Claims
- 1. A photosensitive composition comprising a first o-naphthoquinone diazido compound represented by the following general formula ##STR5## wherein n is an integer of 2-5, in an effective amount up to 40% by weight based on said composition, a triphenylmethane dye in an amount of 0.5 to 5% by weight, and an alkali soluble, non-photosensitive resin.
- 2. The composition of claim 1 wherein said o-naphthoquinone diazido compound is present in an amount of at least 1% by weight based on said composition.
- 3. A photosensitive composition according to claim 1 wherein said first o-naphthoquinonediazido compound is represented by the following formula; ##STR6##
- 4. A composition according to claim 1 wherein n is 2 or 3.
- 5. The photosensitive composition of claim 1 wherein said non-photosensitive resin is selected from the group consisting of m-cresolformaldehyde novolak resins, shellac, rosin, polyacrylic acid, polymethacrylic acid, methacrylic acid methylmethacrylate copolymer, methacrylic acid styrene copolymers, and poly-p-hydroxystyrene.
- 6. A photosensitive composition according to claim 1 further containing a second o-naphthoquinonediazido compound other than said first o-naphthoquinondiazido.
- 7. A photosensitive composition according to claim 6 wherein said second o-naphthoquinonediazido compound is one selected from the group consisting of esters of naphthoquinone-(1,2)-diazido-(2)-sulfonic acid chloride with phenol- or cresol-formaldehyde resin.
- 8. A photosensitive material comprising a support and the photosensitive composition of claim 1 coated thereon.
- 9. The photosensitive material of claim 8 wherein said non-photosensitive resin is selected from the group consisting of m-cresolformaldehyde novolak resins, m-xylenol formaldehyde novolak resins, shellac, rosin, polyacrylic acid, polymethacrylic acid, methacrylic acid-methylmethacrylate copolymers, methacrylic acid-styrene copolymers, and poly-p-hydroxystyrene.
Priority Claims (1)
Number |
Date |
Country |
Kind |
53-136208 |
Nov 1978 |
JPX |
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Parent Case Info
This Application is a continuation application of Ser. No. 248,301, filed Mar. 27, 1981 now abandoned which is a continuation of Ser. No. 090,869, filed Nov. 2, 1979, now abandoned which in turn claims priority of Japanese Application No. 136208/1978 filed on Nov. 2, 1978.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
3046121 |
Schmidt |
Jul 1962 |
|
3201239 |
Neugebauer et al. |
Aug 1965 |
|
3969118 |
Stahlhofen et al. |
Jul 1976 |
|
Continuations (2)
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Number |
Date |
Country |
Parent |
248301 |
Mar 1981 |
|
Parent |
90869 |
Nov 1979 |
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