Claims
- 1. A photothermographic recording material comprising a photo-addressable thermosensitive element on one side of a water resistant support and an outermost backside layer on the other side of said water resistant support, said photo-addressable thermosensitive element comprising a substantially light-insensitive organic silver salt, an organic reducing agent for said substantially light-insensitive organic silver salt in thermal working relationship therewith, photosensitive silver halide in catalytic association with said substantially light insensitive organic silver salt and a binder; and said outermost backside layer comprising polymeric beads, characterized in that an outermost layer on said side of said water resistant support with said photo-addressable thermosensitive element does not contain a fluorine-containing polymeric surfactant; and the static frictional coefficient between said outermost layer on said side of said water resistant support with said photo-addressable thermosensitive element and said outermost backside layer is .ltoreq.0.24.
- 2. Photothermographic recording material according to claim 1, wherein said outermost backside layer of said photothermographic recording material further comprises an antistatic species.
- 3. Photothermographic recording material according to claim 1, wherein said outermost backside layer of said photothermographic recording material further comprises an antihalation dye.
- 4. Photothermographic recording material according to claim 1, wherein said outermost backside layer of said photothermographic recording material further comprises colloidal silica.
- 5. The photothermographic recording material according to claim 1, wherein said outermost backside layer of said photothermographic recording material has an R.sub.z determined according to DIN 4768/1 of >1.75 mm.
- 6. A photothermographic recording process comprising the steps of: (i) providing a photothermographic recording material comprising a photo-addressable thermosensitive element on one side of a water resistant support and an outermost backside layer on the other side of said water resistant support, said photo-addressable thermosensitive element comprising a substantially light-insensitive organic silver salt, an organic reducing agent for said substantially light-insensitive organic silver salt in thermal working relationship therewith, photosensitive silver halide in catalytic association with said substantially light insensitive organic silver salt and a binder; and said outermost backside layer comprising polymeric beads; (ii) image-wise exposing said photo-addressable thermosensitive element with actinic radiation; (iii) bringing said image-wise exposed photothermographic recording material into proximity with a heat source; (iv) uniformly heating said image-wise exposed photothermographic recording material; and (v) removing said photothermographic recording material from said heat source, wherein an outermost layer on said side of said water resistant support with said photo-addressable thermosensitive element does not contain a fluorine-containing polymeric surfactant; the static frictional coefficient between said outermost layer on said side of said water resistant support with said photo-addressable thermosensitive element and said outermost backside layer is .ltoreq.0.24.
- 7. Photothermographic recording process according to claim 6, wherein said outermost backside layer of said photothermographic recording material further comprises an antistatic species.
- 8. Photothermographic recording process according to claim 6, wherein said outermost backside layer of said photothermographic recording material further comprises an antihalation dye.
- 9. Photothermographic recording process according to claim 6, wherein said outermost backside layer of said photothermographic recording material further comprises colloidal silica.
- 10. The photothermographic recording process according to claim 6, wherein said outermost backside layer of said photothermographic recording material has an R.sub.z determined according to DIN 4768/1 of >1.75 mm.
- 11. A photothermographic recording material comprising a photo-addressable thermosensitive element on one side of a water resistant support and an outermost backside layer on the other side of said water resistant support, said photo-addressable thermosensitive element comprising a substantially light-insensitive organic silver salt, an organic reducing agent for said substantially light-insensitive organic silver salt in thermal working relationship therewith, photosensitive silver halide in catalytic association with said substantially light insensitive organic silver salt and a binder; and said outermost backside layer comprising polymeric beads, characterized in that an outermost layer on said side of said water resistant support with said photo-addressable thermosensitive element does not contain a fluorine-containing polymeric surfactant; the static frictional coefficient between said outermost layer on said side of said water resistant support with said photo-addressable thermosensitive element and said outermost backside layer is .ltoreq.0.24; and said outermost layer on said side of said water resistant support with said photo-addressable thermosensitive element has an R.sub.z determined according to DIN 4768/1 of <1.75 .mu.m.
- 12. A photothermographic recording material comprising a photo-addressable thermosensitive element on one side of a water resistant support and an outermost backside layer on the other side of said water resistant support, said photo-addressable thermosensitive element comprising a substantially light-insensitive organic silver salt, an organic reducing agent for said substantially light-insensitive organic silver salt in thermal working relationship therewith, photosensitive silver halide in catalytic association with said substantially light insensitive organic silver salt and a binder; and said outermost backside layer comprising polymeric beads, characterized in that an outermost layer on said side of said water resistant support with said photo-addressable thermosensitive element does not contain a fluorine-containing polymeric surfactant; the static frictional coefficient between said outermost layer on said side of said water resistant support with said photo-addressable thermosensitive element and said outermost backside layer is .ltoreq.0.24; and said outermost layer on said side of said water resistant support with said photo-addressable thermosensitive element has an R.sub.z determined according to DIN 4768/1 of >1.75 mm.
Priority Claims (1)
Number |
Date |
Country |
Kind |
96201530 |
Jun 1996 |
EPX |
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Parent Case Info
The present application is a division of U.S. application Ser. No. 08/862,813 filed May 30, 1997.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
5468603 |
Kub |
Nov 1995 |
|
5750328 |
Melpolder et al. |
May 1998 |
|
5883042 |
Defieuw et al. |
Mar 1999 |
|
Non-Patent Literature Citations (1)
Entry |
Brochure describing 3M (now IMATION) DRYVIEWS.TM.8700 material on U.S. Market since Oct. 1995. |
Divisions (1)
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Number |
Date |
Country |
Parent |
862813 |
May 1997 |
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