Number | Name | Date | Kind |
---|---|---|---|
3881971 | Greer et al. | May 1975 | |
3971684 | Muto | Jul 1976 | |
4106051 | Dormer et al. | Aug 1978 | |
4214946 | Forget | Jul 1980 | |
4255230 | Zajac | Mar 1981 | |
4256534 | Levinstein | Mar 1981 | |
4298443 | Maydan | Nov 1981 | |
4310380 | Flamm et al. | Jan 1982 | |
4383885 | Maydan | May 1983 |
Number | Date | Country |
---|---|---|
5506407 | Jan 1981 | JPX |
Entry |
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Bower, "Planar . . . NF.sub.3 " J. of Electrochemical Society vol. 129, No. 4 (4/82) pp. 795-799. |
G. C. Schwartz and P. M. Schaible, "Reactive Ion Etching of Silicon", *Journal of Vacuum Science and Technology 16(2), Mar./Apr. 1979, p. 410. |
W. W. Yao and R. H. Bruce, "Anisotropic Polysilicon Etching with Cl.sub.2 Plasma", *Electrochemical Society Extended Abstracts, vol. 81-2, Oct. 1981, p. 652. |