Number | Date | Country | Kind |
---|---|---|---|
199 33 642 | Jul 1999 | DE |
Filing Document | Filing Date | Country | Kind |
---|---|---|---|
PCT/DE00/01989 | WO | 00 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO01/05625 | 1/25/2001 | WO | A |
Number | Name | Date | Kind |
---|---|---|---|
4645975 | Meitzler et al. | Feb 1987 | A |
5661303 | Teder | Aug 1997 | A |
5990628 | Birrell | Nov 1999 | A |
6376824 | Michenfelder et al. | Apr 2002 | B1 |
6507015 | Maeno et al. | Jan 2003 | B1 |
Number | Date | Country |
---|---|---|
195 23 262 | Jan 1997 | DE |
197 04 818 | Aug 1997 | DE |
0 857 611 | Aug 1998 | DE |
198 39 273 | Sep 1999 | DE |
Entry |
---|
“Synthese and characterization of aerosol silicon nanocrystal nonvolatile floating-gate memory device”, M.L. Ostraat et al., Applied Physics Letters, vol. 79, No. 3, Jul. 16, 2001, pp. 433-435. |
“Ultraclean Two-Stage Aerosol Reactor for Production of Oxide-Passivated Silicon Nanoparticles for Novel Memory Devices”, Michele L. Ostraat et al., Journal of The Electrochemical Society; 148 (5), pp. G265-G270. |