EM Industries, Inc., Merck Electronic Chemicals, "Photoresists", pp. 1-31. |
L. F. Thompson et al, ACS Symposium Series 219, pp. 43-46, 90-92, 107-159, (1983) "Introduction to Microlithography". |
Elsa Reichmanis et al, ACS Symposium Series 412, pp. 1-24, (1989), "Polymers in Microlithography". |
Derwent Abstract 84-196843/32. |
C. G. Roffey, Photopolymerization of Surface Coatings, (1982), pp. 26-27, 67-68, 141-161, 276-283, 290-296. |
H. J. Merrem et al, Polyimides, vol. 2, pp. 919-931, (1984) "New Developments in Photosensitive" Polyimides. |
O. Rohde, Advances in Resist Technology and Processing II, vol. 539, pp. 175-179, (1985), "Recent Advances in Photoimagable Polyimides". |
Journal of Polymer Science: Part A-1, vol. 8, pp. 1939-1948, (1970), "Photocycloaddition Polymerization I. Preparation and Characterization of Poly-N,N'-polymethylenebisdichloromaleimides*". |
Journal of Polymer Science: Part A-1, vol. 8, pp. 1022-1023, (1970), "Photosensitization of Polyacetylenes". |
Probimide.TM. 300, Photosensitive Polyimide System. |
Chemical Abstract 111: 173458u, 1989. |
Chemical Abstract 106: 58785h, 1987. |
Chemical Abstract 86: 113723g, 1977. |
Chemical Abstract 70: 20691z, 1969. |
Douglas G. Borden, ACS Div. Org. Coat Plast. Chem. Pap., vol. 35, pp. 96-101, (1975), "Changes in Photosensitivity". |
Journal of Polymer Science: Part A, vol. 2, pp. 2907-2916, 1964, "Some Aspects of the Photosensitivity of Poly(vinyl Cinnamate)". |
Chemical Abstract 103: 45821e, 1985. |
Chemical Abstract 96: 218715r, 1982. |
Chemical Abstract 92: 199109v, 1980. |
Chemical Abstract 91: 124401e, 1979. |
Chemical Abstract 89: 138345k, 1978. |
Chemical Abstract 88: 191835a, 1978. |