Number | Date | Country | Kind |
---|---|---|---|
3710282 | Mar 1987 | DEX |
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---|---|---|---|
2850445 | Oster | Sep 1958 | |
2875047 | Oster | Feb 1959 | |
3097096 | Oster | Jul 1963 | |
3488269 | Allen et al. | Jan 1970 | |
3597343 | Delzenne et al. | Aug 1971 | |
3759807 | Osborn et al. | Sep 1973 | |
3782961 | Takahashi | Jan 1974 | |
3850770 | Juna et al. | Nov 1974 | |
3864133 | Hisamatsu et al. | Feb 1975 | |
3960572 | Ibata et al. | Jun 1976 | |
4019972 | Faust | Apr 1977 | |
4054682 | Kuesters et al. | Oct 1977 | |
4071424 | Dart et al. | Jan 1978 | |
4250248 | Faust | Feb 1981 | |
4266004 | Kern | May 1981 | |
4279982 | Iwasaki et al. | Jul 1981 | |
4293635 | Flint et al. | Oct 1981 | |
4339566 | Rosenkranz | Jul 1982 | |
4458007 | Geissler et al. | Jul 1984 | |
4495271 | Geissler et al. | Jan 1985 | |
4517281 | Briney et al. | May 1985 | |
4559382 | Martens et al. | Dec 1985 | |
4636459 | Kawamura | Jan 1987 | |
4650743 | Galloway | Mar 1987 | |
4732840 | Hasegawa | Aug 1988 | |
4895788 | Walls et al. | Jan 1990 | |
4956264 | Geissler et al. | Sep 1990 | |
4983498 | Rode et al. | Jan 1991 |
Entry |
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Chemical Abstracts, 74-Radiation Chem., Photochem., vol. 85, 1976, 85:54620a, Photoresists For Printing Platemaking and Printed Circuit Fabrication, p. 555. |
Photoresist, W. S. DeForest, McGraw-Hill Book Co., New York, pp. 178-183, 1975. |
Photopolymerization of Surface Coatings, C. G. Roffey, John Wiley and Son, Chichester, pp. 182-185, 1982. |