Claims
- 1. In a process for stripping crosslinked photoresist polymer which employs a mixture of methylene chloride and methanol the improvement which comprises employing said mixture additionally containing methyl formate, and wherein the methanol and methyl formate are each present in an amount of from about 1 to about 10 volume percent of the total mixture and wherein the total amount of methanol and methyl formate is at least about 5 and not more than 10 volume percent of the total mixture.
- 2. The process of claim 1 wherein the methanol and methyl formate are each present in an amount of from about 1 to about 5 volume percent.
- 3. The process of claim 2 wherein the methanol and methyl formate are each present in an amount of from about 2.5 to about 5 volume percent each.
- 4. The process of claim 3 wherein the stripping mixture also contains an amine selected from the group consisting of isopropylamine, cyclohexylamine and triethylamine as an aid in stripping.
CROSS-REFERENCE TO RELATED APPLICATION
This is a divisional of application Ser. No. 465,975, filed Feb. 14, 1983, now U.S. Pat. No. 4,438,192.
US Referenced Citations (17)
Divisions (1)
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Number |
Date |
Country |
Parent |
465975 |
Feb 1983 |
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