with perfluoro compounds

Industry

CPC
G03F7/0046

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0046with perfluoro compounds

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Lithographically patterned electrically conductive hydrogels, photo...
- Patent number 12,313,969
- Issue date May 27, 2025
- The Board of Trustees of the Leland Stanford Junior University
- Jia Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluoropolymer adhesives and methods thereof
- Patent number 12,275,820
- Issue date Apr 15, 2025
- The Boeing Company
- Ashley M. Dustin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 12,234,369
- Issue date Feb 25, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photoresist with low-activation-energy ligands or high-develope...
- Patent number 12,210,283
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epoxy formulations and processes for fabrication of relief patterns...
- Patent number 12,189,291
- Issue date Jan 7, 2025
- KAYAKU ADVANCED MATERIALS, INC.
- Daniel J. Nawrocki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,169,360
- Issue date Dec 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition for forming underlayer film in imprinting method, kit,...
- Patent number 12,109,752
- Issue date Oct 8, 2024
- FUJIFILM Corporation
- Akihiro Hakamata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Flow cells
- Patent number 11,988,957
- Issue date May 21, 2024
- Illumina, Inc.
- Jeffrey S. Fisher
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Solvent compatible nozzle plate
- Patent number 11,958,292
- Issue date Apr 16, 2024
- Funai Electric Co., Ltd.
- Sean T. Weaver
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,953,829
- Issue date Apr 9, 2024
- FUJIFILM Corporation
- Kazunari Yagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor device and semiconductor proc...
- Patent number 11,899,368
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Kai Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heterogeneous fluoropolymer mixture polishing pad
- Patent number 11,897,082
- Issue date Feb 13, 2024
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Salts and photoresists comprising same
- Patent number 11,880,134
- Issue date Jan 23, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Soft mold formulations for surface relief grating fabrication with...
- Patent number 11,879,024
- Issue date Jan 23, 2024
- Meta Platforms Technologies, LLC
- Zachary Perlmutter
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions and methods
- Patent number 11,829,069
- Issue date Nov 28, 2023
- Rohm and Haas Electronic Materials LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 11,815,813
- Issue date Nov 14, 2023
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet photoresist with high-efficiency electron transfer
- Patent number 11,809,080
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Han Lai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 11,782,342
- Issue date Oct 10, 2023
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 11,747,725
- Issue date Sep 5, 2023
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,747,726
- Issue date Sep 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yuki Fukumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carboxylate, carboxylic acid generator, resist composition and meth...
- Patent number 11,739,056
- Issue date Aug 29, 2023
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 11,740,555
- Issue date Aug 29, 2023
- Sumitomo Chemical Company, Limited
- Yukako Anryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming pattern,...
- Patent number 11,709,428
- Issue date Jul 25, 2023
- JSR Corporation
- Natsuko Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...
- Patent number 11,703,760
- Issue date Jul 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist pattern-forming method, and composition for upper l...
- Patent number 11,687,003
- Issue date Jun 27, 2023
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photoresist with low-activation-energy ligands or high-develope...
- Patent number 11,681,221
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20250237948
- Publication date Jul 24, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231480
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231483
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250224671
- Publication date Jul 10, 2025
- FUJIFILM CORPORATION
- Takahiro Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACK...
- Publication number 20250226236
- Publication date Jul 10, 2025
- Resonac Corporation
- Yuko KONNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250216780
- Publication date Jul 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tetsuya Matsushita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND...
- Publication number 20250180991
- Publication date Jun 5, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Miyakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20250164875
- Publication date May 22, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- KhanhTin NGUYEN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250164878
- Publication date May 22, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20250164883
- Publication date May 22, 2025
- JSR Corporation
- Motohiro SHIRATANI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155801
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20250147418
- Publication date May 8, 2025
- JSR Corporation
- Naoki NISHIGUCHI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
COMPOSITION, TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMIN...
- Publication number 20250123561
- Publication date Apr 17, 2025
- FUJIFILM CORPORATION
- Keigo YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
- Publication number 20250123566
- Publication date Apr 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LITHOGRAPHICALLY PATTERNED ELECTRICALLY CONDUCTIVE HYDROGELS, PHOTO...
- Publication number 20250110401
- Publication date Apr 3, 2025
- The Board of Trustees of the Leland Stanford Junior University
- Jia LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM...
- Publication number 20250110407
- Publication date Apr 3, 2025
- JSR Corporation
- Hiroyuki KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST CO...
- Publication number 20250102909
- Publication date Mar 27, 2025
- INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITY
- Hyun-Dam JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250076760
- Publication date Mar 6, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLOW CELLS
- Publication number 20240302738
- Publication date Sep 12, 2024
- Illumina, Inc.
- Jeffrey S. Fisher
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, MET...
- Publication number 20240248398
- Publication date Jul 25, 2024
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHO...
- Publication number 20240231227
- Publication date Jul 11, 2024
- Heraeus Epurio LLC
- Ram B. SHARMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLVENT COMPATIBLE NOZZLE PLATE
- Publication number 20240198675
- Publication date Jun 20, 2024
- Funai Electric Co., Ltd.
- Sean T. WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY PATTERNING METHOD
- Publication number 20240176245
- Publication date May 30, 2024
- Korea Advanced Institute of Science and Technology
- Jungchul SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, FLUORINE-CONTAININ...
- Publication number 20240134276
- Publication date Apr 25, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20230367210
- Publication date Nov 16, 2023
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20230341772
- Publication date Oct 26, 2023
- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20230314956
- Publication date Oct 5, 2023
- Samsung Electronics Co., Ltd.
- Sungkun KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Euv Photoresist With Low-Activation-Energy Ligands Or High-Develope...
- Publication number 20230305396
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...
- Publication number 20230280652
- Publication date Sep 7, 2023
- JSR CORPORATION
- Natsuko KINOSHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
REFRACTIVE INDEX CONTRAST POLYMERS AND METHODS FOR PRODUCING AND US...
- Publication number 20230258864
- Publication date Aug 17, 2023
- Arizona Board of Regents on behalf of The University of Arizona
- Dong-Chul "Jeffrey" PYUN
- G02 - OPTICS

with perfluoro compounds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithographically patterned electrically conductive hydrogels, photo...

Treatment liquid and pattern forming method

Fluoropolymer adhesives and methods thereof

Photoresist topcoat compositions and methods of processing photores...

Pattern formation methods

Solution, solution storage body, actinic ray-sensitive or radiation...

EUV photoresist with low-activation-energy ligands or high-develope...

Epoxy formulations and processes for fabrication of relief patterns...

Resist composition and patterning process

Negative resist formulation for producing undercut pattern profiles

Composition for forming underlayer film in imprinting method, kit,...

Flow cells

Solvent compatible nozzle plate

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Manufacturing method of semiconductor device and semiconductor proc...

Heterogeneous fluoropolymer mixture polishing pad

Salts and photoresists comprising same

Soft mold formulations for surface relief grating fabrication with...

Photoresist compositions and methods

Compound, resin, resist composition and method for producing resist...

Extreme ultraviolet photoresist with high-efficiency electron transfer

Salt and photoresist composition containing the same

Radiation-sensitive resin composition and method for forming resist...

Resist composition and method of forming resist pattern

Carboxylate, carboxylic acid generator, resist composition and meth...

Resist composition and method for producing resist pattern

Radiation-sensitive resin composition, method for forming pattern,...

Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...

Negative resist pattern-forming method, and composition for upper l...

EUV photoresist with low-activation-energy ligands or high-develope...

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACK...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...

COMPOSITION, TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMIN...

ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...

LITHOGRAPHICALLY PATTERNED ELECTRICALLY CONDUCTIVE HYDROGELS, PHOTO...

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM...

TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST CO...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

FLOW CELLS

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, MET...

OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHO...

SOLVENT COMPATIBLE NOZZLE PLATE

PHOTOLITHOGRAPHY PATTERNING METHOD

PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, FLUORINE-CONTAININ...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

SUBSTRATE PROCESSING METHOD

Euv Photoresist With Low-Activation-Energy Ligands Or High-Develope...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...

REFRACTIVE INDEX CONTRAST POLYMERS AND METHODS FOR PRODUCING AND US...