This application is a U.S. National Phase application, under 35 U.S.C. § 371, of International Application no. PCT/JP2020/029447, with an international filing date of Jul. 31, 2020, and claims priority to Japanese application no. 2019-150764, filed on Aug. 20, 2019, each of which is hereby incorporated by reference for all purposes.
The disclosure in the present application relates to a photocathode kit, an electron gun, and an electron beam applicator.
Electron guns equipped with a photocathode and electron beam applicators such as an electron microscope, a free electron laser accelerator, an inspection device, or the like including such an electron gun are known. For example, Patent Literatures 1 and 2 disclose an electron gun using a photocathode irradiated with excitation light from a light source and emits an electron beam.
Patent Literature 1 discloses an electron gun using a so-called transmission type photocathode. The photocathode disclosed in Patent Literature 1 has a transparent substrate and a photocathode film formed on the surface of the transparent substrate. A light source is arranged so that light enters the transparent substrate side of the photocathode, the photocathode film is irradiated with excitation light from the light source, and electrons are emitted into vacuum from the photocathode film side. At this time, a lens is arranged between the light source and the photocathode so that the excitation light is focused on the photocathode film.
Further, Patent Literature 2 discloses an electron gun having a housing container that can accommodate a photocathode. The housing container is a container that can have a surface treatment material arranged inside to vaporize the surface treatment material and can perform EA surface treatment on the photocathode with the vaporized surface treatment material. Patent Literature 2 discloses that, with the housing container being provided, it is possible to perform EA surface treatment inside a chamber without taking the photocathode to the outside.
When the light irradiation is being continued, this deteriorates electron emission characteristics of the photocathode and reduces the electron emission amount. Thus, it is known that the intensity of the electron beam of an electron beam source using a photocathode decreases with operating time. EA surface treatment is then applied to the deteriorated photocathode to recover the photocathode.
In Patent Literature 1, EA surface treatment is performed outside a vacuum chamber, and the photocathode is required to be taken out of the vacuum chamber. Since the photocathode is then arranged inside the vacuum chamber after the EA surface treatment, it is required to adjust the lens position with respect to the photocathode so that excitation light is suitably emitted to the photocathode film. Thus, there is a problem of complex operation in moving the photocathode and adjusting the lens position. Further, it is required to provide a motion mechanism used for taking the photocathode to the outside and a lens position adjustment mechanism, and this causes a problem of an increase in size and complexity of the device.
Further, when the housing container as disclosed in Patent Literature 2 is provided, the EA surface treatment of the photocathode is not required to be performed outside a vacuum chamber. However, the EA surface treatment inside a vacuum chamber causes a surface treatment material arranged inside the housing container to be vaporized, and this causes a problem of contamination of the lens when a transmission type photocathode is used.
Accordingly, in a transmission type photocathode, when the photocathode and the lens are installed inside the electron gun, the disclosure in the present application is to provide a photocathode kit, an electron gun, and an electron beam applicator equipped with the electron gun, which no adjustment of the distance between a photocathode film and a lens that focuses on the photocathode film is required. Other optional, additional advantageous effects of the disclosure in the present application will be apparent from embodiments of the invention.
According to the disclosure in the present application, in a transmission type photocathode, no adjustment of the distance between a photocathode film and a lens that focuses on the photocathode film is required when the photocathode and the lens are installed inside the electron gun.
A photocathode kit, an electron gun, and an electron beam applicator will be described below in detail with reference to the drawings. Note that, in this specification, members having the same type of functions are labeled with the same or similar references. Further, for members labeled with the same or similar references, the duplicated description thereof may be omitted.
Further, the position, size, range, or the like of each feature illustrated in the drawings do not always represent the actual position, size, range, or the like for easier understanding. Thus, the disclosure in the present application is not necessarily limited to the position, size, range, or the like disclosed in the drawings.
A photocathode kit 1A in the first embodiment will be described with reference to
The photocathode kit 1A in the first embodiment has a photocathode 2, a lens 3, and a holder 4.
In
The transparent substrate 21 is not particularly limited as long as it can transmit excitation light received from a light source. For example, quartz glass or sapphire glass may be used.
The photocathode film 22 is not particularly limited as long as it can emit an electron beam when irradiated with excitation light and may be made of a material requiring EA surface treatment, a material not requiring EA surface treatment, or the like. The material requiring EA surface treatment may be, for example, a group III-V semiconductor material or a group II-VI semiconductor material. Specifically, AlN, Ce2Te, GaN, a compound of one or more types of alkali metals and Sb, AlAs, GaP, GaAs, GaSb, InAs, or the like, and a mixed crystal thereof, or the like may be used. Another example may be a metal, specifically, Mg, Cu, Nb, LaB6, SeB6, Ag, or the like. With EA surface treatment being performed, the photocathode film 22 can be fabricated, and for the photocathode film 22, not only can excitation light be selected in the near-ultraviolet-infrared wavelength region in accordance with gap energy of a semiconductor but also desired electron beam source performance (quantum yield, durability, monochromaticity, time response, spin polarization) in accordance with a use of the electron beam can be achieved through selection of the material or the structure of the semiconductor.
Further, the material not requiring EA surface treatment may be, for example, a single metal, an alloy, or a metal compound of Cu, Mg, Sm, Tb, Y, or the like or diamond, WBaO, Cs2Te, or the like. The photocathode film not requiring EA surface treatment can be fabricated by a known method (for example, see Japanese Patent No. 3537779 or the like).
The lens 3 converges excitation light received from a light source to the photocathode film 22. The converged excitation light is focused on the photocathode film 22, and an electron beam is emitted from the photocathode film 22. The lens 3 is not particularly limited as long as it can collect light, and a commonly used lens can be used.
The holder 4 holds the photocathode 2 and the lens 3. The holder 4 has a hollow structure so that externally incident excitation light is emitted to the photocathode 2 via the lens 3. Further, the holder 4 has, inside the hollow structure, a substrate holding part 41 that holds the transparent substrate 21 of the photocathode 2 and a retaining member 42 by which the photocathode film 22 and the lens 3 are spaced apart by a predetermined distance.
Note that, although the lens 3 is interposed between and held by the holder 4 and the spacer 42 in the example illustrated in
While details will be described later, the holder 4 can have a heater and thus be preferably formed of a material with good heat transfer. The material may be, for example, a metal such as titanium, molybdenum, an alloy thereof, Inconel, stainless steel (SUS), or the like.
The substrate holding part 41 is not particularly limited as long as it can hold (fix) the transparent substrate 21 to the holder 4.
The spacer 42 is arranged between the photocathode 2 and the lens 3 and defines the distance between the photocathode 2 and the lens 3, in other words, the positional relationship between the photocathode 2 and the lens 3 so that the focal point of the lens 3 is located on the photocathode film 22. The spacer 42 illustrated in
The material forming the spacer 42 is not particularly limited as long as it can retain the photocathode film 22 and the lens 3 to be spaced apart by a predetermined distance. For example, the spacer 42 may be formed of a metal or the like similarly to the holder 4. Alternatively, the spacer 42 may be formed of a non-metal material such as synthetic quartz or ceramics. The non-metal material such as synthetic quartz or ceramics is less deformed by heating than a metal or the like. Therefore, if the non-metal material such as synthetic quartz or ceramics is used as the material forming the spacer, this achieves an advantageous effect that the distance between the photocathode film 22 and the lens 3 is less likely to be changed.
The photocathode kit 1A illustrated in
Further, in the example illustrated in
Further, since the spacer 42 illustrated in
The second communication path 46 of the spacer 42 illustrated in
The photocathode kit 1A in the first embodiment holds the transparent substrate 21 and the lens 3 so that the focal point of the lens 3 is located on the photocathode film 22 of the photocathode 2. Therefore, with the photocathode kit 1A being installed on a light path from a light source, the focal point of excitation light that has passed through the lens 3 can be located on the photocathode film 22. In the conventional art, adjustment for matching the focal point of the lens 3 to the photocathode film 22 is required every time the photocathode 2 is installed inside an electron gun. On the other hand, the use of the photocathode kit 1A illustrated in the first embodiment eliminates the need for position adjustment of the lens 3, and this achieves an advantageous effect that an operation of installing the photocathode 2 and the lens 3 inside the electron gun is simplified.
Further, in the conventional art, two drive units of a drive unit that moves the photocathode and a drive unit that moves the lens are required when the photocathode is installed inside an electron gun. On the other hand, the use of the photocathode kit 1A illustrated in the first embodiment eliminates the need for position adjustment of the lens 3. Thus, the position of the photocathode 2 installed in the electron gun can be adjusted by using only the drive unit which moves the photocathode kit 1A, and this achieves an advantageous effect that the device can be reduced in size and simplified.
A photocathode kit 1B in the second embodiment will be described with reference to
In the first embodiment, the spacer 42 is used as a retaining member for maintaining the distance between the photocathode film 22 and the lens 3 to be a predetermined distance. On the other hand, the second embodiment differs from the first embodiment in that, instead of the spacer 42, a lens holding part is used as the retaining member. Therefore, in the second embodiment, features different from those of the first embodiment will be mainly described, and duplicated description for the features already described in the first embodiment will be omitted. Thus, needless to say, the feature already described in the first embodiment can be employed in the second embodiment even when not explicitly described in the second embodiment.
The holder 4 in the second embodiment illustrated in
The lens holding part 47 is not particularly limited as long as it can fix and hold the lens 3 inside the holder 4 without contacting with the transparent substrate 21. The lens holding part 47 illustrated in
Further, although depiction is omitted, the lens holding part 47 may be formed integrally with the holder 4. More specifically, similarly to the substrate holding part 41, the lens holding part 47 may be formed as a recess provided in the holder 4, and the lens 3 may be engaged with the recess. Alternatively, the lens holding part 47 may be formed as a protrusion provided integrally with the holder 4. The holder 4, as described in the first embodiment, may be divided if necessary.
When the lens holding part 47 and the holder 4 are formed as separate components, the lens holding part 47 may be formed of a metal or a non-metal material such as ceramics similar to the holder 4, for example.
In the second embodiment, the photocathode film 22 and the lens 3 can be retained to be spaced apart by a predetermined distance by the substrate holding part 41 and the lens holding part 47. Therefore, also in the second embodiment, the same advantageous effects as achieved by the photocathode kit 1A of the first embodiment can be achieved.
A photocathode kit 1C in the third embodiment will be described with reference to
The photocathode kit 1C in the third embodiment differs from the photocathode kit 1A illustrated in the first embodiment in that a heater 5 is further provided, and other features are the same as those of the first embodiment. Therefore, in the third embodiment, features different from those of the first embodiment will be mainly described, and duplicated description for the features already described in the first embodiment will be omitted. Thus, needless to say, the feature already described in the first embodiment can be employed in the third embodiment even when not explicitly described in the third embodiment. Further, although the examples illustrated in
Before the photocathode 2 is installed in the electron gun, the photocathode 2 is exposed to impurities in the atmospheric air. It is thus necessary to clean up the surface of the photocathode 2 by heating at 300 to 700 degrees Celsius in vacuum for 10 minutes to 1 hour and removing surface impurities such as an oxide or a carbide.
In the third embodiment, the photocathode kit 1C has the heater 5. It is thus possible to heat the photocathode 2 by using the configuration provided to the photocathode kit 1C. In the example illustrated in
In the example illustrated in
Further, the photocathode kit 1 is arranged inside the electron gun and can perform EA surface treatment on the photocathode 2 inside the electron gun. The EA surface treatment is performed by vaporizing and depositing a surface treatment material on the photocathode 2. In this process, if the heater 5 is exposed to the outside of the holder 4, the surface treatment material of the photocathode 2 may deposit to the heater 5. In the example illustrated in
The heater 5 is not particularly limited as long as it can heat the photocathode film 22 to around 300 to 700 degrees Celsius in vacuum. The heater 5 may be, for example, a heating wire of tantalum or the like or a laser heating device.
The photocathode kit 1C in the third embodiment synergistically achieves the following advantageous effects in addition to the advantageous effects achieved by the photocathode kit 1 of the first and second embodiments.
It is possible to perform heat treatment on the photocathode 2 inside an electron gun after the photocathode kit 1C is installed in the electron gun. Further, even when the photocathode 2 is deteriorated by attachment of impurities due to usage, it is possible to perform heat treatment on the photocathode 2 without taking the electron gun to the outside.
A photocathode kit 1D in the fourth embodiment will be described with reference to
In the first embodiment, the substrate holding part 41 is provided to the holder 4 to hold the transparent substrate 21. On the other hand, the fourth embodiment differs from the first embodiment in that the transparent substrate 21 is held by a substrate holding member 48 instead of being held by the substrate holding part 41, and other features are the same as those of the first embodiment. Therefore, in the fourth embodiment, features different from those of the first embodiment will be mainly described, and duplicated description for the features already described in the first embodiment will be omitted. Thus, needless to say, the feature already described in the first embodiment can be employed in the fourth embodiment even when not explicitly described in the fourth embodiment. Further, although the example illustrated in
In the example illustrated in
The substrate holding member 48 is not particularly limited as long as it can hold the transparent substrate 21 at the lower end of the holder 4. The substrate holding member 48 illustrated in
The substrate holding member 48 can be formed of a metal or a non-metal material such as ceramics similar to the holder 4, for example.
The photocathode kit 1D in the fourth embodiment synergistically achieves the following advantageous effects in addition to the advantageous effects achieved by the photocathode kit 1 of the first to third embodiments.
When the transparent substrate 21 is held inside the holder 4 as with the first embodiment, the holder 4 is required to be formed of a plurality of members. On the other hand, in the fourth embodiment, since the transparent substrate 21 can be held from the outside of the holder 4, the holder 4 can be formed of a single cylindrical component.
Further, when the transparent substrate 21 is held inside the holder 4, handling of the transparent substrate 21 will be difficult unless the transparent substrate 21 has a certain thickness. On the other hand, in the fourth embodiment, since the transparent substrate 21 can be arranged between the lower end of the holder 4 and the substrate holding member 48 and held by the holder 4, the transparent substrate 21 can be thinner. With the thinner transparent substrate 21, a loss of light with which the photocathode film 22 is irradiated is suppressed, and this enables efficient emission of an electron beam. Further, since the thermal capacity of the transparent substrate 21 is reduced, the surface of the photocathode 2 can be efficiently cleaned up.
A photocathode kit 1E in the fifth embodiment will be described with reference to
In the first embodiment, the lens 3 is interposed between and held by the holder 4 and the spacer 42 to hold the lens 3 in the holder 4. On the other hand, the fifth embodiment differs from the first embodiment in that the lens 3 is held by the lens pressing member 31 and the spacer 42 instead of being held by the holder 4 and the spacer 42, and other features are the same as those of the first embodiment. Therefore, in the fifth embodiment, features different from those of the first embodiment will be mainly described, and duplicated description for the features already described in the first embodiment will be omitted. Thus, needless to say, the feature already described in the first embodiment can be employed in the fifth embodiment even when not explicitly described in the fifth embodiment. Further, although the example illustrated in
The lens 3 in the fifth embodiment is interposed between and held by the lens pressing member 31 and the spacer 42 as illustrated in
The lens pressing member 31 is not particularly limited as long as it can press the lens against the spacer 42 without interfering the light path of excitation light emitted to the photocathode film 22. The lens pressing member 31 illustrated in
The material forming the lens pressing member 31 is not particularly limited as long as it is elastic. The material may be, for example, a metal or the like similar to the holder 4. Note that, as described above, when heat treatment of the photocathode 2 is performed, since the temperature thereof is elevated to around 300 to 700 degrees Celsius in vacuum, the temperature of the lens pressing member 31 is also elevated. Since the lens pressing member 31 is used for maintaining the distance between the lens 3 and the photocathode film 22 to be a predetermined distance, it is more preferable that the material forming the lens pressing member 31 be sufficiently heat-resistant, have small thermal expansion, and less emitting a gas when heated. In terms of the above, as the material forming the lens pressing member 31, titanium is most preferred, and molybdenum or Inconel is next most preferred. The material forming the lens pressing member 31 and the material forming the holder 4 may be the same or may be different from each other.
The photocathode kit 1E in the fifth embodiment synergistically achieves the following advantageous effects in addition to the advantageous effects achieved by the photocathode kit 1 of the first to fourth embodiments.
When heat treatment on the photocathode 2 or EA surface treatment on the photocathode 2 is performed, the photocathode kit 1 is heated. In this process, the holder 4 is distorted due to influence of heat, and the distortion may affect the distance between the photocathode film 22 and the lens 3. In the fifth embodiment illustrated in
A photocathode kit 1F in the sixth embodiment will be described with reference to
The sixth embodiment differs from the first embodiment in that a vapor-inflow prevention part 49 is provided on the upper end side of the holder 4, and other features are the same as those of the first embodiment. Therefore, in the sixth embodiment, features different from those of the first embodiment will be mainly described, and duplicated description for the features already described in the first embodiment will be omitted. Thus, needless to say, the feature already described in the first embodiment can be employed in the sixth embodiment even when not explicitly described in the sixth embodiment. Further, although the example illustrated in
Although details will be described later, the photocathode kit 1 is arranged inside an electron gun and can perform EA surface treatment on the photocathode 2 inside the electron gun. The EA surface treatment is performed by vaporizing and depositing a surface treatment material on the photocathode 2.
While most of the vaporized surface treatment material reaches the lower end side of the photocathode kit 1, a part of the vaporized surface treatment material may reach the upper end side of the photocathode kit 1. The sixth embodiment illustrated in
The vapor-inflow prevention part 49 is not particularly limited as long as the vaporized surface treatment material is less likely to deposit to the upper surface of the lens 3. In the example illustrated in
The photocathode kit 1F in the sixth embodiment synergistically achieves the following advantageous effects in addition to the advantageous effects achieved by the photocathode kit 1 of the first to fifth embodiments.
With the vapor-inflow prevention part 49 being provided, the lens 3 can be kept cleaner.
A first embodiment of an electron gun 6 having the photocathode kit 1 will be described with reference to FIG. and
The electron gun 6 in the first embodiment has the photocathode kit 1, a light source 7, an anode 8, a vacuum chamber 9, and a housing container 10 that can accommodate the photocathode kit 1.
Further, the photocathode kit 1 illustrated in
The light source 7 is not particularly limited as long as it can irradiate the photocathode 2 with the excitation light L to emit an electron beam B. The light source 7 may be, for example, a high power (watt order) and high frequency (several hundred MHz) ultrashort pulse laser light source, a relatively inexpensive laser diode, an LED, or the like. The irradiating excitation light L may be any of pulse light or continuous light and may be adjusted as appropriate in accordance with the purpose. The light source 7 can be any light source that emits the excitation light L from the second surface 24 side of the transparent substrate 21 via the lens 3 of the photocathode kit 1. In the example illustrated in
In the example illustrated in
The anode 8 is not particularly limited as long as it can form an electric field with the cathode 2, and an anode commonly used in the field of electron guns can be used.
There is no particular restriction on the arrangement of a power supply as long as the electron beam B can be emitted from the cathode 2 to the anode 8. In the example illustrated in
In the first embodiment of the electron gun 6, EA surface treatment on the deteriorated photocathode 2 can be performed inside the vacuum chamber 9. The housing container 10 in which the photocathode kit 1 is accommodated is a container that can vaporize the surface treatment material 10m arranged therein and is used for performing EA surface treatment on the photocathode 2 with the vaporized surface treatment material. The housing container 10 at least includes the electron beam passage hole 10h through which electrons emitted from the photocathode 2 passes. The electron beam passage hole 10h needs to have a size that enables passage of at least an electron and may be a size of 1 nm to 10 mm or may be a size of 50 μm to 5 mm in order to facilitate fabrication and adjustment of the angle or the positional relationship between the electron emitted from the photocathode 2 and the electron beam passage hole 10h.
There is no particular restriction on the material of the housing container 10, and the housing container 10 can be formed of a heat resistant material that can withstand heat of 300 degrees Celsius or higher, more preferably 400 degrees Celsius or higher, such as glass, molybdenum, ceramic, sapphire, titanium, tungsten, tantalum, or the like, for example.
The surface treatment material 10m arranged inside the housing container 10 is not particularly limited as long as it is a material that enables EA surface treatment. The element forming the surface treatment material 10m may be, for example, Li, Na, K, Rb, Cs, Te, Sb, or the like. Note that Li, Na, K, Rb, and Cs out of the above elements will spontaneously ignite by itself and are unable to be stored and utilized. Thus, Li, Na, K, Rb, and Cs are required to be used in a form of a composite element of the above element or a compound containing the above element. On the other hand, when the element is used in a form of a compound, it is required to prevent an impurity gas from emitting during deposition of the element. Therefore, when the element selected from Li, Na, K, Rb, and Cs is used as the surface treatment material 10m, it is preferable to combine and use a compound such as Cs2CrO4, Rb2CrO4, Na2CrO4, or K2CrO4 and a reducing agent that suppresses emission of an impurity gas. The surface treatment material 10m is vaporized inside the photocathode housing container 10 by using a heating device and deposited on the photocathode 2.
In the first embodiment of the electron gun 6, EA surface treatment is performed by moving the photocathode kit 1 to a deposition position inside the housing container 10 through a drive device 11 as illustrated in
The electron gun 6 in the first embodiment synergistically achieves the following advantageous effects in addition to the advantageous effects achieved by the photocathode kit 1 according to the first to sixth embodiments.
If EA surface treatment is performed in a state where a photocathode and a lens are exposed in a vacuum chamber (in a housing container), respectively, the surface treatment material 10m that has drifted around the end of the transparent substrate 21 may deposit on the lens 3. In such a case, the surface treatment material 10m attached to the lens 3 intervenes in the optical system, and the position at which the excitation light is focused may change. On the other hand, in the example illustrated in
In
The electron beam applicator E equipped with the electron gun may be a known device equipped with an electron gun. For example, the electron beam applicator E may be a free electron laser accelerator, an electron microscope, an electron holography device, an electron beam drawing device, an electron diffractometer, an electron beam inspection device, an electron beam metal additive manufacturing device, an electron beam lithography device, an electron beam processing device, an electron beam curing device, an electron beam sterilization device, an electron beam disinfection device, a plasma generation device, an atomic element generation device, a spin-polarized electron beam generation device, a cathodoluminescence device, an inverse photoemission spectroscopy device, or the like.
The present invention is not limited to the respective embodiments described above, and it is clear that each embodiment may be modified or changed as appropriate within the scope of the technical concept of the present invention. Further, any component used in each embodiment can be combined to another embodiment, and any component can be omitted in each embodiment.
With the use of the photocathode kit, the electron gun, and the electron beam applicator disclosed in the present application, the focal point of the lens is always set on the photocathode film by the holder of the photocathode kit. Therefore, the photocathode kit, the electron gun, and the electron beam applicator disclosed in the present application are useful for business entities that handle an electron gun.
Number | Date | Country | Kind |
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2019-150764 | Aug 2019 | JP | national |
Filing Document | Filing Date | Country | Kind |
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PCT/JP2020/029447 | 7/31/2020 | WO |
Publishing Document | Publishing Date | Country | Kind |
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WO2021/033519 | 2/25/2021 | WO | A |
Number | Name | Date | Kind |
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9934926 | Nishitani | Apr 2018 | B2 |
20160172144 | Nishitani | Jun 2016 | A1 |
20210035766 | Nishitani et al. | Feb 2021 | A1 |
Number | Date | Country |
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2270832 | Jan 2011 | EP |
S 5697937 | Aug 1981 | JP |
H 054840 | Mar 1993 | JP |
2001143648 | May 2001 | JP |
2002313273 | Oct 2002 | JP |
3537779 | Mar 2004 | JP |
2006119551 | May 2006 | JP |
5808021 | Nov 2015 | JP |
WO 2018186294 | Jun 2019 | JP |
WO 2009119074 | Oct 2009 | WO |
WO 2015008561 | Jan 2015 | WO |
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Number | Date | Country | |
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20220181111 A1 | Jun 2022 | US |