Claims
- 1. A silver halide photographic light-sensitive material comprising a support and at least one silver halide emulsion layer, wherein at least one layer of said silver halide photographic light-sensitive material contains a highly water-absorbing high molecular weight compound having a degree of swelling for water of 5 or more in an amount sufficient to accelerate time of development processing and/or dye transfer, wherein the highly water-absorbing high molecular weight compound is a saponified product of a copolymer composed of at least one vinyl ester and ethylenically unsaturated carboxylic acid or derivatives thereof, or a hydrolyzate of an acrylonitrile type polymer.
- 2. A silver halide photographic light-sensitive material as in claim 1, wherein said material further comprises a dye providing layer, and wherein said layer of said silver halide photographic light-sensitive material containing a highly water-absorbing high molecular weight compound is said dye providing layer.
- 3. A silver halide photographic light-sensitive material as in claim 1, wherein the highly water-absorbing high molecular weight compound has a degree of swelling for water of 10 or more.
- 4. A silver halide photographic light-sensitive material as in claim 3, wherein the molar ratio of vinyl ester component to ethylenically unsaturated carboxylic acid component is from 20/80 to 80/20.
- 5. A silver halide photographic light-sensitive material as in claim 4, wherein the molar ratio of vinyl ester component to ethylenically unsaturated carboxylic acid component in the highly water-absorbing high molecular weight compound is from 30/70 to 70/30.
- 6. A silver halide photographic light-sensitive material as in claim 4, wherein the molar ratio of vinyl ester component to ethylenically unsaturated carboxylic acid component in the highly water-absorbing high molecular weight compound is from 40/60 to 60/40.
- 7. A silver halide photographic light-sensitive material as in claim 1, wherein the highly water-absorbing high molecular weight compound is a hydrolyzate of an acrylonitrile type polymer wherein the content of skeletal acrylonitrile is 30 wt % or more.
- 8. A silver halide photographic light-sensitive material as in claim 7, wherein the content of skeletal acrylonitrile in the hydrolyzate of an acrylonitrile type polymer is 50 wt % or more.
- 9. A silver halide photographic light-sensitive material as in claim 1, wherein the highly water-absorbing high molecular weight compound forms a coating layer that is crosslinked or cured after coating.
- 10. A silver halide photographic light-sensitive material as in claim 1, wherein the highly water-absorbing high molecular weight compound is used in an amount of from 0.1 to 20 g per m.sup.2 of the support.
- 11. A silver halide photographic light-sensitive material as in claim 1, wherein the highly water-absorbing high molecular weight compound is used in an amount of from 0.5 to 5 g per m.sup.2 of the support.
- 12. A silver halide photographic light-sensitive material as in claim 1, wherein the light-sensitive material is a silver halide color photographic material and the highly water-absorbing high molecular weight compound is present in an interlayer of said material.
- 13. A silver halide photographic light-sensitive material as in claim 1, wherein the layer containing the highly water-absorbing high molecular weight compound is the silver halide emulsion layer.
- 14. A silver halide photographic light-sensitive material as in claim 1, wherein the layer containing the highly water-absorbing high molecular weight compound is the coating layer.
- 15. A silver halide photographic light-sensitive material as in claim 1, wherein the layer containing the highly water-absorbing high molecular weight compound is an interlayer.
- 16. A silver halide photographic light-sensitive material as in claim 1, wherein the highly water-absorbing high molecular weight compound is contained in more than one layer.
Priority Claims (1)
Number |
Date |
Country |
Kind |
59-277778 |
Dec 1984 |
JPX |
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Parent Case Info
This is a continuation of application Ser. No. 07/344,524 filed Apr. 26, 1989 now abandoned, which is a continuation of application Ser. No. 06/811,859 filed Dec. 20, 1985, now abandoned.
US Referenced Citations (12)
Foreign Referenced Citations (1)
Number |
Date |
Country |
52-102712 |
Aug 1977 |
JPX |
Continuations (2)
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Number |
Date |
Country |
Parent |
344524 |
Apr 1989 |
|
Parent |
811859 |
Dec 1985 |
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