Claims
- 1. A poly(amic acid) ester resin obtained by esterifying carboxyl groups of a poly(amic acid) resin having recurring units represented by the formula: ##STR42## wherein X is a monovalent photosensitive group; R.sub.1 is a (2+p)-valent organic group; R.sub.11 is a tetravalent organic group; R.sub.12 is a divalent organic group; p is an integer of 1 to 12; and m and n are molar numbers of recurring units, and m/n is 1/99 to 100/0, with a compound having no vinyl group, or obtained by subjecting a diamino compound of the formula: ##STR43## wherein X is a monovalent photosensitive group; R.sub.1 is a (2+p)-valent organic group; and p is an integer of 1 to 12, another diamino compound, if used, and a tetravalent carboxylic acid diester to a condensation reaction.
- 2. A poly(amic acid) ester resin according to claim 1, wherein said compound having no vinyl group is a compound having a group --CH.sub.3, --C.sub.2 H.sub.5, --C(CH.sub.3).sub.3, --Si(CH.sub.3).sub.3, --Si(C.sub.2 H.sub.5).sub.3 or --Si(t-Bu)(CH.sub.3).sub.2.
- 3. A poly(amic acid) ester resin according to claim 1, wherein X in formula (I) is one of the groups represented by formulae: ##STR44## wherein R.sub.2 is a divalent group derived from an alkyl group; R.sub.6 and R.sub.9 are independently a divalent group derived from an alkyl group, a divalent group derived from a cycloalkyl group which may contain a methyl or methoxy group, or a divalent aromatic group which may contain a methyl or methoxy group; R.sub.10 is a divalent organic group; R.sub.3, R.sub.4 and R.sub.5 are independently a hydrogen atom or an alkyl group; R.sub.7 is a tetravalent organic group; R.sub.8 is a monovalent aromatic or heterocyclic group; Y.sub.1, Y.sub.2 and Y.sub.3 are independently a hydrogen atom or a monovalent organic group having one or more vinyl groups, provided that at least one of Y.sub.1, Y.sub.2 and Y.sub.3 is a monovalent organic group having a vinyl group; and k is 1 or 2.
- 4. A poly(amic acid) ester resin according to claim 1, wherein R.sub.1 in formula (I) is a group represented by one of the following formulas: ##STR45##
- 5. A poly(amic acid) ester resin according to claim 1, wherein said diamino compound represented by formula (I) is a compound represented by one of the following formulas: ##STR46##
- 6. A poly(amic acid) ester resin according to claim 1, wherein p in the formula (I) is an integer of 1 or 2.
- 7. A poly(amic acid) ester resin according to claim 1, wherein X in the formula (II) is one of the groups represented by formulae: ##STR47## wherein R.sub.2 is a divalent group derived from an alkyl group; R.sub.6 and R.sub.9 are independently a divalent group derived from an alkyl group, a divalent group derived from a cycloalkyl group which may contain a methyl or methoxy group, or a divalent aromatic group which may have a methyl or methoxy group; R.sub.10 is a divalent organic group; R.sub.3, R.sub.4 and R.sub.5 are independently a hydrogen atom or an alkyl group; R.sub.7 is a tetravalent organic group; R.sub.8 is a monovalent aromatic or heterocyclic group; Y.sub.1, Y.sub.2 and Y.sub.3 are independently a hydrogen atom or a monovalent organic group having a vinyl group, provided that at least one of Y.sub.1, Y.sub.2 and Y.sub.3 is a monovalent organic group having a vinyl group; and k is 1 or 2.
- 8. A poly(amic acid) ester resin according to claim 1, wherein less than 50% by mole of R.sub.11 in the formula (II) is a group represented by the formula: ##STR48##
- 9. A poly(amic acid) ester resin according to claim 1, wherein p in the formula (II) is an integer of 1 or 2.
Priority Claims (2)
Number |
Date |
Country |
Kind |
4-007467 |
Jan 1992 |
JPX |
|
4-298560 |
Nov 1992 |
JPX |
|
CROSS-REFERENCE TO RELATED APPLICATION
This application is a divisional application of appplication Ser. No. 005,210, filed Jan. 15, 1993, which issued as U.S. Pat. No. 5,472,823 on Dec. 5, 1995.
US Referenced Citations (3)
Divisions (1)
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Number |
Date |
Country |
Parent |
05210 |
Jan 1993 |
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