. In each unit cell, a local value of the phase shift φ(x,y) is calculated by averaging over that Λ0×Λ0 unit cell. A refractive index needed to achieve that phase shift is calculated based on some or all of the thickness DT, the depth DR, the wavelength λ0, the angle of incidence, and the indices n1(λ0) and n2(λ0). If a set of predetermined unit arrangements is employed, it is determined for each cell which of the predetermined unit arrangements yields an effective phase shift that most closely approximates the calculated phase shift for that cell. If a set of discrete or continuous sizes of a surrounded volume within each unit cell is employed, a size is determined that most closely approximates the calculated phase shift for that cell. After that procedure has been done for every Λ0×Λ0 unit cell, the resulting two-dimensional spatial pattern is physically realized in any suitable way, e.g., as a photolithography mask, as a master for replication, as a die or mold, and so forth, to achieve the spatially selective replacement of the first optical medium in those selected discrete volumes with the second optical medium, or spatially selective formation of the areas 201/202.
In another example procedure, wherein each volume 103 or area 201/202 is limited to transverse dimensions no smaller than about λ0/K, where 2≤K≤20, a given area of the transmissive layer 100 or the reflective surface having transverse dimensions about equal to λ0 by λ0 would include at most about K2 distinct volumes 103 or areas 201/202. The desired phase transformation φ(x,y) can therefore be approximated at each location by one of K2+1 discrete levels, including (i) 2π·n1(λ0)·D/λ0, 2π·n2(λ0)·D/λ0, and at least K2−1 intermediate values for the transmissive layer 100, or (ii) zero, 4π·n1(λ0)·DR/λ0, and at least K2−1 intermediate values for a reflective surface. Higher values of K can yield a more accurate approximation of φ(x,y), but require higher-resolution spatially selective processing techniques and may limit the layer thickness and the corresponding maximum achievable phase shift. In many examples, 4≤K≤10, i.e., the smallest distinct discrete volumes 103 have transverse dimensions between about λ0/4 and about λ0/10. In one specific example, λ0 is about 1000 nm and K=4, yielding a minimum feature size of about 250 nm and division of any λ0×λ0 area into at most K2=16 distinct discrete volumes 103. The desired phase transformation φ(x,y) can therefore be approximated at each location by one of K2+1=17 discrete levels, including n1(λ0), n2(λ0), and at least K2−1=15 intermediate values between n1(λ0) and n2(λ0).
An example procedure for arranging the discrete volumes 103, or the multitude of recessed and non-recessed areas 201/202, to approximate the desired phase function φ(x,y) proceeds as follows (assuming a substantially uniform thickness DT for the transmissive layer 100 and assuming n1>n2; assuming a substantially uniform depth DR for the recessed areas 201). The optical element is divided into a grid with cells λ0×λ0 in size. In each cell, a local value of the phase shift φ(x,y) is calculated by averaging over that λ0×λ0 cell. A refractive index needed to achieve that phase shift is calculated based on some or all of the thickness DT, the depth DR, the wavelength λ0, the angle of incidence, and the indices n1(λ0) and n2(λ0). An integer N with 0≤N≤K2 is determined for each cell that yields a value of a phase shift that most closely approximates the calculated phase shift for that cell. For each cell, N discrete volumes, each (λ0/K)×(λ0/K) in size, are chosen for replacement of the first optical medium by the second optical medium, or for forming a recessed area 201. After that procedure has been done for every λ0×λ0 cell, the resulting two-dimensional spatial pattern is physically realized in any suitable way, e.g., as a photolithography mask, as a master for replication, as a die or mold, and so forth, to achieve the spatially selective replacement of the first optical medium in those selected discrete volumes with the second optical medium, or spatially selective formation of the areas 201/202.
One example is illustrated schematically in
As noted above, the arrangements disclosed above for the volumes 103 of the transmissive layer 100 in some examples, that employ a grid or discrete patterns of spatially selective processing (e.g., as in
Any of the spatially selective processing techniques or methodologies disclosed above for forming the transmissive payer 100 can be similarly employed for forming the recessed/non-recessed areas 201/202 or for forming any needed or desired film or layer 203/204/205. For example, directional dry etching (in some examples followed by reflow) can be employed to yield structures similar to the examples of
In some of the disclosed examples, it may be desirable for the distinct discrete volumes 103, or areas 201/202, to be spatially distributed across the optical element in an uncorrelated, irregular, random, or pseudo-random arrangement. Arranging the volumes 103 or areas 201/202 in an uncorrelated, irregular, random, or pseudo-random arrangement can in some instances reduce or substantially eliminate diffraction or coherent scattering of the incident optical signal. For example, a random number generator can be employed to select which N discrete volumes should be processed in each λ0×λ0 cell. Other algorithms can be employed, including manual manipulation of the spatial pattern
In any of the preceding arrangements wherein one or both indices n1(λ0) or n2(λ0) are not achieved, a transmissive layer thickness DT typically would be employed that is somewhat greater than λ0/|n1(λ0)−n2(λ0)| (in a single-pass transmissive geometry; greater than λ0/(2|n1(λ0)−n2(λ0)|) for a double-pass reflective geometry) so as to provide a sufficient phase variation of at least 2π for approximating a desired phase function. In other examples, layers thinner than those values can be employed, e.g., if a full range of phase shift is not required for a particular application. Similarly, a thickness DR can be employed in some examples that is greater than λ0/(2n1(λ0)) to ensure that a phase shift of at least 2π can be achieved, or layers thinner than those values can be employed. For example, if the effective phase transformation function φeff(x,y) is to be approximated by K discrete levels of phase delay (e.g., by K different types of unit cell as in
In any of the preceding arrangements, thorough calibration typically is required to characterize the etched feature sizes required to achieve the desired local effective index of the transmissive layer 100 or the local effective recessed depth of the reflective surface. For example, the effective index would be expected to vary roughly according to the relative volumes of the first and second optical media in a given unit cell, but of a given combination of materials, etch process, and geometry might result in deviations from that expectation. In some examples, an iterative design, fabrication, and measurement process can be employed to achieve that desired calibration. Once a calibration is done, the values for the local effective index provided by a given arrangement of discrete volumes can be relied upon for designing and fabricating the inventive etched optical elements. An example of such a calibration method includes: (A) specifying the effective phase transformation function φeff(x,y); (B) forming an intermediate optical element by any suitable method in accordance with an estimated arrangement of the volumes or areas (with the initial estimated arrangement determined in any suitable way, including those described above); (C) measuring an intermediate phase function φinter(x,y) imparted on a portion of an incident optical signal transmitted or reflected by the intermediate optical element; (D) altering the estimated arrangement of the volumes or areas in accordance with a difference between φeff(x,y) and φinter(x,y); and (E) repeating steps (B), (C), and (D) using successively altered arrangements of the volumes or areas until the difference between φeff(x,y) and φinter(X,y) is less than a specified allowable phase error. An intermediate optical element having the difference between φeff(x,y) and φinter(x,y) that is less than the specified allowable phase error is suitable for use as the optical element.
In addition to the preceding, the following Examples and the appended claims are incorporated into the description as example apparatus or methods.
An optical element comprising a reflective surface supported by a substantially solid substrate, the reflective surface comprising a multitude of discrete recessed and non-recessed areas arranged contiguously along the reflective surface, wherein: (a) the recessed or non-recessed areas include a non-empty subset of areas of the multitude having a largest transverse dimension less than about a design vacuum wavelength λ0, and the recessed and non-recessed areas are characterized by a depth function d(x,y), as a function of two-dimensional position coordinates x and y along the reflective surface, that equals zero in the non-recessed areas and that assumes non-zero values in the recessed areas up to a maximum depth DR; (b) the reflective surface is reflective over an operational wavelength range that includes the design vacuum wavelength λ0, and a corresponding volume within each recessed area is substantially transparent over the operational wavelength range and is characterized by a first bulk refractive index n1(λ); (c) the optical element is structurally arranged so as to receive an optical signal incident on the reflective surface and to reflect at least a portion of the incident optical signal transformed substantially according to a specified effective phase transformation function φeff(x,y) that varies as a function of x and y; and (d) the discrete areas of the multitude are variously sized and distributed on the reflective surface so as to impart on the reflected portion of the incident optical signal the effective phase transformation φeff(x,y).
The optical element of Example 1 wherein the substrate comprises one or more of: (i) one or more substantially solid doped or undoped dielectric materials, (ii) one or more substantially solid doped or undoped semiconductor materials, or (iii) one or more substantially solid doped or undoped polymers.
The optical element of any one of Examples 1 or 2 wherein the discrete areas of the multitude are sized and distributed along the reflective surface so that (4π/λ0)·n1(λ0)·d(x,y), as a function of two-dimensional position coordinates x and y along the reflective surface, averaged over a sampling area having transverse dimensions about equal to λ0 along the reflective surface, is substantially proportional to the effective phase transformation function φeff(x,y).
The optical element of any one of Examples 1 or 2 wherein the discrete areas of the multitude are sized and distributed along the reflective surface so that (4π/λ0)·n1(λ0)·d(x,y), as a function of two-dimensional position coordinates x and y along the reflective surface, averaged over a sampling area having transverse dimensions about equal to λ0 along the reflective surface, is substantially equal to the effective phase transformation function φeff(x,y).
The optical element of any one of Examples 1 through 4 wherein the optical element is structurally arranged so as to receive the incident optical signal at substantially normal incidence.
The optical element of any one of Examples 1 through 4 wherein the optical element is structurally arranged so as to receive the incident optical signal at non-normal incidence.
The optical element of any one of Examples 1 through 6 wherein the depth function d(x,y) equals zero in the non-recessed areas and is substantially equal to DR in the recessed areas.
The optical element of any one of Examples 1 through 7 wherein the corresponding volume within each recessed area comprises a substantially solid material characterized by the bulk refractive index n1(λ).
The optical element of Example 8 wherein the substantially solid material characterized by the bulk refractive index n1(λ) forms a layer over areas of the reflective surface corresponding to the non-recessed areas.
The optical element of any one of Examples 8 or 9 wherein the substantially solid material characterized by the bulk refractive index n1(λ) comprises one or more of: (i) one or more substantially solid doped or undoped dielectric materials, (ii) one or more substantially solid doped or undoped semiconductor materials, or (iii) one or more a substantially solid doped or undoped polymers.
The optical element of any one of Examples 1 through 7 wherein the corresponding volume within each recessed area (i) comprises vacuum characterized by the bulk refractive index n1(λ)=1, or (ii) comprises a gaseous or liquid material characterized by the bulk refractive index n1(λ).
The optical element of any one of Examples 1 through 11 further comprising a layer of reflective material supported by the substrate, wherein the reflective surface comprises recessed areas and non-recessed areas formed on a surface of the reflective material layer.
The optical element of Example 12 wherein the reflective material is a metallic material.
The optical element of any one of Examples 12 or 13 further comprising a transmissive material that fills the recessed areas of the reflective surface with a transmissive material that is substantially transparent over the operational wavelength range and characterized by the bulk refractive index n1(λ).
The optical element of Example 14 wherein the transmissive material forms a layer over the non-recessed areas of the reflective surface.
The optical element of any one of Examples 14 or 15 wherein the transmissive material comprises one or more of: (i) one or more substantially solid doped or undoped dielectric materials, (ii) one or more substantially solid doped or undoped semiconductor materials, or (iii) one or more substantially solid doped or undoped polymers.
The optical element of any one of Examples 12 through 16 wherein the reflective material layer is between the substrate and the reflective surface.
The optical element of any one of Examples 12 through 16 wherein the reflective surface is between the substrate and the reflective material layer.
The optical element of any one of Examples 1 through 11 further comprising (i) a material layer supported by the substrate and (ii) a reflective film or layer, wherein the reflective surface comprises recessed areas and non-recessed areas formed on a surface of the material layer and covered with the reflective film or layer.
The optical element of Example 19 wherein the reflective film or layer includes one or more metallic films or layers.
The optical element of any one of Examples 19 or 20 wherein the reflective film or layer includes one or more dielectric films or layers.
The optical element of any one of Examples 19 through 21 wherein the material layer is a portion of the substrate.
The optical element of any one of Examples 19 through 21 wherein the material layer includes one or more materials different from one or more materials that form the substrate.
The optical element of any one of Examples 19 through 23 wherein the material layer comprises one or more of: (i) one or more substantially solid doped or undoped dielectric materials, (ii) one or more substantially solid doped or undoped semiconductor materials, or (iii) one or more substantially solid doped or undoped polymers.
The optical element of any one of Examples 19 through 24 wherein each recessed area of the material layer forms a corresponding non-recessed area of the reflective surface, each recessed area of the material layer forms a corresponding non-recessed area of the reflective surface, the material layer is substantially transparent over the operational wavelength range and characterized by the bulk refractive index n1(λ), and the optical element is structurally arranged so as to receive the optical signal incident on the reflective surface by transmission of the optical signal through the material layer.
The optical element of any one of Examples 19 through 24 wherein each recessed area of the material layer forms a corresponding recessed area of the reflective surface, each non-recessed area of the material layer forms a corresponding non-recessed area of the reflective surface, and the optical element is structurally arranged so as to receive the optical signal incident on the reflective surface without transmission of the optical signal through the material layer.
The optical element of Example 26 further comprising a transmissive material that fills the recessed areas of the reflective surface with a transmissive material that is substantially transparent over the operational wavelength range and characterized by the bulk refractive index n1(λ).
The optical element of Example 27 wherein the transmissive material forms a layer over the non-recessed areas of the reflective surface.
The optical element of any one of Examples 26 or 27 wherein the transmissive material comprises one or more of: (i) one or more substantially solid doped or undoped dielectric materials, (ii) one or more substantially solid doped or undoped semiconductor materials, or (iii) one or more substantially solid doped or undoped polymers.
The optical element of any one of Examples 19 through 29 wherein the material layer is between the substrate and the reflective surface.
The optical element of any one of Examples 19 through 29 wherein the reflective surface is between the substrate and the material layer.
The optical element of any one of Examples 1 through 31 wherein the depth DR is substantially equal to [N/λ0]/[2n1(λ0)], where N is a non-zero integer.
The optical element of Example 32 wherein N=1.
The optical element of any one of Examples 1 through 33 wherein φeff(x,y) varies with both x and y.
The optical element of any one of Examples 1 through 34 wherein the position-dependent effective phase transformation function φeff(x,y) is a modulo 2π function.
The optical element of any one of Examples 1 through 35 wherein the effective phase transformation function φeff(x,y) approximates a function of the form φ(x,y)=Ax2+By2, or φ(x,y)=Ax2+By2 modulo 2n, where A and B are non-zero, positive or negative real numbers.
The optical element of Example 36 wherein A=B.
The optical element of any one of Examples 1 through 35 wherein the effective phase transformation function φeff(x,y) approximates a function of the form φ(0)=Mθ, or φ(0)=Mθ modulo 2π, for 0≤θ<2π, where θ is related to x and y by cos θ=x/(x2+y2)1/2 and sin θ=y/(x2+y2)1/2 and M is a non-zero integer.
The optical element of Example 38 wherein M=±1.
The optical element of any one of Examples 1 through 35 wherein the effective phase transformation function φeff(x,y) approximates a sum, or a modulo 2π sum, of distinct, specified, position-dependent phase transformation functions φ1(x,y) and φ2(x,y).
The optical element of Example 40 wherein (i) φ1(x,y)=Ax2+By2, or φ1(x,y)=Ax2+By2 modulo 2π, where A and B are non-zero, positive or negative real numbers, and (ii) φ2(x,y)=Mθ, or φ(θ)=Mθ modulo 2π, for 0≤θ<2π, where θ is related to x and y by cos θ=x/(x2+y2)1/2 and sin θ=y/(x2+y2)1/2 and M is a non-zero integer.
The optical element of any one of Examples 1 through 41 wherein each discrete area of the multitude has a smallest transverse dimension no smaller than about λ0/K, where 2≤K≤20.
The optical element of Example 42 wherein 4≤K≤10.
The optical element of any one of Examples 42 or 43 wherein (4π/λ0)·n1(λ0)·d(x,y), averaged over a sampling area having transverse dimensions about equal to λ0 by λ0 along the reflective surface, can assume one of at least K2+1 discrete values.
The optical element of Example 44 wherein the at least K2+1 discrete values include zero, 4π·n1(λ0)·DR/λ0, and at least K2−1 intermediate values therebetween.
The optical element of any one of Examples 1 through 45 wherein the discrete areas are spatially distributed along the reflective surface in an uncorrelated, irregular, random, or pseudo-random arrangement.
The optical element of any one of Examples 1 through 41 wherein the discrete areas of the multitude are arranged according to a regular two-dimensional grid pattern along the reflective surface characterized by a grid spacing of Λ0 between about λ0/20 and about λ0.
The optical element of Example 47 wherein the grid spacing of Λ0 is between about λ0/10 and about λ0/2.
The optical element of any one of Examples 47 or 48 wherein the multitude of discrete areas is arranged so that, within each unit cell of the grid pattern, the discrete areas or portions thereof encompassed by that unit cell are arranged according to one of a set of K predetermined unit arrangements, so that (4π/λ0)·n1(λ0)·d(x,y), averaged over each unit cell of the grid pattern, can assume one of K discrete values.
The optical element of Example 49 wherein the K discrete values include zero, 4π·n1(λ0)·DR·(K−1)/(K/λ0), and K−2 intermediate values therebetween.
The optical element of any one of Examples 47 or 48 wherein the multitude of discrete areas is arranged so that (i) the discrete areas or portions thereof encompassed by each unit cell of the grid pattern are arranged as a single simply connected recessed area surrounded by a non-recessed area or (ii) the discrete areas or portions thereof encompassed by each unit cell of the grid pattern are arranged as a single simply connected non-recessed area surrounded by a recessed area, so that (4π/λ0)·n1(λ0)·d(x,y), averaged over each unit cell of the grid pattern, can assume a substantially continuous range of values according to a size of each unit cell occupied by the corresponding simply connected area.
The optical element of Example 51 wherein the substantially continuous range of values extends from about zero to about 4π·n1(λ0)·DR/λ0.
A method employing the optical element of any one of Examples 1 through 52, the method comprising (i) directing an optical signal onto the reflective surface of the optical element and (ii) reflecting from the optical element at least a portion of the incident optical signal transformed substantially according to the effective phase transformation function φeff(x,y).
A method for making the optical element of any one of Examples 1 through 18 or 32 through 52, the method comprising spatially selectively processing a surface of a reflective material layer to form the multitude of recessed and non-recessed areas of the reflective surface.
The method of Example 54 wherein the reflective material is a metallic material.
The method of any one of Examples 54 or 55 further comprising filling the recessed areas of the reflective surface with a transmissive material that is substantially transparent over the operational wavelength range and characterized by the bulk refractive index n1(λ).
The method of Example 56 wherein the transmissive material forms a layer over the non-recessed areas of the reflective surface.
A method for making the optical element of any one of Examples 1 through 11 or 19 through 52, the method comprising spatially selectively processing a surface of a material layer to form a multitude of recessed and non-recessed areas of the material layer, and forming, depositing, or applying a reflective film or layer onto the recessed and non-recessed areas of the material layer to form the reflective surface.
The method of Example 58 wherein the reflective film or layer is a metallic film or layer.
The method of any one of Examples 58 or 59 wherein the material layer is a portion of the substrate.
The method of any one of Examples 58 or 59 wherein the material layer includes one or more materials different from one or more materials that form the substrate.
The method of any one of Examples 58 through 60 wherein each recessed area of the material layer forms a corresponding non-recessed area of the reflective surface, each recessed area of the material layer forms a corresponding non-recessed area of the reflective surface, the material layer is substantially transparent over the operational wavelength range and characterized by the bulk refractive index n1(λ), and the optical element is structurally arranged so as to receive the optical signal incident on the reflective surface by transmission of the optical signal through the material layer.
The method of any one of Examples 58 through 60 wherein each recessed area of the material layer forms a corresponding recessed area of the reflective surface, each non-recessed area of the material layer forms a corresponding non-recessed area of the reflective surface, and the optical element is structurally arranged so as to receive the optical signal incident on the reflective surface without transmission of the optical signal through the material layer.
A method for making the optical element of any one of Examples 1 through 52, the method comprising: (A) specifying the effective phase transformation function φeff(x,y); (B) forming an intermediate optical element by spatially selectively processing a surface of a material layer to form a multitude of recessed and non-recessed areas of a reflective surface of the intermediate optical element in accordance with an estimated arrangement of the areas of the multitude; (C) measuring an intermediate phase function φinter(x,y) imparted on a portion of an incident optical signal reflected by the intermediate optical element; (D) altering the estimated arrangement of the areas of the multitude in accordance with a difference between φeff(x,y) and φinter(x,y); and (E) repeating steps (B), (C), and (D) using successively altered arrangements of the areas of the multitude until the difference between φeff(x,y) and φinter(X,Y) is less than a specified allowable phase error, (F) wherein the optical element is the intermediate optical element having the difference between φeff(x,y) and φinter(x,y) that is less than the specified allowable phase error.
A method for making the optical element of any one of Examples 1 through 52, the method comprising: (A) spatially selectively processing a layer of a first material to form a multitude of discrete recessed and non-recessed areas arranged contiguously along the reflective surface according to an initial depth function dI(x,y) that is a function of two-dimensional position coordinates x and y along the reflective surface; and (B) after part (A), heating the spatially processed first material layer so as to cause at least partial reflow of the first material, so that the reflective surface is arranged according to a non-negative reflow depth function dR(x,y) that is equal to d(x,y), wherein: (C) d(x,y)≠di(x,y) over at least one or more portions of the reflective surface; and (D) the discrete areas of the multitude are variously sized and distributed on the reflective surface so that, after parts (A) and (B), the reflective surface is arranged so as to impart on the reflected portion of the incident optical signal the effective phase transformation φeff(x,y).
A method for making an optical element comprising a reflective surface supported by a substantially solid substrate, the method comprising: (A) spatially selectively processing a layer of a first material to form a multitude of discrete recessed and non-recessed areas arranged contiguously along the reflective surface according to an initial depth function dI(x,y) that is a function of two-dimensional position coordinates x and y along the reflective surface; and (B) after part (A), heating the spatially processed first material layer so as to cause at least partial reflow of the first material, so that the reflective surface is arranged according to a non-negative reflow depth function dR(x,y) that is a function of two-dimensional position coordinates x and y along the reflective surface, wherein: (C) the reflective surface is reflective over an operational wavelength range that includes a design vacuum wavelength λ0, and the recessed or non-recessed areas include a non-empty subset of areas of the multitude having a largest transverse dimension less than about λ0; (D) one or more corresponding volumes, located above at least portions of the reflective surface for which dR(x,y)>0, are substantially transparent over the operational wavelength range and are characterized by a bulk refractive index n1(λ); (E) (i) dR(x,y)=0 over at least a portion of one or more areas of the reflective surface corresponding to one or more of the non-recessed areas, (ii) dR(x,y)>0 over at least a portion of one or more areas of the reflective surface corresponding to one or more of the recessed areas, and (iii) dR(x,y)≠di(x,y) over at least one or more portions of the reflective surface; (F) the optical element is structurally arranged so as to receive an optical signal incident on the reflective surface and to reflect at least a portion of the incident optical signal transformed substantially according to the effective phase transformation function φeff(x,y) that varies as a function of x and y; and (G) the discrete areas of the multitude are variously sized and distributed on the reflective surface so that, after parts (A) and (B), the reflective surface is arranged so as to impart on the reflected portion of the incident optical signal the effective phase transformation φeff(x,y).
The method of Example 66, the method further comprising: (A′) specifying the effective phase transformation function φeff(x,y); (B′) performing the method of Example 66 to form an intermediate optical element in accordance with an estimated arrangement of the areas of the multitude and an estimated reflow process sequence; (C′) measuring an intermediate phase function φinter(x,y) imparted on a portion of an incident optical signal reflected by the intermediate optical element; (D′) altering the estimated arrangement of the areas of the multitude, or the reflow process sequence, in accordance with a difference between φeff(x,y) and φinter(x,y); and (E′) repeating steps (B′), (C′), and (D′) using successively altered arrangements of the areas of the multitude or reflow process sequences until the difference between φeff(x,y) and φinter(x,y) is less than a specified allowable phase error, (F′) wherein the optical element is the intermediate optical element having the difference between φeff(x,y) and φinter(x,y) that is less than the specified allowable phase error.
The method of any one of Examples 66 or 67 wherein the substrate comprises one or more of: (i) one or more substantially solid doped or undoped dielectric materials, (ii) one or more substantially solid doped or undoped semiconductor materials, or (iii) one or more substantially solid doped or undoped polymers.
The method of any one of Examples 66 through 68 wherein, after parts (A) and (B), the reflective surface is arranged so that (4π/λ0)·n1(λ0)·dR(x,y), averaged over a sampling area having transverse dimensions about equal to λ0 along the reflective surface, is substantially proportional to the effective phase transformation function φeff(x,y).
The method of any one of Examples 66 through 68 wherein, after parts (A) and (B), the reflective surface is arranged so that (4π/λ0)·n1(λ0)·dR(x,y), averaged over a sampling area having transverse dimensions about equal to λ0 along the reflective surface, is substantially equal to the effective phase transformation function φeff(x,y).
The method of any one of Examples 66 through 70 wherein the optical element is structurally arranged so as to receive the incident optical signal at substantially normal incidence.
The method of any one of Examples 66 through 70 wherein the optical element is structurally arranged so as to receive the incident optical signal at non-normal incidence.
The method of any one of Examples 66 through 72 wherein, after part (A) and before part (B), the discrete areas of the multitude are distributed along the reflective surface so that (4π/λ0)·n1(λ0)·dI(x,y), averaged over a sampling area having transverse dimensions about equal to λ0 along the reflective surface, is substantially proportional to φeff(x,y), where (i) dI(x,y) equals a minimum depth DNR in the non-recessed areas, and (ii) dI(x,y) assumes non-zero values up to a maximum depth DR in the recessed areas.
The method of any one of Examples 66 through 72 wherein, after part (A) and before part (B), the discrete areas of the multitude are distributed along the reflective surface so that (4π/λ0)·n1(λ0)·dI(x,y), averaged over a sampling area having transverse dimensions about equal to λ0 along the reflective surface, is substantially equal to φeff(x,y), where (i) dI(x,y) equals a minimum depth DNR in the non-recessed areas, and (ii) dI(x,y) assumes non-zero values up to a maximum depth DR in the recessed areas.
The method of any one of Examples 66 through 74 wherein the depth function dI(x,y) is substantially equal to DNR in the non-recessed areas and is substantially equal to DR in the recessed areas.
The method of any one of Examples 66 through 75 wherein the one or more corresponding volumes, located above at least portions of the reflective surface for which dR(x,y)>0, comprises a substantially solid material characterized by the bulk refractive index n1(λ).
The method of Example 76 wherein the substantially solid material characterized by the bulk refractive index n1(λ) forms a layer over areas of the reflective surface corresponding to the non-recessed areas.
The method of any one of Examples 76 or 77 wherein the substantially solid material characterized by the bulk refractive index n1(λ) comprises one or more of: (i) one or more substantially solid doped or undoped dielectric materials, (ii) one or more substantially solid doped or undoped semiconductor materials, or (iii) one or more substantially solid doped or undoped polymers.
The method of any one of Examples 66 through 75 wherein the one or more corresponding volumes, located above at least portions of the reflective surface for which dR(x,y)>0, comprise an ambient medium that is (i) vacuum characterized by the bulk refractive index n1(λ)=1, or (ii) a gaseous or liquid material characterized by the bulk refractive index n1(λ).
The method of any one of Examples 66 through 79 wherein (i) the first material layer comprises a layer of one or more reflective materials supported by the substrate, and (ii) the optical element is structurally arranged so as to receive the optical signal incident on the reflective surface without transmission of the optical signal through the substrate.
The method of Example 80 wherein the one or more reflective materials include one or more metallic materials.
The method of any one of Examples 80 or 81 wherein part (A) comprises spatially selectively etching the first material layer, and resulting etched areas of the first material form the recessed areas.
The method of any one of Examples 80 through 82 further comprising, after part (A) and before part (B), at least partly filling the recessed areas with a second material that is substantially transparent over the operational wavelength range and characterized by the bulk refractive index n1(λ), wherein the heating of part (B) causes at least partial reflow of the second material.
The method of Example 83 wherein the second material forms a layer over the non-recessed areas of the reflective surface.
The method of any one of Examples 80 through 82 further comprising, after parts (A) and (B), at least partly filling the corresponding volumes, located above at least portions of the reflective surface for which dR(x,y)>0, with a second material that is substantially transparent over the operational wavelength range and characterized by the bulk refractive index n1(λ).
The method of Example 85 wherein the second material forms a layer over the non-recessed areas of the reflective surface.
The method of any one of Examples 83 through 86 wherein the second material comprises one or more of: (i) one or more substantially solid doped or undoped dielectric materials, (ii) one or more substantially solid doped or undoped semiconductor materials, or (iii) one or more substantially solid doped or undoped polymers.
The method of any one of Examples 66 through 79 further comprising, after parts (A) and (B), forming a reflective film or coating on the reflective surface.
The method of Example 88 wherein the reflective film or coating includes one or more metallic materials.
The method of Example 88 wherein the reflective film or coating includes one or more dielectric layers.
The method of any one of Examples 88 through 90 wherein the first material layer is a portion of the substrate.
The method of any one of Examples 88 through 90 wherein the first material layer includes material different from material of the substrate.
The method of any one of Examples 88 through 92 wherein the first material layer comprises one or more of: (i) one or more substantially solid doped or undoped dielectric materials, (ii) one or more substantially solid doped or undoped semiconductor materials, or (iii) one or more substantially solid doped or undoped polymers.
The method of any one of Examples 88 through 93 wherein part (A) comprises spatially selectively etching the first material layer, resulting etched areas of the first material form the recessed areas, and the optical element is structurally arranged so as to receive the optical signal incident on the reflective surface without transmission of the optical signal through the substrate.
The method of Example 94 further comprising, after forming the reflective film or coating, at least partly filling the corresponding volumes, located above at least portions of the reflective surface for which dR(x,y)>0, with a second material that is substantially transparent over the operational wavelength range and characterized by the bulk refractive index n1(λ).
The method of Example 95 wherein the second material forms a layer over the non-recessed areas of the reflective surface.
The method of any one of Examples 88 through 93 wherein (i) part (A) comprises spatially selectively etching the first material layer, (ii) resulting etched areas of the first material form the non-recessed areas, (iii) the substrate and the first material are substantially transparent over the operational wavelength range, (iv) the first material is characterized by the bulk refractive index n1(λ) and fills the corresponding volumes located above at least portions of the reflective surface for which dR(x,y)>0, and (v) the optical element is arranged so that the optical signal incident on the reflective layer propagates through the substrate.
The method of any one of Examples 66 through 79 further comprising, after part (A), forming a layer of reflective material over the first material layer, wherein (i) part (A) comprises spatially selectively etching the first material layer, (ii) resulting etched areas of the first material form the non-recessed areas; (iii) the substrate and the first material are substantially transparent over the operational wavelength range, (iv) the first material is characterized by the bulk refractive index n1(λ) and fills the corresponding volumes located above at least portions of the reflective surface for which dR(x,y)>0, and (v) the optical element is arranged so that the optical signal incident on the reflective layer propagates through the substrate.
The method of Example 98 wherein the first material comprises one or more of: (i) one or more substantially solid doped or undoped dielectric materials, (ii) one or more substantially solid doped or undoped semiconductor materials, or (iii) one or more substantially solid doped or undoped polymers.
The method of any one of Examples 98 or 99 wherein the reflective material comprises one or more metallic materials.
The method of any one of Examples 98 through 100 wherein the layer of reflective material is formed over the first material layer before part (B), and the heating of part (B) causes at least partial reflow of the reflective material.
The method of any one of Examples 98 through 100 wherein the layer of reflective material is formed over the first material layer after part (B).
The method of any one of Examples 98 through 102 wherein the first material layer is a portion of the substrate.
The method of any one of Examples 98 through 102 wherein the first material layer includes material different from material of the substrate.
The method of any one of Examples 66 through 104 wherein the reflow depth function dR(x,y) assumes values up to a maximum value of about equal to [N/λ0]/[2n1(λ0)], where N is a non-zero integer.
The method of Example 105 wherein N=1.
The method of any one of Examples 66 through 106 wherein φeff(x,y) varies with both x and y.
The method of any one of Examples 66 through 107 wherein the position-dependent effective phase transformation function φeff(x,y) is a modulo 2π function.
The method of any one of Examples 66 through 108 wherein the effective phase transformation function φeff(x,y) approximates a function of the form φ(x,y)=Ax2+By2, or φ(x,y)=Ax2+By2 modulo 2π, where A and B are non-zero, positive or negative real numbers.
The method of Example 109 wherein A=B.
The method of any one of Examples 66 through 108 wherein the effective phase transformation function φeff(x,y) approximates a function of the form φ(θ)=Mθ, or φ(θ)=Mθ modulo 2π, for 0≤θ<2π, where θ is related to x and y by cos θ=x/(x2+y2)1/2 and sin θ=y/(x2+y2)1/2 and M is a non-zero integer.
The method of Example 111 wherein M=±1.
The method of any one of Examples 66 through 108 wherein the effective phase transformation function φeff(x,y) approximates a sum, or a modulo 2π sum, of distinct, specified, position-dependent phase transformation functions φ1(x,y) and φ2(x,y).
The method of Example 113 wherein (i) φ1(x,y)=Ax2+By2, or φ1(x,y)=Ax2+By2 modulo 2π, where A and B are non-zero, positive or negative real numbers, and (ii) φ2(x,y)=Mθ, or φ(θ)=Mθ modulo 2π, for 0≤θ<2π, where θ is related to x and y by cos θ=x/(x2+y2)1/2 and sin θ=y/(x2+y2)1/2 and M is a non-zero integer.
The method of any one of Examples 66 through 114 wherein each discrete area of the multitude has a smallest transverse dimension no smaller than about λ0/K, where 2≤K≤20.
The method of Example 115 wherein 4≤K≤10.
The method of any one of Examples 115 or 116 wherein, after part (A) and before part (B), (4π/λ0)·n1(λ0)·dI(x,y), averaged over a sampling area having transverse dimensions about equal to λ0 by λ0 along the reflective surface, can assume one of at least K2+1 discrete values.
The method of Example 117 wherein the at least K2+1 discrete values include zero, 4π·n1(λ0)·DR/λ0, and at least K2−1 intermediate values therebetween.
The method of any one of Examples 66 through 118 wherein the discrete areas are spatially distributed along the reflective surface in an uncorrelated, irregular, random, or pseudo-random arrangement.
The method of any one of Examples 66 through 114 wherein the discrete areas of the multitude are arranged according to a regular two-dimensional grid pattern along the reflective surface characterized by a grid spacing of Λ0 between about λ0/20 and about λ0.
The method of Example 120 wherein the grid spacing of Λ0 is between about λ0/10 and about λ0/2.
The method of any one of Examples 120 or 121 wherein, after part (A) and before part (B), the multitude of discrete areas is arranged so that, within each unit cell of the grid pattern, the discrete areas or portions thereof encompassed by that unit cell are arranged according to one of a set of K predetermined unit arrangements, so that (4π/λ0)·n1(λ0)·dI(x,y), averaged over each unit cell of the grid pattern, can assume one of K discrete values.
The method of Example 122 wherein the K discrete values include zero, 4π·n1(λ0)·DR·(K−1)/(K·λ0), and K−2 intermediate values therebetween.
The method of any one of Examples 120 or 121 wherein, after part (A) and before part (B), the multitude of discrete areas is arranged so that (i) the discrete areas or portions thereof encompassed by each unit cell of the grid pattern are arranged as a single simply connected recessed area surrounded by a non-recessed area or (ii) the discrete areas or portions thereof encompassed by each unit cell of the grid pattern are arranged as a single simply connected non-recessed area surrounded by a recessed area, so that (4π/λ0)·n1(λ0)·dI(x,y), averaged over each unit cell of the grid pattern, can assume a substantially continuous range of values according to a size of each unit cell occupied by the corresponding simply connected area.
The method of Example 124 wherein the substantially continuous range of values extends from about zero to about 4π·n1(λ0)·DR/λ0.
The optical element made by the method of any one of Examples 66 through 125.
It is intended that equivalents of the disclosed example embodiments and methods shall fall within the scope of the present disclosure or appended claims. It is intended that the disclosed example embodiments and methods, and equivalents thereof, may be modified while remaining within the scope of the present disclosure or appended claims.
In the foregoing Detailed Description, various features may be grouped together in several example embodiments for the purpose of streamlining the disclosure. This method of disclosure is not to be interpreted as reflecting an intention that any claimed embodiment requires more features than are expressly recited in the corresponding claim. Rather, as the appended claims reflect, inventive subject matter may lie in less than all features of a single disclosed example embodiment. Thus, the appended claims are hereby incorporated into the Detailed Description, with each claim standing on its own as a separate disclosed embodiment. However, the present disclosure shall also be construed as implicitly disclosing any embodiment having any suitable set of one or more disclosed or claimed features (i.e., a set of features that are neither incompatible nor mutually exclusive) that appear in the present disclosure or the appended claims, including those sets that may not be explicitly disclosed herein. In addition, for purposes of disclosure, each of the appended dependent claims shall be construed as if written in multiple dependent form and dependent upon all preceding claims with which it is not inconsistent. It should be further noted that the scope of the appended claims does not necessarily encompass the whole of the subject matter disclosed herein.
For purposes of the present disclosure and appended claims, the conjunction “or” is to be construed inclusively (e.g., “a dog or a cat” would be interpreted as “a dog, or a cat, or both”; e.g., “a dog, a cat, or a mouse” would be interpreted as “a dog, or a cat, or a mouse, or any two, or all three”), unless: (i) it is explicitly stated otherwise, e.g., by use of “either . . . or,” “only one of,” or similar language; or (ii) two or more of the listed alternatives are mutually exclusive within the particular context, in which case “or” would encompass only those combinations involving non-mutually-exclusive alternatives. For purposes of the present disclosure and appended claims, the words “comprising,” “including,” “having,” and variants thereof, wherever they appear, shall be construed as open ended terminology, with the same meaning as if the phrase “at least” were appended after each instance thereof, unless explicitly stated otherwise. For purposes of the present disclosure or appended claims, when terms are employed such as “about equal to,” “substantially equal to,” “greater than about,” “less than about,” and so forth, in relation to a numerical quantity, standard conventions pertaining to measurement precision and significant digits shall apply, unless a differing interpretation is explicitly set forth. For null quantities described by phrases such as “substantially prevented,” “substantially absent,” “substantially eliminated,” “about equal to zero,” “negligible,” and so forth, each such phrase shall denote the case wherein the quantity in question has been reduced or diminished to such an extent that, for practical purposes in the context of the intended operation or use of the disclosed or claimed apparatus or method, the overall behavior or performance of the apparatus or method does not differ from that which would have occurred had the null quantity in fact been completely removed, exactly equal to zero, or otherwise exactly nulled.
For purposes of the present disclosure and appended claims, any labelling of elements, steps, limitations, or other portions of an example or claim (e.g., first, second, etc., (a), (b), (c), etc., or (i), (ii), (iii), etc.) is only for purposes of clarity, and shall not be construed as implying any sort of ordering or precedence of the portions so labelled. If any such ordering or precedence is intended, it will be explicitly recited in the example or claim or, in some instances, it will be implicit or inherent based on the specific content of the example or claim. In the appended claims, if the provisions of 35 USC § 112(f) are desired to be invoked in an apparatus claim, then the word “means” will appear in that apparatus claim. If those provisions are desired to be invoked in a method claim, the words “a step for” will appear in that method claim. Conversely, if the words “means” or “a step for” do not appear in a claim, then the provisions of 35 USC § 112(f) are not intended to be invoked for that claim.
If any one or more disclosures are incorporated herein by reference and such incorporated disclosures conflict in part or whole with, or differ in scope from, the present disclosure, then to the extent of conflict, broader disclosure, or broader definition of terms, the present disclosure controls. If such incorporated disclosures conflict in part or whole with one another, then to the extent of conflict, the later-dated disclosure controls.
The Abstract is provided as required as an aid to those searching for specific subject matter within the patent literature. However, the Abstract is not intended to imply that any elements, features, or limitations recited therein are necessarily encompassed by any particular claim. The scope of subject matter encompassed by each claim shall be determined by the recitation of only that claim.
This application claims benefit of U.S. provisional App. No. 62/410,380 filed Oct. 19, 2016 in the names of Dmitri Iazikov, Thomas W. Mossberg, Christoph M. Greiner, and John H. Clark, and U.S. provisional App. No. 62/507,776 filed May 17, 2017 in the names of Dmitri Iazikov, Thomas W. Mossberg, Christoph M. Greiner, and John H. Clark, said provisional applications being hereby incorporated by reference as if fully set forth herein.
| Number | Date | Country | |
|---|---|---|---|
| 62410380 | Oct 2016 | US | |
| 62507776 | May 2017 | US |
