Claims
- 1. A method of removing water from a composition of matter, said method comprising:
contacting a first composition of matter comprising water with a second composition of matter comprising: (1) at least one surfactant comprising at least one phosphate group and (2) a solvent comprising carbon dioxide, wherein at least a portion of the surfactant is soluble in the solvent, such that the at least one surfactant removes at least a portion of the water from the first composition
- 2. The method according to claim 1, wherein the first composition of matter is present in an embodiment selected from the group consisting of integrated circuits, silicon wafers, silicon wafers with vias containing water, low-dielectric constant surfaces used as interlayer dielectrics on integrated circuits, a MEM, a porous material, a micro-porous material, a nano-porous material, a non-woven material, surfaces to be cleaned, surfaces to be treated with passivation layers, surfaces to be coated, surfaces to be treated with a self-assembled monolayer (“SAM”), photoresist coated surfaces, optical interfaces, optical relays, optical fibers, metallized surfaces, and micromirrors.
- 3. The method according to claim 1, wherein the at least one surfactant comprises at least one fluorocarbon group.
- 4. The method according to claim 3, wherein the at least one fluorocarbon group comprises a hydrocarbon spacer attached to an oxygen atom, wherein the oxygen atom is attached to the phosphate group.
- 5. The method according to claim 3, wherein the at least one fluorocarbon group is of the formula:
- 6. The method according to claim 5, wherein said surfactant further comprises a hydrocarbon-containing group attached to the phosphate group.
- 7. The method according to claim 6, wherein the hydrocarbon-containing chain is of the formula:
- 8. The method according to claim 1, wherein the surfactant is represented by the formula:
- 9. The method according to claim 1, wherein the surfactant is an anionic surfactant.
- 10. The method according to claim 9, wherein the anionic surfactant is represented by the formula:
- 11. The method according to claim 9, wherein RF is selected from the group consisting of C6F13(CH2)2 and C10F21(CH2)2, RH is selected from the group consisting of C4H9, C8H17, C12H25, and C16H33, and M is Na+.
- 12. The method according to claim 1, wherein the surfactant is a cationic surfactant.
- 13. The method according to claim 12, wherein the cationic surfactant is selected from the group consisting of:
- 14 The method according to claim 1, wherein the surfactant comprises one or more one or more morpholine units attached to the phosphate group.
- 15. The method according to claim 14, wherein the surfactant is selected from the group consisting of
- 16. The method according to claim 1, wherein the carbon dioxide is supercritical carbon dioxide.
- 17. The method according to claim 1, wherein the carbon dioxide is liquid carbon dioxide.
- 18. The method according to claim 1, wherein said surfactant is present in said composition of matter in an amount ranging from about 1 to about 10 percent based on the weight of the surfactant.
- 19. The method according to claim 1, further comprising at least one additional component selected from the group consisting of polymer modifier, rheology modifiers, plasticizing agents, antibacterial agents, flame retardants, viscosity reduction modifiers, co-solvents, and co-surfactants.
- 20. The method according to claim 1, wherein the water and the surfactant in the second composition of matter form a reverse micelle.
- 21. The method according to claim 1, wherein the water is present in the second composition of matter in an amount ranging from above about 0 to about 200 percent based on the weight of the surfactant.
- 22. A method of applying a surfactant to a substrate, said method comprising:
providing a composition of matter comprising at least one surfactant comprising (1) at least one phosphate group and (2) a solvent comprising carbon dioxide, wherein at least a portion of the surfactant is soluble in the solvent; and applying the composition of matter onto a substrate such that the carbon dioxide separates from the surfactant and wherein the surfactant coats the substrate.
- 23. The method according to claim 22, wherein the substrate is selected from the group consisting of metals, organic polymers, inorganic polymers, textiles, and composites thereof
- 24. The method according to claim 23, wherein the substrate is selected from the group consisting of integrated circuits, silicon wafers, silicon wafers with vias containing water, low-dielectric constant surfaces used as interlayer dielectrics on integrated circuits, a MEM, a porous material, a micro-porous material, a nano-porous material, a non-woven material, surfaces to be cleaned, surfaces to be treated with passivation layers, surfaces to be coated, surfaces to be treated with a self-assembled monolayer, photoresist coated surfaces, optical interfaces, optical relays, optical fibers, metallized surfaces, and micromirrors.
- 25. The method according to claim 22, wherein the at least one surfactant comprises at least one fluorocarbon group.
- 26. The method according to claim 25, wherein the at least one fluorocarbon group comprises a hydrocarbon spacer attached to an oxygen atom, wherein the oxygen atom is attached to the phosphate group.
- 27. The method according to claim 26, wherein the at least one fluorocarbon group is of the formula:
- 28. The method according to claim 26, wherein said surfactant further comprises a hydrocarbon-containing group attached to the phosphate group.
- 29. The method according to claim 28, wherein the hydrocarbon-containing chain is of the formula:
- 30. The method according to claim 22, wherein the surfactant is represented by the formula:
- 31. The method according to claim 22, wherein the surfactant is an anionic surfactant.
- 32. The method according to claim 30, wherein the anionic surfactant is represented by the formula:
- 33. The method according to claim 32, wherein RF is selected from the group consisting of C6F13(CH2)2 and C10F21(CH2)2, RH is selected from the group consisting of C4H9, C8H17, C12H25, and C16H33, and M is Na+.
- 34. The method according to claim 22, wherein the surfactant is a cationic surfactant.
- 35. The method according to claim 34, wherein the cationic surfactant is selected from the group consisting of:
- 36. The method according to claim 22, wherein the surfactant comprises one or more one or more morpholine units attached to the phosphate group.
- 37. The method according to claim 36, wherein the surfactant is selected from the group consisting of
- 38. The method according to claim 22, wherein the carbon dioxide is supercritical carbon dioxide.
- 39 The method according to claim 22, wherein the carbon dioxide is liquid carbon dioxide.
- 40. The method according to claim 22, wherein said surfactant is present in said composition of matter in an amount ranging from about 1 to about 10 percent based on the weight of the surfactant.
- 41. The method according to claim 22, further comprising at least one additional component selected from the group consisting of polymer modifier, rheology modifiers, plasticizing agents, antibacterial agents, flame retardants, viscosity reduction modifiers, co-solvents, and co-surfactants.
- 42. The method according to claim 22, wherein the composition of matter comprises water.
- 43. A composition of matter comprising:
(1) at least one anionic surfactant comprising at least one phosphate group; and (2) a solvent comprising carbon dioxide, wherein at least a portion of the surfactant is soluble in the solvent. wherein the anionic surfactant is represented by the formula: 36wherein RH is, CnH2n+1 wherein n ranges from 1 to 24 or CnF2n+1(CH2)m wherein n ranges from 1 to 24 and m ranges from 1 to 24, RF is CnF2n+1(CH2)m wherein n ranges from 1 to 24 and m ranges from 1 to 24, and M is K+ or Na+.
- 44. The composition of matter according to claim 43, wherein RF is selected from the group consisting of C6F13(CH2)2 and C10F21(CH2)2, RH is selected from the group consisting of C4H9, C8H17, C12H25, and C16H33, and M is Na+.
- 45. The composition of matter according to claim 43, wherein the carbon dioxide is supercritical carbon dioxide.
- 46. The composition of matter according to claim 43, wherein the carbon dioxide is liquid carbon dioxide.
- 47. The composition of matter according to claim 43, wherein said surfactant is present in said composition of matter in an amount ranging from about 1 to about 10 percent based on the weight of the surfactant.
- 48. The composition of matter according to claim 43, further comprising at least one additional component selected from the group consisting of polymer modifier, rheology modifiers, plasticizing agents, antibacterial agents, flame retardants, viscosity reduction modifiers, co-solvents, and co-surfactants.
- 49. The composition of matter according to claim 43, wherein the composition of matter comprises water.
- 50. A reverse micelle comprising the composition of matter as defined by claim 49.
- 51. The reverse micelle according to claim 50, wherein the water is present in an amount ranging from above about 0 to about 200 percent based on the weight of the surfactant.
- 52. A composition of matter comprising:
(1) at least one cationic surfactant comprising at least one phosphate group; and (2) a solvent comprising carbon dioxide, wherein at least a portion of the surfactant is soluble in the solvent.
- 53. The composition of matter according to claim 52, wherein the cationic surfactant is selected from the group consisting of:
- 54. The composition of matter according to claim 52, wherein the carbon dioxide is supercritical carbon dioxide.
- 55. The composition of matter according to claim 52, wherein the carbon dioxide is liquid carbon dioxide.
- 56. The composition of matter according to claim 52, wherein said surfactant is present in said composition of matter in an amount ranging from about 1 to about 10 percent based on the weight of the surfactant.
- 57. The composition of matter according to claim 52, further comprising at least one additional component selected from the group consisting of polymer modifier, rheology modifiers, plasticizing agents, antibacterial agents, flame retardants, viscosity reduction modifiers, co-solvents, and co-surfactants.
- 58. The composition of matter according to claim 52, wherein the composition of matter comprises water.
- 59. A reverse micelle comprising the composition of matter as defined by claim 58.
- 60. The reverse micelle according to claim 59, wherein the water is present in an amount ranging from above about 0 to about 200 percent based on the weight of the surfactant.
- 61. A composition of matter comprising:
(1) at least one surfactant comprising at least one phosphate group; and (2) a solvent comprising carbon dioxide, wherein at least a portion of the surfactant is soluble in the solvent; wherein the at least one surfactant comprises one or more one or more morpholine units attached to the phosphate group.
- 62. The composition of matter according to claim 61, wherein the surfactant is selected from the group consisting of
- 63. The composition of matter according to claim 61, wherein the carbon dioxide is supercritical carbon dioxide.
- 64. The composition of matter according to claim 61, wherein the carbon dioxide is liquid carbon dioxide.
- 65. The composition of matter according to claim 61, wherein said surfactant is present in said composition of matter in an amount ranging from about 1 to about 10 percent based on the weight of the surfactant.
- 66. The composition of matter according to claim 61, further comprising at least one additional component selected from the group consisting of polymer modifier, rheology modifiers, plasticizing agents, antibacterial agents, flame retardants, viscosity reduction modifiers, co-solvents, and co-surfactants.
- 67. The composition of matter according to claim 61, wherein the composition of matter comprises water.
- 68. A reverse micelle comprising the composition of matter as defined by claim 67.
- 69. The reverse micelle according to claim 68, wherein the water is present in an amount ranging from above about 0 to about 200 percent based on the weight of the surfactant.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] The present application claims priority to Provisional Application Serial No. 60/235,516 filed Sep. 26, 2000, the disclosure of which is incorporated herein by reference in its entirety.
Provisional Applications (1)
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Number |
Date |
Country |
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60235516 |
Sep 2000 |
US |