Cleaning of wafer as interim step

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CPC
Y10S438/906

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S438/00Semiconductor device manufacturing: process

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Y10S438/906Cleaning of wafer as interim step

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Patents Grantslast 30 patents

Information Patent Grant
Mechanisms for cleaning substrate surface for hybrid bonding
- Patent number 10,727,097
- Issue date Jul 28, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chau Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and materials for making a monolithic porous pad cast onto...
- Patent number 10,040,226
- Issue date Aug 7, 2018
- Entegris, Inc.
- Briant Enoch Benson
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Photoresist removal
- Patent number 9,256,134
- Issue date Feb 9, 2016
- Advanced Technology Materials, Inc.
- David W. Minsek
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Mechanisms for cleaning substrate surface for hybrid bonding
- Patent number 9,040,385
- Issue date May 26, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Chau Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for surface treatment
- Patent number 9,023,741
- Issue date May 5, 2015
- BOE Technology Group Co., Ltd.
- Xianghua Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and materials for making a monolithic porous pad cast onto a...
- Patent number 8,920,571
- Issue date Dec 30, 2014
- Entegris, Inc.
- Briant Enoch Benson
- B24 - GRINDING POLISHING
Information Patent Grant
Photoresist removal
- Patent number 8,679,734
- Issue date Mar 25, 2014
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to reduce charge buildup during high aspect ratio contact etch
- Patent number 8,673,787
- Issue date Mar 18, 2014
- Micron Technology, Inc.
- Gurtej S. Sandhu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods and materials for making a monolithic porous pad cast onto...
- Patent number 8,533,895
- Issue date Sep 17, 2013
- Entegris, Inc.
- Briant Enoch Benson
- B24 - GRINDING POLISHING
Information Patent Grant
Organic light emitting diode display with improved crystallinity of...
- Patent number 8,519,386
- Issue date Aug 27, 2013
- Samsung Display Co., Ltd.
- Kyu-Sik Cho
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Simultaneous front side ash and backside clean
- Patent number 8,444,869
- Issue date May 21, 2013
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods of finishing quartz glass surfaces and components made by t...
- Patent number 8,318,035
- Issue date Nov 27, 2012
- Lam Research Corporation
- Mark W. Kiehlbauch
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Photoresist removal
- Patent number 8,236,485
- Issue date Aug 7, 2012
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Component cleaning method and storage medium
- Patent number 8,236,109
- Issue date Aug 7, 2012
- Tokyo Electron Limited
- Tsuyoshi Moriya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Organic light emitting diode display with improved on-current, and...
- Patent number 8,232,123
- Issue date Jul 31, 2012
- Samsung Electronics Co., Ltd.
- Kyu-Sik Cho
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
High yield and high throughput method for the manufacture of integr...
- Patent number 8,207,060
- Issue date Jun 26, 2012
- Byung Chun Yang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of removing resist and apparatus therefor
- Patent number 8,187,389
- Issue date May 29, 2012
- Meidensha Corporation
- Toshinori Miura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming capacitors, and methods of utilizing silicon diox...
- Patent number 8,183,157
- Issue date May 22, 2012
- Micron Technology, Inc.
- Naraji B Rana
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Dry cleaning apparatus and method
- Patent number 8,173,934
- Issue date May 8, 2012
- IMT Co. Ltd
- Jong Myoung Lee
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for fabricating metal interconnection of semiconductor device
- Patent number 8,153,518
- Issue date Apr 10, 2012
- Dongbu Hitek Co., Ltd.
- Chung-Kyung Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for manufacturing semiconductor integrated circuit device
- Patent number 8,129,275
- Issue date Mar 6, 2012
- Renesas Electronics Corporation
- Naofumi Ohashi
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,097,538
- Issue date Jan 17, 2012
- Kabushiki Kaisha Toshiba
- Tatsuhiko Koide
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and system for monitoring contamination on a substrate
- Patent number 8,083,862
- Issue date Dec 27, 2011
- Tokyo Electron Limited
- Ian J. Brown
- B08 - CLEANING
Information Patent Grant
Methods of utilizing silicon dioxide-containing masking structures
- Patent number 8,026,148
- Issue date Sep 27, 2011
- Micron Technology, Inc.
- Niraj B. Rana
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for manufacturing semiconductor device and method for cleani...
- Patent number 7,994,063
- Issue date Aug 9, 2011
- National University Corporation Tohoku University
- Tadahiro Ohmi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods and materials for making a monolithic porous pad cast onto...
- Patent number 7,984,526
- Issue date Jul 26, 2011
- Entegris, Inc.
- Briant Enoch Benson
- B24 - GRINDING POLISHING
Information Patent Grant
Method to reduce charge buildup during high aspect ratio contact etch
- Patent number 7,985,692
- Issue date Jul 26, 2011
- Micron Technology, Inc.
- Gurtej S. Sandhu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of treating a semiconductor substrate
- Patent number 7,985,683
- Issue date Jul 26, 2011
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of manufacturing complementary metal oxide semiconductor ima...
- Patent number 7,964,495
- Issue date Jun 21, 2011
- Dongbu Hitek Co., Ltd.
- Han-Choon Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for cleaning silicon wafer and apparatus for cleaning the si...
- Patent number 7,955,440
- Issue date Jun 7, 2011
- Sumco Corporation
- Shigeru Okuuchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST REMOVAL
- Publication number 20140213498
- Publication date Jul 31, 2014
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR SURFACE TREATMENT
- Publication number 20140141564
- Publication date May 22, 2014
- BOE TECHNOLOGY GROUP CO., LTD.
- Xianghua WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND MATERIALS FOR MAKING A MONOLITHIC POROUS PAD CAST ONTO A...
- Publication number 20140020712
- Publication date Jan 23, 2014
- Entegris, Inc.
- Briant Enoch Benson
- A46 - BRUSHWARE
Information Patent Application
PHOTORESIST REMOVAL
- Publication number 20120302483
- Publication date Nov 29, 2012
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANIC LIGHT EMITTING DIODE DISPLAY AND METHOD FOR MANUFACTURING T...
- Publication number 20120262433
- Publication date Oct 18, 2012
- Samsung Electronics Co., Ltd.
- Kyu-Sik CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND MATERIALS FOR MAKING A MONOLITHIC POROUS PAD CAST ONTO...
- Publication number 20110277789
- Publication date Nov 17, 2011
- Entegris, Inc.
- Briant Enoch Benson
- B08 - CLEANING
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE CONTAINING STACKED SE...
- Publication number 20110263121
- Publication date Oct 27, 2011
- Sanyo Electric Co., Ltd.
- Ryosuke Usui
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method to Reduce Charge Buildup During High Aspect Ratio Contact Etch
- Publication number 20110250759
- Publication date Oct 13, 2011
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming Capacitors, and Methods of Utilizing Silicon Diox...
- Publication number 20110143543
- Publication date Jun 16, 2011
- Micro Technology Inc.
- NIRAJ RANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Utilizing Silicon Dioxide-Containing Masking Structures
- Publication number 20110111597
- Publication date May 12, 2011
- Micron Technology, Inc.
- Niraj Rana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT CLEAN BY REMOTE PLASMA AND REPAIR OF SILICIDE SURFACE
- Publication number 20110104897
- Publication date May 5, 2011
- XINLIANG LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD FOR CLEANI...
- Publication number 20110034037
- Publication date Feb 10, 2011
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100267233
- Publication date Oct 21, 2010
- Tatsuhiko Koide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SILICON WAFER AND APPARATUS FOR CLEANING THE SI...
- Publication number 20100252070
- Publication date Oct 7, 2010
- SUMCO CORPORATION
- Shigeru Okuuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of treating a semiconductor substrate
- Publication number 20100240219
- Publication date Sep 23, 2010
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING METAL INTERCONNECTION OF SEMICONDUCTOR DEVICE
- Publication number 20100167524
- Publication date Jul 1, 2010
- Chung-Kyung Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT CLEANING METHOD AND STORAGE MEDIUM
- Publication number 20100154821
- Publication date Jun 24, 2010
- TOKYO ELECTRON LIMITED
- TSUYOSHI MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REMOVING RESIST AND APPARATUS THEREFOR
- Publication number 20100139708
- Publication date Jun 10, 2010
- MEIDENSHA CORPORATION
- Toshinori Mirura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
- Publication number 20100136786
- Publication date Jun 3, 2010
- Naofumi Ohashi
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Application
Methods Of Forming Capacitors, And Methods Of Utilizing Silicon Dio...
- Publication number 20100099232
- Publication date Apr 22, 2010
- Niraj Rana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF TREATING A SEMICONDUCTOR SUBSTRATE
- Publication number 20100075504
- Publication date Mar 25, 2010
- Hiroshi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20100075508
- Publication date Mar 25, 2010
- Canon ANELVA Corporation
- Takuya Seino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE
- Publication number 20090311874
- Publication date Dec 17, 2009
- Hiroshi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact Clean by Remote Plasma and Repair of Silicide Surface
- Publication number 20090305500
- Publication date Dec 10, 2009
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC LIGHT EMITTING DIODE DISPLAY AND METHOD FOR MANUFACTURING T...
- Publication number 20090302319
- Publication date Dec 10, 2009
- Samsung Electronics Co., Ltd.
- Kyu-Sik CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20090221143
- Publication date Sep 3, 2009
- Koichiro Saga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High yield and high throughput method for the manufacture of integr...
- Publication number 20090197404
- Publication date Aug 6, 2009
- Byung Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus And Method For Cleaning Glass Substrates Using A Cool Hyd...
- Publication number 20090188534
- Publication date Jul 30, 2009
- Agency for Science, Technology and Research
- David Tee LIANG
- B08 - CLEANING
Information Patent Application
METHODS FOR FABRICATING RESIDUE-FREE CONTACT OPENINGS
- Publication number 20090104767
- Publication date Apr 23, 2009
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLAR CELLS AND METHODS AND APPARATUSES FOR FORMING THE SAME INCLUD...
- Publication number 20090093080
- Publication date Apr 9, 2009
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Cleaning of wafer as interim step

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mechanisms for cleaning substrate surface for hybrid bonding

Methods and materials for making a monolithic porous pad cast onto...

Photoresist removal

Mechanisms for cleaning substrate surface for hybrid bonding

Method for surface treatment

Method and materials for making a monolithic porous pad cast onto a...

Photoresist removal

Method to reduce charge buildup during high aspect ratio contact etch

Methods and materials for making a monolithic porous pad cast onto...

Organic light emitting diode display with improved crystallinity of...

Simultaneous front side ash and backside clean

Methods of finishing quartz glass surfaces and components made by t...

Photoresist removal

Component cleaning method and storage medium

Organic light emitting diode display with improved on-current, and...

High yield and high throughput method for the manufacture of integr...

Method of removing resist and apparatus therefor

Method of forming capacitors, and methods of utilizing silicon diox...

Dry cleaning apparatus and method

Method for fabricating metal interconnection of semiconductor device

Process for manufacturing semiconductor integrated circuit device

Method of manufacturing semiconductor device

Method and system for monitoring contamination on a substrate

Methods of utilizing silicon dioxide-containing masking structures

Method for manufacturing semiconductor device and method for cleani...

Methods and materials for making a monolithic porous pad cast onto...

Method to reduce charge buildup during high aspect ratio contact etch

Method of treating a semiconductor substrate

Method of manufacturing complementary metal oxide semiconductor ima...

Method for cleaning silicon wafer and apparatus for cleaning the si...

Patents Applicationslast 30 patents

PHOTORESIST REMOVAL

METHOD FOR SURFACE TREATMENT

METHOD AND MATERIALS FOR MAKING A MONOLITHIC POROUS PAD CAST ONTO A...

PHOTORESIST REMOVAL

ORGANIC LIGHT EMITTING DIODE DISPLAY AND METHOD FOR MANUFACTURING T...

METHODS AND MATERIALS FOR MAKING A MONOLITHIC POROUS PAD CAST ONTO...

MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE CONTAINING STACKED SE...

Method to Reduce Charge Buildup During High Aspect Ratio Contact Etch

Method of Forming Capacitors, and Methods of Utilizing Silicon Diox...

Methods of Utilizing Silicon Dioxide-Containing Masking Structures

CONTACT CLEAN BY REMOTE PLASMA AND REPAIR OF SILICIDE SURFACE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD FOR CLEANI...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR CLEANING SILICON WAFER AND APPARATUS FOR CLEANING THE SI...

Method of treating a semiconductor substrate

METHOD FOR FABRICATING METAL INTERCONNECTION OF SEMICONDUCTOR DEVICE

COMPONENT CLEANING METHOD AND STORAGE MEDIUM

METHOD OF REMOVING RESIST AND APPARATUS THEREFOR

PROCESS FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

Methods Of Forming Capacitors, And Methods Of Utilizing Silicon Dio...

METHOD OF TREATING A SEMICONDUCTOR SUBSTRATE

METHOD OF FABRICATING A SEMICONDUCTOR DEVICE

METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE

Contact Clean by Remote Plasma and Repair of Silicide Surface

ORGANIC LIGHT EMITTING DIODE DISPLAY AND METHOD FOR MANUFACTURING T...

METHOD OF CLEANING AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE

High yield and high throughput method for the manufacture of integr...

Apparatus And Method For Cleaning Glass Substrates Using A Cool Hyd...

METHODS FOR FABRICATING RESIDUE-FREE CONTACT OPENINGS

SOLAR CELLS AND METHODS AND APPARATUSES FOR FORMING THE SAME INCLUD...